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Letters
Maximizing the performance of a field emission device by profiling the emitter’s height distribution
In Special Collection:
Vacuum Nanoelectronics
J. Vac. Sci. Technol. B 41, 050601 (2023)
https://doi.org/10.1116/6.0003016
ARTICLES
Electronic and Optoelectronic Materials, Devices and Processing
Electrochemical bulk and film-type oxygen sensors: Strategies for detecting extremely low concentration in hydrogen environments
J. Vac. Sci. Technol. B 41, 052201 (2023)
https://doi.org/10.1116/6.0002631
Plasma processing and annealing for defect management at SiO2/Si interface
J. Vac. Sci. Technol. B 41, 052202 (2023)
https://doi.org/10.1116/6.0002822
Novel process integration flow of germanium-on-silicon FinFETs for low-power technologies
Sumit Choudhary; Midathala Yogesh; Daniel Schwarz; Hannes S. Funk; Subrata Ghosh; Satinder K. Sharma; Jörg Schulze; Kenneth E. Gonsalves
J. Vac. Sci. Technol. B 41, 052203 (2023)
https://doi.org/10.1116/6.0002767
Method for improving dry etching end point detection based on change in time accumulation correlation of plasma emitting wavelengths
J. Vac. Sci. Technol. B 41, 052204 (2023)
https://doi.org/10.1116/6.0002890
Microstructure, creep properties, and electrical resistivity of magnetron sputtering deposited SAC305 thin films
J. Vac. Sci. Technol. B 41, 052205 (2023)
https://doi.org/10.1116/6.0002949
Simulation analyses of carrier dynamics in npn-type GaN-heterojunction bipolar transistors with different hole-concentration p-base layers
J. Vac. Sci. Technol. B 41, 052206 (2023)
https://doi.org/10.1116/6.0002577
Top electrode dependence of the write-once-read-many-times resistance switching in BiFeO3 films
J. Vac. Sci. Technol. B 41, 052207 (2023)
https://doi.org/10.1116/6.0002946
Role of dislocations on Sn diffusion during low temperature annealing of GeSn layers
Hryhorii Stanchu; Abdulla Said; Oluwatobi Olorunsola; Sudip Acharya; Sylvester Amoah; Mohammad Zamani-Alavijeh; Fernando M. de Oliveira; Santosh Karki Chhetri; Jin Hu; Yuriy I. Mazur; Shui-Qing Yu; Gregory Salamo
J. Vac. Sci. Technol. B 41, 052208 (2023)
https://doi.org/10.1116/6.0002957
Metal-pattern preparation based on selective deposition using soft organofluorine surfaces
J. Vac. Sci. Technol. B 41, 052209 (2023)
https://doi.org/10.1116/6.0002832
Investigation of the deposition of α-tantalum (110) films on a-plane sapphire substrate by molecular beam epitaxy for superconducting circuit
Haolin Jia; Boyi zhou; Tao Wang; Yanfu Wu; Lina Yang; Zengqian Ding; Shuming Li; Xiao Cai; Kanglin Xiong; Jiagui Feng
J. Vac. Sci. Technol. B 41, 052210 (2023)
https://doi.org/10.1116/6.0002886
Energy Conversion and Storage Devices
Electrochemical imaging correlated to hydrogen evolution reaction on transition metal dichalcogenide, WS2
Akichika Kumatani; Hiroto Ogawa; Takahiko Endo; Yu Kobayashi; Jana Lustikova; Hiroki Ida; Yasufumi Takahashi; Tomokazu Matsue; Yasumitsu Miyata; Hitoshi Shiku
J. Vac. Sci. Technol. B 41, 052401 (2023)
https://doi.org/10.1116/6.0002706
Lithography
Synergy of cold development and electron-beam exposure for Si nanotip patterning in quantum-electronic devices
J. Vac. Sci. Technol. B 41, 052601 (2023)
https://doi.org/10.1116/6.0002845
Interpolation and difference optimized machine learning model for accurate prediction of silicon etching depth with small sample dataset
J. Vac. Sci. Technol. B 41, 052602 (2023)
https://doi.org/10.1116/6.0002823
Nanoscale Science and Technology
Understanding the origin of micro/nanoporous thin films of PMMA
J. Vac. Sci. Technol. B 41, 052801 (2023)
https://doi.org/10.1116/6.0002787
Influence of electron beam irradiation on nanoscale adhesion during colloidal probe experiments inside the scanning electron microscope
J. Vac. Sci. Technol. B 41, 052802 (2023)
https://doi.org/10.1116/6.0002764
Strong-field electron emission from gold needle tips
In Special Collection:
Physics and Chemistry of Surfaces and Interfaces
J. Vac. Sci. Technol. B 41, 052803 (2023)
https://doi.org/10.1116/6.0002916
Ce0.7La0.15Ca0.15O2−δ nanoparticles synthesis via colloidal solution combustion method: Studying structural and physicochemical properties and Congo Red dye photodegradation
Adnene Midouni; Anis Chaouachi; Sami Barkaoui; Nejib Abassi; Samir Chakhari; Ammar Mahjoubi; Djamel Ghernaout; Ahmed Hichem Hamzaoui; Muhammad Imran Khan; Noureddine Elboughdiri
J. Vac. Sci. Technol. B 41, 052804 (2023)
https://doi.org/10.1116/6.0002825
Temperature dependent correlation of Hall effect and optical measurements of electron concentration in degenerate InN thin film
In Special Collection:
Physics and Chemistry of Surfaces and Interfaces
Fernando M. de Oliveira; Chen Li; Pijush K. Ghosh; Andrian V. Kuchuk; Morgan E. Ware; Yuriy I. Mazur; Gregory J. Salamo
J. Vac. Sci. Technol. B 41, 052805 (2023)
https://doi.org/10.1116/6.0002866
MEMS and NEMS
Microelectronic and Nanoelectronic Devices
Effects of gases on the field emission performance of silicon gated field emitter array
Ranajoy Bhattacharya; Mason Cannon; Girish Rughoobur; Nedeljko Karaulac; Winston Chern; Reza Farsad Asadi; Zheng Tao; Bruce E. Gnade; Akintunde Ibitayo Akinwande; Jim Browning
J. Vac. Sci. Technol. B 41, 053201 (2023)
https://doi.org/10.1116/6.0002789
Plasma-induced energy band evolution for two-dimensional heterogeneous anti-ambipolar transistors
Simran Shahi; Asma Ahmed; Ruizhe Yang; Anthony Cabanillas; Anindita Chakravarty; Maomao Liu; Hemendra Nath Jaiswal; Yu Fu; Yutong Guo; Satyajeetsinh Shaileshsin Jadeja; Hariharan Murugesan; Anthony Butler; Chu Te Chen; Joel Muhigirwa; Mohamed Enaitalla; Jun Liu; Fei Yao; Huamin Li
J. Vac. Sci. Technol. B 41, 053202 (2023)
https://doi.org/10.1116/6.0002888
Influence of external circuitry on CF4 breakdown process in capacitively coupled plasma
J. Vac. Sci. Technol. B 41, 053203 (2023)
https://doi.org/10.1116/5.0161552
Measurement and Characterization
Effect of annealing on focused ion beam induced surface damages in silicon analyzed by micro-Raman spectroscopy
J. Vac. Sci. Technol. B 41, 054001 (2023)
https://doi.org/10.1116/6.0002895
Cluster-induced desorption/ionization mass spectrometry of Ir(ppy)3
In Special Collection:
Secondary Ion Mass Spectrometry (SIMS)
J. Vac. Sci. Technol. B 41, 054002 (2023)
https://doi.org/10.1116/6.0002556
Vacuum Measurement and Technology
Fabrication of pyramid-shaped gold tip for adiabatic nanofocusing of surface plasmon polaritons
J. Vac. Sci. Technol. B 41, 054201 (2023)
https://doi.org/10.1116/6.0002505
Investigation of the intrinsic outgassing rates for narrow structured vacuum devices under readsorption effect
J. Vac. Sci. Technol. B 41, 054202 (2023)
https://doi.org/10.1116/6.0002906
Errata
Erratum: “Electronic structure of InSb (001), (110), and (111)B surfaces” [J. Vac. Sci. Technol. B 41, 032808 (2023)]
Jason T. Dong; Hadass S. Inbar; Mihir Pendharkar; Teun A. J. van Schijndel; Elliot C. Young; Connor P. Dempsey; Christopher J. Palmstrøm
J. Vac. Sci. Technol. B 41, 053401 (2023)
https://doi.org/10.1116/6.0002960
Comments
Perspectives
Measuring and understanding the nanomechanical properties of halide perovskites and their correlation to structure—A perspective
J. Vac. Sci. Technol. B 41, 058501 (2023)
https://doi.org/10.1116/6.0002794
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications
A. S. Stodolna, T. W. Mechielsen, et al.
Infrared optical properties of SiGeSn and GeSn layers grown by molecular beam epitaxy
Glenn G. Jernigan, John P. Murphy, et al.