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Novel excitation structure to improve the performance of a miniature radio frequency ion thruster

Wenjia Jiang; Liqiu Wei; Xinyong Yang; Zhou Yang

J. Vac. Sci. Technol. B 41, 040601 (2023) https://doi.org/10.1116/6.0002753

Abstract

View articletitled, Novel excitation structure to improve the performance of a miniature radio frequency ion thruster

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ARTICLES

Electronic and Optoelectronic Materials, Devices and Processing

Exploring the mysteries of topology in quantum materials by spin-resolved spectroscopies

In Special Collection: Papers from the 14th International Symposium on Atomic Level Characterizations for New Materials and Devices (ALC '22)

C. Tusche; K. Hagiwara; X. L. Tan; Y.-J. Chen; C. M. Schneider

J. Vac. Sci. Technol. B 41, 042201 (2023) https://doi.org/10.1116/6.0002707

Abstract

View articletitled, Exploring the mysteries of topology in quantum materials by spin-resolved spectroscopies

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High-quality GeSn thin-film resonant cavities for short-wave infrared applications

Jheng-Ying Wu; Yu-Fu Wang; Chia-You Liu; Shin-Chun Kuo; Tzu-Hsuan Chen; Jiun-Yun Li; Chin-Ya Huang; Chien-Hao Liu; Jung-Yen Yang; Chun-Chieh Chang; Tzu-Hsuan Chang

J. Vac. Sci. Technol. B 41, 042202 (2023) https://doi.org/10.1116/6.0002525

Abstract

View articletitled, High-quality GeSn thin-film resonant cavities for short-wave infrared applications

Supplementary Material

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Phosphorus deactivation by hydrogen on hot carrier stressed high-voltage N-channel field effect transistor CMOS device demonstrated by scanning capacitance microscopy imaging

Jochonia Nxumalo; Wang Yun-Yu (王允愈); Mike Smith; You Lin (尤林); David Fillmore; Matthew Gerber; Jin Qiang (金强)

J. Vac. Sci. Technol. B 41, 042203 (2023) https://doi.org/10.1116/5.0147443

Abstract

View articletitled, Phosphorus deactivation by hydrogen on hot carrier stressed high-voltage N-channel field effect transistor CMOS device demonstrated by scanning capacitance microscopy imaging

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Fabrication of plasma-reduced silver coupled with titanium dioxide nanoparticles for visible light-driven photocatalysis

In Special Collection: Papers from the 2022 International Symposium of the Vacuum Society of the Philippines (ISVSP 2022)

Arantxa Danielle S. Montallana; Joven Paolo D. Angeles; Jinn P. Chu; Matthew P. Sherburne; Magdaleno R. Vasquez, Jr.; Motoi Wada

J. Vac. Sci. Technol. B 41, 042204 (2023) https://doi.org/10.1116/6.0002510

Abstract

View articletitled, Fabrication of plasma-reduced silver coupled with titanium dioxide nanoparticles for visible light-driven photocatalysis

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Silicon etching by chlorine plasma: Validation of surface reactions mechanism

Dmitry Levko; Laxminarayan L. Raja

J. Vac. Sci. Technol. B 41, 042205 (2023) https://doi.org/10.1116/6.0002608

Abstract

View articletitled, Silicon etching by chlorine plasma: Validation of surface reactions mechanism

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Optical and electronic spin properties of fluorescent micro- and nanodiamonds upon prolonged ultrahigh-temperature annealing

In Special Collection: Honoring Dr. Gary McGuire’s Research and Leadership as Editor of the Journal of Vacuum Science & Technology for Three Decades

Nicholas Nunn; Sergey Milikisiyants; Marco D. Torelli; Richard Monge; Tom Delord; Alexander I. Shames; Carlos A. Meriles; Ashok Ajoy; Alex I. Smirnov; Olga A. Shenderova

J. Vac. Sci. Technol. B 41, 042206 (2023) https://doi.org/10.1116/6.0002797

Abstract

View articletitled, Optical and electronic spin properties of fluorescent micro- and nanodiamonds upon prolonged ultrahigh-temperature annealing

Supplementary Material

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CHORUS

Theoretical prediction of mechanical, thermodynamic, and surface oxygen adsorption properties of anti-perovskite Ti₃AC (A = Tl and Al) ceramics for thermal barrier coating materials

Diyou Jiang; Wei Hu; Haiqing Wan; Sanqiu Liu

J. Vac. Sci. Technol. B 41, 042207 (2023) https://doi.org/10.1116/6.0002623

Abstract

View articletitled, Theoretical prediction of mechanical, thermodynamic, and surface oxygen adsorption properties of anti-perovskite Ti3AC (A = Tl and Al) ceramics for thermal barrier coating materials

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Influence of processing conditions on the titanium–aluminum contact metallization on a silicon wafer for thermal management

Manish Singh; Lakshmi Narayanan Ramasubramanian; Raj N. Singh

J. Vac. Sci. Technol. B 41, 042208 (2023) https://doi.org/10.1116/6.0002749

Abstract

View articletitled, Influence of processing conditions on the titanium–aluminum contact metallization on a silicon wafer for thermal management

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CHORUS

Barrier/seed system for electroless metallization on complex surfaces using (aminomethylaminoethyl)phenethyltrimethoxysilane self-assembled films

In Special Collection: Honoring Dr. Gary McGuire’s Research and Leadership as Editor of the Journal of Vacuum Science & Technology for Three Decades

J. K. L. Peters; G. D. Ashby; H. D. Hallen

J. Vac. Sci. Technol. B 41, 042209 (2023) https://doi.org/10.1116/6.0002519

Abstract

View articletitled, Barrier/seed system for electroless metallization on complex surfaces using (aminomethylaminoethyl)phenethyltrimethoxysilane self-assembled films

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Lithography

Multipurpose active scanning probe cantilevers for near-field spectroscopy, scanning tunnel imaging, and atomic-resolution lithography

Isaac Stricklin; Teodor Gotszalk; Mahmoud Behzadirad; Eberhard Manske; Thomas Kissinger; Ivo W. Rangelow; Tito L. Busani

J. Vac. Sci. Technol. B 41, 042601 (2023) https://doi.org/10.1116/6.0002486

Abstract

View articletitled, Multipurpose active scanning probe cantilevers for near-field spectroscopy, scanning tunnel imaging, and atomic-resolution lithography

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CHORUS

Experimental research on airflow efficiency of dynamic gas lock for extreme ultraviolet lithography

Kuibo Wang; Zixiang Gao; Yan Luo; Xiaobin Wu

J. Vac. Sci. Technol. B 41, 042602 (2023) https://doi.org/10.1116/6.0002661

Abstract

View articletitled, Experimental research on airflow efficiency of dynamic gas lock for extreme ultraviolet lithography

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Generalized performance optimization for massively-parallel electron-beam systems

Soo-Young Lee; Md Nabid Hasan

J. Vac. Sci. Technol. B 41, 042603 (2023) https://doi.org/10.1116/6.0002653

Abstract

View articletitled, Generalized performance optimization for massively-parallel electron-beam systems

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Nanoscale Science and Technology

Effect of praseodymium coating on electron emission from a nanoscale gold field emitter array

L. B. De Rose; D. H. Catanzaro; C. Choi; A. Scherer

J. Vac. Sci. Technol. B 41, 042801 (2023) https://doi.org/10.1116/6.0002700

Abstract

View articletitled, Effect of praseodymium coating on electron emission from a nanoscale gold field emitter array

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AlGe wafer bonding in ultra-high vacuum environment

Thomas Stöttinger; Bernhard Rebhan; Kurt Hingerl

J. Vac. Sci. Technol. B 41, 042802 (2023) https://doi.org/10.1116/6.0002539

Abstract

View articletitled, AlGe wafer bonding in ultra-high vacuum environment

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Rubidium focused ion beam induced platinum deposition

Y. Li; S. Xu; M. Sezen; F. Bakan Misirlioglu; E. J. D. Vredenbregt

J. Vac. Sci. Technol. B 41, 042803 (2023) https://doi.org/10.1116/6.0002609

Abstract

View articletitled, Rubidium focused ion beam induced platinum deposition

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Study of surface damage in silicon by irradiation with focused rubidium ions using a cold-atom ion source

S. Xu; Y. Li; M. A. Verheijen; E. R. Kieft; E. J. D. Vredenbregt

J. Vac. Sci. Technol. B 41, 042804 (2023) https://doi.org/10.1116/6.0002643

Abstract

View articletitled, Study of surface damage in silicon by irradiation with focused rubidium ions using a cold-atom ion source

Supplementary Material

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Vacuum technique of nanodiamond dispersing on a substrate from an aqueous suspension

In Special Collection: Honoring Dr. Gary McGuire’s Research and Leadership as Editor of the Journal of Vacuum Science & Technology for Three Decades

Oleg S. Kudryavtsev; Alexey M. Romshin; Dmitrii G. Pasternak; Igor I. Vlasov

J. Vac. Sci. Technol. B 41, 042805 (2023) https://doi.org/10.1116/6.0002629

Abstract

View articletitled, Vacuum technique of nanodiamond dispersing on a substrate from an aqueous suspension

Supplementary Material

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Acquisition of field ion microscope image using deflector during atom probe analysis

In Special Collection: Papers from the 14th International Symposium on Atomic Level Characterizations for New Materials and Devices (ALC '22)

Masahiro Taniguchi; Yasuo Yamauchi; Kenji Yoshikawa

J. Vac. Sci. Technol. B 41, 042806 (2023) https://doi.org/10.1116/6.0002607

Abstract

View articletitled, Acquisition of field ion microscope image using deflector during atom probe analysis

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Field emission: Applying the “magic emitter” validity test to a recent paper, and related research-literature integrity issues

In Special Collection: Vacuum Nanoelectronics

Richard G. Forbes

J. Vac. Sci. Technol. B 41, 042807 (2023) https://doi.org/10.1116/6.0002739

Abstract

View articletitled, Field emission: Applying the “magic emitter” validity test to a recent paper, and related research-literature integrity issues

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Coaxial ion source: Pressure dependence of gas flow and field ion emission

D. Bedrane; A. Houël; A. Delobbe; M. Lagaize; Ph. Dumas; S. Veesler; E. Salançon

J. Vac. Sci. Technol. B 41, 042808 (2023) https://doi.org/10.1116/6.0002795

Abstract

View articletitled, Coaxial ion source: Pressure dependence of gas flow and field ion emission

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Microelectronic and Nanoelectronic Devices

On the origin and evolution of hotspots in multipatterning processes

Prem Panneerchelvam; Chad M. Huard; Trey Graves; Alessandro Vaglio Pret; Roel Gronheid; Ankur Agarwal; Mark D. Smith

J. Vac. Sci. Technol. B 41, 043201 (2023) https://doi.org/10.1116/6.0002601

Abstract

View articletitled, On the origin and evolution of hotspots in multipatterning processes

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Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling

Roshan J. Tirukkonda; Mark D. Kraman; Rahul Sharangpani; Kartik Sondhi; Aaron N. Fancher; Stephen R. Ross; Joyeeta Nag; Alexei L. Bogdanov; Raghuveer S. Makala; Senaka K. Kanakamedala

J. Vac. Sci. Technol. B 41, 043202 (2023) https://doi.org/10.1116/6.0002709

Abstract

View articletitled, Hardmask engineering by mask encapsulation for enabling next generation reactive ion etch scaling

Supplementary Material

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Simulation of a multichannel vacuum transistor with high cut-off frequency

Zhihua Shen; Xiao Wang; Bin Ge; Shengli Wu; Jinshou Tian

J. Vac. Sci. Technol. B 41, 043203 (2023) https://doi.org/10.1116/6.0002675

Abstract

View articletitled, Simulation of a multichannel vacuum transistor with high cut-off frequency

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Magnetic Devices and Spintronics

Effect of sputtering-target composition on the structure, dielectric, ferroelectric, and energy storage properties of highly (00l)-oriented Ba(Zr_xTi_1–x)O₃ films

Lei Li; Daili Gong; Fangren Hu; Hongbo Cheng; Wei Zhang

J. Vac. Sci. Technol. B 41, 043801 (2023) https://doi.org/10.1116/6.0002547

Abstract

View articletitled, Effect of sputtering-target composition on the structure, dielectric, ferroelectric, and energy storage properties of highly (00l)-oriented Ba(ZrxTi1–x)O3 films

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Measurement and Characterization

Defect formation in InGaAs/AlSb/InAs memory devices

In Special Collection: Physics and Chemistry of Surfaces and Interfaces

Aurelia Trevisan; Peter D. Hodgson; Dominic Lane; Manus Hayne; Paul M. Koenraad

J. Vac. Sci. Technol. B 41, 044001 (2023) https://doi.org/10.1116/6.0002677

Abstract

View articletitled, Defect formation in InGaAs/AlSb/InAs memory devices

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Heat transfer mechanism of electrostatic chuck surface and wafer backside to improve wafer temperature uniformity

Tae Woong Yoon; Sung Il Cho; Minsuk Choi; Sang Jeen Hong

J. Vac. Sci. Technol. B 41, 044002 (2023) https://doi.org/10.1116/6.0002737

Abstract

View articletitled, Heat transfer mechanism of electrostatic chuck surface and wafer backside to improve wafer temperature uniformity

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Growth mode and characterizations of electrodeposited Re thick films from aqueous solutions with additives on Cu (110) + (311) substrates

Wangping Wu; Sheng Lin; Qinqin Wang

J. Vac. Sci. Technol. B 41, 044003 (2023) https://doi.org/10.1116/6.0002691

Abstract

View articletitled, Growth mode and characterizations of electrodeposited Re thick films from aqueous solutions with additives on Cu (110) + (311) substrates

Supplementary Material

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Noise reduction and peak detection in x-ray diffraction data by linear and nonlinear methods

In Special Collection: Honoring Dr. Gary McGuire’s Research and Leadership as Editor of the Journal of Vacuum Science & Technology for Three Decades

Long V. Le; Jeroen A. Deijkers; Young D. Kim; Haydn N. G. Wadley; David E. Aspnes

J. Vac. Sci. Technol. B 41, 044004 (2023) https://doi.org/10.1116/6.0002526

Abstract

View articletitled, Noise reduction and peak detection in x-ray diffraction data by linear and nonlinear methods

Supplementary Material

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Rapid detection of radiation susceptible regions in electronics

Sergei P. Stepanoff; Aman Haque; Fan Ren; Stephen Pearton; Douglas E. Wolfe

J. Vac. Sci. Technol. B 41, 044005 (2023) https://doi.org/10.1116/6.0002689

Abstract

View articletitled, Rapid detection of radiation susceptible regions in electronics

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CHORUS

A novel design of a retarding field electron energy analyzer with a cavity electrode providing extremely high energy resolution

Kazuhiro Honda; Hiroyuki Ito; Souichi Katagiri; Takashi Doi; Masahiro Sasaki

J. Vac. Sci. Technol. B 41, 044006 (2023) https://doi.org/10.1116/6.0002597

Abstract

View articletitled, A novel design of a retarding field electron energy analyzer with a cavity electrode providing extremely high energy resolution

Supplementary Material

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Secondary ion mass spectrometry analysis of metal oxides using 70 keV argon, carbon dioxide, and water gas cluster ion beams

In Special Collection: Secondary Ion Mass Spectrometry (SIMS)

A. H. Alsaedi; A. S. Walton; N. P. Lockyer

J. Vac. Sci. Technol. B 41, 044007 (2023) https://doi.org/10.1116/6.0002591

Abstract

View articletitled, Secondary ion mass spectrometry analysis of metal oxides using 70 keV argon, carbon dioxide, and water gas cluster ion beams

Supplementary Material

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Surface and functional characterization of nanostructured thin films for environmental remediation

In Special Collection: Secondary Ion Mass Spectrometry (SIMS)

Enrica Maria Malannata; Alessandro Auditore; Antonino Licciardello

J. Vac. Sci. Technol. B 41, 044008 (2023) https://doi.org/10.1116/6.0002611

Abstract

View articletitled, Surface and functional characterization of nanostructured thin films for environmental remediation

Supplementary Material

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Determining the oxygen detection limit with magnetic sector dynamic secondary ion mass spectrometry (SIMS)

In Special Collection: Secondary Ion Mass Spectrometry (SIMS)

A. Merkulov

J. Vac. Sci. Technol. B 41, 044009 (2023) https://doi.org/10.1116/6.0002578

Abstract

View articletitled, Determining the oxygen detection limit with magnetic sector dynamic secondary ion mass spectrometry (SIMS)

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Vacuum Measurement and Technology

Development of the electron cyclotron resonance heating system for Divertor Tokamak Test

In Special Collection: XXV AIV Conference - Materials, Interfaces, and Processes in Industrial and Basic Research Applications (2022)

Saul Garavaglia; Luca Balbinot; Alessandro Bruschi; Daniele Busi; Andrea Bussolan; Francesco Fanale; Gustavo Granucci; Alessandro Moro; Paola Platania; Natale Rispoli; Afra Romano; Emanuele Sartori; Stefan Schmuck; Alessandro Simonetto; Espedito Vassallo

J. Vac. Sci. Technol. B 41, 044201 (2023) https://doi.org/10.1116/6.0002396

Abstract

View articletitled, Development of the electron cyclotron resonance heating system for Divertor Tokamak Test

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Morphologic and electronic changes induced by thermally supported hydrogen cleaning of GaAs(110) facets

In Special Collection: Physics and Chemistry of Surfaces and Interfaces

D. S. Rosenzweig; M. Schnedler; R. E. Dunin-Borkowski; Ph. Ebert; H. Eisele

J. Vac. Sci. Technol. B 41, 044202 (2023) https://doi.org/10.1116/6.0002733

Abstract

View articletitled, Morphologic and electronic changes induced by thermally supported hydrogen cleaning of GaAs(110) facets

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On the origins of the m/z = 19 signals in residual gas analysis

Sean Davies; Dane E. Walker; John A. Rees; David L. Seymour

J. Vac. Sci. Technol. B 41, 044203 (2023) https://doi.org/10.1116/6.0002498

Abstract

View articletitled, On the origins of the m/z = 19 signals in residual gas analysis

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Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy

In Special Collection: Papers from the 14th International Symposium on Atomic Level Characterizations for New Materials and Devices (ALC '22)

Kento Takenaka; Koji Takahara; Tomoki Eguchi; Hirosuke Sumida; Satoru Suzuki

J. Vac. Sci. Technol. B 41, 044204 (2023) https://doi.org/10.1116/6.0002662

Abstract

View articletitled, Deviation of photoelectron intensity from Beer-Lambert law in near-ambient pressure hard x-ray photoelectron spectroscopy

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Surface modification of s235 steel, molybdenum, and tungsten using electron beam scanning and electric discharge machining

In Special Collection: Secondary Ion Mass Spectrometry (SIMS)

Piotr Konarski; Joachim Ażgin; Aleksander Zawada; Sung-Hui Feng; Ching-Hsiang Chien; Dong-Yea Sheu

J. Vac. Sci. Technol. B 41, 044205 (2023) https://doi.org/10.1116/6.0002605

Abstract

View articletitled, Surface modification of s235 steel, molybdenum, and tungsten using electron beam scanning and electric discharge machining

Supplementary Material

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Heat-transfer modeling of the gas gap under a wafer

E. Gonzalez-Juez

J. Vac. Sci. Technol. B 41, 044206 (2023) https://doi.org/10.1116/6.0002851

Abstract

View articletitled, Heat-transfer modeling of the gas gap under a wafer

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Notes

Practical guide for in-house solid-state nanopore fabrication and characterization

Anumol Dominic; Muhammad Sajeer Parambath; Simran Nasa; Manoj Varma

J. Vac. Sci. Technol. B 41, 043204 (2023) https://doi.org/10.1116/6.0002682

Abstract

View articletitled, Practical guide for in-house solid-state nanopore fabrication and characterization

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Issues

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Letters

ARTICLES

Electronic and Optoelectronic Materials, Devices and Processing

Lithography

Nanoscale Science and Technology

Microelectronic and Nanoelectronic Devices

Magnetic Devices and Spintronics

Measurement and Characterization

Vacuum Measurement and Technology

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