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Volume 40, Issue 5

September 2022

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Cover Image

ISSN 2166-2746

EISSN 2166-2754

In this Issue

Letters
ARTICLES
Comments
Errata

Letters

Facile fabrication of nanoporous structure on β titanium alloy to eliminate stress shielding for bone implant

Binbin Kang; Xiaohong Chen; Ping Liu

J. Vac. Sci. Technol. B 40, 050601 (2022) https://doi.org/10.1116/6.0001962

Abstract

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AlGaN nanowire deep ultraviolet LEDs with polarization enhanced tunnel junction and p-AlGaN layer by molecular beam epitaxy

Mohammad Fazel Vafadar; Songrui Zhao

J. Vac. Sci. Technol. B 40, 050602 (2022) https://doi.org/10.1116/6.0002037

Abstract

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ARTICLES

Electronic and Optoelectronic Materials, Devices and Processing

Yellow luminescence band defect related photocurrent instability of GaN p-i-n ultraviolet photodetectors

Liyong Pu; Zhiyuan Wang; Dong Zhou; Weizong Xu; Fangfang Ren; Dunjun Chen; Rong Zhang; Youdou Zheng; Hai Lu

J. Vac. Sci. Technol. B 40, 052201 (2022) https://doi.org/10.1116/6.0001916

Abstract

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Electrochemical characterization of ZnO-based transparent materials as recording electrodes for neural probes in optogenetics

Yuki Miwa; Hisashi Kino; Takafumi Fukushima; Tetsu Tanaka

J. Vac. Sci. Technol. B 40, 052202 (2022) https://doi.org/10.1116/6.0001836

Abstract

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Electron density and temperature of dual-frequency capacitively coupled argon plasma in two-dimensional distribution obtained and studied in experiment

Jidun Wu; Xijian Xiao; Yanfei Wang; Xiaojiang Huang; Lu Dai

J. Vac. Sci. Technol. B 40, 052203 (2022) https://doi.org/10.1116/5.0094293

Abstract

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Highly repeatable dry etch corner rounding solution for 0.11 μm shallow trench isolation

Wenwen Zhang; Yongzhi Fang

J. Vac. Sci. Technol. B 40, 052204 (2022) https://doi.org/10.1116/6.0001897

Abstract

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On the chemistry mechanism for low-pressure chlorine process plasmas

Dmitry Levko; Laxminarayan L. Raja

J. Vac. Sci. Technol. B 40, 052205 (2022) https://doi.org/10.1116/6.0002055

Abstract

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Improving detection of plasma etching end point using light compensation on optical emission spectra

Se-Jin Oh; Doug-Yong Sung; Jung-Min Ko; Sang Ki Nam

J. Vac. Sci. Technol. B 40, 052206 (2022) https://doi.org/10.1116/6.0002009

Abstract

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Improve photo-to-dark current ratio of p-Si/SiO₂/n-Ga₂O₃ heterojunction solar-blind photodetector by inserting SiO₂ barrier layer

Xu Yan; Xueqiang Ji; Jinjin Wang; Chao Lu; Zuyong Yan; Shengrun Hu; Sai Zhang; Peigang Li

J. Vac. Sci. Technol. B 40, 052207 (2022) https://doi.org/10.1116/5.0107495

Abstract

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Thermal sensitivity and current-voltage-temperature characteristics in Pt/epitaxy n-Si/n⁺Si structures as a function of Schottky contact area

Hasan Efeoǧlu; Abdulmecit Turut; Melik Gül

J. Vac. Sci. Technol. B 40, 052208 (2022) https://doi.org/10.1116/6.0002030

Abstract

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Comparison of temperature, current density, and light intensity distributions of nano-resistor patterns for an improved solid state incandescent light emitting device simulation model

Adam Samuel; Yue Kuo

J. Vac. Sci. Technol. B 40, 052209 (2022) https://doi.org/10.1116/6.0002074

Abstract

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Observation of interfacial strain relaxation and electron beam damage thresholds in Al_0.3In_0.7N/GaN heterostructures by transmission electron microscopy

Keisuke Motoki; Zachary Engel; Christopher M. Matthews; Habib Ahmad; Timothy M. McCrone; Kohei Harada; W. Alan Doolittle

J. Vac. Sci. Technol. B 40, 052210 (2022) https://doi.org/10.1116/6.0001974

Abstract

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Lithography

Volatile vapor knife of immersion lithography hood using solutal Marangoni effect

Junil Ryu; Gilgu Lee; Won Ki Lee; Jong Min Yoon; Namil Koo; Hyoungsoo Kim

J. Vac. Sci. Technol. B 40, 052601 (2022) https://doi.org/10.1116/5.0100753

Abstract

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Selective growth of graphene films on gallium-focused ion beam irradiated domains

In Special Collection: Papers from the 65th International Conference on Electron, Ion, And Photon Beam Technology and Nanofabrication (EIPBN 2022)

Jacques Gierak; Gilles Raynaud; Caroline Guiziou; Jean René Coudevylle; Ali Madouri; Lars Bruchhaus; Achim Nadzeyka; Björn Whittman; Ralf Jede; Christophe David; Jean Christophe Girard

J. Vac. Sci. Technol. B 40, 052602 (2022) https://doi.org/10.1116/6.0002104

Abstract

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Combined ultraviolet- and electron-beam lithography with Micro-Resist-Technology GmbH ma-N1400 resist

D. J. Thoen; V. Murugesan; A. Pascual Laguna; K. Karatsu; A. Endo; J. J. A. Baselmans

J. Vac. Sci. Technol. B 40, 052603 (2022) https://doi.org/10.1116/6.0001918

Abstract

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Nanoscale Science and Technology

Reliability and resistance projections for rhodium and iridium interconnects from first-principles

Nicholas A. Lanzillo; Daniel C. Edelstein

J. Vac. Sci. Technol. B 40, 052801 (2022) https://doi.org/10.1116/6.0001980

Abstract

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Dysprosium liquid metal alloy ion source for magnetic nanostructures

Lothar Bischoff; Nico Klingner; Paul Mazarov; Kilian Lenz; Ryszard Narkowicz; Wolfgang Pilz; Fabian Meyer

J. Vac. Sci. Technol. B 40, 052802 (2022) https://doi.org/10.1116/6.0001837

Abstract

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Piezoelectric effect of crystal nanodomains on the friction force

Michiko Sasaki; Masahiro Goto

J. Vac. Sci. Technol. B 40, 052803 (2022) https://doi.org/10.1116/6.0001881

Abstract

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Fabrication of microstructures on curved hydrogel substrates

In Special Collection: Papers from the 65th International Conference on Electron, Ion, And Photon Beam Technology and Nanofabrication (EIPBN 2022)

M. Chen; X. Ding; L. Que; X. Liang

J. Vac. Sci. Technol. B 40, 052804 (2022) https://doi.org/10.1116/6.0002071

Abstract

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CHORUS

Microelectronic and Nanoelectronic Devices

Physics based model of an AlGaN/GaN vacuum field effect transistor

N. Hernandez; M. Cahay; J. Ludwick; T. Back; H. Hall; J. O’Mara

J. Vac. Sci. Technol. B 40, 053201 (2022) https://doi.org/10.1116/6.0001959

Abstract

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Supplementary Material

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Multiple connected artificial synapses based on electromigrated Au nanogaps

In Special Collection: Neuromorphic Materials, Devices, and Processing

Keita Sakai; Mamiko Yagi; Mitsuki Ito; Jun-ichi Shirakashi

J. Vac. Sci. Technol. B 40, 053202 (2022) https://doi.org/10.1116/6.0002081

Abstract

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Measurement and Characterization

Effect of rapid thermal annealing on the mechanical stress and physico-chemical properties in plasma enhanced atomic layer deposited silicon nitride thin films

Antony Premkumar Peter; Alfonso Sepulveda Marquez; Johan Meersschaut; Praveen Dara; Timothee Blanquart; Takayama Tomomi; Ebisudani Taishi; Shiba Elichiro; Yosuke Kimura; Sander van Gompel; Pierre Morin

J. Vac. Sci. Technol. B 40, 054001 (2022) https://doi.org/10.1116/6.0001922

Abstract

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Realistic simulation of reflection high-energy electron diffraction patterns for two-dimensional lattices using Ewald construction

Chong Liu; Kai Chang; Ke Zou

J. Vac. Sci. Technol. B 40, 054002 (2022) https://doi.org/10.1116/6.0001899

Abstract

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Supplementary Material

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Application of deep-learning based techniques for automatic metrology on scanning and transmission electron microscopy images

J. Baderot; M. Grould; D. Misra; N. Clément; A. Hallal; S. Martinez; J. Foucher

J. Vac. Sci. Technol. B 40, 054003 (2022) https://doi.org/10.1116/6.0001988

Abstract

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Vacuum Measurement and Technology

Zr-Al 16 wt. % and Na₂CrO₄ composite particles used for Na dispenser and its reaction kinetic

Wentao Song; Chao Zhang; Ruibin Ma; Ziyuan Zhong; Heng Zhao; Wenhuai Tian

J. Vac. Sci. Technol. B 40, 054201 (2022) https://doi.org/10.1116/6.0001863

Abstract

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Nonevaporable getter-MEMS for generating UHV conditions in small volumina

In Special Collection: Vacuum Nanoelectronics

Leonard Frank Diekmann; Alexander Kassner; Folke Dencker; Marc Christopher Wurz

J. Vac. Sci. Technol. B 40, 054202 (2022) https://doi.org/10.1116/6.0001991

Abstract

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Sensitivity of thermal conductivity vacuum gauges for constant current and constant temperature operation

Christoph Langer; Dominik Berndt; Rupert Schreiner

J. Vac. Sci. Technol. B 40, 054203 (2022) https://doi.org/10.1116/6.0001964

Abstract

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Comments

Comment on “ZnO/Ag/graphene transparent conductive oxide film with ultrathin Ag layer” [J. Vac. Sci. Technol. B 39, 052208 (2021)]

B. L. Zhu

J. Vac. Sci. Technol. B 40, 056001 (2022) https://doi.org/10.1116/6.0001934

Abstract

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Errata

Erratum: ‘‘Hollow cathode enhanced capacitively coupled plasmas in Ar/N₂/H₂ mixtures and implications for plasma enhanced ALD” [J. Vac. Sci. Technol. B 40, 044002 (2022)]

David R. Boris; Michael J. Johnson; Charles R. Eddy, Jr.; Scott G. Walton

J. Vac. Sci. Technol. B 40, 057001 (2022) https://doi.org/10.1116/6.0002172

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ARTICLES

Electronic and Optoelectronic Materials, Devices and Processing

Lithography

Nanoscale Science and Technology

Microelectronic and Nanoelectronic Devices

Measurement and Characterization

Vacuum Measurement and Technology

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