Skip Nav Destination
Issues
Letters
Using static linear response theory to describe field emission field enhancement and a field-induced insulator-conductor transition
In Special Collection:
Vacuum Nanoelectronics
Caio P. de Castro; Thiago A. de Assis; Roberto Rivelino; Fernando de B. Mota; Caio M. C. de Castilho
J. Vac. Sci. Technol. B 39, 060601 (2021)
https://doi.org/10.1116/6.0001550
ARTICLES
Electronic and Optoelectronic Materials, Devices and Processing
Optoelectronic performance characterization of MoS2 photodetectors for low frequency sensing applications
J. Vac. Sci. Technol. B 39, 062201 (2021)
https://doi.org/10.1116/6.0001280
Multifractal wavefunctions of charge carriers in graphene with folded deformations, ripples, or uniaxial flexural modes: Analogies to the quantum Hall effect under random pseudomagnetic fields
In Special Collection:
Strain Engineering of Nanophotonic Devices
J. Vac. Sci. Technol. B 39, 062202 (2021)
https://doi.org/10.1116/6.0001337
Multiplexing implementation of rubbing-induced site-selective growth of MoS2 feature arrays
J. Vac. Sci. Technol. B 39, 062203 (2021)
https://doi.org/10.1116/6.0001268
Modeling the effect of stochastic heating and surface chemistry in a pure CF4 inductively coupled plasma
J. Vac. Sci. Technol. B 39, 062204 (2021)
https://doi.org/10.1116/6.0001293
Surface wetting on micromilled and laser-etched aluminum with ion-beam postprocessing
J. Vac. Sci. Technol. B 39, 062206 (2021)
https://doi.org/10.1116/6.0001282
Enhancement of thermionic emission and conversion characteristics using polarization- and band-engineered n-type AlGaN/GaN cathodes
In Special Collection:
Vacuum Nanoelectronics
J. Vac. Sci. Technol. B 39, 062207 (2021)
https://doi.org/10.1116/6.0001357
Stress reduction and wafer bow accommodation for the fabrication of thin film lithium niobate on oxidized silicon
J. Vac. Sci. Technol. B 39, 062208 (2021)
https://doi.org/10.1116/6.0001283
Multiple electron beam generation from InGaN photocathode
J. Vac. Sci. Technol. B 39, 062209 (2021)
https://doi.org/10.1116/6.0001272
Mechanism and solution of sharp defects in trench double-diffused metal-oxide semiconductor polysilicon recess etching
J. Vac. Sci. Technol. B 39, 062210 (2021)
https://doi.org/10.1116/6.0001395
Maintaining atomically smooth GaAs surfaces after high-temperature processing for precise interdiffusion analysis and materials engineering
J. Vac. Sci. Technol. B 39, 062212 (2021)
https://doi.org/10.1116/6.0001399
Lithography
PHIDL: Python-based layout and geometry creation for nanolithography
Adam N. McCaughan; Alexander N. Tait; Sonia M. Buckley; Dylan M. Oh; Jeffrey T. Chiles; Jeffrey M. Shainline; Sae Woo Nam
J. Vac. Sci. Technol. B 39, 062601 (2021)
https://doi.org/10.1116/6.0001203
Optimized ultraviolet grayscale process for high vertical resolution applied to spectral imagers
J. Vac. Sci. Technol. B 39, 062602 (2021)
https://doi.org/10.1116/6.0001273
Diffraction-grating beam splitter, interferometric-lithography nanopatterning with a multilongitudinal-mode diode laser
J. Vac. Sci. Technol. B 39, 062603 (2021)
https://doi.org/10.1116/6.0001377
Identifying extreme ultraviolet lithography attenuated phase shifting mask absorber materials using effective media approximation modeling
J. Vac. Sci. Technol. B 39, 062604 (2021)
https://doi.org/10.1116/6.0001298
Nanoscale Science and Technology
Lithographically patterned stretchable metallic microwiring on electrospun nanofiber mats
Yutika Badhe; Pedro E. Rocha-Flores; Walter E. Voit; David Remer; Lauren Costella; Alexandra Joshi-Imre
J. Vac. Sci. Technol. B 39, 062801 (2021)
https://doi.org/10.1116/6.0001279
Intermetallic compound formation inhibiting electromigration-based micro/nanowire growth
J. Vac. Sci. Technol. B 39, 062803 (2021)
https://doi.org/10.1116/6.0001271
100 keV vacuum sealed field emission gun for high resolution electron microscopy
Mohamed M. El-Gomati; Torquil Wells; Xiaoping Zha; Richard Sykes; Christopher J. Russo; Richard Henderson; Greg McMullan
J. Vac. Sci. Technol. B 39, 062804 (2021)
https://doi.org/10.1116/6.0001275
Bridging the gap: Perspectives of nanofabrication technologies for application-oriented research
Mario Baum; Christoph Meinecke; Thomas Blaudeck; Christian Helke; Danny Reuter; Karla Hiller; Sascha Hermann; Stefan E. Schulz; Harald Kuhn
J. Vac. Sci. Technol. B 39, 062805 (2021)
https://doi.org/10.1116/6.0001299
Diffusion of zirconium on the surface of Schottky electron sources
J. Vac. Sci. Technol. B 39, 062806 (2021)
https://doi.org/10.1116/6.0001381
Synthesis of NiS2 nanomaterial as wide range pressure sensor
In Special Collection:
Strain Engineering of Nanophotonic Devices
J. Vac. Sci. Technol. B 39, 062807 (2021)
https://doi.org/10.1116/6.0001344
Incorporating photoemission into the theoretical unification of electron emission and space-charge limited current
In Special Collection:
Vacuum Nanoelectronics
J. Vac. Sci. Technol. B 39, 062808 (2021)
https://doi.org/10.1116/6.0001515
Tensile-strained self-assembly of InGaAs on InAs(111)A
In Special Collection:
Strain Engineering of Nanophotonic Devices
Kevin D. Vallejo; Trent A. Garrett; Carlos I. Cabrera; Baolai Liang; Kevin A. Grossklaus; Paul J. Simmonds
J. Vac. Sci. Technol. B 39, 062809 (2021)
https://doi.org/10.1116/6.0001481
Investigating the pattern transfer fidelity of Norland Optical Adhesive 81 for nanogrooves by microtransfer molding
J. Vac. Sci. Technol. B 39, 062810 (2021)
https://doi.org/10.1116/6.0001333
MEMS and NEMS
Microelectronic and Nanoelectronic Devices
Influences of etching chemical parameters on AlGaN/GaN electrical degradation in power devices
J. Vac. Sci. Technol. B 39, 063201 (2021)
https://doi.org/10.1116/6.0001130
Planar figure-8 coils for ultra-focal and directional micromagnetic brain stimulation
J. Vac. Sci. Technol. B 39, 063202 (2021)
https://doi.org/10.1116/6.0001281
Organic Electronic and Optoelectronic Devices
Fabrication of Cd-free ZnCuInS/ZnS based inverted quantum dot light-emitting diode: Considering substrate temperature effect on sputtered ZnO layer
Mohammad Mostafizur Rahman Biswas; Md. Faruk Hossain; Masahiro Morimoto; Shigeki Naka; Hiroyuki Okada
J. Vac. Sci. Technol. B 39, 063401 (2021)
https://doi.org/10.1116/6.0001365
Plasmonics
Subradiant resonances in Au and Ag bipartite lattices in the visible spectrum
J. Vac. Sci. Technol. B 39, 063601 (2021)
https://doi.org/10.1116/6.0001270
Measurement and Characterization
Optical metrology of characterizing wetting states
Deming Meng; Yifei Wang; Hao Yang; Buyun Chen; Pan Hu; Boxiang Song; Yunxiang Wang; Zerui Liu; Tse-Hsien Ou; Ximing Zheng; Yichen Gong; Wei Wu
J. Vac. Sci. Technol. B 39, 064001 (2021)
https://doi.org/10.1116/6.0001187
Distribution of trace impurities in microvolumes and analysis of concentration using laser sputtered neutral mass spectrometry
Haruko Akutsu; Reiko Saito; Jun Asakawa; Kei Kiyokawa; Masato Morita; Tetsuo Sakamoto; Masaaki Fujii
J. Vac. Sci. Technol. B 39, 064002 (2021)
https://doi.org/10.1116/6.0001244
Virtual metrology modeling of reactive ion etching based on statistics-based and dynamics-inspired spectral features
J. Vac. Sci. Technol. B 39, 064003 (2021)
https://doi.org/10.1116/6.0001277
Long-term brain-on-chip: Multielectrode array recordings in 3D neural cell cultures
J. Vac. Sci. Technol. B 39, 064004 (2021)
https://doi.org/10.1116/6.0001297
Vacuum Measurement and Technology
Comparative study of thermal desorption and pumping performance for TiZrV-, Pd-, or Pd/TiZrV-coated copper tubes
J. Vac. Sci. Technol. B 39, 064202 (2021)
https://doi.org/10.1116/6.0001475
Miniature touch mode capacitance vacuum gauge with circular diaphragm
J. Vac. Sci. Technol. B 39, 064203 (2021)
https://doi.org/10.1116/6.0001332
Notes
Fabry–Perot-cavity-based refractometry without influence of mirror penetration depth
J. Vac. Sci. Technol. B 39, 065001 (2021)
https://doi.org/10.1116/6.0001501
Errata
Erratum: “Electrical and ion beam analyses of yttrium and yttrium-titanium getter thin films oxidation” [J. Vac. Sci. Technol. B 39, 054202 (2021)]
Clément Bessouet; Sylvain Lemettre; Charlotte Kutyla; Alain Bosseboeuf; Philippe Coste; Thierry Sauvage; Hélène Lecoq; Olivier Wendling; Aurélien Bellamy; Piyush Jagtap; Stéphanie Escoubas; Christophe Guichet; Olivier Thomas; Johan Moulin
J. Vac. Sci. Technol. B 39, 067001 (2021)
https://doi.org/10.1116/6.0001458
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Filtering the beam from an ionic liquid ion source
Alexander C. G. Storey, Aydin Sabouri, et al.