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High signal-to-noise ratio differential conductance spectroscopy
Opportunities for ionic liquid/ionogel gating of emerging transistor architectures
Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures
Nanofabrication of silicon surfaces for reduced virus adhesion
Design optimization of sub-5 nm node nanosheet field effect transistors to minimize self-heating effects
Issues
Letters
High signal-to-noise ratio differential conductance spectroscopy
J. Vac. Sci. Technol. B 39, 010601 (2021)
https://doi.org/10.1116/6.0000823
Review Articles
Electromigrated nanogaps: A review on the fabrications and applications
J. Vac. Sci. Technol. B 39, 010802 (2021)
https://doi.org/10.1116/6.0000866
Perspectives
Opportunities for ionic liquid/ionogel gating of emerging transistor architectures
J. Vac. Sci. Technol. B 39, 011001 (2021)
https://doi.org/10.1116/6.0000678
ARTICLES
Electronic and Optoelectronic Materials, Devices and Processing
Temperature dependence of the electrical characteristics of ZnO thin film transistor with high-k NbLaO gate dielectric
J. Vac. Sci. Technol. B 39, 012202 (2021)
https://doi.org/10.1116/6.0000522
Optimization of a continuous hot embossing process for fabrication of micropyramid structures in thermoplastic sheets
In Special Collection:
Electron, Ion, and Photon Beam Technology and Nanofabrication, EIPBN 2020
J. Vac. Sci. Technol. B 39, 012203 (2021)
https://doi.org/10.1116/6.0000551
Developing single-layer metal-oxide-semiconductor quantum dots for diagnostic qubits
In Special Collection:
Electron, Ion, and Photon Beam Technology and Nanofabrication, EIPBN 2020
J. Vac. Sci. Technol. B 39, 012204 (2021)
https://doi.org/10.1116/6.0000549
Rare earth doped CaWO4 and CaMoO4 thin films for white light emission
J. Vac. Sci. Technol. B 39, 012205 (2021)
https://doi.org/10.1116/6.0000610
β-Ga2O3 Schottky diodes based strain gauges with high resistance, large gauge factor, and high operating temperature
J. Vac. Sci. Technol. B 39, 012206 (2021)
https://doi.org/10.1116/6.0000776
Energy Conversion and Storage Devices
Evidence of improved power conversion efficiency in lead-free CsGeI3 based perovskite solar cell heterostructure via scaps simulation
J. Vac. Sci. Technol. B 39, 012401 (2021)
https://doi.org/10.1116/6.0000718
Analysis of LiCoO2 electrodes through principal component analysis of current–voltage datacubes measured using atomic force microscopy
J. Vac. Sci. Technol. B 39, 012402 (2021)
https://doi.org/10.1116/6.0000695
Lithography
Minimizing filling time for ultraviolet nanoimprint lithography with templates with multiple structures
J. Vac. Sci. Technol. B 39, 012601 (2021)
https://doi.org/10.1116/6.0000648
Medusa 82—Hydrogen silsesquioxane based high sensitivity negative-tone resist with long shelf-life and grayscale lithography capability
In Special Collection:
Electron, Ion, and Photon Beam Technology and Nanofabrication, EIPBN 2020
Mandy Grube; Benjamin Schille; Matthias Schirmer; Maik Gerngroß; Uwe Hübner; Paul Voigt; Sascha Brose
J. Vac. Sci. Technol. B 39, 012602 (2021)
https://doi.org/10.1116/6.0000542
3D modeling of electron-beam lithographic process from scanning electron microscope images
J. Vac. Sci. Technol. B 39, 012603 (2021)
https://doi.org/10.1116/6.0000694
Nanometer Science and Technology
Nanofabrication of silicon surfaces for reduced virus adhesion
In Special Collection:
Electron, Ion, and Photon Beam Technology and Nanofabrication, EIPBN 2020
J. Vac. Sci. Technol. B 39, 012801 (2021)
https://doi.org/10.1116/6.0000548
Lithium source for focused ion beam implantation and analysis
Michael Titze; Daniel L. Perry; Elizabeth A. Auden; Jose L. Pacheco; John B. S. Abraham; Edward S. Bielejec
J. Vac. Sci. Technol. B 39, 012802 (2021)
https://doi.org/10.1116/6.0000645
MEMS and NEMS
Insights from evaluation of surface cracks in surface-hardened polydimethylsiloxane by means of video analysis
In Special Collection:
Electron, Ion, and Photon Beam Technology and Nanofabrication, EIPBN 2020
J. Vac. Sci. Technol. B 39, 013001 (2021)
https://doi.org/10.1116/6.0000550
Microelectronic and Nanoelectronic Devices
Design optimization of sub-5 nm node nanosheet field effect transistors to minimize self-heating effects
In Special Collection:
Reliability and Stress-related Phenomena in Nano and Microelectronics
J. Vac. Sci. Technol. B 39, 013201 (2021)
https://doi.org/10.1116/6.0000675
Stabilization of cold-field-emission current from a CeB6 single-crystal emitter by using a faceted (100) plane
J. Vac. Sci. Technol. B 39, 013202 (2021)
https://doi.org/10.1116/6.0000739
Novel physics-based tool-prototype for electromigration assessment in commercial-grade power delivery networks
In Special Collection:
Reliability and Stress-related Phenomena in Nano and Microelectronics
J. Vac. Sci. Technol. B 39, 013203 (2021)
https://doi.org/10.1116/6.0000617
Development of microfabricated planar slow-wave structures on dielectric substrates for miniaturized millimeter-band traveling-wave tubes
In Special Collection:
Papers from the 33rd International Vacuum Nanoelectronics Conference (33rd IVNC 2020)
Nikita M. Ryskin; Roman A. Torgashov; Andrey V. Starodubov; Andrey G. Rozhnev; Alexey A. Serdobintsev; Anton M. Pavlov; Viktor V. Galushka; Dmitry A. Bessonov; Giacomo Ulisse; Viktor Krozer
J. Vac. Sci. Technol. B 39, 013204 (2021)
https://doi.org/10.1116/6.0000716
Silicon field emitters fabricated by dicing-saw and wet-chemical-etching
In Special Collection:
Papers from the 33rd International Vacuum Nanoelectronics Conference (33rd IVNC 2020)
Simon Edler; Andreas Schels; Josef Biba; Walter Hansch; Michael Bachmann; Felix Düsberg; Marinus Werber; Christoph Langer; Manuel Meyer; David von Bergen; Andreas Pahlke
J. Vac. Sci. Technol. B 39, 013205 (2021)
https://doi.org/10.1116/6.0000466
Measurement and Characterization
Vacuum Measurement and Technology
Surface polarity dependence of thermionic emission and conversion characteristics of n-type GaN cathodes
In Special Collection:
Papers from the 33rd International Vacuum Nanoelectronics Conference (33rd IVNC 2020)
J. Vac. Sci. Technol. B 39, 014201 (2021)
https://doi.org/10.1116/6.0000710
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning
Yasser Pordeli, Céline Steenge, et al.
Heating of photocathode via field emission and radiofrequency pulsed heating: Implication toward breakdown
Ryo Shinohara, Soumendu Bagchi, et al.