Issues

Letters

Thermal stability and small-signal characteristics of AlGaN/GaN HEMTs with gate insertion metal layer for millimeter-wave applications

Dong-Hwan Kim; Su-Keun Eom; Jun-Seok Jeong; Jae-Gil Lee; Kwang-Seok Seo; Ho-Young Cha

J. Vac. Sci. Technol. B 35, 060601 (2017) https://doi.org/10.1116/1.4998310

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Electronic & Optoelectronic Materials, Devices & Processing

Improvement of Ohmic contacts on Ga₂O₃ through use of ITO-interlayers

Patrick H. Carey, IV; Jiancheng Yang; Fan Ren; David C. Hays; Stephen J. Pearton; Akito Kuramata; Ivan I. Kravchenko

J. Vac. Sci. Technol. B 35, 061201 (2017) https://doi.org/10.1116/1.4995816

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CHORUS

Spectral response characteristics of transmission-mode alkali telluride photocathodes working from vacuum-ultraviolet to ultraviolet band

Xiang Zhang; Yijun Zhang; Yunsheng Qian; Cheng Feng; Jingzhi Zhang; Yunlong Jiang; Zhiyun Pan

J. Vac. Sci. Technol. B 35, 061202 (2017) https://doi.org/10.1116/1.5006049

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Temperature dependence of the morphology and electronic structure of ultrathin platinum on TiO₂-teminated SrTiO₃ (001)

Wei Guo; Agham B. Posadas; Alexander A. Demkov

J. Vac. Sci. Technol. B 35, 061203 (2017) https://doi.org/10.1116/1.4991892

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Comparison study of the low temperature growth of dilute GeSn and Ge

Perry C. Grant; Wei Dou; Bader Alharthi; Joshua M. Grant; Aboozar Mosleh; Wei Du; Baohua Li; Mansour Mortazavi; Hameed A. Naseem; Shui-Qing Yu

J. Vac. Sci. Technol. B 35, 061204 (2017) https://doi.org/10.1116/1.4990773

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CHORUS

Characterization of n-type Cu₂O deposited by reactive ion beam sputter deposition

Assamen Ayalew Ejigu; Liang-chiun Chao

J. Vac. Sci. Technol. B 35, 061205 (2017) https://doi.org/10.1116/1.4990598

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Generation and elimination of silicon pitting for 300 mm CMOS process technologies

Santosh Kumar Pani; Royston Hugh Hogan; Madhavan Pandurangan; Jian Zhang; Pak Koesun

J. Vac. Sci. Technol. B 35, 061206 (2017) https://doi.org/10.1116/1.4995023

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Fabrication and pixel characterization of a row-column addressable 128 × 128 InAs/GaSb type-II superlattice midwave infrared photodiode array

Sona Das; Utpal Das

J. Vac. Sci. Technol. B 35, 061207 (2017) https://doi.org/10.1116/1.4997143

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Lithography

Characteristic study of image-based alignment for increasing accuracy in lithography application

Libin Zhang; Lisong Dong; Xiaojing Su; Yayi Wei

J. Vac. Sci. Technol. B 35, 061601 (2017) https://doi.org/10.1116/1.4985679

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Study of shot noise in photoresists for extreme ultraviolet lithography through comparative analysis of line edge roughness in electron beam and extreme ultraviolet lithography

Suchit Bhattarai; Andrew R. Neureuther; Patrick P. Naulleau

J. Vac. Sci. Technol. B 35, 061602 (2017) https://doi.org/10.1116/1.4991054

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CHORUS

Lithographic performance of ZEP520A and mr-PosEBR resists exposed by electron beam and extreme ultraviolet lithography

Roberto Fallica; Dimitrios Kazazis; Robert Kirchner; Anja Voigt; Iacopo Mochi; Helmut Schift; Yasin Ekinci

J. Vac. Sci. Technol. B 35, 061603 (2017) https://doi.org/10.1116/1.5003476

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Practical design of the electron gun for a microfocus x-ray source

W. P. Li; P. F. Wang; J. B. Liu; W. X. Zhao; L. Han

J. Vac. Sci. Technol. B 35, 061604 (2017) https://doi.org/10.1116/1.5010897

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Nanometer Science & Technology

Comparison of air and heptane solvent annealing of block copolymers for bit-patterned media

Allen G. Owen; Hao Su; Angelique Montgomery; Subhadra Gupta

J. Vac. Sci. Technol. B 35, 061801 (2017) https://doi.org/10.1116/1.5004150

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Effect of lift-off conditions on micropatterning of nanocrystalline quantum dot films

Ala H. Sabeeh; Jared S. Price; Jerzy Ruzyllo

J. Vac. Sci. Technol. B 35, 061802 (2017) https://doi.org/10.1116/1.4989450

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MEMS & NEMS

Improved properties of the MEMS-type ion-sorption micropump

Tomasz Grzebyk; Anna Górecka-Drzazga; Jan A. Dziuban

J. Vac. Sci. Technol. B 35, 062001 (2017) https://doi.org/10.1116/1.4994782

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Deposition of Mo/Si multilayers onto MEMS micromirrors and its utilization for extreme ultraviolet maskless lithography

Nikolay Chkhalo; Vladimir Polkovnikov; Nikolay Salashchenko; Mikhail Toropov

J. Vac. Sci. Technol. B 35, 062002 (2017) https://doi.org/10.1116/1.4995369

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Microelectronic & Nanoelectronic Devices

Study of CO₂ ashing for porous SiOCH film using 100 MHz/13.56 MHz dual frequency superimposed capacitive coupled plasma

Tsubasa Imamura; Katsumi Yamamoto; Kazuaki Kurihara; Hisataka Hayashi

J. Vac. Sci. Technol. B 35, 062201 (2017) https://doi.org/10.1116/1.4987020

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Independent tuning of work function and field enhancement factor in hybrid lanthanum hexaboride-graphene-silicon field emitters

Fatemeh Rezaeifar; Qingfeng Lin; Xiangyu Chen; Tracy M. Mattox; Ayush Garg; Andrew Clough; Nirakar Poudel; Louis Blankemeier; Debarghya Sarkar; Stephen B. Cronin; Rehan Kapadia

J. Vac. Sci. Technol. B 35, 062202 (2017) https://doi.org/10.1116/1.5001324

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CHORUS

Work function consideration in vacuum field emission transistor design

Jiwon Kim; Hyeongwan Oh; Jungsik Kim; Rock-Hyun Baek; Jin-Woo Han; M. Meyyappan; Jeong-Soo Lee

J. Vac. Sci. Technol. B 35, 062203 (2017) https://doi.org/10.1116/1.5000549

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Measurement and Characterization

Electrophysical parameters of the space charge region of the low-threshold field cathode

A. Yafyasov; V. Bogevolnov

J. Vac. Sci. Technol. B 35, 062901 (2017) https://doi.org/10.1116/1.4993139

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Effect of well/barrier thickness ratio on strain relaxation in GaN/AlN superlattices grown on GaN/sapphire template

Serhii B. Kryvyi; Petro M. Lytvyn; Vasyl P. Kladko; Hryhorii V. Stanchu; Andrian V. Kuchuk; Yuriy. I. Mazur; Gregory J. Salamo; Shibin Li; Pavlo P. Kogutyuk; Alexander E. Belyaev

J. Vac. Sci. Technol. B 35, 062902 (2017) https://doi.org/10.1116/1.4999468

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PAPERS FROM THE 61st INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION

EIPBN Review Articles

Review Article: Active scanning probes: A versatile toolkit for fast imaging and emerging nanofabrication

Ivo W. Rangelow; Tzvetan Ivanov; Ahmad Ahmad; Marcus Kaestner; Claudia Lenk; Iman S. Bozchalooi; Fangzhou Xia; Kamal Youcef-Toumi; Mathias Holz; Alexander Reum

J. Vac. Sci. Technol. B 35, 06G101 (2017) https://doi.org/10.1116/1.4992073

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Nanoimprint Lithography

Gold microelectrodes fabricated by a print-and-imprint method using laser-drilled polyimide through-hole masks

Takahiro Nakamura; Kento Seki; Kazuro Nagase; Masaru Nakagawa

J. Vac. Sci. Technol. B 35, 06G301 (2017) https://doi.org/10.1116/1.4991629

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Hot embossing of Au- and Pb-based alloys for x-ray grating fabrication

Lucia Romano; Joan Vila-Comamala; Helmut Schift; Marco Stampanoni; Konstantins Jefimovs

J. Vac. Sci. Technol. B 35, 06G302 (2017) https://doi.org/10.1116/1.4991807

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Principle and observation of fluorescence moiré fringes for alignment in print and imprint methods

Eri Kikuchi; Yota Ishito; Shinya Matsubara; Takahiro Nakamura; Masayuki Abe; Masaru Nakagawa

J. Vac. Sci. Technol. B 35, 06G303 (2017) https://doi.org/10.1116/1.4990844

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Double nanoimprint lithography: A technology for effectively reducing feature size

Xiaohao Ma; Dandan Deng; Dehu Cui

J. Vac. Sci. Technol. B 35, 06G304 (2017) https://doi.org/10.1116/1.4991631

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Impact of preparation conditions on the properties of materials for replica stamps

Marc Papenheim; Wolfgang Eidemüller; Christian Steinberg; Andre Mayer; Hella-Christin Scheer

J. Vac. Sci. Technol. B 35, 06G305 (2017) https://doi.org/10.1116/1.4991868

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Low reflection Fresnel lenses via double imprint combined with vacuum-UV surface hardening

Christian Steinberg; Nour Al-Hussainawi; Marc Papenheim; Andre Mayer; Hella-Christin Scheer; Maria Matschuk; Henrik Pranov

J. Vac. Sci. Technol. B 35, 06G306 (2017) https://doi.org/10.1116/1.4991863

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Stochastic simulation of the UV curing process in nanoimprint lithography: Pattern size and shape effects in sub-50 nm lithography

Masanori Koyama; Masamitsu Shirai; Hiroaki Kawata; Yoshihiko Hirai; Masaaki Yasuda

J. Vac. Sci. Technol. B 35, 06G307 (2017) https://doi.org/10.1116/1.4997295

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Three-dimensional photolithography using built-in lens mask

Toshiki Tanaka; Daiki Sugihara; Masaru Sasago; Hisao Kikuta; Hiroaki Kawata; Yoshihiko Hirai

J. Vac. Sci. Technol. B 35, 06G308 (2017) https://doi.org/10.1116/1.4995693

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Nanophotonics and Plasmonics

Patterning of electrically tunable light-emitting photonic structures demonstrating bound states in the continuum

Erika Penzo; Silvia Romano; Yu Wang; Scott Dhuey; Luca Dal Negro; Vito Mocella; Stefano Cabrini

J. Vac. Sci. Technol. B 35, 06G401 (2017) https://doi.org/10.1116/1.4994849

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CHORUS

Coaxial hybrid perovskite fibers: Synthesis and encapsulation in situ via electrospinning

John P. Murphy; Jessica M. Andriolo; Nathan J. Sutton; Molly C. Brockway; Jack L. Skinner

J. Vac. Sci. Technol. B 35, 06G402 (2017) https://doi.org/10.1116/1.4991724

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Light absorption and scattering of 40–170 nm gold nanoparticles on glass substrates

Ranveig Flatabø; Vårin R. A. Holm; Håkon Eidsvåg; Bodil Holst; Martin M. Greve

J. Vac. Sci. Technol. B 35, 06G403 (2017) https://doi.org/10.1116/1.4994113

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Electron Beam Lithography

Adjustable sidewall slopes by electron-beam exposure layout

Corinna Kaspar; Jörg Butschke; Mathias Irmscher; Stephan Martens; Holger Sailer; Robert Kirchner; Vitaliy A. Guzenko; Helmut Schift; Joachim N. Burghartz

J. Vac. Sci. Technol. B 35, 06G501 (2017) https://doi.org/10.1116/1.4993724

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Atom sieve for nanometer resolution neutral helium microscopy

Ranveig Flatabø; Martin M. Greve; Sabrina D. Eder; Matthias Kalläne; Adrià Salvador Palau; Karl K. Berggren; Bodil Holst

J. Vac. Sci. Technol. B 35, 06G502 (2017) https://doi.org/10.1116/1.4994330

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Effects of stochastic exposure on critical dimension in electron-beam lithography

Hyesung Ji; Soo-Young Lee; Jin Choi; Seom-Beom Kim; In-Kyun Shin; Chan-Uk Jeon

J. Vac. Sci. Technol. B 35, 06G503 (2017) https://doi.org/10.1116/1.4995445

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Improvement of silicon waveguide transmission by advanced e-beam lithography data fracturing strategies

Shane Patrick; Richard J. Bojko; Stefan J. H. Stammberger; Enxiao Luan; Lukas Chrostowski

J. Vac. Sci. Technol. B 35, 06G504 (2017) https://doi.org/10.1116/1.4991900

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CHORUS

Isofocal dose based proximity effect correction tolerance to the effective process blur

Gerald G. Lopez; Mohsen Azadi; Meredith G. Metzler; Nikola Belic; Ulrich Hofmann

J. Vac. Sci. Technol. B 35, 06G505 (2017) https://doi.org/10.1116/1.4995421

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CHORUS

Optical and Extreme UV (EUV) Lithography

Tip-to-tip variation mitigation in extreme ultraviolet lithography for 7 nm and beyond metallization layers and design rule analysis

Yulu Chen; Lei Sun; Zhengqing John Qi; Shuo Zhao; Francis Goodwin; Itty Matthew; Vince Plachecki

J. Vac. Sci. Technol. B 35, 06G601 (2017) https://doi.org/10.1116/1.4994908

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Nanoelectronics

Nanofluidic/nanoelectronic study on solvent-processed nanoscale organic transistors

Da Li; Byunghoon Ryu; Qingyu Cui; Mikai Chen; Lingjie Jay Guo; Biwu Ma; Xiaogan Liang

J. Vac. Sci. Technol. B 35, 06G801 (2017) https://doi.org/10.1116/1.4991743

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CHORUS

Fabrication of nickel stamp using e-beam evaporation and electroforming for electroreduction of carbon dioxide

Yangchun Lan; Wuyang Zhuge; Dehu Cui; Xing Cheng

J. Vac. Sci. Technol. B 35, 06G802 (2017) https://doi.org/10.1116/1.4991784

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Thermal nanoimprint to improve the morphology of MAPbX₃ (MA = methylammonium, X = I or Br)

Andre Mayer; Maximilian Buchmüller; Si Wang; Christian Steinberg; Marc Papenheim; Hella-Christin Scheer; Neda Pourdavoud; Tobias Haeger; Thomas Riedl

J. Vac. Sci. Technol. B 35, 06G803 (2017) https://doi.org/10.1116/1.4991619

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Fabrication of a high-resolution electron beam with a carbon nanotube cold-cathode

Ha Rim Lee; Hyeon Hee Yang; Kyu Chang Park

J. Vac. Sci. Technol. B 35, 06G804 (2017) https://doi.org/10.1116/1.4991920

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Fabrication of prebent MoS₂ biosensors on flexible substrates

Byunghoon Ryu; Erika Yang; Younggeun Park; Katsuo Kurabayashi; Xiaogan Liang

J. Vac. Sci. Technol. B 35, 06G805 (2017) https://doi.org/10.1116/1.4991749

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CHORUS

Novel Imaging and Characterization Techniques

Fabrication of hard x-ray zone plates with high aspect ratio using metal-assisted chemical etching

Kenan Li; Michael J. Wojcik; Ralu Divan; Leonidas E. Ocola; Bing Shi; Daniel Rosenmann; Chris Jacobsen

J. Vac. Sci. Technol. B 35, 06G901 (2017) https://doi.org/10.1116/1.4991794

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CHORUS

Camera for transmission He⁺ ion microscopy

Karen L. Kavanagh; Christoph Herrmann; John A. Notte

J. Vac. Sci. Technol. B 35, 06G902 (2017) https://doi.org/10.1116/1.4991898

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Micro- and Nanofluidics

Passive pumping for the parallel trapping of single neurons onto a microsieve electrode array

Jean-Philippe Frimat; Bart Schurink; Regina Luttge

J. Vac. Sci. Technol. B 35, 06GA01 (2017) https://doi.org/10.1116/1.4991827

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Subterahertz sensor in microfluidic devices for on-line determination and control of ethanol concentration

Salomao Moraes da Silva Junior; Johan Stiens; Stanislav Moshkalev; Jacobus Willibrordus Swart; Vladimir Matvejev; Yuchen Zhang; Cathleen De Tandt

J. Vac. Sci. Technol. B 35, 06GA02 (2017) https://doi.org/10.1116/1.4991891

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Advanced Pattern Transfer

Chromium oxide as a hard mask material better than metallic chromium

Ferhat Aydinoglu; Faycal Saffih; Ripon Kumar Dey; Bo Cui

J. Vac. Sci. Technol. B 35, 06GB01 (2017) https://doi.org/10.1116/1.4998480

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Tip-based Lithography

Oxidation sharpening of silicon tips in the atmospheric environment

Ripon Kumar Dey; Jiashi Shen; Bo Cui

J. Vac. Sci. Technol. B 35, 06GC01 (2017) https://doi.org/10.1116/1.4998561

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Batch fabrication of AFM probes with direct positioning capability

Shuo Zheng; Chenxu Zhu; Ripon Kumar Dey; Bo Cui

J. Vac. Sci. Technol. B 35, 06GC02 (2017) https://doi.org/10.1116/1.5010814

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Lithographic Materials and Resist

Fifty nanometer lines patterned into silica using water developable chitosan bioresist and electron beam lithography

Mathieu Caillau; Pierre Crémillieu; Emmanuelle Laurenceau; Yann Chevolot; Jean-Louis Leclercq; Sergeï Alekseev; Céline Chevalier; Thierry Delair

J. Vac. Sci. Technol. B 35, 06GE01 (2017) https://doi.org/10.1116/1.4996870

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Crosslinkable photoacid generators for ultrahigh loading in epoxide functionalized molecular resists

Hannah Narcross; Brandon L. Sharp; Laren M. Tolbert; Clifford L. Henderson

J. Vac. Sci. Technol. B 35, 06GE02 (2017) https://doi.org/10.1116/1.4991894

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CHORUS

Positive-tone crosslinked molecular resist based on acid-catalyzed depolymerization

Brandon L. Sharp; Hannah L. Narcross; Laren M. Tolbert; Clifford L. Henderson

J. Vac. Sci. Technol. B 35, 06GE03 (2017) https://doi.org/10.1116/1.4991904

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CHORUS

Nanofabrication and Biology

Single fiber surface enhanced Raman scattering probe

Srismrita Basu; HsuanChao Hou; Debsmita Biswas; Theda Daniels-Race; Mandi Lopez; J. Michael Mathis; Martin Feldman

J. Vac. Sci. Technol. B 35, 06GF01 (2017) https://doi.org/10.1116/1.4990697

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Nano and Micro-Mechanical Systems

DC sputtering of highly c-axis AlN films on top of 3C-SiC (111)-on-Si (111) substrates under various N₂ concentrations

Abid Iqbal; Glenn Walker; Leonie Hold; Alanna Fernandes; Alan Iacopi; Faisal Mohd-Yasin

J. Vac. Sci. Technol. B 35, 06GH01 (2017) https://doi.org/10.1116/1.4991748

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Nanofabrication Through Self-Assembly

Block copolymer directed self-assembly using chemoepitaxial guiding underlayers with topography

Benjamin D. Nation; Peter J. Ludovice; Clifford L. Henderson

J. Vac. Sci. Technol. B 35, 06GI01 (2017) https://doi.org/10.1116/1.4991895

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CHORUS

Synthesis and self-assembly of low χ block copolymers with large periodicity

Caleb L. Breaux; Clifford L. Henderson; Haibo Li; Bing Li; Mark Neisser

J. Vac. Sci. Technol. B 35, 06GI02 (2017) https://doi.org/10.1116/1.4991874

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CHORUS

3D Micro and Nano Patterning

Chemical copatterning strategies using azlactone-based block copolymers

Mohammadali Masigol; Niloy Barua; Scott T. Retterer; Bradley S. Lokitz; Ryan R. Hansen

J. Vac. Sci. Technol. B 35, 06GJ01 (2017) https://doi.org/10.1116/1.4991881

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Bio-inspired nanostructures for enhanced light management

Honglei Wang; Yuchen Liang; Samantha Cheng; Benjamin Li; Andrew Li; George Du; Walter Hu

J. Vac. Sci. Technol. B 35, 06GJ02 (2017) https://doi.org/10.1116/1.4995472

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CHORUS

Focused Beam Induced Processing

Reducing curtaining effects in FIB/SEM applications by a goniometer stage and an image processing method

Thomas Henning Loeber; Bert Laegel; Sandra Wolff; Sebastian Schuff; Frank Balle; Tilmann Beck; Dietmar Eifler; Jan Henrik Fitschen; Gabriele Steidl

J. Vac. Sci. Technol. B 35, 06GK01 (2017) https://doi.org/10.1116/1.4991638

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