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Issues
November 2014
ISSN 2166-2746
EISSN 2166-2754
In this Issue
Letters
Shortwave-infrared photoluminescence from Ge1−xSnx thin films on silicon
Seyed Amir Ghetmiri; Wei Du; Benjamin R. Conley; Aboozar Mosleh; Amjad Nazzal; Greg Sun; Richard A. Soref; Joe Margetis; John Tolle; Hameed A. Naseem; Shui-Qing Yu
J. Vac. Sci. Technol. B 32, 060601 (2014)
https://doi.org/10.1116/1.4897917
Atomic layer deposition TiO2–Al2O3 stack: An improved gate dielectric on Ga-polar GaN metal oxide semiconductor capacitors
Daming Wei; James H. Edgar; Dayrl P. Briggs; Scott T. Retterer; Bernadeta Srijanto; Dale K. Hensley; Harry M. Meyer, III
J. Vac. Sci. Technol. B 32, 060602 (2014)
https://doi.org/10.1116/1.4897919
Origin of external quantum efficiency degradation in organic light-emitting diodes with a DC magnetron sputtered cathode
J. Vac. Sci. Technol. B 32, 060603 (2014)
https://doi.org/10.1116/1.4897920
High-performance transparent, all-oxide nonvolatile charge trap memory transistor using In-Ga-Zn-O channel and ZnO trap layer
J. Vac. Sci. Technol. B 32, 060604 (2014)
https://doi.org/10.1116/1.4899180
Review Articles
Electronic & Optoelectronic Materials, Devices & Processing
Faceted sidewall etching of n-GaN on sapphire by photoelectrochemical wet processing
J. Vac. Sci. Technol. B 32, 061201 (2014)
https://doi.org/10.1116/1.4896592
Novel approach to improve heat dissipation of AlGaN/GaN high electron mobility transistors with a Cu filled via under device active area
J. Vac. Sci. Technol. B 32, 061202 (2014)
https://doi.org/10.1116/1.4896593
Simulation of a rising sun magnetron employing a faceted cathode with a continuous current source
J. Vac. Sci. Technol. B 32, 061205 (2014)
https://doi.org/10.1116/1.4900636
Ordered array of Ga droplets on GaAs(001) by local anodic oxidation
J. Vac. Sci. Technol. B 32, 061206 (2014)
https://doi.org/10.1116/1.4901017
Thermal treatment induced change of diluted oxygen doped ZnTe films grown by metal-organic chemical vapor deposition
J. Vac. Sci. Technol. B 32, 061207 (2014)
https://doi.org/10.1116/1.4900635
Negative gate-bias instability of ZnO thin-film transistors studied by current–voltage and capacitance–voltage analyses
J. Vac. Sci. Technol. B 32, 061208 (2014)
https://doi.org/10.1116/1.4901505
Straightforward electrical measurement of forward-voltage to investigate thermal effects in InGaN/GaN high-brightness light-emitting diodes
J. Vac. Sci. Technol. B 32, 061209 (2014)
https://doi.org/10.1116/1.4901411
Electronic … Optoelectronic Materials, Devices & Processing
Multilayer MoS2 transistors enabled by a facile dry-transfer technique and thermal annealing
J. Vac. Sci. Technol. B 32, 061203 (2014)
https://doi.org/10.1116/1.4898117
Lithography
Study of high-resolution electron-beam resists for applications in low-temperature lithography
J. Vac. Sci. Technol. B 32, 061601 (2014)
https://doi.org/10.1116/1.4896671
Nanometer Science & Technology
Electrochemically etched Ni tips in a constant-current mode for spin-polarized scanning tunneling microscopy
J. Vac. Sci. Technol. B 32, 061801 (2014)
https://doi.org/10.1116/1.4898865
On the nucleation and crystallization of nanoparticles in continuous-flow nonthermal plasma reactors
J. Vac. Sci. Technol. B 32, 061802 (2014)
https://doi.org/10.1116/1.4899206
Self-termination in the gas-phase layer-by-layer growth of an aza silane and water on planar silicon and nylon substrates
J. Vac. Sci. Technol. B 32, 061803 (2014)
https://doi.org/10.1116/1.4899936
Optical properties of pseudomorphic Ge1−xSnx (x = 0 to 0.11) alloys on Ge(001)
Manasa Medikonda; Gangadhara R. Muthinti; Relja Vasić; Thomas N. Adam; Alexander Reznicek; Matthew Wormington; Girish Malladi; Yihwan Kim; Yi-Chiau Huang; Alain C. Diebold
J. Vac. Sci. Technol. B 32, 061805 (2014)
https://doi.org/10.1116/1.4901254
MEMS & NEMS
Determination of thin film coefficient of thermal expansion and residual strain from freestanding fixed–fixed beams
J. Vac. Sci. Technol. B 32, 062001 (2014)
https://doi.org/10.1116/1.4896761
Realization of suspended silicon-based structures using a smart three-dimensional etching method
J. Vac. Sci. Technol. B 32, 062002 (2014)
https://doi.org/10.1116/1.4898576
Microelectronic & Nanoelectronic Devices
Large-grained Pb(Zr,Ti)O3 integrated into polycrystalline-silicon thin-film transistor for system-on-glass applications
J. Vac. Sci. Technol. B 32, 062201 (2014)
https://doi.org/10.1116/1.4896672
Quantitative characterization of pore stuffing and unstuffing for postporosity plasma protection of low-k materials
Markus H. Heyne; Liping Zhang; Junjun Liu; Iftikar Ahmad; Dorel Toma; Jean-François de Marneffe; Stefan De Gendt; Mikhail R. Baklanov
J. Vac. Sci. Technol. B 32, 062202 (2014)
https://doi.org/10.1116/1.4896759
Electrical characteristics of flexible ZnO thin-film transistors annealed by microwave irradiation
J. Vac. Sci. Technol. B 32, 062203 (2014)
https://doi.org/10.1116/1.4898115
Characteristics of electron emission of Al-Al2O3-Ti/Au diode with a new double-layer insulator
J. Vac. Sci. Technol. B 32, 062204 (2014)
https://doi.org/10.1116/1.4900632
58th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
EIPBN Review Articles
Scanning probes in nanostructure fabrication
Marcus Kaestner; Tzvetan Ivanov; Andreas Schuh; Ahmad Ahmad; Tihomir Angelov; Yana Krivoshapkina; Matthias Budden; Manuel Hofer; Steve Lenk; Jens-Peter Zoellner; Ivo W. Rangelow; Alexander Reum; Elshad Guliyev; Mathias Holz; Nikolay Nikolov
J. Vac. Sci. Technol. B 32, 06F101 (2014)
https://doi.org/10.1116/1.4897500
Directed- and Biomolecular-Self-Assembly
Programmed self-assembly of microscale components using biomolecular recognition through the avidin–biotin interaction
J. Vac. Sci. Technol. B 32, 06F301 (2014)
https://doi.org/10.1116/1.4893075
Electro-Mechanical Applications (MEMS/NEMS)
RF sputtering of polycrystalline (100), (002), and (101) oriented AlN on an epitaxial 3C-SiC (100) on Si(100) substrate
J. Vac. Sci. Technol. B 32, 06F401 (2014)
https://doi.org/10.1116/1.4900418
Electron- or Ion-Beam Lithography
Three-dimensional nanofabrication using hydrogen silsesquioxane/poly(methylmethacrylate) bilayer resists
J. Vac. Sci. Technol. B 32, 06F501 (2014)
https://doi.org/10.1116/1.4893659
An information theoretic perspective on e-beam direct-write as complementary lithography
J. Vac. Sci. Technol. B 32, 06F502 (2014)
https://doi.org/10.1116/1.4894459
Multistep Aztec profiles by grayscale electron beam lithography for angle-resolved microspectrometer applications
J. Vac. Sci. Technol. B 32, 06F504 (2014)
https://doi.org/10.1116/1.4897505
Minimization of line edge roughness and critical dimension error in electron-beam lithography
J. Vac. Sci. Technol. B 32, 06F505 (2014)
https://doi.org/10.1116/1.4899238
Fabrication of polydimethylsiloxane microlens arrays on a plastic film by proton beam writing
J. Vac. Sci. Technol. B 32, 06F506 (2014)
https://doi.org/10.1116/1.4900419
Lift-off with solvent for negative resist using low energy electron beam exposure
J. Vac. Sci. Technol. B 32, 06F507 (2014)
https://doi.org/10.1116/1.4901012
Determination and analysis of minimum dose for achieving vertical sidewall in electron-beam lithography
J. Vac. Sci. Technol. B 32, 06F508 (2014)
https://doi.org/10.1116/1.4901013
Improved alignment algorithm for electron beam lithography
J. Vac. Sci. Technol. B 32, 06F509 (2014)
https://doi.org/10.1116/1.4901015
Experimental verification of achieving vertical sidewalls for nanoscale features in electron-beam lithography
J. Vac. Sci. Technol. B 32, 06F510 (2014)
https://doi.org/10.1116/1.4901171
Hydrogen silsesquioxane on SOI proximity and microloading effects correction from a single 1D characterization sample
J. Vac. Sci. Technol. B 32, 06F511 (2014)
https://doi.org/10.1116/1.4901567
Electronic Applications
Inelastic electron tunneling spectroscopy for molecular detection
J. Vac. Sci. Technol. B 32, 06F601 (2014)
https://doi.org/10.1116/1.4897137
Emerging Methods
Mobility based 3D simulation of selective, viscoelastic polymer reflow using surface evolver
J. Vac. Sci. Technol. B 32, 06F701 (2014)
https://doi.org/10.1116/1.4896480
Built-in lens mask lithography (challenge for high-definition lens-less lithography)
J. Vac. Sci. Technol. B 32, 06F702 (2014)
https://doi.org/10.1116/1.4900604
Extreme Ultraviolet Lithography
Experimental measurements of telecentricity errors in high-numerical-aperture extreme ultraviolet mask images
Sudharshanan Raghunathan; Obert R. Wood, II; Pawitter Mangat; Erik Verduijn; Vicky Philipsen; Eric Hendrickx; Rik Jonckheere; Kenneth A. Goldberg; Markus P. Benk; Patrick Kearney; Zachary Levinson; Bruce W. Smith
J. Vac. Sci. Technol. B 32, 06F801 (2014)
https://doi.org/10.1116/1.4901876
Electron or Ion Sources and Systems
Photoemission lifetime of a negative electron affinity gallium nitride photocathode
J. Vac. Sci. Technol. B 32, 06F901 (2014)
https://doi.org/10.1116/1.4901566
Ion-Beam- and Electron-Beam-Induced Processing
Mechanism and applications of helium transmission milling in thin membranes
J. Vac. Sci. Technol. B 32, 06FA01 (2014)
https://doi.org/10.1116/1.4900728
Maskless High-Throughput Lithography
Microscopy and Nanometrology
Simulation of insulating-layer charging on a conductive substrate irradiated by ion and electron beams
J. Vac. Sci. Technol. B 32, 06FC01 (2014)
https://doi.org/10.1116/1.4896337
In-situ visualization of local magnetic fields using low-energy electron beam in scanning electron microscope
J. Vac. Sci. Technol. B 32, 06FC02 (2014)
https://doi.org/10.1116/1.4897504
Integrating focused ion beam–scanning electron microscope with confocal Raman microscope into a single instrument
J. Vac. Sci. Technol. B 32, 06FC03 (2014)
https://doi.org/10.1116/1.4897502
Cross-sectional atomic force microscope in scanning electron microscope
J. Vac. Sci. Technol. B 32, 06FC04 (2014)
https://doi.org/10.1116/1.4901565
High-voltage energy dispersive x-ray spectrometry using a low-energy primary beam
J. Vac. Sci. Technol. B 32, 06FC05 (2014)
https://doi.org/10.1116/1.4901883
Medical and Bioscience Applications
Iron-doped apatite nanoparticles for improvement of phage therapy
Jessica M. Andriolo; Ryan M. Hensleigh; Casey A. McConnell; Marisa Pedulla; Katie Hailer; Rajendra Kasinath; Gary Wyss; William Gleason; Jack L. Skinner
J. Vac. Sci. Technol. B 32, 06FD01 (2014)
https://doi.org/10.1116/1.4894460
Clinical probe utilizing surface enhanced Raman scattering
J. Vac. Sci. Technol. B 32, 06FD02 (2014)
https://doi.org/10.1116/1.4896479
Nanoscaffold's stiffness affects primary cortical cell network formation
J. Vac. Sci. Technol. B 32, 06FD03 (2014)
https://doi.org/10.1116/1.4900420
Nanophotonics and Plasmonics
Ultrahigh NA, high aspect ratio interference lithography with resonant dielectric underlayers
J. Vac. Sci. Technol. B 32, 06FE01 (2014)
https://doi.org/10.1116/1.4894168
Block copolymer self assembly for design and vapor-phase synthesis of nanostructured antireflective surfaces
J. Vac. Sci. Technol. B 32, 06FE02 (2014)
https://doi.org/10.1116/1.4896335
Evanescent-coupled antireflection coatings for hyper-numerical aperture immersion lithography
J. Vac. Sci. Technol. B 32, 06FE03 (2014)
https://doi.org/10.1116/1.4900726
Full-color reflective display system based on high contrast gratings
J. Vac. Sci. Technol. B 32, 06FE04 (2014)
https://doi.org/10.1116/1.4901416
Nanofabrication of Novel Materials Including Graphene
Transfer patterning of large-area graphene nanomesh via holographic lithography and plasma etching
J. Vac. Sci. Technol. B 32, 06FF01 (2014)
https://doi.org/10.1116/1.4895667
Effects of MoS2 thickness and air humidity on transport characteristics of plasma-doped MoS2 field-effect transistors
J. Vac. Sci. Technol. B 32, 06FF02 (2014)
https://doi.org/10.1116/1.4897133
Solid-state fabrication of ultrathin freestanding carbon nanotube–graphene hybrid structures for field emission applications
J. Vac. Sci. Technol. B 32, 06FF03 (2014)
https://doi.org/10.1116/1.4899241
Nanoimprint and Roll-to-Roll Manufacturing
Effect of residual stress on replication fidelity with nanoimprint
Marc Papenheim; Khalid Dhima; Si Wang; Christian Steinberg; Hella-Christin Scheer; Jens Saupe; Maik Schönfeld; Jürgen Grimm
J. Vac. Sci. Technol. B 32, 06FG01 (2014)
https://doi.org/10.1116/1.4895794
Computational study of the demolding process in nanoimprint lithography
J. Vac. Sci. Technol. B 32, 06FG02 (2014)
https://doi.org/10.1116/1.4897138
Thermal roll-to-roll imprinted nanogratings on plastic film
J. Vac. Sci. Technol. B 32, 06FG03 (2014)
https://doi.org/10.1116/1.4897132
Fabrication of high-contrast gratings for a parallel spectrum splitting dispersive element in a concentrated photovoltaic system
J. Vac. Sci. Technol. B 32, 06FG04 (2014)
https://doi.org/10.1116/1.4898198
Guided wrinkling with nanoimprinted SU-8 surfaces
Christian Steinberg; Daniel Blenskens; Khalid Dhima; Si Wang; Marc Papenheim; Hella-Christin Scheer; Joachim Zajadacz; Klaus Zimmer
J. Vac. Sci. Technol. B 32, 06FG05 (2014)
https://doi.org/10.1116/1.4898201
Fabrication of wafer-scale nanopatterned sapphire substrate by hybrid nanoimprint lithography
Xu Guo; Jing Hu; Zhe Zhuang; Mengmeng Deng; Feixiang Wu; Xie Li; Bin Liu; Changsheng Yuan; Haixiong Ge; Feng Li; Yanfeng Chen
J. Vac. Sci. Technol. B 32, 06FG06 (2014)
https://doi.org/10.1116/1.4898778
High resolution soft mold for UV-curing nanoimprint lithography using an oxygen insensitive degradable material
J. Vac. Sci. Technol. B 32, 06FG07 (2014)
https://doi.org/10.1116/1.4901418
Impact of resist shrinkage on the template release process in nanoimprint lithography
Takamitsu Tochino; Takahiro Shiotsu; Kimiaki Uemura; Masaaki Yasuda; Hiroaki Kawata; Yoshihiko Hirai
J. Vac. Sci. Technol. B 32, 06FG08 (2014)
https://doi.org/10.1116/1.4901874
Fabrication of antireflection structure film by roll-to-roll ultraviolet nanoimprint lithography
J. Vac. Sci. Technol. B 32, 06FG09 (2014)
https://doi.org/10.1116/1.4901877
Silicon nanopillar anodes for lithium-ion batteries using nanoimprint lithography with flexible molds
J. Vac. Sci. Technol. B 32, 06FG10 (2014)
https://doi.org/10.1116/1.4901878
Processing & Pattern Transfer
Vertical directionality-controlled metal-assisted chemical etching for ultrahigh aspect ratio nanoscale structures
Richard C. Tiberio; Michael J. Rooks; Chieh Chang; Clifford F. Knollenberg; Elizabeth A. Dobisz; Anne Sakdinawat
J. Vac. Sci. Technol. B 32, 06FI01 (2014)
https://doi.org/10.1116/1.4898199
Nanostructure transfer using cyclic olefin copolymer templates fabricated by thermal nanoimprint lithography
J. Vac. Sci. Technol. B 32, 06FI02 (2014)
https://doi.org/10.1116/1.4900609
Analytical parametric model used to study the influence of electrostatic force on surface coverage during electrospinning of polymer fibers
J. Vac. Sci. Technol. B 32, 06FI03 (2014)
https://doi.org/10.1116/1.4900608
Fabrication of silicon nanostructures with large taper angle by reactive ion etching
J. Vac. Sci. Technol. B 32, 06FI04 (2014)
https://doi.org/10.1116/1.4901420
Resists
Investigation of CSAR 62, a new resist for electron beam lithography
J. Vac. Sci. Technol. B 32, 06FJ01 (2014)
https://doi.org/10.1116/1.4899239
Determination of spot size and acid diffusion length in positive chemically amplified resist for e-beam lithography at 100 and 5 kV
Florian Delachat; Christophe Constancias; Jérôme Reche; Bernard Dal'Zotto; Laurent Pain; Boris Le Drogoff; Mohamed Chaker; Joëlle Margot
J. Vac. Sci. Technol. B 32, 06FJ02 (2014)
https://doi.org/10.1116/1.4900730
Simulation and Modelling of Nanofabrication
Defect formation and transformation in graphene under electron irradiation: A molecular dynamics study
J. Vac. Sci. Technol. B 32, 06FK01 (2014)
https://doi.org/10.1116/1.4897304
Optical proximity correction using holographic imaging technique
J. Vac. Sci. Technol. B 32, 06FK02 (2014)
https://doi.org/10.1116/1.4901417
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Machine learning driven measurement of high-aspect-ratio nanostructures using Mueller matrix spectroscopic ellipsometry
Shiva Mudide, Nick Keller, et al.