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Issues

Volume 30, Issue 6
November 2012
Journal of Vacuum Science & Technology B Cover Image for Volume 30, Issue 6
All Issues
ISSN 2166-2746
EISSN 2166-2754

Letters

Gas chopping etching process for InP based nanostructures with high aspect ratios
Sohaib Afzal; Johann Peter Reithmaier
J. Vac. Sci. Technol. B 30, 060601 (2012) https://doi.org/10.1116/1.4754293
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Low homologous temperature (<0.2) sputtering of indium films on silicon
Tuoc Dang; Darryl Shima; Ganesh Balakrishnan; Antao Chen; Robert G. Bedford
J. Vac. Sci. Technol. B 30, 060602 (2012) https://doi.org/10.1116/1.4753818
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Template-dependent nucleation of metallic droplets
Denis M. Nothern; Joanna M. Millunchick
J. Vac. Sci. Technol. B 30, 060603 (2012) https://doi.org/10.1116/1.4754563
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UV ozone treatment for improving contact resistance on graphene
Chung Wei Chen; Fan Ren; Gou-Chung Chi; Sheng-Chun Hung; Y. P. Huang; Jihyun Kim; Ivan I. Kravchenko; Stephen J. Pearton
J. Vac. Sci. Technol. B 30, 060604 (2012) https://doi.org/10.1116/1.4754566
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Active layer thickness effects on the structural and electrical properties of p-type Cu2O thin-film transistors
Dong-Woo Nam; In-Tak Cho; Jong-Ho Lee; Eou-Sik Cho; Joonsung Sohn; Sang-Hun Song; Hyuck-In Kwon
J. Vac. Sci. Technol. B 30, 060605 (2012) https://doi.org/10.1116/1.4764110
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Review Article

Historical development and future trends of vacuum electronics
Georg Gaertner
J. Vac. Sci. Technol. B 30, 060801 (2012) https://doi.org/10.1116/1.4747705
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Electronic & Optoelectronic Materials, Devices & Processing

High-temperature stability of postgrowth-annealed Al-doped MgxZn1-xO films without the phase separation effect
Kuang-Po Hsueh; Yi-Chang Cheng; Wen-Yen Lin; Po-Wei Cheng; Hsien-Chin Chiu; Hsiang-Chun Wang; Jinn-Kong Sheu; Yu-Hsiang Yeh
J. Vac. Sci. Technol. B 30, 061201 (2012) https://doi.org/10.1116/1.4754813
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Voltage induced acoustic resonance in metal organic chemical vapor deposition SrTiO3 thin film
Nick M. Sbrockey; Gary S. Tompa; Thottam S. Kalkur; Jialan Zhang; S. Pamir Alpay; Melanie W. Cole
J. Vac. Sci. Technol. B 30, 061202 (2012) https://doi.org/10.1116/1.4757129
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Effect of bilayer geometry on the diffusion of Ni in amorphous Si and the consequent growth of silicides
Mahamad Ahamad Mohiddon; Mamidipudi Ghanashyam Krishna
J. Vac. Sci. Technol. B 30, 061203 (2012) https://doi.org/10.1116/1.4757134
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Effect of p-AlxGa1−xN electron blocking layer on optical and electrical properties in GaN-based light emitting diodes
Ki-Hyun Kim; Sang-Won Lee; Sung-Nam Lee; Jihoon Kim
J. Vac. Sci. Technol. B 30, 061204 (2012) https://doi.org/10.1116/1.4757289
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Eutectic alloy electrode for rigid and low resistance carbon nanotube contact
Daehyun Park; Dongryul Jeon
J. Vac. Sci. Technol. B 30, 061205 (2012) https://doi.org/10.1116/1.4764513
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In situ near-edge x-ray absorption fine structure spectroscopy investigation of the thermal defunctionalization of graphene oxide
Vincent Lee; Robert V. Dennis; Cherno Jaye; Xi Wang; Daniel A. Fischer; Alexander N. Cartwright; Sarbajit Banerjee
J. Vac. Sci. Technol. B 30, 061206 (2012) https://doi.org/10.1116/1.4766325
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Comparison of neutron irradiation effects in AlGaN/AlN/GaN, AlGaN/GaN, and InAlN/GaN heterojunctions
A. Y. Polyakov; N. B. Smirnov; A. V. Govorkov; E. A. Kozhukhova; Stephen J. Pearton; Fan Ren; Lu Liu; J. W. Johnson; Wantae Lim; N. G. Kolin; S. S. Veryovkin; V. S. Ermakov
J. Vac. Sci. Technol. B 30, 061207 (2012) https://doi.org/10.1116/1.4766727
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Lithography

Hot embossing of thick amorphous fluoropolymer for back end processing of infrared arrays
Justin K. Markunas; Peter J. Smith; John Melngailis
J. Vac. Sci. Technol. B 30, 061601 (2012) https://doi.org/10.1116/1.4757287
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Fabrication of nanodot array mold with 2 Tdot/in.2 for nanoimprint using metallic glass
Yasuyuki Fukuda; Yasunori Saotome; Nobuyuki Nishiyama; Kana Takenaka; Noriko Saidoh; Eiichi Makabe; Akihisa Inoue
J. Vac. Sci. Technol. B 30, 061602 (2012) https://doi.org/10.1116/1.4761472
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Nanometer Science & Technology

Silicon-on-insulator based ZnO nanowire photodetector
Yong Xie; Manfred Madel; Benjamin Neuschl; Wanqi Jie; Uwe Röder; Martin Feneberg; Klaus Thonke
J. Vac. Sci. Technol. B 30, 061801 (2012) https://doi.org/10.1116/1.4759261
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Large area nanofabrication of butterfly wing's three dimensional ultrastructures
Mukti Aryal; Doo-Hyun Ko; John R. Tumbleston; Abay Gadisa; Edward T. Samulski; Rene Lopez
J. Vac. Sci. Technol. B 30, 061802 (2012) https://doi.org/10.1116/1.4759461
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Experimental study of electric field screening by the proximity of two carbon fiber cathodes
Wilkin Tang; Don Shiffler; Ken Golby; Matthew LaCour; Tim Knowles
J. Vac. Sci. Technol. B 30, 061803 (2012) https://doi.org/10.1116/1.4759254
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Fabrication of silicon nanopore arrays using a combination of dry and wet etching
Tao Deng; Jian Chen; Weihua Si; Ming Yin; Wen Ma; Zenwen Liu
J. Vac. Sci. Technol. B 30, 061804 (2012) https://doi.org/10.1116/1.4766322
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Microelectronic & Nanoelectronic Devices

Optimization of surface pretreatment for single GaN nanowire devices
Andrew M. Herrero; Kris A. Bertness
J. Vac. Sci. Technol. B 30, 062201 (2012) https://doi.org/10.1116/1.4754701
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Thin film high dielectric constant metal oxides prepared by reactive sputtering
Steven W. Wright; C. Philip Judge; Michael J. Lee; Derek F. Bowers; Mike Dunbar; Craig D. Wilson
J. Vac. Sci. Technol. B 30, 062202 (2012) https://doi.org/10.1116/1.4757132
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Using electron spectroscopy to verify the model of Ga implanted during focused ion beam circuit editing
David W. Niles; Teresa Spicer; Ronald W. Kee
J. Vac. Sci. Technol. B 30, 062203 (2012) https://doi.org/10.1116/1.4759249
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Transmission electron microscopy characterization of electrically stressed AlGaN/GaN high electron mobility transistor devices
Michael R. Johnson; David A. Cullen; Lu Liu; Tsung Sheng Kang; Fan Ren; Chih-Yang Chang; Stephen J. Pearton; Soohwan Jang; J. Wayne Johnson; David J. Smith
J. Vac. Sci. Technol. B 30, 062204 (2012) https://doi.org/10.1116/1.4766303
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Organic Electronics and Optoelectronics

Discrepancies in performance for heterojunction organic field-effect transistors with different channel lengths
Xinge Yu; Junsheng Yu; Wei Huang; Shijiao Han
J. Vac. Sci. Technol. B 30, 062401 (2012) https://doi.org/10.1116/1.4753932
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The 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Self Assembly
Porous TEM windows fabrication using CsCl self-assembly
Wenhan Liu; Mark Ferguson; Mustafa Yavuz; Bo Cui
J. Vac. Sci. Technol. B 30, 06F201 (2012) https://doi.org/10.1116/1.4751550
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Image quality and pattern transfer in directed self assembly with block-selective atomic layer deposition
Ricardo Ruiz; Lei Wan; Jeffrey Lille; Kanaiyalal C. Patel; Elizabeth Dobisz; Danvers E. Johnston; Kim Kisslinger; Charles T. Black
J. Vac. Sci. Technol. B 30, 06F202 (2012) https://doi.org/10.1116/1.4758773
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Three-dimensional capillary force assembly: Fabrication of white light emitters
Julien Cordeiro; Olivier Lecarme; Guilherme Osvaldo Dias; David Peyrade
J. Vac. Sci. Technol. B 30, 06F203 (2012) https://doi.org/10.1116/1.4764090
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Mechanical properties of polymeric nanostructures fabricated through directed self-assembly of symmetric diblock and triblock copolymers
Sean P. Delcambre; Shengxiang Ji; Paul F. Nealey
J. Vac. Sci. Technol. B 30, 06F204 (2012) https://doi.org/10.1116/1.4766916
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Sub-30 nm pitch line-space patterning of semiconductor and dielectric materials using directed self-assembly
Hsin-Yu Tsai; Hiroyuki Miyazoe; Sebastian Engelmann; Bang To; Ed Sikorski; Jim Bucchignano; Dave Klaus; Chi-Chun Liu; Joy Cheng; Dan Sanders; Nicholas Fuller; Michael Guillorn
J. Vac. Sci. Technol. B 30, 06F205 (2012) https://doi.org/10.1116/1.4767237
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Electron or Ion Beam Lithography
Electron beam direct write of chalcogenide glass integrated optics
Galen B. Hoffman; Ronald M. Reano
J. Vac. Sci. Technol. B 30, 06F301 (2012) https://doi.org/10.1116/1.4748567
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Tilted nanostructure fabrication by electron beam lithography
Jian Zhang; Babak Shokouhi; Bo Cui
J. Vac. Sci. Technol. B 30, 06F302 (2012) https://doi.org/10.1116/1.4754809
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High resolution patterning on nonplanar substrates with large height variation using electron beam lithography
Vishva Ray; Yukinori Aida; Ryo Funakoshi; Hitoshi Kato; Stella W. Pang
J. Vac. Sci. Technol. B 30, 06F303 (2012) https://doi.org/10.1116/1.4755819
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Combined helium ion beam and nanoimprint lithography attains 4 nm half-pitch dense patterns
Wen-Di Li; Wei Wu; Richard Stanley Williams
J. Vac. Sci. Technol. B 30, 06F304 (2012) https://doi.org/10.1116/1.4758768
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Long nanoscale gaps on III–V substrates by electron beam lithography
Stephen Thoms; Douglas S. Macintyre
J. Vac. Sci. Technol. B 30, 06F305 (2012) https://doi.org/10.1116/1.4766881
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Lithographically fabricated gratings for the interferometric measurement of material shear moduli under extreme conditions
Arianna E. Gleason; Richard C. Tiberio; Wendy L. Mao; Suzanne Ali; Cynthia A. Bolme; Amy Lazicki; Garry Bordonaro; John Treichler; Vincent Genova; Jon H. Eggert
J. Vac. Sci. Technol. B 30, 06F306 (2012) https://doi.org/10.1116/1.4767323
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New types of dose distributions for vertical sidewall minimizing total dose in 3-D electron-beam proximity effect correction of nanoscale features
Qing Dai; Soo-Young Lee; Sang-Hee Lee; Byung-Gook Kim; Han-Ku Cho
J. Vac. Sci. Technol. B 30, 06F307 (2012) https://doi.org/10.1116/1.4767446
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Fast simulation of stochastic exposure distribution in electron-beam lithography
Xinyu Zhao; Soo-Young Lee; Sang-Hee Lee; Byung-Gook Kim; Han-Ku Cho
J. Vac. Sci. Technol. B 30, 06F308 (2012) https://doi.org/10.1116/1.4767447
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Emerging Technologies and Solar
Via-hole fabrication for III-V triple-junction solar cells
Yuning Zhao; Patrick Fay; Andre Wibowo; Jianhong Liu; Chris Youtsey
J. Vac. Sci. Technol. B 30, 06F401 (2012) https://doi.org/10.1116/1.4754306
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Progress toward an aberration-corrected low energy electron microscope for DNA sequencing and surface analysis
Marian Mankos; Khashayar Shadman; Alpha T. N'Diaye; Andreas K. Schmid; Henrik H. J. Persson; Ronald W. Davis
J. Vac. Sci. Technol. B 30, 06F402 (2012) https://doi.org/10.1116/1.4764095
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Extreme Ultraviolet lithography
Residual-type mask defect printability for extreme ultraviolet lithography
Tsuyoshi Amano; Susumu Iida; Ryoichi Hirano; Tsuneo Terasawa; Hidehiro Watanabe; Yuichi Inazuki
J. Vac. Sci. Technol. B 30, 06F501 (2012) https://doi.org/10.1116/1.4756934
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Defect tolerant extreme ultraviolet lithography technique
Lukasz Urbanski; Wei Li; Jorge J. Rocca; Carmen S. Menoni; Mario C. Marconi; Artak Isoyan; Aaron Stein
J. Vac. Sci. Technol. B 30, 06F502 (2012) https://doi.org/10.1116/1.4758758
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Identification of residual-type defect on extreme ultraviolet mask by projection electron microscope using Monte Carlo simulation
Susumu Iida; Tsuyoshi Amano; Ryoichi Hirano; Tsuneo Terasawa; Hidehiro Watanabe
J. Vac. Sci. Technol. B 30, 06F503 (2012) https://doi.org/10.1116/1.4758924
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Evaluation of lithographic performance of extreme ultra violet mask using coherent scattering microscope
Jonggul Doh; Jae Uk Lee; Jinho Ahn; Seong-sue Kim
J. Vac. Sci. Technol. B 30, 06F504 (2012) https://doi.org/10.1116/1.4764091
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Optical properties of TaTe2O7 thin films as absorber materials for extreme ultraviolet lithography binary masks
Hee Young Kang; Pazhanisami Peranantham; Chang Kwon Hwangbo; Hwan-Seok Seo; Seong-Su Kim; Jang Hoon Lee
J. Vac. Sci. Technol. B 30, 06F505 (2012) https://doi.org/10.1116/1.4766879
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Fundamental study of extreme UV resist line edge roughness: Characterization, experiment, and modeling
Ramakrishnan Ayothi; Lovejeet Singh; Yoshi Hishiro; Jed W. Pitera; Linda K. Sundberg; Martha I. Sanchez; Luisa Bozano; Kumar Virwani; Hoa D. Truong; Noel Arellano; Karen Petrillo; Gregory M. Wallraff; William D. Hinsberg; Yueming Hua
J. Vac. Sci. Technol. B 30, 06F506 (2012) https://doi.org/10.1116/1.4767235
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Supplementary Material
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Electron or Ion Sources and Systems
Visualization of beams from ionic liquid ion sources for focused ion beam applications
Carla S. Perez-Martinez; Paulo C. Lozano
J. Vac. Sci. Technol. B 30, 06F601 (2012) https://doi.org/10.1116/1.4745187
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Secondary ion mass spectrometry on the helium ion microscope: A feasibility study of ion extraction
David Dowsett; Tom Wirtz; Nico Vanhove; Lex Pillatsch; Sybren Sijbrandij; John Notte
J. Vac. Sci. Technol. B 30, 06F602 (2012) https://doi.org/10.1116/1.4754309
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Computer modeling of the Schottky electron source
Lynwood W. Swanson; Gregory A. Schwind; Sean M. Kellogg; Kun Liu
J. Vac. Sci. Technol. B 30, 06F603 (2012) https://doi.org/10.1116/1.4756935
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Mass filtered plasma focused ion beam system
Charles E. Otis; Anthony Graupera; Dustin Laur; Shouyin Zhang; Sean Kellogg; Greg Schwind
J. Vac. Sci. Technol. B 30, 06F604 (2012) https://doi.org/10.1116/1.4764920
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Size dependent enhancement of photoelectron emission quantum efficiencies from magnesium dots
Heon J. Choi; Ananthan Raghunathan; Timothy R. Groves
J. Vac. Sci. Technol. B 30, 06F605 (2012) https://doi.org/10.1116/1.4766883
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Probe current distribution characterization technique for focused ion beam
Shida Tan; Richard Livengood; Yuval Greenzweig; Yariv Drezner; Darryl Shima
J. Vac. Sci. Technol. B 30, 06F606 (2012) https://doi.org/10.1116/1.4766882
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Imaging & Metrology
Simulation of electron scattering in a scanning electron microscope for subsurface metrology
Nobuhiro Okai; Yasunari Sohda
J. Vac. Sci. Technol. B 30, 06F701 (2012) https://doi.org/10.1116/1.4767236
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Development of optical system with rotational misalignment adjustment for multi-optical-probe confocal microscopy
Jiseok Lim; Myungki Jung; Seo Young Hwang; Shinill Kang
J. Vac. Sci. Technol. B 30, 06F702 (2012) https://doi.org/10.1116/1.4767639
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Microfluidics
Switchable electrowetting of droplets on dual-scale structured surfaces
Shaun Berry; Ted Fedynyshyn; Lalitha Parameswaran; Alberto Cabral
J. Vac. Sci. Technol. B 30, 06F801 (2012) https://doi.org/10.1116/1.4764092
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Supplementary Material
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Fabrication of on-chip fluidic channels incorporating nanopores using self-aligned double layer resist processing technique
Bongho Kim; Jihun Kwon; Daehong Kim; Sungwoo Chun; Hyungyu Lee; Seung-Beck Lee
J. Vac. Sci. Technol. B 30, 06F802 (2012) https://doi.org/10.1116/1.4767234
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Nanobiology
Pyramid array substrates for biomedical studies
Ronny Löffler; Monika Fleischer; Dieter P. Kern; Claudia Matschegewski; Susanne Stählke; Barbara Nebe; Regina Lange
J. Vac. Sci. Technol. B 30, 06F901 (2012) https://doi.org/10.1116/1.4757109
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Fabrication of polymeric substrates with micro- and nanoscale topography bioimprinted at progressive cell morphologies
Lynn M. Murray; Volker Nock; Maan M. Alkaisi; Joanne J. M. Lee; Tim B. F. Woodfield
J. Vac. Sci. Technol. B 30, 06F902 (2012) https://doi.org/10.1116/1.4758759
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Arrays of topographically and peptide-functionalized hydrogels for analysis of biomimetic extracellular matrix properties
Michelle J. Wilson; Yaming Jiang; Bernardo Yañez-Soto; Sara Liliensiek; William L. Murphy; Paul F. Nealey
J. Vac. Sci. Technol. B 30, 06F903 (2012) https://doi.org/10.1116/1.4762842
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Nanoelectronics
Negative electron-beam resist hard mask ion beam etching process for the fabrication of nanoscale magnetic tunnel junctions
Sung-Woo Chun; Daehong Kim; Jihun Kwon; Bongho Kim; Hyungyu Lee; Seung-Beck Lee
J. Vac. Sci. Technol. B 30, 06FA01 (2012) https://doi.org/10.1116/1.4767123
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Nanoimprint Lithography
Fast and continuous patterning on the surface of plastic fiber by using thermal roller imprint
Akihiro Ohtomo; Mitsunori Kokubo; Hiroshi Goto; Harutaka Mekaru; Hideki Takagi
J. Vac. Sci. Technol. B 30, 06FB01 (2012) https://doi.org/10.1116/1.4754810
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Fabrication of Au nanorod and nanogap split-ring structures by reactive-monolayer-assisted thermal nanoimprint lithography involving electrodeposition
Tatsuya Tomioka; Shoichi Kubo; Koichi Nagase; Morihisa Hoga; Masaru Nakagawa
J. Vac. Sci. Technol. B 30, 06FB02 (2012) https://doi.org/10.1116/1.4755817
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Study of defect mechanisms in partly filled stamp cavities for thermal nanoimprint control
Andre Mayer; Khalid Dhima; Saskia Möllenbeck; Si Wang; Hella-Christin Scheer; Junji Sakamoto; Hiroaki Kawata; Yoshihiko Hirai
J. Vac. Sci. Technol. B 30, 06FB03 (2012) https://doi.org/10.1116/1.4756933
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High-resolution nondestructive patterning of isolated organic semiconductors
Yi-Chen Lo; Dawen Li; Zhenzhong Sun; Shoieb Shaik; Xing Cheng
J. Vac. Sci. Technol. B 30, 06FB04 (2012) https://doi.org/10.1116/1.4757956
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Release layer-free acrylate resins with segregation auxiliary agents for ultraviolet nanoimprinting
Shunya Ito; Cheol Min Yun; Kei Kobayashi; Masaru Nakagawa
J. Vac. Sci. Technol. B 30, 06FB05 (2012) https://doi.org/10.1116/1.4758769
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Density measurement of pillar structure fabricated via nanoimprinting using a poly(dimethylsiloxane) mold
Yuji Kang; Yasuki Nakai; Yuichi Haruyama; Shinji Matsui
J. Vac. Sci. Technol. B 30, 06FB06 (2012) https://doi.org/10.1116/1.4758776
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High-density pattern transfer via roll-to-roll ultraviolet nanoimprint lithography using replica mold
Jun Taniguchi; Hiroshi Yoshikawa; Go Tazaki; Toshiyuki Zento
J. Vac. Sci. Technol. B 30, 06FB07 (2012) https://doi.org/10.1116/1.4758922
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Cross-linking control during imprint for hybrid lithography
Khalid Dhima; Christian Steinberg; Saskia Möllenbeck; Andre Mayer; Si Wang; Hella-Christin Scheer
J. Vac. Sci. Technol. B 30, 06FB08 (2012) https://doi.org/10.1116/1.4763357
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Sidewall-angle dependent mold filling of three-dimensional microcavities in thermal nanoimprint lithography
Helmut Schift; Mirco Altana; Arne Schleunitz
J. Vac. Sci. Technol. B 30, 06FB09 (2012) https://doi.org/10.1116/1.4764096
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Investigation of nonreactive fluoroalkyl-containing surfactants for reducing release energy of ultraviolet-cured acrylate resins
Masaru Nakagawa; Ayako Endo; Yoshitaka Tsukidate
J. Vac. Sci. Technol. B 30, 06FB10 (2012) https://doi.org/10.1116/1.4766880
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Fabrication of an adhesion-free transparent roll stamp for large area patterning using ultraviolet-type roller nanoimprint lithography
Hyun-Ha Park; HyungJun Lim; SungHwi Lee; JaeJong Lee
J. Vac. Sci. Technol. B 30, 06FB11 (2012) https://doi.org/10.1116/1.4766894
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Control of inclination angle of glass-like carbon mold by defocus UV exposure on Si-containing photoresist
Harutaka Mekaru; Chieko Okuyama; Akihisa Ueno
J. Vac. Sci. Technol. B 30, 06FB12 (2012) https://doi.org/10.1116/1.4766316
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Real-time full-area monitoring of the filling process in molds for UV nanoimprint lithography using dark field illumination
Qing Wang; Hiroshi Hiroshima; Kenta Suzuki; Sung-Won Youn
J. Vac. Sci. Technol. B 30, 06FB13 (2012) https://doi.org/10.1116/1.4767122
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Maskless Lithography
Multiaxis and multibeam technology for high throughput maskless E-beam lithography
Hiroshi Yasuda; Takeshi Haraguchi; Hidebumi Yabara; Kouji Takahata; Hidekazu Murata; Eiji Rokuta; Hiroshi Shimoyama
J. Vac. Sci. Technol. B 30, 06FC01 (2012) https://doi.org/10.1116/1.4767275
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MEMs, NEMS & Tip Based Nanofabrication
Bimaterial electromechanical systems for a biomimetical acoustic sensor
Enrico Mastropaolo; Rhonira Latif; Thomas Koickal; Alister Hamilton; Rebecca Cheung; Michael Newton; Leslie Smith
J. Vac. Sci. Technol. B 30, 06FD01 (2012) https://doi.org/10.1116/1.4764094
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Silver patterning using an atomic force microscope tip and laser-induced chemical deposition from liquids
Carlos A. Jarro; Eugenii U. Donev; Mustafa Pinar Menguç; Jeffrey Todd Hastings
J. Vac. Sci. Technol. B 30, 06FD02 (2012) https://doi.org/10.1116/1.4764093
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Nanomechanical tuning forks fabricated using focused-ion-beam chemical vapor deposition
Hiroki Ashiba; Reo Kometani; Shin'ichi Warisawa; Sunao Ishihara
J. Vac. Sci. Technol. B 30, 06FD03 (2012) https://doi.org/10.1116/1.4766315
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Improved single ion implantation with scanning probe alignment
Michael Ilg; Christoph D. Weis; Julian Schwartz; Arun Persaud; Qing Ji; Cheuk Chi Lo; Jeffrey Bokor; Alex Hegyi; Elshad Guliyev; Ivo W. Rangelow; Thomas Schenkel
J. Vac. Sci. Technol. B 30, 06FD04 (2012) https://doi.org/10.1116/1.4767233
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Piezoelectrically transduced silicon carbide MEMS double-clamped beam resonators
Boris Sviličić; Enrico Mastropaolo; Tao Chen; Rebecca Cheung
J. Vac. Sci. Technol. B 30, 06FD05 (2012) https://doi.org/10.1116/1.4767441
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Nanophotonics & Plasmonics
Fabrication of digital planar holograms into high refractive index waveguide core for spectroscopy-on-chip applications
Cosimo Calò; Valeria Lacatena; Scott D. Dhuey; Stefano Cabrini; Sergey Babin; Christophe Peroz; Alexander Koshelev; Igor Ivonin; Alexander Goltsov; Vladimir Yankov
J. Vac. Sci. Technol. B 30, 06FE01 (2012) https://doi.org/10.1116/1.4750038
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Sensing properties of infrared nanostructured plasmonic crystals fabricated by electron beam lithography and argon ion milling
Baogang Quan; Zhe Liu; Lin Li; Weijie Sun; Xinlong Xu; Xiaoxiang Xia; Haifang Yang; Junjie Li; Changzhi Gu
J. Vac. Sci. Technol. B 30, 06FE02 (2012) https://doi.org/10.1116/1.4767274
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Nanostructures & Processing
Template-assisted assembly of ZnO nanorods with postdeposition growth
Tao-Hua Lee; Hung-Jue Sue; Xing Cheng
J. Vac. Sci. Technol. B 30, 06FF01 (2012) https://doi.org/10.1116/1.4750036
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Nanofabrication of high aspect ratio (∼50:1) sub-10 nm silicon nanowires using inductively coupled plasma etching
Muhammad M. Mirza; Haiping Zhou; Philippe Velha; Xu Li; Kevin E. Docherty; Antonio Samarelli; Gary Ternent; Douglas J. Paul
J. Vac. Sci. Technol. B 30, 06FF02 (2012) https://doi.org/10.1116/1.4755835
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Fabrication of nanoscale, high throughput, high aspect ratio freestanding gratings
Alexander Bruccoleri; Pran Mukherjee; Ralf K. Heilmann; Jonathan Yam; Mark L. Schattenburg; Frank DiPiazza
J. Vac. Sci. Technol. B 30, 06FF03 (2012) https://doi.org/10.1116/1.4755815
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Dual applications of free-standing holographic nanopatterns for lift-off and stencil lithography
Ke Du; Yuyang Liu; Ishan Wathuthanthri; Chang-Hwan Choi
J. Vac. Sci. Technol. B 30, 06FF04 (2012) https://doi.org/10.1116/1.4757110
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Process considerations for layer-by-layer 3D patterning of silicon, using ion implantation, silicon deposition, and selective silicon etching
Kristinn B. Gylfason; Andreas C. Fischer; B. Gunnar Malm; Henry H. Radamson; Lyubov M. Belova; Frank Niklaus
J. Vac. Sci. Technol. B 30, 06FF05 (2012) https://doi.org/10.1116/1.4756947
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Low-pressure inductively coupled plasma etching of benzocyclobutene with SF6/O2 plasma chemistry
Erica A. Douglas; Jeffrey Stevens; Kira Fishgrab; Christine Ford; Randy J. Shul; Stephen J. Pearton
J. Vac. Sci. Technol. B 30, 06FF06 (2012) https://doi.org/10.1116/1.4758765
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Fabrication and magnetic properties of 100-nm-scaled permalloy nanotube arrays
Yu-Chen Huang; Cheng-Yi Kuo; Jia-Hong Shyu; Ching-Ming Lee; Lance Horng; Jong-Ching Wu
J. Vac. Sci. Technol. B 30, 06FF07 (2012) https://doi.org/10.1116/1.4762843
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Growth characterization of electron-beam-induced silver deposition from liquid precursor
Leonidas E. Ocola; Alexandra Joshi-Imre; Cynthia Kessel; Brian Chen; Jonathan Park; David Gosztola; Ralu Divan
J. Vac. Sci. Technol. B 30, 06FF08 (2012) https://doi.org/10.1116/1.4765629
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Optimization of a self-closing effect to produce nanochannels with top slits in fused silica
Mariusz Graczyk; Martina Balaz; Anders Kvennefors; Heiner Linke; Ivan Maximov
J. Vac. Sci. Technol. B 30, 06FF09 (2012) https://doi.org/10.1116/1.4766317
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From nanocone to nanodisc: Structural transformation of gold nanoarrays via simple mechanical stresses
Yuyang Liu; Ke Du; Ishan Wathuthanthri; Chang-Hwan Choi
J. Vac. Sci. Technol. B 30, 06FF10 (2012) https://doi.org/10.1116/1.4765635
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Study of the interaction of polymethylmethacrylate fragments with methyl isobutyl ketone and isopropyl alcohol
Mohammad Ali Mohammad; Kolattukudy Poulose Santo; Steven K. Dew; Maria Stepanova
J. Vac. Sci. Technol. B 30, 06FF11 (2012) https://doi.org/10.1116/1.4766318
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Supplementary Material
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From sponge to dot arrays on (100) Ge by increasing the energy of ion impacts
Roman Böttger; Lothar Bischoff; Karl-Heinz Heinig; Wolfgang Pilz; Bernd Schmidt
J. Vac. Sci. Technol. B 30, 06FF12 (2012) https://doi.org/10.1116/1.4767269
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Optical & Grating Based Lithography
Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists
Gustaf Winroth; Todd R. Younkin; James M. Blackwell; Roel Gronheid
J. Vac. Sci. Technol. B 30, 06FG01 (2012) https://doi.org/10.1116/1.4758772
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Talbot effect immersion lithography by self-imaging of very fine grating patterns
Takashi Sato
J. Vac. Sci. Technol. B 30, 06FG02 (2012) https://doi.org/10.1116/1.4767440
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Fast aerial image simulations for partially coherent systems by transmission cross coefficient decomposition with analytical kernels
Peng Gong; Shiyuan Liu; Wen Lv; Xinjiang Zhou
J. Vac. Sci. Technol. B 30, 06FG03 (2012) https://doi.org/10.1116/1.4767442
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Bit Patterned Media & Data Storage
Fabrication of 1 Teradot/in.2 CoCrPt bit patterned media and recording performance with a conventional read/write head
Elizabeth A. Dobisz; Dan Kercher; Michael Grobis; Olav Hellwig; Ernesto E. Marinero; Dieter Weller; Thomas R. Albrecht
J. Vac. Sci. Technol. B 30, 06FH01 (2012) https://doi.org/10.1116/1.4757955
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Fabrication of 5 Tdot/in.2 bit patterned media with servo pattern using directed self-assembly
Naoko Kihara; Ryousuke Yamamoto; Norikatsu Sasao; Takuya Shimada; Akiko Yuzawa; Takeshi Okino; Yasuaki Ootera; Yoshiyuki Kamata; Akira Kikitsu
J. Vac. Sci. Technol. B 30, 06FH02 (2012) https://doi.org/10.1116/1.4763356
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Resists
High aspect ratio features in poly(methylglutarimide) using electron beam lithography and solvent developers
Golnaz Karbasian; Patrick J. Fay; Huili (Grace) Xing; Debdeep Jena; Alexei O. Orlov; Gregory L. Snider
J. Vac. Sci. Technol. B 30, 06FI01 (2012) https://doi.org/10.1116/1.4750217
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Selective laser ablation of radiation exposed methyl acetoxy calix(6)arene
Pradeep N. Perera; Adam M. Schwartzberg; Dimas G. de Oteyza; Scott D. Dhuey; Bruce D. Harteneck; Stefano Cabrini; Deirdre L. Olynick
J. Vac. Sci. Technol. B 30, 06FI02 (2012) https://doi.org/10.1116/1.4767347
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Graphene
Optimization of the visibility of graphene on poly-Si film by thin-film optics engineering
Tao Chen; Enrico Mastropaolo; Andrew Bunting; Tom Stevenson; Rebecca Cheung
J. Vac. Sci. Technol. B 30, 06FJ01 (2012) https://doi.org/10.1116/1.4758760
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Molecular dynamics study of the structural modification of graphene by electron irradiation
Yoshiki Asayama; Masaaki Yasuda; Kazuhiro Tada; Hiroaki Kawata; Yoshihiko Hirai
J. Vac. Sci. Technol. B 30, 06FJ02 (2012) https://doi.org/10.1116/1.4765630
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3DIC Technology
Low-temperature Al–Ge bonding for 3D integration
Filip Crnogorac; Fabian R. W. Pease; Ryan P. Birringer; Reinhold H. Dauskardt
J. Vac. Sci. Technol. B 30, 06FK01 (2012) https://doi.org/10.1116/1.4762844
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Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Heating of C s 2 Te photocathode via field emission and radiofrequency pulsed heating: Implication toward breakdown
Ryo Shinohara, Soumendu Bagchi, et al.
Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning
Yasser Pordeli, Céline Steenge, et al.
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