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Large-area suspended graphene on GaN nanopillars

Chongmin Lee; Byung-Jae Kim; Fan Ren; S. J. Pearton; Jihyun Kim

J. Vac. Sci. Technol. B 29, 060601 (2011) https://doi.org/10.1116/1.3654042

Abstract

View articletitled, Large-area suspended graphene on GaN nanopillars

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Recessed area patterning via nanoimprint lithography

Karen S. L. Chong; Yeong-Yuh Lee; Hong Yee Low

J. Vac. Sci. Technol. B 29, 060602 (2011) https://doi.org/10.1116/1.3660393

Abstract

View articletitled, Recessed area patterning via nanoimprint lithography

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Investigating the effect of off-state stress on trap densities in AlGaN/GaN high electron mobility transistors

L. Liu; F. Ren; S. J. Pearton; R. C. Fitch; D. E. Walker; K. D. Chabak; J. K. Gillespie; M. Kossler; M. Trejo; David Via; A. Crespo

J. Vac. Sci. Technol. B 29, 060603 (2011) https://doi.org/10.1116/1.3660396

Abstract

View articletitled, Investigating the effect of off-state stress on trap densities in AlGaN/GaN high electron mobility transistors

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Temperature mapping using single wavelength pyrometry during epitaxial growth

Bernard Paquette; Badii Gsib; Richard Arès

J. Vac. Sci. Technol. B 29, 060604 (2011) https://doi.org/10.1116/1.3660395

Abstract

View articletitled, Temperature mapping using single wavelength pyrometry during epitaxial growth

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Review Article

Functional semiconductor nanowires via vapor deposition

Jian Shi; Xudong Wang

J. Vac. Sci. Technol. B 29, 060801 (2011) https://doi.org/10.1116/1.3641913

Abstract

View articletitled, Functional semiconductor nanowires via vapor deposition

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Electronic & Optoelectronic Materials, Devices & Processing

Effects of proton irradiation on dc characteristics of InAlN/GaN high electron mobility transistors

C. F. Lo; L. Liu; F. Ren; H.-Y. Kim; J. Kim; S. J. Pearton; O. Laboutin; Yu Cao; J. W. Johnson; I. I. Kravchenko

J. Vac. Sci. Technol. B 29, 061201 (2011) https://doi.org/10.1116/1.3644480

Abstract

View articletitled, Effects of proton irradiation on dc characteristics of InAlN/GaN high electron mobility transistors

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Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications

Meng-Yu Lin; Yung-Shuan Sheng; Shu-Han Chen; Ching-Yuan Su; Lain-Jong Li; Shih-Yen Lin

J. Vac. Sci. Technol. B 29, 061202 (2011) https://doi.org/10.1116/1.3646481

Abstract

View articletitled, Graphitic carbon film formation under Ni templates by radio-frequency sputtering for transparent electrode applications

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Pulsed-laser atom probe tomography of p-type field effect transistors on Si-on-insulator substrates

S. Jin; K. S. Jones; P. A. Ronsheim; M. Hatzistergos

J. Vac. Sci. Technol. B 29, 061203 (2011) https://doi.org/10.1116/1.3647879

Abstract

View articletitled, Pulsed-laser atom probe tomography of p-type field effect transistors on Si-on-insulator substrates

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Comparison of passivation layers for AlGaN/GaN high electron mobility transistors

R. C. Fitch; D. E. Walker, Jr.; K. D. Chabak; J. K. Gillespie; M. Kossler; M. Trejo; A. Crespo; L. Liu; T. S. Kang; C.-F. Lo; F. Ren; D. J. Cheney; S. J. Pearton

J. Vac. Sci. Technol. B 29, 061204 (2011) https://doi.org/10.1116/1.3656390

Abstract

View articletitled, Comparison of passivation layers for AlGaN/GaN high electron mobility transistors

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Investigation of polarity effects on the degradation of Pd/Ti/Pt ohmic contacts to p-type SiC under current stress

B. P. Downey; J. R. Flemish; S. E. Mohney

J. Vac. Sci. Technol. B 29, 061205 (2011) https://doi.org/10.1116/1.3659730

Abstract

View articletitled, Investigation of polarity effects on the degradation of Pd/Ti/Pt ohmic contacts to p-type SiC under current stress

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Energy Conversion and Storage Devices

PEN/Si₃N₄ bilayer film for dc bus capacitors in power converters in hybrid electric vehicles

Chen Zou; Qiming Zhang; Shihai Zhang; Douglas Kushner; Xin Zhou; Richard Bernard; Raymond J. Orchard, Jr.

J. Vac. Sci. Technol. B 29, 061401 (2011) https://doi.org/10.1116/1.3646479

Abstract

View articletitled, PEN/Si3N4 bilayer film for dc bus capacitors in power converters in hybrid electric vehicles

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Fabrication of two-dimensional tungsten photonic crystals for high-temperature applications

M. Araghchini; Y. X. Yeng; N. Jovanovic; P. Bermel; L. A. Kolodziejski; M. Soljacic; I. Celanovic; J. D. Joannopoulos

J. Vac. Sci. Technol. B 29, 061402 (2011) https://doi.org/10.1116/1.3646475

Abstract

View articletitled, Fabrication of two-dimensional tungsten photonic crystals for high-temperature applications

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Lithography

Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithography

Tobias Senn; Oliver Kutz; Christian Weniger; Junming Li; Max Schoengen; Heike Löchel; Johannes Wolf; Philipp Göttert; Bernd Löchel

J. Vac. Sci. Technol. B 29, 061601 (2011) https://doi.org/10.1116/1.3644474

Abstract

View articletitled, Integration of moth-eye structures into a poly(dimethylsiloxane) stamp for the replication of functionalized microlenses using UV-nanoimprint lithography

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Fabrication of ultra-high-density nanodot array patterns (∼3 Tbits/in.²) using electron-beam lithography

Min-Hyun Lee; Hyun-Mi Kim; Seong-Yong Cho; Kipil Lim; Soo-Yeon Park; Jae Jong Lee; Ki-Bum Kim

J. Vac. Sci. Technol. B 29, 061602 (2011) https://doi.org/10.1116/1.3646469

Abstract

View articletitled, Fabrication of ultra-high-density nanodot array patterns (∼3 Tbits/in.2) using electron-beam lithography

Supplementary Material

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Development of an experimental technique for testing rheological properties of ultrathin polymer films used in nanoimprint lithography

Dariusz M. Jarzabek; Zygmunt Rymuza; Akira Horiba; Yoshihiko Hirai

J. Vac. Sci. Technol. B 29, 061603 (2011) https://doi.org/10.1116/1.3656377

Abstract

View articletitled, Development of an experimental technique for testing rheological properties of ultrathin polymer films used in nanoimprint lithography

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Method to pattern etch masks in two inclined planes for three-dimensional nano- and microfabrication

R. Willem Tjerkstra; Léon A. Woldering; Johanna M. van den Broek; Fred Roozeboom; Irwan D. Setija; Willem L. Vos

J. Vac. Sci. Technol. B 29, 061604 (2011) https://doi.org/10.1116/1.3662000

Abstract

View articletitled, Method to pattern etch masks in two inclined planes for three-dimensional nano- and microfabrication

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Nanometer Science & Technology

Growth mechanism of multilayer-graphene-capped, vertically aligned multiwalled carbon nanotube arrays

Yuki Matsuoka; Ian T. Clark; Masamichi Yoshimura

J. Vac. Sci. Technol. B 29, 061801 (2011) https://doi.org/10.1116/1.3644494

Abstract

View articletitled, Growth mechanism of multilayer-graphene-capped, vertically aligned multiwalled carbon nanotube arrays

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Fabrication of nanogaps by a progressive electromigration technique using wires of various thicknesses

Swatilekha Saha; Guoguang Qian; Kim M. Lewis

J. Vac. Sci. Technol. B 29, 061802 (2011) https://doi.org/10.1116/1.3647908

Abstract

View articletitled, Fabrication of nanogaps by a progressive electromigration technique using wires of various thicknesses

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Laser nitriding of niobium for application to superconducting radio-frequency accelerator cavities

S. Singaravelu; J. M. Klopf; G. Krafft; M. J. Kelley

J. Vac. Sci. Technol. B 29, 061803 (2011) https://doi.org/10.1116/1.3656380

Abstract

View articletitled, Laser nitriding of niobium for application to superconducting radio-frequency accelerator cavities

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High temperature focused ion beam response of graphite resulting in spontaneous nanosheet formation

Rupert Langegger; Alois Lugstein; Markus Glaser; Emmerich Bertagnolli; Andreas Steiger-Thirsfeld

J. Vac. Sci. Technol. B 29, 061804 (2011) https://doi.org/10.1116/1.3661994

Abstract

View articletitled, High temperature focused ion beam response of graphite resulting in spontaneous nanosheet formation

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Morphology of the Au-Si interface formed during solidification of liquid Au/Si(111) islands

Nick Jungwirth; Eric Dailey; Prashanth Madras; Jeff Drucker

J. Vac. Sci. Technol. B 29, 061805 (2011) https://doi.org/10.1116/1.3661996

Abstract

View articletitled, Morphology of the Au-Si interface formed during solidification of liquid Au/Si(111) islands

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Oxide nanotube analogues: CuO nanobarrels

H. H. Farrell; Ruben D. Parra

J. Vac. Sci. Technol. B 29, 061806 (2011) https://doi.org/10.1116/1.3661990

Abstract

View articletitled, Oxide nanotube analogues: CuO nanobarrels

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MEMS & NEMS

Semiconductor nanopores formed by chemical vapor deposition of heteroepitaxial SiC films on SOI(100) substrates

Yoshifumi Ikoma; Hafizal Yahaya; Keiji Kuriyama; Hirofumi Sakita; Yuta Nishino; Teruaki Motooka

J. Vac. Sci. Technol. B 29, 062001 (2011) https://doi.org/10.1116/1.3646471

Abstract

View articletitled, Semiconductor nanopores formed by chemical vapor deposition of heteroepitaxial SiC films on SOI(100) substrates

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Microelectronic & Nanoelectronic Devices

Suppression of boron diffusion in deep submicron devices

Michael A. Gribelyuk; Phil Oldiges; Paul A. Ronsheim; Jun Yuan; Leon Kimball

J. Vac. Sci. Technol. B 29, 062201 (2011) https://doi.org/10.1116/1.3656376

Abstract

View articletitled, Suppression of boron diffusion in deep submicron devices

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Interface and electrical properties of Tm₂O₃ gate dielectrics for gate oxide scaling in MOS devices

M. Kouda; T. Kawanago; P. Ahmet; K. Natori; T. Hattori; H. Iwai; K. Kakushima; A. Nishiyama; N. Sugii; K. Tsutsui

J. Vac. Sci. Technol. B 29, 062202 (2011) https://doi.org/10.1116/1.3660800

Abstract

View articletitled, Interface and electrical properties of Tm2O3 gate dielectrics for gate oxide scaling in MOS devices

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Organic Electronics and Optoelectronics

Fabrication of a blue organic light-emitting diode with a novel thermal deposition boat

Sangmin Lee; Ching W. Tang

J. Vac. Sci. Technol. B 29, 062401 (2011) https://doi.org/10.1116/1.3656392

Abstract

View articletitled, Fabrication of a blue organic light-emitting diode with a novel thermal deposition boat

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Plasmonics

Surface plasmon waveguide devices with T_g-bonded Cytop claddings

Charles Chiu; Ewa Lisicka-Skrzek; R. Niall Tait; Pierre Berini

J. Vac. Sci. Technol. B 29, 062601 (2011) https://doi.org/10.1116/1.3660801

Abstract

View articletitled, Surface plasmon waveguide devices with Tg-bonded Cytop claddings

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The 55th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication

Directed Assembly

Patterned atomic layer epitaxy of Si/Si(001):H

James H. G. Owen; Joshua Ballard; John N. Randall; Justin Alexander; James R. Von Ehr

J. Vac. Sci. Technol. B 29, 06F201 (2011) https://doi.org/10.1116/1.3628673

Abstract

View articletitled, Patterned atomic layer epitaxy of Si/Si(001):H

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Modeling the power spectrum of thermal line edge roughness in a lamellar diblock copolymer mesophase

August W. Bosse

J. Vac. Sci. Technol. B 29, 06F202 (2011) https://doi.org/10.1116/1.3644338

Abstract

View articletitled, Modeling the power spectrum of thermal line edge roughness in a lamellar diblock copolymer mesophase

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Towards an all-track 300 mm process for directed self-assembly

Chi-Chun Liu; Christopher J. Thode; Paulina A. Rincon Delgadillo; Gordon S. W. Craig; Paul F. Nealey; Roel Gronheid

J. Vac. Sci. Technol. B 29, 06F203 (2011) https://doi.org/10.1116/1.3644341

Abstract

View articletitled, Towards an all-track 300 mm process for directed self-assembly

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Fabrication of chevron patterns for patterned media with block copolymer directed assembly

Guoliang Liu; Paul F. Nealey; Ricardo Ruiz; Elizabeth Dobisz; Kanaiyalal C. Patel; Thomas R. Albrecht

J. Vac. Sci. Technol. B 29, 06F204 (2011) https://doi.org/10.1116/1.3650697

Abstract

View articletitled, Fabrication of chevron patterns for patterned media with block copolymer directed assembly

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Selective placement of DNA origami on substrates patterned by nanoimprint lithography

Erika Penzo; Risheng Wang; Matteo Palma; Shalom J Wind

J. Vac. Sci. Technol. B 29, 06F205 (2011) https://doi.org/10.1116/1.3646900

Abstract

View articletitled, Selective placement of DNA origami on substrates patterned by nanoimprint lithography

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Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study

Raluca Tiron; Xavier Chevalier; Christophe Couderc; Jonathan Pradelles; Jessy Bustos; Laurent Pain; Christophe Navarro; Stephanie Magnet; Guillaume Fleury; Georges Hadziioannou

J. Vac. Sci. Technol. B 29, 06F206 (2011) https://doi.org/10.1116/1.3659714

Abstract

View articletitled, Optimization of block copolymer self-assembly through graphoepitaxy: A defectivity study

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Di-block copolymer directed anodization of hexagonally ordered nanoporous aluminum oxide

Kunbae Noh; Chulmin Choi; Hyunsu Kim; Young Oh; Jin-Yeol Kim; Se-Yeon Jung; Tae-Yeon Seong; Sungho Jin

J. Vac. Sci. Technol. B 29, 06F207 (2011) https://doi.org/10.1116/1.3659716

Abstract

View articletitled, Di-block copolymer directed anodization of hexagonally ordered nanoporous aluminum oxide

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Direct top-down ordering of diblock copolymers through nanoimprint lithography

M. Salaün; N. Kehagias; B. Salhi; T. Baron; J. Boussey; C. M. Sotomayor Torres; M. Zelsmann

J. Vac. Sci. Technol. B 29, 06F208 (2011) https://doi.org/10.1116/1.3662399

Abstract

View articletitled, Direct top-down ordering of diblock copolymers through nanoimprint lithography

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Electron or Ion Beam Lithography

3D Nanostructuring of hydrogen silsesquioxane resist by 100 keV electron beam lithography

Joan Vila-Comamala; Sergey Gorelick; Vitaliy A. Guzenko; Christian David

J. Vac. Sci. Technol. B 29, 06F301 (2011) https://doi.org/10.1116/1.3629811

Abstract

View articletitled, 3D Nanostructuring of hydrogen silsesquioxane resist by 100 keV electron beam lithography

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Selective profile transformation of electron-beam exposed multilevel resist structures based on a molecular weight dependent thermal reflow

Arne Schleunitz; Vitaliy A. Guzenko; Andreas Schander; Marko Vogler; Helmut Schift

J. Vac. Sci. Technol. B 29, 06F302 (2011) https://doi.org/10.1116/1.3634013

Abstract

View articletitled, Selective profile transformation of electron-beam exposed multilevel resist structures based on a molecular weight dependent thermal reflow

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Developer-free direct patterning of PMMA/ZEP 520A by low voltage electron beam lithography

David Ai Zhi Zheng (鄭愛智); Mohammad Ali Mohammad; Steven Kelly Dew; Maria Stepanova

J. Vac. Sci. Technol. B 29, 06F303 (2011) https://doi.org/10.1116/1.3634017

Abstract

View articletitled, Developer-free direct patterning of PMMA/ZEP 520A by low voltage electron beam lithography

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Nanopatterning of PMMA on insulating surfaces with various anticharging schemes using 30 keV electron beam lithography

Mustafa Muhammad; Steven C. Buswell; Steven K. Dew; Maria Stepanova

J. Vac. Sci. Technol. B 29, 06F304 (2011) https://doi.org/10.1116/1.3636367

Abstract

View articletitled, Nanopatterning of PMMA on insulating surfaces with various anticharging schemes using 30 keV electron beam lithography

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Electron-beam-induced deposition of 3-nm-half-pitch patterns on bulk Si

J. C. van Oven; F. Berwald; K. K. Berggren; P. Kruit; C. W. Hagen

J. Vac. Sci. Technol. B 29, 06F305 (2011) https://doi.org/10.1116/1.3640743

Abstract

View articletitled, Electron-beam-induced deposition of 3-nm-half-pitch patterns on bulk Si

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Comparison between ZEP and PMMA resists for nanoscale electron beam lithography experimentally and by numerical modeling

Kirill Koshelev; Mohammad Ali Mohammad; Taras Fito; Kenneth L. Westra; Steven K. Dew; Maria Stepanova

J. Vac. Sci. Technol. B 29, 06F306 (2011) https://doi.org/10.1116/1.3640794

Abstract

View articletitled, Comparison between ZEP and PMMA resists for nanoscale electron beam lithography experimentally and by numerical modeling

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Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspection

D. S. Macintyre; S. Thoms

J. Vac. Sci. Technol. B 29, 06F307 (2011) https://doi.org/10.1116/1.3634020

Abstract

View articletitled, Comparison of hydrogen silsesquioxane development methods for sub-10 nm electron beam lithography using accurate linewidth inspection

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Secondary-electron signal level measurements of self-assembled monolayers for spatial-phase-locked electron-beam lithography

Lin Lee Cheong; Jose M. Lobez; Euclid E. Moon; Jeffrey T. Hastings; Henry I. Smith

J. Vac. Sci. Technol. B 29, 06F308 (2011) https://doi.org/10.1116/1.3646897

Abstract

View articletitled, Secondary-electron signal level measurements of self-assembled monolayers for spatial-phase-locked electron-beam lithography

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Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides

Richard J. Bojko; Jing Li; Li He; Tom Baehr-Jones; Michael Hochberg; Yukinori Aida

J. Vac. Sci. Technol. B 29, 06F309 (2011) https://doi.org/10.1116/1.3653266

Abstract

View articletitled, Electron beam lithography writing strategies for low loss, high confinement silicon optical waveguides

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Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope

P. C. Post; A. Mohammadi-Gheidari; C. W. Hagen; P. Kruit

J. Vac. Sci. Technol. B 29, 06F310 (2011) https://doi.org/10.1116/1.3656027

Abstract

View articletitled, Parallel electron-beam-induced deposition using a multi-beam scanning electron microscope

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Experimental evaluation method of point spread functions used for proximity effects correction in electron beam lithography

Bengt A. Nilsson

J. Vac. Sci. Technol. B 29, 06F311 (2011) https://doi.org/10.1116/1.3656343

Abstract

View articletitled, Experimental evaluation method of point spread functions used for proximity effects correction in electron beam lithography

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Density multiplication of nanostructures fabricated by ultralow voltage electron beam lithography using PMMA as positive- and negative-tone resist

Adegboyega P. Adeyenuwo; Maria Stepanova; Steven K. Dew

J. Vac. Sci. Technol. B 29, 06F312 (2011) https://doi.org/10.1116/1.3657512

Abstract

View articletitled, Density multiplication of nanostructures fabricated by ultralow voltage electron beam lithography using PMMA as positive- and negative-tone resist

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Miniaturization of grayscale images

Joel K. W. Yang; Huigao Duan; Jaslyn B. K. Law; Hong Yee Low; Bryan Cord

J. Vac. Sci. Technol. B 29, 06F313 (2011) https://doi.org/10.1116/1.3660790

Abstract

View articletitled, Miniaturization of grayscale images

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Three-dimensional proximity effect correction for large-scale uniform patterns

Q. Dai; S.-Y. Lee; S.-H. Lee; B.-G. Kim; H.-K. Cho

J. Vac. Sci. Technol. B 29, 06F314 (2011) https://doi.org/10.1116/1.3660785

Abstract

View articletitled, Three-dimensional proximity effect correction for large-scale uniform patterns

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Model based hybrid proximity effect correction scheme combining dose modulation and shape adjustments

Thomas Klimpel; Martin Schulz; Rainer Zimmermann; Hans-Jürgen Stock; Alex Zepka

J. Vac. Sci. Technol. B 29, 06F315 (2011) https://doi.org/10.1116/1.3662879

Abstract

View articletitled, Model based hybrid proximity effect correction scheme combining dose modulation and shape adjustments

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Measurement of surface potential of insulating film on a conductive substrate in a scanning electron microscope specimen chamber

Masatoshi Kotera; Akira Osada; Masaru Otani; Yasuhiro Ohara

J. Vac. Sci. Technol. B 29, 06F316 (2011) https://doi.org/10.1116/1.3662079

Abstract

View articletitled, Measurement of surface potential of insulating film on a conductive substrate in a scanning electron microscope specimen chamber

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Electron bombardment of films used for reducing spurious charge in electrostatic electron optics

Juan R. Maldonado; Fabian Pease; Charles J. Hitzman; Alan D. Brodie; Paul Petric; Chris Bevis; Mark McCord; William M. Tong; Francoise Kidwingira; Piero Pianetta; Matt Bibee; Apurva Mehta; Ritwik Bhatia

J. Vac. Sci. Technol. B 29, 06F317 (2011) https://doi.org/10.1116/1.3663957

Abstract

View articletitled, Electron bombardment of films used for reducing spurious charge in electrostatic electron optics

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Emerging technologies

3D nanostructures by stacking pre-patterned fluid-supported single-crystal Si membranes

Shabnam Ghadarghadr; Corey P. Fucetola; Lin Lee Cheong; Euclid E. Moon; Henry I. Smith

J. Vac. Sci. Technol. B 29, 06F401 (2011) https://doi.org/10.1116/1.3628672

Abstract

View articletitled, 3D nanostructures by stacking pre-patterned fluid-supported single-crystal Si membranes

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3D fabrication by stacking prepatterned, rigidly held membranes

Amil A. Patel; Corey P. Fucetola; Euclid E. Moon; Henry I. Smith

J. Vac. Sci. Technol. B 29, 06F402 (2011) https://doi.org/10.1116/1.3643762

Abstract

View articletitled, 3D fabrication by stacking prepatterned, rigidly held membranes

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Probe field enhancement in photonic crystals by upconversion nanoparticles

Jingyu Zhang; Teresa E. Pick; Daniel Gargas; Scott Dhuey; Emory M. Chan; Ying Wu; Xiaogan Liang; P. James Schuck; Deirdre L. Olynick; Brett A. Helms; Stefano Cabrini

J. Vac. Sci. Technol. B 29, 06F403 (2011) https://doi.org/10.1116/1.3662086

Abstract

View articletitled, Probe field enhancement in photonic crystals by upconversion nanoparticles

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Extreme Ultraviolet lithography

Mask roughness challenges in extreme ultraviolet mask development

Patrick Naulleau; Brittany McClinton; Kenneth A. Goldberg; Iacopo Mochi; Abbas Rastegar

J. Vac. Sci. Technol. B 29, 06F501 (2011) https://doi.org/10.1116/1.3632989

Abstract

View articletitled, Mask roughness challenges in extreme ultraviolet mask development

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Actinic characterization of extreme ultraviolet bump-type phase defects

Kenneth A. Goldberg; Iacopo Mochi

J. Vac. Sci. Technol. B 29, 06F502 (2011) https://doi.org/10.1116/1.3653257

Abstract

View articletitled, Actinic characterization of extreme ultraviolet bump-type phase defects

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Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging

Tetsuo Harada; Masato Nakasuji; Teruhiko Kimura; Takeo Watanabe; Hiroo Kinoshita; Yutaka Nagata

J. Vac. Sci. Technol. B 29, 06F503 (2011) https://doi.org/10.1116/1.3657525

Abstract

View articletitled, Imaging of extreme-ultraviolet mask patterns using coherent extreme-ultraviolet scatterometry microscope based on coherent diffraction imaging

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Analysis of a scheme for de-magnified Talbot lithography

L. Urbanski; M. C. Marconi; A. Isoyan; A. Stein; C. S. Menoni; J. J. Rocca

J. Vac. Sci. Technol. B 29, 06F504 (2011) https://doi.org/10.1116/1.3653507

Abstract

View articletitled, Analysis of a scheme for de-magnified Talbot lithography

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Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualification

G. F. Lorusso; E. Hendrickx; N. Davydova; Y. Peng; M. Eurlings; K. Feenstra; J. Jiang

J. Vac. Sci. Technol. B 29, 06F505 (2011) https://doi.org/10.1116/1.3660385

Abstract

View articletitled, Metrology development for extreme ultraviolet lithography: Flare and out-of-band qualification

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Electron or Ion Sources and Systems

Defined emission area and custom thermal electron sources

William A. Mackie; Gerald G. Magera

J. Vac. Sci. Technol. B 29, 06F601 (2011) https://doi.org/10.1116/1.3656350

Abstract

View articletitled, Defined emission area and custom thermal electron sources

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Review Article: Rare-earth monosulfides as durable and efficient cold cathodes

Marc Cahay; Punit Boolchand; Steven B. Fairchild; Larry Grazulis; Paul T. Murray; Tyson C. Back; Vincent Semet; Vu Thien Binh; Xiaohua Wu; Daniel Poitras; David J. Lockwood; Fei Yu; Vikram Kuppa

J. Vac. Sci. Technol. B 29, 06F602 (2011) https://doi.org/10.1116/1.3653275

Abstract

View articletitled, Review Article: Rare-earth monosulfides as durable and efficient cold cathodes

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Ion beams in SEM: An experiment towards a high brightness low energy spread electron impact gas ion source

David S. Jun; Vladimir G. Kutchoukov; Pieter Kruit

J. Vac. Sci. Technol. B 29, 06F603 (2011) https://doi.org/10.1116/1.3660390

Abstract

View articletitled, Ion beams in SEM: An experiment towards a high brightness low energy spread electron impact gas ion source

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Nanomachining with a focused neon beam: A preliminary investigation for semiconductor circuit editing and failure analysis

Shida Tan; Richard Livengood; Paul Hack; Roy Hallstein; Darryl Shima; John Notte; Shawn McVey

J. Vac. Sci. Technol. B 29, 06F604 (2011) https://doi.org/10.1116/1.3660797

Abstract

View articletitled, Nanomachining with a focused neon beam: A preliminary investigation for semiconductor circuit editing and failure analysis

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Influence of gun design on Coulomb interactions in a field emission gun

T. Verduin; B. Cook; P. Kruit

J. Vac. Sci. Technol. B 29, 06F605 (2011) https://doi.org/10.1116/1.3660798

Abstract

View articletitled, Influence of gun design on Coulomb interactions in a field emission gun

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Microfluidics

Fabrication of fluidic devices with 30 nm nanochannels by direct imprinting

Irene Fernandez-Cuesta; Anna Laura Palmarelli; Xiaogan Liang; Jingyu Zhang; Scott Dhuey; Deirdre Olynick; Stefano Cabrini

J. Vac. Sci. Technol. B 29, 06F801 (2011) https://doi.org/10.1116/1.3662886

Abstract

View articletitled, Fabrication of fluidic devices with 30 nm nanochannels by direct imprinting

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Simulation and Modeling

Modeling of charging effect on ion induced secondary electron emission from nanostructured materials

Kaoru Ohya; Daiki Takami; Takuya Yamanaka

J. Vac. Sci. Technol. B 29, 06F901 (2011) https://doi.org/10.1116/1.3643752

Abstract

View articletitled, Modeling of charging effect on ion induced secondary electron emission from nanostructured materials

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Enhancement of spatial resolution in generating point spread functions by Monte Carlo simulation in electron-beam lithography

S.-Y. Lee; Q. Dai; S.-H. Lee; B.-G. Kim; H.-K. Cho

J. Vac. Sci. Technol. B 29, 06F902 (2011) https://doi.org/10.1116/1.3650696

Abstract

View articletitled, Enhancement of spatial resolution in generating point spread functions by Monte Carlo simulation in electron-beam lithography

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Process window modeling using focus balancing technique

Artak Isoyan; Ebo Croffie; Lawrence S. Melvin, III

J. Vac. Sci. Technol. B 29, 06F903 (2011) https://doi.org/10.1116/1.3662407

Abstract

View articletitled, Process window modeling using focus balancing technique

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Nanobiology and Cell Guidance

Suspended, micron-scale corner cube retroreflectors as ultra-bright optical labels

Tim Sherlock; Azeem Nasrullah; Julia Litvinov; Eliedonna Cacao; Jennifer Knoop; Steven Kemper; Katerina Kourentzi; Archana Kar; Paul Ruchhoeft; Richard Willson

J. Vac. Sci. Technol. B 29, 06FA01 (2011) https://doi.org/10.1116/1.3656801

Abstract

View articletitled, Suspended, micron-scale corner cube retroreflectors as ultra-bright optical labels

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New approach for measuring protrusive forces in cells

A. Mathur; P. Roca-Cusachs; O. M. Rossier; S. J. Wind; M. P. Sheetz; J. Hone

J. Vac. Sci. Technol. B 29, 06FA02 (2011) https://doi.org/10.1116/1.3655580

Abstract

View articletitled, New approach for measuring protrusive forces in cells

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Influence of surface patterning on bacterial growth behavior

Peter Nill; Dieter P. Kern; Nadine Goehring; Andreas Peschel

J. Vac. Sci. Technol. B 29, 06FA03 (2011) https://doi.org/10.1116/1.3662084

Abstract

View articletitled, Influence of surface patterning on bacterial growth behavior

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Nanoelectronics

Novel method for fabrication of nanoscale single-electron transistors: Electron beam induced deposition of Pt and atomic layer deposition of tunnel barriers

Hubert C. George; Tatyana A. Orlova; Alexei O. Orlov; Gregory L. Snider

J. Vac. Sci. Technol. B 29, 06FB01 (2011) https://doi.org/10.1116/1.3640752

Abstract

View articletitled, Novel method for fabrication of nanoscale single-electron transistors: Electron beam induced deposition of Pt and atomic layer deposition of tunnel barriers

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Fabrication of hybrid metal island/silicon single electron transistor

Yen-Chun Lee; Alexei O. Orlov; Gregory L. Snider

J. Vac. Sci. Technol. B 29, 06FB02 (2011) https://doi.org/10.1116/1.3644340

Abstract

View articletitled, Fabrication of hybrid metal island/silicon single electron transistor

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Local, direct-write, damage-free thinning of germanium nanowires

Peter Roediger; Mario Mijic; Clemens Zeiner; Alois Lugstein; Heinz D. Wanzenboeck; Emmerich Bertagnolli

J. Vac. Sci. Technol. B 29, 06FB03 (2011) https://doi.org/10.1116/1.3660388

Abstract

View articletitled, Local, direct-write, damage-free thinning of germanium nanowires

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Nanoimprint Lithography

Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures

Arne Schleunitz; Christian Spreu; Marko Vogler; Hakan Atasoy; Helmut Schift

J. Vac. Sci. Technol. B 29, 06FC01 (2011) https://doi.org/10.1116/1.3643761

Abstract

View articletitled, Combining nanoimprint lithography and a molecular weight selective thermal reflow for the generation of mixed 3D structures

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Macro-optical inspection method for deterioration evaluation of release-coated mold surfaces for nanoimprint lithography

Jun Taniguchi; Junki Takahashi; Mitsuru Uda; Atushi Kohayase; Kenichi Kotaki

J. Vac. Sci. Technol. B 29, 06FC02 (2011) https://doi.org/10.1116/1.3646885

Abstract

View articletitled, Macro-optical inspection method for deterioration evaluation of release-coated mold surfaces for nanoimprint lithography

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Room temperature nanoimprinting using spin-coated hydrogen silsesquioxane with high boiling point solvent

Yuji Kang; Makoto Okada; Shinya Omoto; Yuichi Haruyama; Kazuhiro Kanda; Shinji Matsui

J. Vac. Sci. Technol. B 29, 06FC03 (2011) https://doi.org/10.1116/1.3653227

Abstract

View articletitled, Room temperature nanoimprinting using spin-coated hydrogen silsesquioxane with high boiling point solvent

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Evaluation of fluorine additive effect on cationic UV-nanoimprint resin

Makoto Okada; Yuichi Haruyama; Shinji Matsui; Hiroto Miyake; Shuso Iyoshi; Takao Yukawa; Hidekazu Takeuchi

J. Vac. Sci. Technol. B 29, 06FC04 (2011) https://doi.org/10.1116/1.3653513

Abstract

View articletitled, Evaluation of fluorine additive effect on cationic UV-nanoimprint resin

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Evaluation of the curing process of UV resins in a 1,1,1,3,3-pentafluoropropane gas environment by photo differential scanning calorimetry and Fourier transform infrared spectroscopy

Yohei Sawada; Yuichi Haruyama; Kazuhiro Kanda; Shinji Matsui; Makoto Okada; Hiroto Miyake; Takeshi Ohsaki; Yoshihiko Hirai; Hiroshi Hiroshima

J. Vac. Sci. Technol. B 29, 06FC05 (2011) https://doi.org/10.1116/1.3656022

Abstract

View articletitled, Evaluation of the curing process of UV resins in a 1,1,1,3,3-pentafluoropropane gas environment by photo differential scanning calorimetry and Fourier transform infrared spectroscopy

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Fabrication of a seamless roll mold using inorganic electron beam resist with postexposure bake

Noriyuki Unno; Jun Taniguchi; Kiyoshi Ishikawa

J. Vac. Sci. Technol. B 29, 06FC06 (2011) https://doi.org/10.1116/1.3656052

Abstract

View articletitled, Fabrication of a seamless roll mold using inorganic electron beam resist with postexposure bake

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Soft patterning on cylindrical surface of plastic optical fiber

Harutaka Mekaru; Hideki Takagi; Akihiro Ohtomo; Mitsunori Kokubo; Hiroshi Goto

J. Vac. Sci. Technol. B 29, 06FC07 (2011) https://doi.org/10.1116/1.3656802

Abstract

View articletitled, Soft patterning on cylindrical surface of plastic optical fiber

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Large-diameter roll mold fabrication method using a small-diameter quartz roll mold and UV nanoimprint lithography

Jun Taniguchi; Noriyuki Unno; Hiroki Maruyama

J. Vac. Sci. Technol. B 29, 06FC08 (2011) https://doi.org/10.1116/1.3657524

Abstract

View articletitled, Large-diameter roll mold fabrication method using a small-diameter quartz roll mold and UV nanoimprint lithography

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Suitability of thin poly(dimethylsiloxane) as an antisticking layer for UV nanoimprinting

Makoto Okada; Yuichi Haruyama; Kazuhiro Kanda; Shinji Matsui

J. Vac. Sci. Technol. B 29, 06FC09 (2011) https://doi.org/10.1116/1.3653226

Abstract

View articletitled, Suitability of thin poly(dimethylsiloxane) as an antisticking layer for UV nanoimprinting

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Mechanical characteristics of imprinted nanostructures fabricated with a poly(dimethylsiloxane) mold

Yuji Kang; Makoto Okada; Yasuki Nakai; Yuichi Haruyama; Kazuhiro Kanda; Shinji Matsui

J. Vac. Sci. Technol. B 29, 06FC10 (2011) https://doi.org/10.1116/1.3657520

Abstract

View articletitled, Mechanical characteristics of imprinted nanostructures fabricated with a poly(dimethylsiloxane) mold

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Atomic step patterning in nanoimprint lithography: Molecular dynamics study

Kazuhiro Tada; Masaaki Yasuda; Geng Tan; Yumiko Miyake; Hiroaki Kawata; Mamoru Yoshimoto; Yoshihiko Hirai

J. Vac. Sci. Technol. B 29, 06FC11 (2011) https://doi.org/10.1116/1.3659712

Abstract

View articletitled, Atomic step patterning in nanoimprint lithography: Molecular dynamics study

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Liquid transfer imprint lithography: A new route to residual layer thickness control

Namil Koo; Jung Wuk Kim; Martin Otto; Christian Moormann; Heinrich Kurz

J. Vac. Sci. Technol. B 29, 06FC12 (2011) https://doi.org/10.1116/1.3660792

Abstract

View articletitled, Liquid transfer imprint lithography: A new route to residual layer thickness control

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Mechanical characterization of a piezo-operated thermal imprint system

Andre Mayer; Sakia Moellenbeck; Khalid Dhima; Si Wang; Hella-Christin Scheer

J. Vac. Sci. Technol. B 29, 06FC13 (2011) https://doi.org/10.1116/1.3656048

Abstract

View articletitled, Mechanical characterization of a piezo-operated thermal imprint system

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Experimental analysis for process control in hybrid lithography

Khalid Dhima; Christian Steinberg; Saskia Möllenbeck; Andre Mayer; Si Wang; Hella-Christin Sheer

J. Vac. Sci. Technol. B 29, 06FC14 (2011) https://doi.org/10.1116/1.3659717

Abstract

View articletitled, Experimental analysis for process control in hybrid lithography

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High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography

J. Sakamoto; N. Fujikawa; N. Nishikura; H. Kawata; M. Yasuda; Y. Hirai

J. Vac. Sci. Technol. B 29, 06FC15 (2011) https://doi.org/10.1116/1.3662080

Abstract

View articletitled, High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography

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Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography

Jian He; K. Richter; J. W. Bartha; S. Howitz

J. Vac. Sci. Technol. B 29, 06FC16 (2011) https://doi.org/10.1116/1.3662094

Abstract

View articletitled, Fabrication of silicon template with smooth tapered sidewall for nanoimprint lithography

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Hard stamp processes for the EVG 620 full field nanoimprint system

James Conway; James B. Kruger; Mahnaz Mansourpour; Paul Rissman

J. Vac. Sci. Technol. B 29, 06FC17 (2011) https://doi.org/10.1116/1.3662085

Abstract

View articletitled, Hard stamp processes for the EVG 620 full field nanoimprint system

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Characterization of pentafluoropropane dissolved UV-nanoimprint resin

Mika Chinen; Yohei Sawada; Yuichi Haruyama; Shinji Matsui; Makoto Okada; Hiroshi Hiroshima

J. Vac. Sci. Technol. B 29, 06FC18 (2011) https://doi.org/10.1116/1.3662856

Abstract

View articletitled, Characterization of pentafluoropropane dissolved UV-nanoimprint resin

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Anisotropic filling phenomenon of cavities in UV nanoimprint lithography

Qing Wang; Hiroshi Hiroshima

J. Vac. Sci. Technol. B 29, 06FC19 (2011) https://doi.org/10.1116/1.3662889

Abstract

View articletitled, Anisotropic filling phenomenon of cavities in UV nanoimprint lithography

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Maskless Lithography

Charging effects during focused electron beam induced deposition of silicon oxide

Sanne K. de Boer; Willem F. van Dorp; Jeff Th. M. De Hosson

J. Vac. Sci. Technol. B 29, 06FD01 (2011) https://doi.org/10.1116/1.3659713

Abstract

View articletitled, Charging effects during focused electron beam induced deposition of silicon oxide

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Scanning proximal probe lithography for sub-10 nm resolution on calix[4]resorcinarene

Marcus Kaestner; Ivo W. Rangelow

J. Vac. Sci. Technol. B 29, 06FD02 (2011) https://doi.org/10.1116/1.3662092

Abstract

View articletitled, Scanning proximal probe lithography for sub-10 nm resolution on calix[4]resorcinarene

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Multitip atomic force microscope lithography system for high throughput nanopatterning

Young Oh; Chulmin Choi; Kunbae Noh; Diana Villwock; Sungho Jin; Gwangmin Kwon; Haiwon Lee

J. Vac. Sci. Technol. B 29, 06FD03 (2011) https://doi.org/10.1116/1.3662396

Abstract

View articletitled, Multitip atomic force microscope lithography system for high throughput nanopatterning

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Lithography-patterning-fidelity-aware electron-optical system design optimization

Sheng-Yung Chen (陳勝勇); Hoi-Tou Ng (伍海濤); Shiau-Yi Ma (馬學億); Hsing-Hong Chen (陳信宏); Chun-Hung Liu (劉俊宏); Kuen-Yu Tsai (蔡坤諭)

J. Vac. Sci. Technol. B 29, 06FD04 (2011) https://doi.org/10.1116/1.3662402

Abstract

View articletitled, Lithography-patterning-fidelity-aware electron-optical system design optimization

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Micro- and Nano-mechanics (MEMS, NEMS)

Investigation of graphene piezoresistors for use as strain gauge sensors

Xing Chen; Xiaohu Zheng; Ji-Kwan Kim; Xinxin Li; Dong-Weon Lee

J. Vac. Sci. Technol. B 29, 06FE01 (2011) https://doi.org/10.1116/1.3660784

Abstract

View articletitled, Investigation of graphene piezoresistors for use as strain gauge sensors

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Quality factor enhancement on nanomechanical resonators utilizing stiction phenomena

Hiroki Ashiba; Reo Kometani; Shin’ichi Warisawa; Sunao Ishihara

J. Vac. Sci. Technol. B 29, 06FE02 (2011) https://doi.org/10.1116/1.3660384

Abstract

View articletitled, Quality factor enhancement on nanomechanical resonators utilizing stiction phenomena

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Dynamic characteristics control of DLC nano-resonator fabricated by focused-ion-beam chemical vapor deposition

Reo Kometani; Shunjiro Nishi; Shin’ichi Warisawa; Sunao Ishihara

J. Vac. Sci. Technol. B 29, 06FE03 (2011) https://doi.org/10.1116/1.3662493

Abstract

View articletitled, Dynamic characteristics control of DLC nano-resonator fabricated by focused-ion-beam chemical vapor deposition

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MEMS process compatibility of multiwall carbon nanotubes

Eugene H. Cook; David J. D. Carter

J. Vac. Sci. Technol. B 29, 06FE04 (2011) https://doi.org/10.1116/1.3662082

Abstract

View articletitled, MEMS process compatibility of multiwall carbon nanotubes

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Low frequency tantalum electromechanical systems for biomimetical applications

Rhonira Latif; Enrico Mastropaolo; Andrew Bunting; Rebecca Cheung; Thomas Koickal; Alister Hamilton; Michael Newton; Leslie Smith

J. Vac. Sci. Technol. B 29, 06FE05 (2011) https://doi.org/10.1116/1.3662408

Abstract

View articletitled, Low frequency tantalum electromechanical systems for biomimetical applications

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Carbon nanomechanical resonator fabrication from PMMA by FIB/electron-beam dual-beam lithography

Reo Kometani; Taiki Hatakeyama; Kouhei Kuroda; Shin’ichi Warisawa; Sunao Ishihara

J. Vac. Sci. Technol. B 29, 06FE06 (2011) https://doi.org/10.1116/1.3662083

Abstract

View articletitled, Carbon nanomechanical resonator fabrication from PMMA by FIB/electron-beam dual-beam lithography

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Micro- and Nano-photonics, Plasmonics

Light trapping in plasmonic nanocavities on metal surfaces

Aleksandr Polyakov; Howard A. Padmore; Xiaogan Liang; Scott Dhuey; Bruce Harteneck; James P. Schuck; Stefano Cabrini

J. Vac. Sci. Technol. B 29, 06FF01 (2011) https://doi.org/10.1116/1.3634021

Abstract

View articletitled, Light trapping in plasmonic nanocavities on metal surfaces

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Large area 3D helical photonic crystals

A. K. Raub; S. R. J. Brueck

J. Vac. Sci. Technol. B 29, 06FF02 (2011) https://doi.org/10.1116/1.3640756

Abstract

View articletitled, Large area 3D helical photonic crystals

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Gradually shifting surface plasmon resonance by controlling the diameter of a nanohole structure by self-assembly

Takamitsu Takagi; Reo Kometani; Sunao Ishihara; Shinichi Warisawa; Kazuma Kurihara; Koichi Awazu

J. Vac. Sci. Technol. B 29, 06FF03 (2011) https://doi.org/10.1116/1.3660387

Abstract

View articletitled, Gradually shifting surface plasmon resonance by controlling the diameter of a nanohole structure by self-assembly

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Multilayer infrared metamaterial fabrication using membrane projection lithography

D. Bruce Burckel; Joel R. Wendt; Sally Samora; Michael B. Sinclair; Igal Brener; James C. Ginn

J. Vac. Sci. Technol. B 29, 06FF04 (2011) https://doi.org/10.1116/1.3653258

Abstract

View articletitled, Multilayer infrared metamaterial fabrication using membrane projection lithography

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Coexistence of guided mode resonance and extraordinary optical transmission in metal/dielectric/metal photonic crystal slab

Neil Ou; Jia-Hong Shyu; Huang-Ming Lee; Jong-Ching Wu

J. Vac. Sci. Technol. B 29, 06FF05 (2011) https://doi.org/10.1116/1.3662406

Abstract

View articletitled, Coexistence of guided mode resonance and extraordinary optical transmission in metal/dielectric/metal photonic crystal slab

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Nanofabrication of photonic crystal-based devices using electron beam spot lithography

A. S. Jugessur; M. Yagnyukova; J. S. Aitchison

J. Vac. Sci. Technol. B 29, 06FF06 (2011) https://doi.org/10.1116/1.3662088

Abstract

View articletitled, Nanofabrication of photonic crystal-based devices using electron beam spot lithography

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Nanostructures and Pattern Transfer

Etch properties of resists modified by sequential infiltration synthesis

Yu-Chih Tseng; Qing Peng; Leonidas E. Ocola; David A. Czaplewski; Jeffrey W. Elam; Seth B. Darling

J. Vac. Sci. Technol. B 29, 06FG01 (2011) https://doi.org/10.1116/1.3640758

Abstract

View articletitled, Etch properties of resists modified by sequential infiltration synthesis

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Twelve nanometer half-pitch W–Cr–HSQ trilayer process for soft x-ray tungsten zone plates

Julia Reinspach; Fredrik Uhlén; Hans M. Hertz; Anders Holmberg

J. Vac. Sci. Technol. B 29, 06FG02 (2011) https://doi.org/10.1116/1.3643760

Abstract

View articletitled, Twelve nanometer half-pitch W–Cr–HSQ trilayer process for soft x-ray tungsten zone plates

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New diamond nanofabrication process for hard x-ray zone plates

Fredrik Uhlén; Sandra Lindqvist; Daniel Nilsson; Julia Reinspach; Ulrich Vogt; Hans M. Hertz; Anders Holmberg; Ray Barrett

J. Vac. Sci. Technol. B 29, 06FG03 (2011) https://doi.org/10.1116/1.3656055

Abstract

View articletitled, New diamond nanofabrication process for hard x-ray zone plates

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Selective graphene growth from DLC thin film patterned by focused-ion-beam chemical vapor deposition

Taiki Hatakeyama; Reo Kometani; Shin’ichi Warisawa; Sunao Ishihara

J. Vac. Sci. Technol. B 29, 06FG04 (2011) https://doi.org/10.1116/1.3655581

Abstract

View articletitled, Selective graphene growth from DLC thin film patterned by focused-ion-beam chemical vapor deposition

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Pulsed helium ion beam induced deposition: A means to high growth rates

Paul F. A. Alkemade; Hozanna Miro; Emile van Veldhoven; Diederik J. Maas; Daryl A. Smith; Philip D. Rack

J. Vac. Sci. Technol. B 29, 06FG05 (2011) https://doi.org/10.1116/1.3656347

Abstract

View articletitled, Pulsed helium ion beam induced deposition: A means to high growth rates

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Technology platform for the fabrication of titanium nanostructures

Serge Ecoffey; Marc Guilmain; Jean-François Morissette; Frédéric Bourque; Jérémy Pont; Bruno Lee Sang; Dominique Drouin

J. Vac. Sci. Technol. B 29, 06FG06 (2011) https://doi.org/10.1116/1.3657517

Abstract

View articletitled, Technology platform for the fabrication of titanium nanostructures

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Nanofabrication down to 10 nm on a plastic substrate

Li Tao; Jongho Lee; Deji Akinwande

J. Vac. Sci. Technol. B 29, 06FG07 (2011) https://doi.org/10.1116/1.3662081

Abstract

View articletitled, Nanofabrication down to 10 nm on a plastic substrate

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Fabrication of complex nanostructures of Poly(vinylidenefluoride-trifluoroethylene) by dual step hot-embossing

Juan-juan Wen; Zhen-kui Shen; Zhi-jun Qiu; An-quan Jiang; Ran Liu; Yifang Chen

J. Vac. Sci. Technol. B 29, 06FG08 (2011) https://doi.org/10.1116/1.3662087

Abstract

View articletitled, Fabrication of complex nanostructures of Poly(vinylidenefluoride-trifluoroethylene) by dual step hot-embossing

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Computational study of electron-irradiation effects in carbon nanomaterials on substrates

Yoshinori Chihara; Masaaki Yasuda; Shinya Wakuda; Hiroaki Kawata; Yoshihiko Hirai

J. Vac. Sci. Technol. B 29, 06FG09 (2011) https://doi.org/10.1116/1.3662409

Abstract

View articletitled, Computational study of electron-irradiation effects in carbon nanomaterials on substrates

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Injection compression molding of high-aspect-ratio nanostructures

Keisuke Nagato; Tetsuya Hamaguchi; Masayuki Nakao

J. Vac. Sci. Technol. B 29, 06FG10 (2011) https://doi.org/10.1116/1.3662405

Abstract

View articletitled, Injection compression molding of high-aspect-ratio nanostructures

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Optical Lithography, including Masks and Maskless

Evaluation of three exposure schemes for absorbance-modulated interference lithography

John E. Foulkes; Charles W. Holzwarth; Richard J. Blaikie

J. Vac. Sci. Technol. B 29, 06FH01 (2011) https://doi.org/10.1116/1.3640757

Abstract

View articletitled, Evaluation of three exposure schemes for absorbance-modulated interference lithography

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Flexible poly(dimethyl siloxane) support layers for the evanescent characterization of near-field lithography systems

Ciaran P. Moore; Richard J. Blaikie

J. Vac. Sci. Technol. B 29, 06FH02 (2011) https://doi.org/10.1116/1.3653511

Abstract

View articletitled, Flexible poly(dimethyl siloxane) support layers for the evanescent characterization of near-field lithography systems

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Fast aerial image simulations using one basis mask pattern for optical proximity correction

Shiyuan Liu; Xiaofei Wu; Wei Liu; Chuanwei Zhang

J. Vac. Sci. Technol. B 29, 06FH03 (2011) https://doi.org/10.1116/1.3659718

Abstract

View articletitled, Fast aerial image simulations using one basis mask pattern for optical proximity correction

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Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems

David O. S. Melville; Alan E. Rosenbluth; Andreas Waechter; Marc Millstone; Jaione Tirapu-Azpiroz; Kehan Tian; Kafai Lai; Tadanobu Inoue; Masaharu Sakamoto; Kostas Adam; Alexander Tritchkov

J. Vac. Sci. Technol. B 29, 06FH04 (2011) https://doi.org/10.1116/1.3662090

Abstract

View articletitled, Computational lithography: Exhausting the resolution limits of 193-nm projection lithography systems

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Resists

In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers

Katherine J. Harry; Sebastian Strobel; Joel K. W. Yang; Huigao Duan; Karl K. Berggren

J. Vac. Sci. Technol. B 29, 06FJ01 (2011) https://doi.org/10.1116/1.3644339

Abstract

View articletitled, In situ study of hydrogen silsesquioxane dissolution rate in salty and electrochemical developers

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Improved time dependent performance of hydrogen silsesquioxane resist using a spin on top coat

Daron A. Westly; Donald M. Tennant; Yukinori Aida; Hirofumi Ohki; Takashi Ohkubo

J. Vac. Sci. Technol. B 29, 06FJ02 (2011) https://doi.org/10.1116/1.3660788

Abstract

View articletitled, Improved time dependent performance of hydrogen silsesquioxane resist using a spin on top coat

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