Skip Nav Destination

Issues

Select Year

Issue

Volume 29, Issue 5

September 2011

All Issues

ISSN 2166-2746

EISSN 2166-2754

In this Issue

Review Article
Electronic & Optoelectronic Materials, Devices & Processing
Lithography
Nanometer Science & Technology
MEMS & NEMS
Microelectronic & Nanoelectronic Devices
Organic Electronics and Optoelectronics
Brief Reports and Comments

Review Article

Fabrication and performance of graphene nanoelectromechanical systems

Robert A. Barton; Jeevak Parpia; Harold G. Craighead

J. Vac. Sci. Technol. B 29, 050801 (2011) https://doi.org/10.1116/1.3623419

Abstract

View articletitled, Fabrication and performance of graphene nanoelectromechanical systems

Open the PDF for in another window

Electronic & Optoelectronic Materials, Devices & Processing

Current transport mechanisms of InGaN metal-insulator-semiconductor photodetectors

Z. G. Shao; D. J. Chen; B. Liu; H. Lu; Z. L. Xie; R. Zhang; Y. D. Zheng

J. Vac. Sci. Technol. B 29, 051201 (2011) https://doi.org/10.1116/1.3622298

Abstract

View articletitled, Current transport mechanisms of InGaN metal-insulator-semiconductor photodetectors

Open the PDF for in another window

Etching mechanisms of thin SiO₂ exposed to Cl₂ plasma

C. Petit-Etienne; M. Darnon; L. Vallier; E. Pargon; G. Cunge; M. Fouchier; P. Bodart; M. Haass; M. Brihoum; O. Joubert; S. Banna; T. Lill

J. Vac. Sci. Technol. B 29, 051202 (2011) https://doi.org/10.1116/1.3622311

Abstract

View articletitled, Etching mechanisms of thin SiO2 exposed to Cl2 plasma

Open the PDF for in another window

Removing imperceptible fluoride residue after chemical dry-cleaning to fabricate uniform low-resistance NiSi film

Takuya Futase; Hisanori Tanioto; Mitsuo Kimoto; Hideaki Tsugane; Hidenori Suzuki; Hiroshi Tobimatsu

J. Vac. Sci. Technol. B 29, 051203 (2011) https://doi.org/10.1116/1.3622301

Abstract

View articletitled, Removing imperceptible fluoride residue after chemical dry-cleaning to fabricate uniform low-resistance NiSi film

Open the PDF for in another window

Indium nitride epilayer prepared by UHV-plasma-assisted metalorganic molecule beam epitaxy

Wei-Chun Chen; Shou-Yi Kuo; Fang-I Lai; Woei-Tyng Lin; Chien-Nan Hsiao; Din Ping Tsai

J. Vac. Sci. Technol. B 29, 051204 (2011) https://doi.org/10.1116/1.3622315

Abstract

View articletitled, Indium nitride epilayer prepared by UHV-plasma-assisted metalorganic molecule beam epitaxy

Open the PDF for in another window

Influence of sputtering pressure on band gap of Zn_1−xMg_xO thin films prepared by radio frequency magnetron sputtering

Dapeng Wang; Tadashi Narusawa; Toshiyuki Kawaharamura; Mamoru Furuta; Chaoyang Li

J. Vac. Sci. Technol. B 29, 051205 (2011) https://doi.org/10.1116/1.3622316

Abstract

View articletitled, Influence of sputtering pressure on band gap of Zn1−xMgxO thin films prepared by radio frequency magnetron sputtering

Open the PDF for in another window

Large-area and nanoscale n-ZnO/p-Si heterojunction photodetectors

C. Periasamy; P. Chakrabarti

J. Vac. Sci. Technol. B 29, 051206 (2011) https://doi.org/10.1116/1.3628638

Abstract

View articletitled, Large-area and nanoscale n-ZnO/p-Si heterojunction photodetectors

Open the PDF for in another window

X-ray photoelectron spectroscopy measurement of the Schottky barrier at the SiC(N)/Cu interface

Sean W. King; Marc French; Milt Jaehnig; Markus Kuhn; Boyan Boyanov; Benjamin French

J. Vac. Sci. Technol. B 29, 051207 (2011) https://doi.org/10.1116/1.3633691

Abstract

View articletitled, X-ray photoelectron spectroscopy measurement of the Schottky barrier at the SiC(N)/Cu interface

Open the PDF for in another window

Lithography

Statistical analysis of subnanometer residual disorder in photonic crystal waveguides: Correlation between slow light properties and structural properties

N. Le Thomas; Z. Diao; H. Zhang; R. Houdré

J. Vac. Sci. Technol. B 29, 051601 (2011) https://doi.org/10.1116/1.3622289

Abstract

View articletitled, Statistical analysis of subnanometer residual disorder in photonic crystal waveguides: Correlation between slow light properties and structural properties

Open the PDF for in another window

Novel fabrication technique for nanoscale hydrogen silsesquioxane structures using a direct printing technique

Ki-Yeon Yang; Sang-Chul Oh; Hyungwon Park; Heon Lee

J. Vac. Sci. Technol. B 29, 051602 (2011) https://doi.org/10.1116/1.3628585

Abstract

View articletitled, Novel fabrication technique for nanoscale hydrogen silsesquioxane structures using a direct printing technique

Open the PDF for in another window

Large area microcorrals and cavity formation on cantilevers using a focused ion beam

Laxmikant V. Saraf; David W. Britt

J. Vac. Sci. Technol. B 29, 051603 (2011) https://doi.org/10.1116/1.3626833

Abstract

View articletitled, Large area microcorrals and cavity formation on cantilevers using a focused ion beam

Open the PDF for in another window

Low energy micron size beam from inductively coupled plasma ion source

P. Y. Nabhiraj; Ranjini Menon; R. K. Bhandari; G. Mohan Rao; S. Mohan

J. Vac. Sci. Technol. B 29, 051604 (2011) https://doi.org/10.1116/1.3640851

Abstract

View articletitled, Low energy micron size beam from inductively coupled plasma ion source

Open the PDF for in another window

Nanometer Science & Technology

Optimization of postgrowth electron-beam curing for focused electron-beam-induced Pt deposits

Harald Plank; Gerald Kothleitner; Ferdinand Hofer; Stephan G. Michelitsch; Christian Gspan; Andreas Hohenau; Joachim Krenn

J. Vac. Sci. Technol. B 29, 051801 (2011) https://doi.org/10.1116/1.3622314

Abstract

View articletitled, Optimization of postgrowth electron-beam curing for focused electron-beam-induced Pt deposits

Open the PDF for in another window

Silicon nitride nanotemplate fabrication using inductively coupled plasma etching process

Asma Ayari-Kanoun; Abdelatif Jaouad; Abdelkader Souifi; Dominique Drouin; Jacques Beauvais

J. Vac. Sci. Technol. B 29, 051802 (2011) https://doi.org/10.1116/1.3628593

Abstract

View articletitled, Silicon nitride nanotemplate fabrication using inductively coupled plasma etching process

Open the PDF for in another window

Characterization of Mo/Si multilayer growth on stepped topographies

A. J. R. van den Boogaard; E. Louis; E. Zoethout; K. A. Goldberg; F. Bijkerk

J. Vac. Sci. Technol. B 29, 051803 (2011) https://doi.org/10.1116/1.3628640

Abstract

View articletitled, Characterization of Mo/Si multilayer growth on stepped topographies

Open the PDF for in another window

Mueller polarimetry as a tool for detecting asymmetry in diffraction grating profiles

Tatiana Novikova; Pavel Bulkin; Vladimir Popov; Bicher Haj Ibrahim; Antonello De Martino

J. Vac. Sci. Technol. B 29, 051804 (2011) https://doi.org/10.1116/1.3633693

Abstract

View articletitled, Mueller polarimetry as a tool for detecting asymmetry in diffraction grating profiles

Open the PDF for in another window

Effect of nanoscale ripples on the formation of ZnO quantum dots

Liang-Chiun Chao; Wei-Ruei Chen; Jun-Wei Chen; Syuan-Miao Lai; Gerd Keiser

J. Vac. Sci. Technol. B 29, 051805 (2011) https://doi.org/10.1116/1.3633689

Abstract

View articletitled, Effect of nanoscale ripples on the formation of ZnO quantum dots

Open the PDF for in another window

Releasable infrared metamaterials

J. A. D’Archangel; G. D. Boreman; D.J. Shelton; M. B. Sinclair; I. Brener

J. Vac. Sci. Technol. B 29, 051806 (2011) https://doi.org/10.1116/1.3633695

Abstract

View articletitled, Releasable infrared metamaterials

Open the PDF for in another window

In-process characterization tool for optically produced sub-100-nm structures

M. Z. Shaikh; S. Kieß; M. Grégoire; S. Simon; A. Tausendfreund; M. Zimmermann; G. Goch

J. Vac. Sci. Technol. B 29, 051807 (2011) https://doi.org/10.1116/1.3635404

Abstract

View articletitled, In-process characterization tool for optically produced sub-100-nm structures

Open the PDF for in another window

Improved estimation of embedded InGaAs/GaAs quantum dots locations using a domed-apex nanoprobe

Lixia Xu; Yoshio Arai; Wakako Araki; Takahiro Ogawa; Kazunari Ozasa; Mizuo Maeda; Masahiko Hara

J. Vac. Sci. Technol. B 29, 051808 (2011) https://doi.org/10.1116/1.3628632

Abstract

View articletitled, Improved estimation of embedded InGaAs/GaAs quantum dots locations using a domed-apex nanoprobe

Open the PDF for in another window

MEMS & NEMS

Gallium nitride nanowire electromechanical resonators with piezoresistive readout

Jason M. Gray; Charles T. Rogers; Kris A. Bertness; Norman A. Sanford

J. Vac. Sci. Technol. B 29, 052001 (2011) https://doi.org/10.1116/1.3622326

Abstract

View articletitled, Gallium nitride nanowire electromechanical resonators with piezoresistive readout

Open the PDF for in another window

Microelectronic & Nanoelectronic Devices

Electronic properties of ultrathin high-κ dielectrics studied by ballistic electron emission microscopy

H. L. Qin; C. Troadec; K. E. J. Goh; K. Kakushima; H. Iwai; M. Bosman; K. L. Pey

J. Vac. Sci. Technol. B 29, 052201 (2011) https://doi.org/10.1116/1.3622296

Abstract

View articletitled, Electronic properties of ultrathin high-κ dielectrics studied by ballistic electron emission microscopy

Open the PDF for in another window

Organic Electronics and Optoelectronics

Organic thin-film transistors with electron-beam cured and flash vacuum deposited polymeric gate dielectric

Gamal Abbas; Hazel Assender; Mervat Ibrahim; D. Martin Taylor

J. Vac. Sci. Technol. B 29, 052401 (2011) https://doi.org/10.1116/1.3628635

Abstract

View articletitled, Organic thin-film transistors with electron-beam cured and flash vacuum deposited polymeric gate dielectric

Open the PDF for in another window

Brief Reports and Comments

Embedding a carbon nanotube across the diameter of a solid state nanopore

E. S. Sadki; S. Garaj; D. Vlassarev; J. A. Golovchenko; D. Branton

J. Vac. Sci. Technol. B 29, 053001 (2011) https://doi.org/10.1116/1.3628602

Abstract

View articletitled, Embedding a carbon nanotube across the diameter of a solid state nanopore

Open the PDF for in another window

Submit your article

Sign up for alerts

RSS

Current Issue RSS Feed

Open Issues RSS Feed

Most Read
Most Cited

Future of plasma etching for microelectronics: Challenges and opportunities

Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.

Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications

A. S. Stodolna, T. W. Mechielsen, et al.

High-efficiency metalenses for zone-plate-array lithography

Henry I. Smith, Mark Mondol, et al.

Review Article

Fabrication and performance of graphene nanoelectromechanical systems

Electronic & Optoelectronic Materials, Devices & Processing

Current transport mechanisms of InGaN metal-insulator-semiconductor photodetectors

Etching mechanisms of thin SiO₂ exposed to Cl₂ plasma

Removing imperceptible fluoride residue after chemical dry-cleaning to fabricate uniform low-resistance NiSi film

Indium nitride epilayer prepared by UHV-plasma-assisted metalorganic molecule beam epitaxy

Influence of sputtering pressure on band gap of Zn_1−xMg_xO thin films prepared by radio frequency magnetron sputtering

Large-area and nanoscale n-ZnO/p-Si heterojunction photodetectors

X-ray photoelectron spectroscopy measurement of the Schottky barrier at the SiC(N)/Cu interface

Lithography

Statistical analysis of subnanometer residual disorder in photonic crystal waveguides: Correlation between slow light properties and structural properties

Novel fabrication technique for nanoscale hydrogen silsesquioxane structures using a direct printing technique

Large area microcorrals and cavity formation on cantilevers using a focused ion beam

Low energy micron size beam from inductively coupled plasma ion source

Nanometer Science & Technology

Optimization of postgrowth electron-beam curing for focused electron-beam-induced Pt deposits

Silicon nitride nanotemplate fabrication using inductively coupled plasma etching process

Characterization of Mo/Si multilayer growth on stepped topographies

Mueller polarimetry as a tool for detecting asymmetry in diffraction grating profiles

Effect of nanoscale ripples on the formation of ZnO quantum dots

Releasable infrared metamaterials

In-process characterization tool for optically produced sub-100-nm structures

Improved estimation of embedded InGaAs/GaAs quantum dots locations using a domed-apex nanoprobe

MEMS & NEMS

Gallium nitride nanowire electromechanical resonators with piezoresistive readout

Microelectronic & Nanoelectronic Devices

Electronic properties of ultrathin high-κ dielectrics studied by ballistic electron emission microscopy

Organic Electronics and Optoelectronics

Organic thin-film transistors with electron-beam cured and flash vacuum deposited polymeric gate dielectric

Brief Reports and Comments

Embedding a carbon nanotube across the diameter of a solid state nanopore

Submit your article

Sign up for alerts

RSS

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

Issues

Review Article

Electronic & Optoelectronic Materials, Devices & Processing

Lithography

Nanometer Science & Technology

MEMS & NEMS

Microelectronic & Nanoelectronic Devices

Organic Electronics and Optoelectronics

Brief Reports and Comments

RSS

Resources

Explore

pubs.aip.org

Connect with AIP Publishing

This Feature Is Available To Subscribers Only