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Different growth mechanisms of vertical carbon nanotubes by rf- or dc-plasma enhanced chemical vapor deposition at low temperature

Huiyao Wang; John J. Moore

J. Vac. Sci. Technol. B 28, 1081–1085 (2010) https://doi.org/10.1116/1.3497030

Abstract

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Influence of the tip work function on scanning tunneling microscopy and spectroscopy on zinc doped GaAs

A. P. Wijnheijmer; J. K. Garleff; M. A. v. d. Heijden; P. M. Koenraad

J. Vac. Sci. Technol. B 28, 1086–1092 (2010) https://doi.org/10.1116/1.3498739

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Field-emission of ${TiSi}_{2}$ thin film deposited by an in situ chloride-generated route

Yemin Hu; Ying Li; Mingyuan Zhu; Zheng Hu; Leshu Yu

J. Vac. Sci. Technol. B 28, 1093–1096 (2010) https://doi.org/10.1116/1.3498742

Abstract

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Characterization of electrodeposited Ni–Fe–SiC alloys for microelectromechanical applications

Xiaohu Zheng; Xing Chen; Feng Gu; YuanWei Liu; Dong-Weon Lee

J. Vac. Sci. Technol. B 28, 1097–1099 (2010) https://doi.org/10.1116/1.3498740

Abstract

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UV ozone passivation of the metal/dielectric interface for ${HfO}_{2}$ -based organic thin film transistors

W. M. Tang; W. T. Ng; M. G. Helander; M. T. Greiner; Z. H. Lu

J. Vac. Sci. Technol. B 28, 1100–1103 (2010) https://doi.org/10.1116/1.3498744

Abstract

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Surface and near-surface modifications of ultralow dielectric constant materials exposed to plasmas under sidewall-like conditions

Ming-Shu Kuo; G. S. Oehrlein

J. Vac. Sci. Technol. B 28, 1104–1110 (2010) https://doi.org/10.1116/1.3499271

Abstract

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Growth of size and density controlled $GaAs / {In}_{x} {Ga}_{1 - x} As / GaAs$ $(x = 0.10)$ nanowires on anodic alumina membrane-assisted etching of nanopatterned GaAs

Aloysius A. Gunawan; S. Jha; T. F. Kuech

J. Vac. Sci. Technol. B 28, 1111–1119 (2010) https://doi.org/10.1116/1.3498753

Abstract

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Complex dielectric function and refractive index spectra of epitaxial CdO thin film grown on $r$ -plane sapphire from 0.74 to 6.45 eV

S. G. Choi; J. Zúñiga-Pérez; V. Muñoz-Sanjosé; A. G. Norman; C. L. Perkins; D. H. Levi

J. Vac. Sci. Technol. B 28, 1120–1124 (2010) https://doi.org/10.1116/1.3498755

Abstract

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Formation of three-dimensional and nanowall structures on silicon using a hydrogen-assisted high aspect ratio etching

S. Azimi; M. Mehran; A. Amini; A. Vali; S. Mohajerzadeh; M. Fathipour

J. Vac. Sci. Technol. B 28, 1125–1131 (2010) https://doi.org/10.1116/1.3497033

Abstract

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Statistical-noise effect on discrete power spectrum of line-edge and line-width roughness

Atsushi Hiraiwa (平岩篤); Akio Nishida (西田彰男)

J. Vac. Sci. Technol. B 28, 1132–1137 (2010) https://doi.org/10.1116/1.3499647

Abstract

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Defect-free etching process for GaAs/AlGaAs hetero-nanostructure using chlorine/argon mixed neutral beam

Xuan-Yu Wang; Chi-Hsien Huang; Yuzo Ohno; Mokoto Igarashi; Akihiro Murayama; Seiji Samukawa

J. Vac. Sci. Technol. B 28, 1138–1142 (2010) https://doi.org/10.1116/1.3499716

Abstract

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Effect of Al doping on resistive switching behavior of ${NiO}_{x}$ films for nonvolatile memory application

Jonggi Kim; Heedo Na; Jinho Oh; Dae-Hong Ko; Hyunchul Sohn

J. Vac. Sci. Technol. B 28, 1143–1147 (2010) https://doi.org/10.1116/1.3501109

Abstract

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Mechanical and electronic characteristics of scanning probe microscopy probes based on coaxial palladium nanowire/carbon nanotube hybrid structures

Ian Thomas Clark; Gemma Rius; Yuki Matsuoka; Masamichi Yoshimura

J. Vac. Sci. Technol. B 28, 1148–1152 (2010) https://doi.org/10.1116/1.3501131

Abstract

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${CO}_{2}$ laser treatment for stabilization of the superhydrophobicity of carbon nanotube surfaces

S. C. Ramos; G. Vasconcelos; E. F. Antunes; A. O. Lobo; V. J. Trava-Airoldi; E. J. Corat

J. Vac. Sci. Technol. B 28, 1153–1157 (2010) https://doi.org/10.1116/1.3502024

Abstract

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Dose loss of phosphorus due to interface segregation in silicon-on-insulator substrates

Ruey-Dar Chang; Chia-Chi Ma; Jung-Ruey Tsai

J. Vac. Sci. Technol. B 28, 1158–1163 (2010) https://doi.org/10.1116/1.3499648

Abstract

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Influence of surface treatment and interface layers on electrical spin injection efficiency and transport in InAs

L. Zhu; E. T. Yu

J. Vac. Sci. Technol. B 28, 1164–1168 (2010) https://doi.org/10.1116/1.3502674

Abstract

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Electron detection performance of diamond avalanche diode

Hideo Morishita; Takashi Ohshima; Michio Hatano; Yoko Iwakaji; Osamu Maida; Toshimichi Ito

J. Vac. Sci. Technol. B 28, 1169–1172 (2010) https://doi.org/10.1116/1.3497031

Abstract

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Thin film transistors with a ZnO channel and gate dielectric layers of ${HfO}_{2}$ by atomic layer deposition

Ronald Grundbacher; Kiran Chikkadi; Christofer Hierold

J. Vac. Sci. Technol. B 28, 1173–1178 (2010) https://doi.org/10.1116/1.3501338

Abstract

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Silicon nitride hardmask fabrication using a cyclic ${CHF}_{3}$ -based reactive ion etching process for vertical profile nanostructures

Peter Kaspar; Yogesh Jeyaram; Heinz Jäckel; Annette Foelske; Rüdiger Kötz; Sandro Bellini

J. Vac. Sci. Technol. B 28, 1179–1186 (2010) https://doi.org/10.1116/1.3501120

Abstract

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Hydrogen etching and cutting of multiwall carbon nanotubes

Michael J. Behr; E. Ashley Gaulding; K. Andre Mkhoyan; Eray S. Aydil

J. Vac. Sci. Technol. B 28, 1187–1194 (2010) https://doi.org/10.1116/1.3498737

Abstract

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Controlled sacrificial sidewall surface micromachining for the release of high length-to-thickness aspect ratio bridges

Christopher R. Raum; R. Niall Tait; Robert Gauthier

J. Vac. Sci. Technol. B 28, 1195–1201 (2010) https://doi.org/10.1116/1.3503612

Abstract

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Field emission stability and properties of simultaneously grown microcrystalline diamond and carbon nanostructure films

Kishore Uppireddi; Brad R. Weiner; Gerardo Morell

J. Vac. Sci. Technol. B 28, 1202–1205 (2010) https://doi.org/10.1116/1.3503619

Abstract

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Electron beam induced etching of silicon with ${SF}_{6}$

N. Vanhove; P. Lievens; W. Vandervorst

J. Vac. Sci. Technol. B 28, 1206–1209 (2010) https://doi.org/10.1116/1.3504594

Abstract

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Simultaneous observation of surface topography and elasticity at atomic scale by multifrequency frequency modulation atomic force microscopy

Yoshitaka Naitoh; Zongmin Ma; Yan Jun Li; Masami Kageshima; Yasuhiro Sugawara

J. Vac. Sci. Technol. B 28, 1210–1214 (2010) https://doi.org/10.1116/1.3503611

Abstract

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Nonlinearities in depth profiling nanometer layers

M. P. Seah; C. P. A. Mulcahy; S. Biswas

J. Vac. Sci. Technol. B 28, 1215–1221 (2010) https://doi.org/10.1116/1.3504592

Abstract

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Challenges in the fabrication of an optical frequency ground plane cloak consisting of silicon nanorod arrays

J. Blair; D. Brown; V. A. Tamma; W. Park; C. Summers

J. Vac. Sci. Technol. B 28, 1222–1230 (2010) https://doi.org/10.1116/1.3504595

Abstract

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Ni full-filling into ${Al}_{2} O_{3} / Al$ film with etched tunnels using a polyethylene glycol solution bath in electroless-plating

Joo-Hee Jang; Chang-Hyoung Lee; Woo-Sung Choi; Nam-Jeong Kim; Taek-You Kim; Tae-Yoo Kim; Jang-Hyun Kim; Chan Park; Su-Jeong Suh

J. Vac. Sci. Technol. B 28, 1231–1234 (2010) https://doi.org/10.1116/1.3506105

Abstract

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Antimonide-based depletion-mode metal-oxide-semiconductor field-effect transistors using small-bandgap InAs channel layers

H.-K. Lin; G.-Y. Liau; H.-K. Liu

J. Vac. Sci. Technol. B 28, 1235–1238 (2010) https://doi.org/10.1116/1.3506111

Abstract

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Impact of exposure doses on demolding process in UV nanoimprint lithography

Toshiaki Tanabe; Noriyoshi Fujii; Masato Matsue; Hiroaki Kawata; Yoshihiko Hirai

J. Vac. Sci. Technol. B 28, 1239–1241 (2010) https://doi.org/10.1116/1.3501126

Abstract

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Statistical-noise effect on autocorrelation function of line-edge and line-width roughness

Atsushi Hiraiwa (平岩篤); Akio Nishida (西田彰男)

J. Vac. Sci. Technol. B 28, 1242–1250 (2010) https://doi.org/10.1116/1.3514206

Abstract

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Thin polymer films viscosity measurements from nanopatterning method

Tanguy Leveder; Stefan Landis; Nicolas Chaix; Laurent Davoust

J. Vac. Sci. Technol. B 28, 1251–1258 (2010) https://doi.org/10.1116/1.3504591

Abstract

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Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer

Patrick P. Naulleau; Gregg M. Gallatin

J. Vac. Sci. Technol. B 28, 1259–1266 (2010) https://doi.org/10.1116/1.3509437

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Performance and reliability analysis of $p$ -type metal-oxide-semiconductor field effect transistors with various combinations of Ru and Al gate metal

Hong Bae Park; Chang Seo Park; Chang Yong Kang; Seung-Chul Song; Byoung Hun Lee; Tea Wan Kim; Tae-Young Jang; Dong-Hyoub Kim; Jae Kyeong Jeong; Rino Choi

J. Vac. Sci. Technol. B 28, 1267–1270 (2010) https://doi.org/10.1116/1.3514103

Abstract

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Structural and optical properties of self-assembled InAs quantum dot molecules on GaAs substrates

Peng Tian; Lirong Huang; Yi Yu; Dexiu Huang

J. Vac. Sci. Technol. B 28, 1271–1273 (2010) https://doi.org/10.1116/1.3516010

Abstract

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Fabrication and field emission of carbon $nanotubes / {TiO}_{2} / Ti$ composite nanostructures

Jian-Biao Chen; Cheng-Wei Wang; Rui-Sheng Guo; Lin-Qing Wang; Wei-Dong Zhu; Feng Zhou; Wei-Min Liu

J. Vac. Sci. Technol. B 28, 1274–1278 (2010) https://doi.org/10.1116/1.3516017

Abstract

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Atomic resolution force microscopy imaging on a strongly ionic surface with differently functionalized tips

T. Arai; S. Gritschneder; L. Tröger; M. Reichling

J. Vac. Sci. Technol. B 28, 1279–1283 (2010) https://doi.org/10.1116/1.3511505

Abstract

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Electron field emission from well-aligned GaP nanotips

Hung-Chun Lo; Jeff T. H. Tsai; Jih-Perng Leu; Chia-Fu Chen

J. Vac. Sci. Technol. B 28, 1284–1286 (2010) https://doi.org/10.1116/1.3506089

Abstract

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Sputtering behavior and evolution of depth resolution upon low energy ion irradiation of GaAs

M. J. P. Hopstaken; M. S. Gordon; D. Pfeiffer; D. K. Sadana; T. Topuria; P. M. Rice; C. Gerl; M. Richter; C. Marchiori

J. Vac. Sci. Technol. B 28, 1287–1297 (2010) https://doi.org/10.1116/1.3514117

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Relaxation of misfit strain in silicon-germanium (⁠ ${Si}_{1 - x} {Ge}_{x}$ ⁠) films during dry oxidation

Jung-Ho Yoo; Sun-Wook Kim; Byoung-Gi Min; Hyunchul Sohn; Dae-Hong Ko; Mann-Ho Cho

J. Vac. Sci. Technol. B 28, 1298–1303 (2010) https://doi.org/10.1116/1.3516014

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Quantifying reaction spread and x-ray exposure sensitivity in hydrogen silsesquioxane latent resist patterns with x-ray spectromicroscopy

Allison G. Caster; Stefan Kowarik; Adam M. Schwartzberg; Stephen R. Leone; Alexei Tivanski; Mary K. Gilles

J. Vac. Sci. Technol. B 28, 1304–1313 (2010) https://doi.org/10.1116/1.3514124

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Supplementary Material

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Reduction of spin-flip scattering in metallic nonlocal spin valves

H. Zou; X. J. Wang; Y. Ji

J. Vac. Sci. Technol. B 28, 1314–1317 (2010) https://doi.org/10.1116/1.3514204

Abstract

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Single-walled carbon nanotube alignment by grating-guided electrostatic self-assembly

Huifeng Li; Dazhi Sun; Hung-Jue Sue; Xing Cheng

J. Vac. Sci. Technol. B 28, 1318–1321 (2010) https://doi.org/10.1116/1.3514205

Abstract

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Brief Reports and Comments

Moisture effect on electromigration characteristics for copper dual damascene interconnection

Yi-Lung Cheng; Wei-Yuan Chang; Ying-Lang Wang

J. Vac. Sci. Technol. B 28, 1322–1325 (2010) https://doi.org/10.1116/1.3501127

Abstract

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Shop Notes

Simple derivation of the formula for Sommerfeld supply density used in electron-emission physics and limitations on its use

Richard G. Forbes

J. Vac. Sci. Technol. B 28, 1326–1329 (2010) https://doi.org/10.1116/1.3501118

Abstract

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PAPERS FROM THE 54th INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION

Preface

Martin Feldman

J. Vac. Sci. Technol. B 28, C6a1 (2010) https://doi.org/10.1116/1.3522593

Extract

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Plenary

To charge or not to charge: 50 years of lithographic choices

R. Fabian Pease

J. Vac. Sci. Technol. B 28, C6A1–C6A6 (2010) https://doi.org/10.1116/1.3517607

Abstract

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Directed Assembly

Argon ion multibeam nanopatterning of Ni–Cu inserts for injection molding

Anton Koeck; Roman Bruck; Markus Wellenzohn; Rainer Hainberger; Elmar Platzgummer; Hans Loeschner; Peter Joechl; Stefan Eder-Kapl; Christoph Ebm; Peter Czepl; Kurt Kaiblinger; Friedrich Pipelka; Florian Letzkus; Mathias Irmscher; Bernd Heitkamp

J. Vac. Sci. Technol. B 28, C6B1–C6B6 (2010) https://doi.org/10.1116/1.3517643

Abstract

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Mechanism and dynamics of block copolymer directed assembly with density multiplication on chemically patterned surfaces

Guoliang Liu; Sean P. Delcambre; Karl O. Stuen; Gordon S. W. Craig; Juan J. de Pablo; Paul F. Nealey; Kim Nygård; Dillip K. Satapathy; Oliver Bunk; Harun H. Solak

J. Vac. Sci. Technol. B 28, C6B13–C6B19 (2010) https://doi.org/10.1116/1.3518918

Abstract

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Nanostructure fabrication by self-assembly of block copolymers on three-dimensional diamondlike carbon structures

Hiroyuki Mino; Reo Kometani; Shin-ichi Warisawa; Sunao Ishihara

J. Vac. Sci. Technol. B 28, C6B20–C6B23 (2010) https://doi.org/10.1116/1.3518462

Abstract

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Shape control and density multiplication of cylinder-forming ternary block copolymer-homopolymer blend thin films on chemical patterns

Huiman Kang; Francois Detcheverry; Karl O. Stuen; Gordon S. W. Craig; Juan J. de Pablo; Padma Gopalan; Paul F. Nealey

J. Vac. Sci. Technol. B 28, C6B24–C6B29 (2010) https://doi.org/10.1116/1.3518910

Abstract

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Integration of block copolymer directed assembly with 193 immersion lithography

Chi-Chun Liu; Paul F. Nealey; Alex K. Raub; Philip J. Hakeem; Steve R. J. Brueck; Eungnak Han; Padma Gopalan

J. Vac. Sci. Technol. B 28, C6B30–C6B34 (2010) https://doi.org/10.1116/1.3501348

Abstract

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Directed assembly of solution processed single-walled carbon nanotubes via dielectrophoresis: From aligned array to individual nanotube devices

Paul Stokes; Saiful I. Khondaker

J. Vac. Sci. Technol. B 28, C6B7–C6B12 (2010) https://doi.org/10.1116/1.3501347

Abstract

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Electron Beams

High-current electron optical design for reflective electron beam lithography direct write lithography

Mark McCord; Shinichi Kojima; Paul Petric; Alan Brodie; Jeff Sun

J. Vac. Sci. Technol. B 28, C6C1–C6C5 (2010) https://doi.org/10.1116/1.3505130

Abstract

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5 kV multielectron beam lithography: MAPPER tool and resist process characterization

D. Rio; C. Constancias; M. Martin; B. Icard; J. van Nieuwstadt; J. Vijverberg; L. Pain

J. Vac. Sci. Technol. B 28, C6C14–C6C20 (2010) https://doi.org/10.1116/1.3517664

Abstract

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Excitation and imaging of resonant optical modes of Au triangular nanoantennas using cathodoluminescence spectroscopy

Anil Kumar; Kin-Hung Fung; James C. Mabon; Edmond Chow; Nicholas X. Fang

J. Vac. Sci. Technol. B 28, C6C21–C6C25 (2010) https://doi.org/10.1116/1.3504566

Abstract

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Field induced shape and work function modification for the ZrO/W(100) Schottky cathode

K. Liu; G. A. Schwind; L. W. Swanson; J. A. Campbell

J. Vac. Sci. Technol. B 28, C6C26–C6C33 (2010) https://doi.org/10.1116/1.3501362

Abstract

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Performance characterization of negative resists for sub-10-nm electron beam lithography

R. Bonam; P. Verhagen; A. Munder; J. Hartley

J. Vac. Sci. Technol. B 28, C6C34–C6C40 (2010) https://doi.org/10.1116/1.3517721

Abstract

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Simulation of scanning electron microscope images taking into account local and global electromagnetic fields

Sergey Babin; Sergey S. Borisov; Hiroyuki Ito; Andrei Ivanchikov; Makoto Suzuki

J. Vac. Sci. Technol. B 28, C6C41–C6C47 (2010) https://doi.org/10.1116/1.3518917

Abstract

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Simulation of electron beam lithography of nanostructures

M. Stepanova; T. Fito; Zs. Szabó; K. Alti; A. P. Adeyenuwo; K. Koshelev; M. Aktary; S. K. Dew

J. Vac. Sci. Technol. B 28, C6C48–C6C57 (2010) https://doi.org/10.1116/1.3497019

Abstract

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Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist

Huigao Duan; Donald Winston; Joel K. W. Yang; Bryan M. Cord; Vitor R. Manfrinato; Karl K. Berggren

J. Vac. Sci. Technol. B 28, C6C58–C6C62 (2010) https://doi.org/10.1116/1.3501353

Abstract

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Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept

Paul Petric; Chris Bevis; Mark McCord; Allen Carroll; Alan Brodie; Upendra Ummethala; Luca Grella; Anthony Cheung; Regina Freed

J. Vac. Sci. Technol. B 28, C6C6–C6C13 (2010) https://doi.org/10.1116/1.3511436

Abstract

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Analysis of surface electromagnetic wave resonant structures for potential application in an array of compact photoelectron sources

Heon J. Choi; Timothy R. Groves

J. Vac. Sci. Technol. B 28, C6C63–C6C68 (2010) https://doi.org/10.1116/1.3504590

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Inspection of open defects in a thin film transistor-liquid crystal display panel by using a low-energy electron microcolumn

Tae Sik Oh; Dae-Wook Kim; Young Chul Kim; Seungjoon Ahn; Gun-hee Lee; Ho Seob Kim

J. Vac. Sci. Technol. B 28, C6C69–C6C73 (2010) https://doi.org/10.1116/1.3502658

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Brightness limitations of cold field emitters caused by Coulomb interactions

B. Cook; T. Verduin; C. W. Hagen; P. Kruit

J. Vac. Sci. Technol. B 28, C6C74–C6C79 (2010) https://doi.org/10.1116/1.3502642

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Emerging Technologies

Direct transformation of a resist pattern into a graphene field effect transistor through interfacial graphitization of liquid gallium

Jun-ichi Fujita; Yosuke Miyazawa; Ryuichi Ueki; Mio Sasaki; Takeshi Saito

J. Vac. Sci. Technol. B 28, C6D1–C6D4 (2010) https://doi.org/10.1116/1.3511511

Abstract

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Study of transport properties in graphene monolayer flakes on ${SiO}_{2}$ substrates

J. M. Tirado; D. Nezich; X. Zhao; J. W. Chung; J. Kong; T. Palacios

J. Vac. Sci. Technol. B 28, C6D11–C6D14 (2010) https://doi.org/10.1116/1.3516649

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Fabrication of metal patterns on freestanding graphenoid nanomembranes

André Beyer; Andrey Turchanin; Christoph T. Nottbohm; Nils Mellech; Mark Schnietz; Armin Gölzhäuser

J. Vac. Sci. Technol. B 28, C6D5–C6D10 (2010) https://doi.org/10.1116/1.3511475

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Extreme Ultraviolet Lithography

Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research

K. A. Goldberg; I. Mochi

J. Vac. Sci. Technol. B 28, C6E1–C6E10 (2010) https://doi.org/10.1116/1.3498757

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Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks

Iacopo Mochi; Kenneth A. Goldberg; Sungmin Huh

J. Vac. Sci. Technol. B 28, C6E11–C6E16 (2010) https://doi.org/10.1116/1.3498756

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Assessing the mask clamping ability of a low thermal expansion material chuck

J. R. Zeuske; P. Vukkadala; R. L. Engelstad; A. R. Mikkelson; G. Kalkowski; S. Risse; S. Mueller

J. Vac. Sci. Technol. B 28, C6E17–C6E22 (2010) https://doi.org/10.1116/1.3502449

Abstract

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Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning

Simi A. George; Patrick P. Naulleau; Iacopo Mochi; Farhad Salmassi; Eric M. Gullikson; Kenneth A. Goldberg; Erik H. Anderson

J. Vac. Sci. Technol. B 28, C6E23–C6E30 (2010) https://doi.org/10.1116/1.3502436

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Extreme ultraviolet mask surface cleaning effects on lithography process performance

Simi A. George; Lorie Mae Baclea-an; Patrick P. Naulleau; Robert J. Chen; Ted Liang

J. Vac. Sci. Technol. B 28, C6E31–C6E35 (2010) https://doi.org/10.1116/1.3501344

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High transmission pellicles for extreme ultraviolet lithography reticle protection

Yashesh A. Shroff; Michael Leeson; Pei-Yang Yan; Eric Gullikson; Farhad Salmassi

J. Vac. Sci. Technol. B 28, C6E36–C6E41 (2010) https://doi.org/10.1116/1.3505126

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Focused Ion Beams

Focused chromium ion beam

A. V. Steele; B. Knuffman; J. J. McClelland; J. Orloff

J. Vac. Sci. Technol. B 28, C6F1–C6F5 (2010) https://doi.org/10.1116/1.3502668

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Design of a parallel mass spectrometer for focused ion beam columns

A. Khursheed; K. H. Cheong; H. Q. Hoang

J. Vac. Sci. Technol. B 28, C6F10–C6F14 (2010) https://doi.org/10.1116/1.3497021

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Gas field ion source and liquid metal ion source charged particle material interaction study for semiconductor nanomachining applications

Shida Tan; Richard Livengood; Darryl Shima; John Notte; Shawn McVey

J. Vac. Sci. Technol. B 28, C6F15–C6F21 (2010) https://doi.org/10.1116/1.3511509

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Model for nanopillar growth by focused helium ion-beam-induced deposition

Paul F. A. Alkemade; Ping Chen; Emile van Veldhoven; Diederik Maas

J. Vac. Sci. Technol. B 28, C6F22–C6F25 (2010) https://doi.org/10.1116/1.3517536

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${Ga}^{+}$ beam lithography for suspended lateral beams and nanowires

M. David Henry; Michael Shearn; Axel Scherer

J. Vac. Sci. Technol. B 28, C6F26–C6F30 (2010) https://doi.org/10.1116/1.3497013

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Transmission electron microscopy study of damage layer formed through ion beam induced deposition of platinum on silicon substrate

Byong Chon Park; Yun Chang Park; Hwack Joo Lee; Young Heon Kim

J. Vac. Sci. Technol. B 28, C6F31–C6F37 (2010) https://doi.org/10.1116/1.3516651

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Piezoresistive effect in the three-dimensional diamondlike carbon nanostructure fabricated by focused-ion-beam chemical vapor deposition

Reo Kometani; Kouki Yusa; Shin’ichi Warisawa; Sunao Ishihara

J. Vac. Sci. Technol. B 28, C6F38–C6F41 (2010) https://doi.org/10.1116/1.3504584

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Analysis of subsurface beam spread and its impact on the image resolution of the helium ion microscope

Sybren Sijbrandij; John Notte; Colin Sanford; Ray Hill

J. Vac. Sci. Technol. B 28, C6F6–C6F9 (2010) https://doi.org/10.1116/1.3497012

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Masks and Maskless Lithography

Blanking characteristics of a miniature electron beam column

C. S. Silver; J. P. Spallas; L. P. Muray

J. Vac. Sci. Technol. B 28, C6G1–C6G4 (2010) https://doi.org/10.1116/1.3502437

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Multibeam scanning electron microscope: Experimental results

A. Mohammadi-Gheidari; C. W. Hagen; P. Kruit

J. Vac. Sci. Technol. B 28, C6G5–C6G10 (2010) https://doi.org/10.1116/1.3498749

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Metrology and Imaging

Application of analytic scanning electron microscopy to critical dimensions metrology at nanometer scale

Sergey Babin; Konstantin Bay; Justin J. Hwu

J. Vac. Sci. Technol. B 28, C6H1–C6H5 (2010) https://doi.org/10.1116/1.3504476

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Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale

Huigao Duan; Vitor R. Manfrinato; Joel K. W. Yang; Donald Winston; Bryan M. Cord; Karl K. Berggren

J. Vac. Sci. Technol. B 28, C6H11–C6H17 (2010) https://doi.org/10.1116/1.3501359

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Robust estimation of line width roughness parameters

Kedar Patel; Soumendra N. Lahiri; Costas J. Spanos

J. Vac. Sci. Technol. B 28, C6H18–C6H33 (2010) https://doi.org/10.1116/1.3517718

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Understanding the relationship between true and measured resist feature critical dimension and line edge roughness using a detailed scanning electron microscopy simulator

Richard A. Lawson; Clifford L. Henderson

J. Vac. Sci. Technol. B 28, C6H34–C6H39 (2010) https://doi.org/10.1116/1.3517717

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Linewidth metrology for sub-10-nm lithography

S. Thoms; D. S. Macintyre

J. Vac. Sci. Technol. B 28, C6H6–C6H10 (2010) https://doi.org/10.1116/1.3505129

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Microfluidics

Three-dimensional microfluidic mixers using ion beam lithography and micromachining

E. Palacios; L. E. Ocola; A. Joshi-Imre; S. Bauerdick; M. Berse; L. Peto

J. Vac. Sci. Technol. B 28, C6I1–C6I6 (2010) https://doi.org/10.1116/1.3505128

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Nanofluidic channels fabricated by e-beam lithography and polymer reflow sealing

Mina Fouad; Mustafa Yavuz; Bo Cui

J. Vac. Sci. Technol. B 28, C6I11–C6I13 (2010) https://doi.org/10.1116/1.3517620

Abstract

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Rotation speed control of Janus particles by dielectrophoresis in a microfluidic channel

T. Honegger; O. Lecarme; K. Berton; D. Peyrade

J. Vac. Sci. Technol. B 28, C6I14–C6I19 (2010) https://doi.org/10.1116/1.3502670

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Fabricating millimeter to nanometer sized cavities concurrently for nanofluidic devices

Nicole R. Devlin; Devin K. Brown

J. Vac. Sci. Technol. B 28, C6I7–C6I10 (2010) https://doi.org/10.1116/1.3517701

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Modeling

Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography

A. Erdmann; F. Shao; P. Evanschitzky; T. Fühner

J. Vac. Sci. Technol. B 28, C6J1–C6J7 (2010) https://doi.org/10.1116/1.3497024

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Monte Carlo modeling of electron backscattering from carbon nanotube forests

M. K. Alam; P. Yaghoobi; A. Nojeh

J. Vac. Sci. Technol. B 28, C6J13–C6J18 (2010) https://doi.org/10.1116/1.3511506

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Reducing the pattern redundancy in optical proximity correction modeling by analyzing the pattern linearity

Jianliang Li; Lin Zhang; Qiliang Yan; Lawrence S. Melvin, III; Chadwick Lin; Eason Su; Nail Tang

J. Vac. Sci. Technol. B 28, C6J19–C6J24 (2010) https://doi.org/10.1116/1.3511510

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High accuracy electron beam model development in MICHELLE: eBEAM

Serguei G. Ovtchinnikov; Simon J. Cooke; Roman Shtokhamer; Alexander N. Vlasov; Masis M. Mkrtchyan; Christopher Kostas; John J. Petillo; Baruch Levush

J. Vac. Sci. Technol. B 28, C6J8–C6J12 (2010) https://doi.org/10.1116/1.3503899

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Nanobiology

Fabrication of three-dimensional structures for the assessment of cell mechanical interactions within cell monolayers

David Fuard; Michel Moussus; Caterina Tomba; David Peyrade; Alice Nicolas

J. Vac. Sci. Technol. B 28, C6K1–C6K7 (2010) https://doi.org/10.1116/1.3511435

Abstract

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Gelatin/glycerol coating to preserve mechanically compliant nanowire electrodes from damage during brain implantation

Jolanda A. Witteveen; Dmitry B. Suyatin; Lina Gällentoft; Jens Schouenborg; Nils Danielsen; Christelle N. Prinz

J. Vac. Sci. Technol. B 28, C6K13–C6K16 (2010) https://doi.org/10.1116/1.3498764

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Microfluidics-assisted photo nanoimprint lithography for the formation of cellular bioimprints

V. Nock; L. Murray; F. Samsuri; M. M. Alkaisi; J. J. Evans

J. Vac. Sci. Technol. B 28, C6K17–C6K22 (2010) https://doi.org/10.1116/1.3501342

Abstract

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Texturing of silicon using a microporous polymer etch mask

N. S. Korivi; J. Hoffpauir; P. K. Ajmera

J. Vac. Sci. Technol. B 28, C6K8–C6K12 (2010) https://doi.org/10.1116/1.3507890

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Nanoelectronics

Low damage fully self-aligned replacement gate process for fabricating deep sub-100 nm gate length GaAs metal-oxide-semiconductor field-effect transistors

X. Li; S. Bentley; H. McLelland; M. C. Holland; H. Zhou; S. Thoms; D. S. Macintyre; I. G. Thayne

J. Vac. Sci. Technol. B 28, C6L1–C6L5 (2010) https://doi.org/10.1116/1.3501355

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Platinum single-electron transistors with tunnel barriers made by atomic layer deposition

Hubert C. George; Alexei O. Orlov; Gregory L. Snider

J. Vac. Sci. Technol. B 28, C6L6–C6L8 (2010) https://doi.org/10.1116/1.3511432

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Si single electron transistor fabricated by chemical mechanical polishing

Yen-Chun Lee; Vishwanath Joshi; Alexei O. Orlov; Gregory L. Snider

J. Vac. Sci. Technol. B 28, C6L9–C6L13 (2010) https://doi.org/10.1116/1.3498748

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Nanoimprint

Aspects of hybrid pattern definition while combining thermal nanoimprint with optical lithography

H.-C. Scheer; S. Möllenbeck; A. Mayer; K. Dhima

J. Vac. Sci. Technol. B 28, C6M1–C6M6 (2010) https://doi.org/10.1116/1.3498750

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Nanoimprinted $P 3 HT / C_{60}$ solar cells optimized by oblique deposition of $C_{60}$

Yi Yang; Mukti Aryal; Kamil Mielczarek; Walter Hu; Anvar Zakhidov

J. Vac. Sci. Technol. B 28, C6M104–C6M107 (2010) https://doi.org/10.1116/1.3517513

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Process-simulation system for UV-nanoimprint lithography

Mayuko Shibata; Akira Horiba; Yoshinori Nagaoka; Hiroaki Kawata; Masaaki Yasuda; Yoshihiko Hirai

J. Vac. Sci. Technol. B 28, C6M108–C6M113 (2010) https://doi.org/10.1116/1.3511789

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Rapid patterning of spin-on-glass using ultrasonic nanoimprint

Harutaka Mekaru; Masaharu Takahashi

J. Vac. Sci. Technol. B 28, C6M114–C6M121 (2010) https://doi.org/10.1116/1.3501361

Abstract

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45 nm hp line/space patterning into a thin spin coat film by UV nanoimprint based on condensation

Hiroshi Hiroshima; Qing Wang; Sung-Won Youn

J. Vac. Sci. Technol. B 28, C6M12–C6M16 (2010) https://doi.org/10.1116/1.3507882

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Rapid thermal imprinting of high-aspect-ratio nanostructures with dynamic heating of mold surface

Keisuke Nagato; Shuntaro Hattori; Tetsuya Hamaguchi; Masayuki Nakao

J. Vac. Sci. Technol. B 28, C6M122–C6M124 (2010) https://doi.org/10.1116/1.3517608

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Residual layer uniformity using complementary patterns to compensate for pattern density variation in UV nanoimprint lithography

Qing Wang; Hiroshi Hiroshima; Hidemasa Atobe; Sung-Won Youn

J. Vac. Sci. Technol. B 28, C6M125–C6M129 (2010) https://doi.org/10.1116/1.3497015

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Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications

Zhaoning Yu; Justin Hwu; Yongdong Liu; Zhenpeng Su; Henry Yang; Hongying Wang; Wei Hu; Yuan Xu; Nobuo Kurataka; Yautzong Hsu; Shifu Lee; Gene Gauzner; Kim Lee; David Kuo

J. Vac. Sci. Technol. B 28, C6M130–C6M135 (2010) https://doi.org/10.1116/1.3507888

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Sputtering with an etch-free lift-off in thermal nanoimprint lithography

Andre Mayer; Nicolas Bogdanski; Saskia Möllenbeck; Khalid Dhima; Marc Papenheim; Hella-Christin Scheer

J. Vac. Sci. Technol. B 28, C6M136–C6M139 (2010) https://doi.org/10.1116/1.3507879

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Evaluation of oxygen inhibition for UV-curable resins by adhesion force measurement using scanning probe microscope

Makoto Okada; Masayuki Iwasa; Hiroto Miyake; Takeshi Ohsaki; Yuichi Haruyama; Kazuhiro Kanda; Shinji Matsui

J. Vac. Sci. Technol. B 28, C6M17–C6M22 (2010) https://doi.org/10.1116/1.3517511

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Assessment of release properties in UV nanoimprint lithography using high-aspect-ratio nanoscale molds

Junki Takahashi; Jun Taniguchi; Yasuhiro Kamiya

J. Vac. Sci. Technol. B 28, C6M23–C6M27 (2010) https://doi.org/10.1116/1.3503896

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Characterizations of nanoembossed $Pb ({Zr}_{0.3}, {Ti}_{0.7}) O_{3}$ ferroelectric films

Zhenkui Shen; Zhihui Chen; Qian Lu; Anquan Jiang; Zhijun Qiu; Xinping Qu; Yifang Chen; Ran Liu

J. Vac. Sci. Technol. B 28, C6M28–C6M31 (2010) https://doi.org/10.1116/1.3497018

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Electrical properties of transferred metal nanopattern using metal oxide release layer

Noriyuki Unno; Jun Taniguchi; Shouichi Ide

J. Vac. Sci. Technol. B 28, C6M32–C6M36 (2010) https://doi.org/10.1116/1.3501352

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Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography

Arne Schleunitz; Christian Spreu; Tomi Haatainen; Anna Klukowska; Helmut Schift

J. Vac. Sci. Technol. B 28, C6M37–C6M40 (2010) https://doi.org/10.1116/1.3497022

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Fabrication of ordered nanospheres using a combination of nanoimprint lithography and controlled dewetting

Arne Schleunitz; Christian Spreu; JaeJong Lee; Helmut Schift

J. Vac. Sci. Technol. B 28, C6M41–C6M44 (2010) https://doi.org/10.1116/1.3498762

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Fabrication of seamless three-dimensional roll mold using direct electron-beam writing on rotating cylindrical substrate

Jun Taniguchi; Shintaro Tsuji; Masao Aratani

J. Vac. Sci. Technol. B 28, C6M45–C6M49 (2010) https://doi.org/10.1116/1.3511474

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Facile wide-scale defect detection of UV-nanoimprinted resist patterns by fluorescent microscopy

Kei Kobayashi; Shoichi Kubo; Shinji Matsui; Masaru Nakagawa

J. Vac. Sci. Technol. B 28, C6M50–C6M56 (2010) https://doi.org/10.1116/1.3507440

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High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application

G. Kreindl; T. Glinsner; R. Miller; D. Treiblmayr; R. Födisch

J. Vac. Sci. Technol. B 28, C6M57–C6M62 (2010) https://doi.org/10.1116/1.3518914

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Hole mobility enhancement by chain alignment in nanoimprinted poly(3-hexylthiophene) nanogratings for organic electronics

Min Zhou; Mukti Aryal; Kamil Mielczarek; Anvar Zakhidov; Walter Hu

J. Vac. Sci. Technol. B 28, C6M63–C6M67 (2010) https://doi.org/10.1116/1.3501343

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Impact of molecular size on resist filling process in nanoimprint lithography: Molecular dynamics study

Akihiro Taga; Masaaki Yasuda; Hiroaki Kawata; Yoshihiko Hirai

J. Vac. Sci. Technol. B 28, C6M68–C6M71 (2010) https://doi.org/10.1116/1.3511434

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Defect analysis for patterned media

Zhengmao Ye; John Fretwell; Kang Luo; Steven Ha; Gerard Schmid; Dwayne LaBrake; Douglas J. Resnick; S. V. Sreenivasan

J. Vac. Sci. Technol. B 28, C6M7–C6M11 (2010) https://doi.org/10.1116/1.3498752

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Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography

A. Francone; C. Iojoiu; C. Poulain; C. Lombard; B. Pépin-Donat; J. Boussey; M. Zelsmann

J. Vac. Sci. Technol. B 28, C6M72–C6M76 (2010) https://doi.org/10.1116/1.3501339

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Impact of substrate deformation on demolding force for thermal imprint process

H. Kawata; Y. Watanabe; N. Fujikawa; M. Yasuda; Y. Hirai

J. Vac. Sci. Technol. B 28, C6M77–C6M82 (2010) https://doi.org/10.1116/1.3517537

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Imprinted quarter wave plate at terahertz frequency

Shimul C. Saha; Yong Ma; James P. Grant; A. Khalid; David R. S. Cumming

J. Vac. Sci. Technol. B 28, C6M83–C6M87 (2010) https://doi.org/10.1116/1.3497023

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Long-range ordered aluminum oxide nanotubes by nanoimprint-assisted aluminum film surface engineering

Kunbae Noh; Chulmin Choi; Jin-Yeol Kim; Young Oh; Karla S. Brammer; Mariana C. Loya; Sungho Jin

J. Vac. Sci. Technol. B 28, C6M88–C6M92 (2010) https://doi.org/10.1116/1.3498759

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Nanofabrication of surface-enhanced Raman scattering device by an integrated block-copolymer and nanoimprint lithography method

E. L. Yang; C. C. Liu; C. Y. P. Yang; C. A. Steinhaus; P. F. Nealey; J. L. Skinner

J. Vac. Sci. Technol. B 28, C6M93–C6M97 (2010) https://doi.org/10.1116/1.3501341

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Nanoimprinting for diffractive light trapping in solar cells

Dirk N. Weiss; Hao-Chih Yuan; Benjamin G. Lee; Howard M. Branz; Stephen T. Meyers; Andrew Grenville; Douglas A. Keszler

J. Vac. Sci. Technol. B 28, C6M98–C6M103 (2010) https://doi.org/10.1116/1.3498754

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Nanomechanics

Microelectromechanical systems for biomimetical applications

Rhonira Latif; Enrico Mastropaolo; Andy Bunting; Rebecca Cheung; Thomas Koickal; Alister Hamilton; Michael Newton; Leslie Smith

J. Vac. Sci. Technol. B 28, C6N1–C6N6 (2010) https://doi.org/10.1116/1.3504892

Abstract

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Micromachined scanning proximal probes with integrated piezoresistive readout and bimetal actuator for high eigenmode operation

Mirosław Woszczyna; Paweł Zawierucha; Piotr Pałetko; Michał Zielony; Teodor Gotszalk; Yanko Sarov; Tzvetan Ivanov; Andreas Frank; Jens-Peter Zöllner; Ivo W. Rangelow

J. Vac. Sci. Technol. B 28, C6N12–C6N17 (2010) https://doi.org/10.1116/1.3518465

Abstract

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Piezoelectrically driven silicon carbide resonators

Enrico Mastropaolo; Isaac Gual; Graham Wood; Andrew Bunting; Rebecca Cheung

J. Vac. Sci. Technol. B 28, C6N18–C6N23 (2010) https://doi.org/10.1116/1.3498760

Abstract

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Microfabricated resistive high-sensitivity nanoprobe for scanning thermal microscopy

G. Wielgoszewski; P. Sulecki; T. Gotszalk; P. Janus; D. Szmigiel; P. Grabiec; E. Zschech

J. Vac. Sci. Technol. B 28, C6N7–C6N11 (2010) https://doi.org/10.1116/1.3502614

Abstract

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Nanophotonics

On the fabrication of three-dimensional silicon-on-insulator based optical phased array for agile and large angle laser beam steering systems

Amir Hosseini; David Kwong; Yang Zhang; Saurabh A. Chandorkar; Filip Crnogorac; Andrew Carlson; Babak Fallah; Seth Bank; Emanuel Tutuc; John Rogers; R. Fabian W. Pease; Ray T. Chen

J. Vac. Sci. Technol. B 28, C6O1–C6O7 (2010) https://doi.org/10.1116/1.3511508

Abstract

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Colloidal optical waveguides with integrated local light sources built by capillary force assembly

O. Lecarme; T. Pinedo Rivera; L. Arbez; T. Honegger; K. Berton; D. Peyrade

J. Vac. Sci. Technol. B 28, C6O11–C6O15 (2010) https://doi.org/10.1116/1.3503897

Abstract

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Resonant coupling to a dipole absorber inside a metamaterial: Anticrossing of the negative index response

Svyatoslav Smolev; Zahyun Ku; S. R. J Brueck; Igal Brener; Michael B. Sinclair; Gregory A. Ten Eyck; W. L. Langston; Lorena I. Basilio

J. Vac. Sci. Technol. B 28, C6O16–C6O20 (2010) https://doi.org/10.1116/1.3503898

Abstract

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Fabrication and characterization of coupled metal-dielectric-metal nanoantennas

Bhuwan Joshi; Xuejin Wen; Kai Sun; Wu Lu; Qi-Huo Wei

J. Vac. Sci. Technol. B 28, C6O21–C6O25 (2010) https://doi.org/10.1116/1.3501349

Abstract

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Fabrication of nanostar arrays by nanoimprint lithography

Teodor Veres; Bo Cui; Liviu Clime

J. Vac. Sci. Technol. B 28, C6O26–C6O29 (2010) https://doi.org/10.1116/1.3504890

Abstract

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Fabrication techniques for three-dimensional metamaterials in the midinfrared

J. R. Wendt; D. B. Burckel; G. A. Ten Eyck; A. R. Ellis; I. Brener; M. B. Sinclair

J. Vac. Sci. Technol. B 28, C6O30–C6O33 (2010) https://doi.org/10.1116/1.3504586

Abstract

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Self-aligned gold nanocone probe tips

B. Zeeb; S. Jäger; C. Schäfer; P. Nill; A. J. Meixner; D. P. Kern; M. Fleischer

J. Vac. Sci. Technol. B 28, C6O34–C6O37 (2010) https://doi.org/10.1116/1.3518461

Abstract

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Large area three-dimensional photonic crystals with embedded waveguides

Alex K. Raub; S. R. J. Brueck

J. Vac. Sci. Technol. B 28, C6O38–C6O44 (2010) https://doi.org/10.1116/1.3507887

Abstract

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Sub-10 nm patterning of gold nanostructures on silicon-nitride membranes for plasmon mapping with electron energy-loss spectroscopy

Ai Leen Koh; David W. McComb; Stefan A. Maier; H. Y. Low; Joel K. W. Yang

J. Vac. Sci. Technol. B 28, C6O45–C6O49 (2010) https://doi.org/10.1116/1.3501351

Abstract

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Geometry enhanced asymmetric rectifying tunneling diodes

Kwangsik Choi; Geunmin Ryu; Filiz Yesilkoy; Athanasios Chryssis; Neil Goldsman; Mario Dagenais; Martin Peckerar

J. Vac. Sci. Technol. B 28, C6O50–C6O55 (2010) https://doi.org/10.1116/1.3501350

Abstract

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Waveguide-plasmon resonances in gold-capped silicon-nitride disk photonic crystal slabs

Jia-Hong Shyu; Huang-Ming Lee; Jui-Hsing Chien; Jong-Ching Wu

J. Vac. Sci. Technol. B 28, C6O56–C6O59 (2010) https://doi.org/10.1116/1.3518460

Abstract

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Multilayer pattern transfer for plasmonic color filter applications

Alex F. Kaplan; Ting Xu; Yi-Kuei Wu; L. Jay Guo

J. Vac. Sci. Technol. B 28, C6O60–C6O63 (2010) https://doi.org/10.1116/1.3511430

Abstract

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Tunable optofluidic nano-Bragg microcavity filter

A. S. Jugessur; J. Dou; J. S. Aitchison

J. Vac. Sci. Technol. B 28, C6O8–C6O10 (2010) https://doi.org/10.1116/1.3498763

Abstract

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Nanostructures

Batch wafer scale fabrication of passivated carbon nanotube transistors for electrochemical sensing applications

I. Martin-Fernandez; X. Borrisé; E. Lora-Tamayo; P. Godignon; F. Perez-Murano

J. Vac. Sci. Technol. B 28, C6P1–C6P5 (2010) https://doi.org/10.1116/1.3504527

Abstract

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Direct synthesis of vertical $α {-Fe}_{2} O_{3}$ nanowires from sputtered Fe thin film

Keisuke Nagato; Masaki Furubayashi; Tetsuya Hamaguchi; Masayuki Nakao

J. Vac. Sci. Technol. B 28, C6P11–C6P13 (2010) https://doi.org/10.1116/1.3501363

Abstract

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Pyrolysis of two-dimensional and three-dimensional interferometrically patterned resist structures

D. B. Burckel; C. M. Washburn; D. D. Koleske; R. Polsky

J. Vac. Sci. Technol. B 28, C6P14–C6P17 (2010) https://doi.org/10.1116/1.3495756

Abstract

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Fabrication and initial characterization of ultrahigh aspect ratio vias in gold using the helium ion microscope

Larry Scipioni; David C. Ferranti; Vincent S. Smentkowski; Radislav A. Potyrailo

J. Vac. Sci. Technol. B 28, C6P18–C6P23 (2010) https://doi.org/10.1116/1.3517514

Abstract

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Supplementary Material

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Fabrication of poly(ethylene glycol) hydrogel structures for pharmaceutical applications using electron beam and optical lithography

Misuk Bae; Richard A. Gemeinhart; Ralu Divan; Kamlesh J. Suthar; Derrick C. Mancini

J. Vac. Sci. Technol. B 28, C6P24–C6P29 (2010) https://doi.org/10.1116/1.3517716

Abstract

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Nanofabrication of x-ray zone plates using ultrananocrystalline diamond molds and electroforming

Michael J. Wojcik; Vishwanath Joshi; Anirudha V. Sumant; Ralu Divan; Leonidas E. Ocola; Ming Lu; Derrick C. Mancini

J. Vac. Sci. Technol. B 28, C6P30–C6P35 (2010) https://doi.org/10.1116/1.3501357

Abstract

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Nanomachining and clamping point optimization of silicon carbon nitride resonators using low voltage electron beam lithography and cold development

M. A. Mohammad; C. Guthy; S. Evoy; S. K. Dew; M. Stepanova

J. Vac. Sci. Technol. B 28, C6P36–C6P41 (2010) https://doi.org/10.1116/1.3517683

Abstract

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Nanoporous ultrananocrystalline diamond membranes

Olga Makarova; Ralu Divan; Nicolaie Moldovan; Daniel Rosenmann; Cha-Mei Tang

J. Vac. Sci. Technol. B 28, C6P42–C6P47 (2010) https://doi.org/10.1116/1.3501345

Abstract

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Nanostructured silicon membranes for control of molecular transport

Bernadeta R. Srijanto; Scott T. Retterer; Jason D. Fowlkes; Mitchel J. Doktycz

J. Vac. Sci. Technol. B 28, C6P48–C6P52 (2010) https://doi.org/10.1116/1.3518911

Abstract

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Semiconductor crystal islands for three-dimensional integration

F. Crnogorac; S. Wong; R. F. W. Pease

J. Vac. Sci. Technol. B 28, C6P53–C6P58 (2010) https://doi.org/10.1116/1.3511473

Abstract

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Structure and properties of polymer core-shell systems: Helium ion microscopy and electrical conductivity studies

Valery Bliznyuk; Alexander Pud; Larry Scipioni; Chuong Huynh; Nikolay Ogurtsov; David Ferranti

J. Vac. Sci. Technol. B 28, C6P59–C6P65 (2010) https://doi.org/10.1116/1.3504589

Abstract

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Copper-plated 50 nm $T$ -gate fabrication

Richard K. Oxland; Xu Li; Susan Ferguson; Steven Bentley; Iain G. Thayne

J. Vac. Sci. Technol. B 28, C6P6–C6P10 (2010) https://doi.org/10.1116/1.3501346

Abstract

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Noise analysis of carbon nanotube field effect transistors irradiated by electron beam

Jack Chan; Deborah Kidd; Brian Burke; Lloyd Harriott; Keith Williams

J. Vac. Sci. Technol. B 28, C6P66–C6P69 (2010) https://doi.org/10.1116/1.3517517

Abstract

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Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch

Pran Mukherjee; Alexander Bruccoleri; Ralf K. Heilmann; Mark L. Schattenburg; Alex F. Kaplan; L. Jay Guo

J. Vac. Sci. Technol. B 28, C6P70–C6P75 (2010) https://doi.org/10.1116/1.3507427

Abstract

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Novel Imaging-Optical Lithography

Optical and computed evaluation of keyhole diffractive imaging for lensless x-ray microscopy

Bing Dai; Diling Zhu; Ronnachai Jaroensri; Kanokwan Kulalert; Piero Pianetta; R. Fabian W. Pease

J. Vac. Sci. Technol. B 28, C6Q1–C6Q5 (2010) https://doi.org/10.1116/1.3501340

Abstract

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Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging

P. Xie; B. W. Smith

J. Vac. Sci. Technol. B 28, C6Q12–C6Q19 (2010) https://doi.org/10.1116/1.3504550

Abstract

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Development of a simple, compact, low-cost interference lithography system

Hasan Korre; Corey P. Fucetola; Jeremy A. Johnson; Karl K. Berggren

J. Vac. Sci. Technol. B 28, C6Q20–C6Q24 (2010) https://doi.org/10.1116/1.3504498

Abstract

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Nondestructive detection of deviation in integrated circuits

Leili Baghaei; Bing Dai; Piero Pianetta; R. Fabian W. Pease

J. Vac. Sci. Technol. B 28, C6Q25–C6Q27 (2010) https://doi.org/10.1116/1.3518464

Abstract

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Customized illumination for process window optimization and yield improvement in mask aligner lithography systems

Michael Hornung; Uwe Vogler; Reinhard Voelkel

J. Vac. Sci. Technol. B 28, C6Q6–C6Q11 (2010) https://doi.org/10.1116/1.3518920

Abstract

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Resists

Impact of development chemistry on extreme ultraviolet resist performance

Roel Gronheid

J. Vac. Sci. Technol. B 28, C6S1–C6S5 (2010) https://doi.org/10.1116/1.3498751

Abstract

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High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors

Richard A. Lawson; Laren M. Tolbert; Clifford L. Henderson

J. Vac. Sci. Technol. B 28, C6S12–C6S18 (2010) https://doi.org/10.1116/1.3511790

Abstract

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Photopatternable inorganic hardmask

Alan Telecky; Peng Xie; Jason Stowers; Andrew Grenville; Bruce Smith; Douglas A. Keszler

J. Vac. Sci. Technol. B 28, C6S19–C6S22 (2010) https://doi.org/10.1116/1.3507889

Abstract

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Effects of salty-developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense pattern transfer

M. Yan; J. Lee; B. Ofuonye; S. Choi; J. H. Jang; I. Adesida

J. Vac. Sci. Technol. B 28, C6S23–C6S27 (2010) https://doi.org/10.1116/1.3504497

Abstract

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Comparison of positive tone versus negative tone resist pattern collapse behavior

Wei-Ming Yeh; David E. Noga; Richard A. Lawson; Laren M. Tolbert; Clifford L. Henderson

J. Vac. Sci. Technol. B 28, C6S6–C6S11 (2010) https://doi.org/10.1116/1.3518136

Abstract

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Letters

Sputtering of (001)AlN thin films: Control of polarity by a seed layer

E. Milyutin; S. Harada; D. Martin; J. F. Carlin; N. Grandjean; V. Savu; O. Vaszquez-Mena; J. Brugger; P. Muralt

J. Vac. Sci. Technol. B 28, L61–L63 (2010) https://doi.org/10.1116/1.3501117

Abstract

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Editorial

Gerry Lucovsky

J. Vac. Sci. Technol. B 28, P1 (2010) https://doi.org/10.1116/1.3511696

Extract

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