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September 2008

This content was originally published in

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena

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ISSN 1071-1023

EISSN 1520-8567

In this Issue

Articles
Brief Reports and Comments
Shop Notes
Letters

Articles

Study of $193 nm$ photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation

M. Sumiya; R. Bruce; S. Engelmann; F. Weilnboeck; G. S. Oehrlein

J. Vac. Sci. Technol. B 26, 1637–1646 (2008) https://doi.org/10.1116/1.2960561

Abstract

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Study of $193 nm$ photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation

M. Sumiya; R. Bruce; S. Engelmann; F. Weilnboeck; G. S. Oehrlein

J. Vac. Sci. Technol. B 26, 1647–1653 (2008) https://doi.org/10.1116/1.2960563

Abstract

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Comparative study of thermally cured and electron-beam-exposed hydrogen silsesquioxane resists

Sookyung Choi; Michael J. Word; Vipan Kumar; Ilesanmi Adesida

J. Vac. Sci. Technol. B 26, 1654–1659 (2008) https://doi.org/10.1116/1.2960565

Abstract

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Nanofabrication by mechanical and electrical processes using electrically conductive diamond tip

Shojiro Miyake; Haifeng Zheng; Jongduk Kim; Mei Wang

J. Vac. Sci. Technol. B 26, 1660–1665 (2008) https://doi.org/10.1116/1.2965815

Abstract

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Sub- $50 - nm$ track pitch mold using electron beam lithography for discrete track recording media

R. Sbiaa; E. L. Tan; R. M. Seoh; K. O. Aung; S. K. Wong; S. N. Piramanayagam

J. Vac. Sci. Technol. B 26, 1666–1669 (2008) https://doi.org/10.1116/1.2966426

Abstract

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Oxidation behavior of ${In}_{95} {Sn}_{5}$ solid solution

S. Ramasamy; V. Sabarinathan; Nipun Agarwal; David J. Smith

J. Vac. Sci. Technol. B 26, 1670–1674 (2008) https://doi.org/10.1116/1.2966429

Abstract

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Comparative study of ${Cl}_{2}$ ⁠, ${Cl}_{2} ∕ O_{2}$ ⁠, and ${Cl}_{2} ∕ N_{2}$ inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP

C. F. Carlström; R. van der Heijden; M. S. P. Andriesse; F. Karouta; R. W. van der Heijden; E. van der Drift; H. W. M. Salemink

J. Vac. Sci. Technol. B 26, 1675–1683 (2008) https://doi.org/10.1116/1.2968696

Abstract

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Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography

Yuk-Hong Ting; Sang-Min Park; Chi-Chun Liu; Xiaosong Liu; F. J. Himpsel; Paul F. Nealey; Amy E. Wendt

J. Vac. Sci. Technol. B 26, 1684–1689 (2008) https://doi.org/10.1116/1.2966433

Abstract

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Fabrication of concave gratings by curved surface UV-nanoimprint lithography

Yung-Pin Chen; Yuet-Ping Lee; Jer-Haur Chang; Lon A. Wang

J. Vac. Sci. Technol. B 26, 1690–1695 (2008) https://doi.org/10.1116/1.2968702

Abstract

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Growth of nitrogen doped ZnO films through a nitrogen diffusion process from WN films formed by a cosputtering technique

Jonghyun Lee; Jaehwan Ha; Jinpyo Hong; Seungnam Cha; Ungyu Paik

J. Vac. Sci. Technol. B 26, 1696–1699 (2008) https://doi.org/10.1116/1.2968706

Abstract

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Field-emission fluorescent lamp using carbon nanotubes on a wire-type cold cathode and a reflecting anode

J. X. Huang; Jun Chen; S. Z. Deng; J. C. She; N. S. Xu

J. Vac. Sci. Technol. B 26, 1700–1704 (2008) https://doi.org/10.1116/1.2970144

Abstract

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Fabrication and properties of Cu–Ni mixed-metal periodical array for midinfrared filtering and hydrophobic application

Wen-Hsien Huang; Yu-Lin Yang; Shich-Chuan Wu

J. Vac. Sci. Technol. B 26, 1705–1711 (2008) https://doi.org/10.1116/1.2975202

Abstract

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Correlation of the growth rate for selective epitaxial growth of silicon and oxide thickness and oxide coverage in a reduced pressure chemical vapor deposition pancake reactor

Kung-Yen Lee

J. Vac. Sci. Technol. B 26, 1712–1717 (2008) https://doi.org/10.1116/1.2976567

Abstract

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Optical properties and critical-point energies of $Ba Ti O_{3}$ (001) from $1.5 to 5.2 eV$

S. G. Choi; A. M. Dattelbaum; S. T. Picraux; S. K. Srivastava; C. J. Palmstrøm

J. Vac. Sci. Technol. B 26, 1718–1722 (2008) https://doi.org/10.1116/1.2976569

Abstract

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Comparative study of ZrN and Zr–Ge–N thin films as diffusion barriers for Cu metallization on Si

L. C. Leu; P. Sadik; D. P. Norton; L. McElwee-White; T. J. Anderson

J. Vac. Sci. Technol. B 26, 1723–1727 (2008) https://doi.org/10.1116/1.2976571

Abstract

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Nanochannels fabricated in polydimethylsiloxane using sacrificial electrospun polyethylene oxide nanofibers

Leon M. Bellan; Elizabeth A. Strychalski; Harold G. Craighead

J. Vac. Sci. Technol. B 26, 1728–1731 (2008) https://doi.org/10.1116/1.2975199

Abstract

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Supplementary Material

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Programmable proximity aperture lithography with MeV ion beams

Nitipon Puttaraksa; Sergey Gorelick; Timo Sajavaara; Mikko Laitinen; Somsorn Singkarat; Harry J. Whitlow

J. Vac. Sci. Technol. B 26, 1732–1739 (2008) https://doi.org/10.1116/1.2978173

Abstract

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Comparison of selective Ge growth in $Si O_{2}$ trenches on Si(001) and on blanket Si(001) substrates: Surface roughness and doping

J.-S. Park; M. Curtin; J. M. Hydrick; M. Carroll; J. G. Fiorenza; A. Lochtefeld; S. Novak

J. Vac. Sci. Technol. B 26, 1740–1744 (2008) https://doi.org/10.1116/1.2981073

Abstract

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Large areas of periodic nanoholes perforated in multistacked films produced by lift-off

Wei Wu; Dibyendu Dey; Alex Katsnelson; Omer G. Memis; Hooman Mohseni

J. Vac. Sci. Technol. B 26, 1745–1747 (2008) https://doi.org/10.1116/1.2982240

Abstract

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Self-aligned metal-contact and passivation technique for submicron ridge waveguide laser fabrication

J. H. Teng; E. L. Lim; S. J. Chua; S. S. Ang; L. F. Chong; J. R. Dong; R. Yin

J. Vac. Sci. Technol. B 26, 1748–1752 (2008) https://doi.org/10.1116/1.2982246

Abstract

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Iterative imprint for multilayered nanostructures by feeding, vacuum forming, and bonding of sheets

Hideaki Suzuki; Keisuke Nagato; Shuntaro Sugimoto; Kensuke Tsuchiya; Tetsuya Hamaguchi; Masayuki Nakao

J. Vac. Sci. Technol. B 26, 1753–1756 (2008) https://doi.org/10.1116/1.2982243

Abstract

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Electron field emission from $Zn O_{x}$ nanoparticles decorated on vertically aligned carbon nanotubes prepared by vapor-phase transport

A. Wisitsoraat; A. Tuantranont; V. Patthanasettakul; S. Mongpraneet

J. Vac. Sci. Technol. B 26, 1757–1760 (2008) https://doi.org/10.1116/1.2975201

Abstract

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Fabrication of gold tips suitable for tip-enhanced Raman spectroscopy

Craig Williams; Debdulal Roy

J. Vac. Sci. Technol. B 26, 1761–1764 (2008) https://doi.org/10.1116/1.2981078

Abstract

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Effect of ZnO catalyst on carbon nanotube growth by thermal chemical vapor deposition

Shih-Fong Lee; Yung-Ping Chang; Li-Ying Lee

J. Vac. Sci. Technol. B 26, 1765–1770 (2008) https://doi.org/10.1116/1.2981084

Abstract

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Single-pass forming for three-dimensional microstructures by high-speed shearing of multilayer thin films

Tetsuya Hamaguchi; Hiroki Yonemoto; Keisuke Nagato; Kensuke Tsuchiya; Masayuki Nakao

J. Vac. Sci. Technol. B 26, 1771–1774 (2008) https://doi.org/10.1116/1.2982241

Abstract

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ArF resist-friendly etching technology

Toshio Hayashi; Yasuhiro Morikawa; Koukou Suu; Michio Ishikawa

J. Vac. Sci. Technol. B 26, 1775–1781 (2008) https://doi.org/10.1116/1.2975198

Abstract

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Specific spectral features in electron emission from nanocrystalline silicon quasi-ballistic cold cathode detected by an angle-resolved high resolution analyzer

Daisuke Sakai; Chunhei Oshima; Toshiyuki Ohta; Nobuyoshi Koshida

J. Vac. Sci. Technol. B 26, 1782–1786 (2008) https://doi.org/10.1116/1.2975203

Abstract

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Deposition of $Ni O_{x}$ thin films with radio frequency magnetron sputtering and their characteristics as a source/drain electrode for the pentacene thin film transistor

Dong-Jin Yun; Shi-Woo Rhee

J. Vac. Sci. Technol. B 26, 1787–1793 (2008) https://doi.org/10.1116/1.2981075

Abstract

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Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications

J. Kettle; R. T. Hoyle; R. M. Perks; S. Dimov

J. Vac. Sci. Technol. B 26, 1794–1799 (2008) https://doi.org/10.1116/1.2981081

Abstract

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Deposition of $W N_{x} C_{y}$ for diffusion barrier application using the imido guanidinato complex $W (N^{i} \Pr) {Cl}_{3} [{}^{i}\Pr N C (N {Me}_{2}) N^{i} \Pr]$

Hiral M. Ajmera; Andrew T. Heitsch; Timothy J. Anderson; Corey B. Wilder; Laurel L. Reitfort; Lisa McElwee-White; David P. Norton

J. Vac. Sci. Technol. B 26, 1800–1807 (2008) https://doi.org/10.1116/1.2981082

Abstract

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Transferring optical proximity correction effects into a process model

Jianliang Li; Qiliang Yan; Lawrence S. Melvin, III

J. Vac. Sci. Technol. B 26, 1808–1812 (2008) https://doi.org/10.1116/1.2981085

Abstract

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Use of ion beam assisted deposition and low temperature annealing for the fabrication of low loss, vertically stacked alumina waveguide structures

J. R. Nightingale; R. Goswami; J. Duperre; J. M. Dawson; L. A. Hornak; D. Korakakis

J. Vac. Sci. Technol. B 26, 1813–1816 (2008) https://doi.org/10.1116/1.2981080

Abstract

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Brief Reports and Comments

Nonvolatile memory and antifuse behavior in $Pt ∕ a - Ti O_{2} ∕ Ag$ structures

T. Busani; R. A. B. Devine

J. Vac. Sci. Technol. B 26, 1817–1820 (2008) https://doi.org/10.1116/1.2966424

Abstract

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Shop Notes

Electron-beam lithography of multiple-layer submicrometer periodic arrays on a barium fluoride substrate

J. S. Tharp; D. J. Shelton; S. L. Wadsworth; G. D. Boreman

J. Vac. Sci. Technol. B 26, 1821–1823 (2008) https://doi.org/10.1116/1.2966431

Extract

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Letters

Study of substrate-directed ordering of long double-stranded DNA molecules on bare highly oriented pyrolytic graphite surface based on atomic force microscopy relocation imaging

Huabin Wang; Hongjie An; Feng Zhang; Zhixiang Zhang; Ming Ye; Peng Xiu; Yi Zhang; Jun Hu

J. Vac. Sci. Technol. B 26, L41–L44 (2008) https://doi.org/10.1116/1.2968698

Abstract

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