Skip Nav Destination

Issues

Select Year

Issue

Review Article

Extreme ultraviolet lithography: A review

Banqiu Wu; Ajay Kumar

J. Vac. Sci. Technol. B 25, 1743–1761 (2007) https://doi.org/10.1116/1.2794048

Abstract

View articletitled, Extreme ultraviolet lithography: A review

Open the PDF for in another window

Regular Articles

Effect of process parameters on via formation in Si using deep reactive ion etching

I. U. Abhulimen; S. Polamreddy; S. Burkett; L. Cai; L. Schaper

J. Vac. Sci. Technol. B 25, 1762–1770 (2007) https://doi.org/10.1116/1.2787869

Abstract

View articletitled, Effect of process parameters on via formation in Si using deep reactive ion etching

Open the PDF for in another window

Fabrication of a Fresnel zone plate through electron beam lithographic process and its application to measuring of critical dimension scanning electron microscope performance

J. Kim; K. Jalhadi; S.-Y. Lee; D. C. Joy

J. Vac. Sci. Technol. B 25, 1771–1775 (2007) https://doi.org/10.1116/1.2787874

Abstract

View articletitled, Fabrication of a Fresnel zone plate through electron beam lithographic process and its application to measuring of critical dimension scanning electron microscope performance

Open the PDF for in another window

Defects in HgTe grown by molecular beam epitaxy on (211)B-oriented CdZnTe substrates

E. Selvig; C. R. Tonheim; K. O. Kongshaug; T. Skauli; T. Lorentzen; R. Haakenaasen

J. Vac. Sci. Technol. B 25, 1776–1784 (2007) https://doi.org/10.1116/1.2787876

Abstract

View articletitled, Defects in HgTe grown by molecular beam epitaxy on (211)B-oriented CdZnTe substrates

Open the PDF for in another window

Enhanced field emission from carbon nanotubes with a thin layer of low work function barium strontium oxide surface coating

Feng Jin; Yan Liu; Christopher M. Day; Scott A. Little

J. Vac. Sci. Technol. B 25, 1785–1788 (2007) https://doi.org/10.1116/1.2790914

Abstract

View articletitled, Enhanced field emission from carbon nanotubes with a thin layer of low work function barium strontium oxide surface coating

Open the PDF for in another window

Development of chemical-mechanical polished high-resolution zone plates

Stefan Rehbein; Peter Guttmann; Stephan Werner; Gerd Schneider

J. Vac. Sci. Technol. B 25, 1789–1793 (2007) https://doi.org/10.1116/1.2790917

Abstract

View articletitled, Development of chemical-mechanical polished high-resolution zone plates

Open the PDF for in another window

Electrical properties and deep traps in ZnO films grown by molecular beam epitaxy

A. Y. Polyakov; N. B. Smirnov; A. I. Belogorokhov; A. V. Govorkov; E. A. Kozhukhova; A. V. Osinsky; J. Q. Xie; B. Hertog; S. J. Pearton

J. Vac. Sci. Technol. B 25, 1794–1798 (2007) https://doi.org/10.1116/1.2790918

Abstract

View articletitled, Electrical properties and deep traps in ZnO films grown by molecular beam epitaxy

Open the PDF for in another window

Proposed single layer composite film used as high transmission phase shifting masks for the 32, 45, and $65 nm$ technology nodes

Fu-Der Lai; Jian Long Huang

J. Vac. Sci. Technol. B 25, 1799–1803 (2007) https://doi.org/10.1116/1.2790920

Abstract

View articletitled, Proposed single layer composite film used as high transmission phase shifting masks for the 32, 45, and <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>65</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> technology nodes

Open the PDF for in another window

Critical parameter determination of sonic flow controller diamond microtubes and micronozzles

S. S. Mammana; F. T. Degasperi; M. C. Salvadori; D. C. Sparapani; M. F. Laino; R. C. Rangel; F. S. Teixeira; M. Cattani

J. Vac. Sci. Technol. B 25, 1804–1807 (2007) https://doi.org/10.1116/1.2790924

Abstract

View articletitled, Critical parameter determination of sonic flow controller diamond microtubes and micronozzles

Open the PDF for in another window

On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during $Si O_{2}$ etching process

Butsurin Jinnai; Toshiyuki Orita; Mamoru Konishi; Jun Hashimoto; Yoshinari Ichihashi; Akito Nishitani; Shingo Kadomura; Hiroto Ohtake; Seiji Samukawa

J. Vac. Sci. Technol. B 25, 1808–1813 (2007) https://doi.org/10.1116/1.2794050

Abstract

View articletitled, On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Si</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> etching process

Open the PDF for in another window

Influence of $Ru O_{2}$ nanoparticles on electron emission from carbon nanotubes

Huarong Liu; Tsuneyuki Noguchi; Shigeki Kato

J. Vac. Sci. Technol. B 25, 1814–1818 (2007) https://doi.org/10.1116/1.2794053

Abstract

View articletitled, Influence of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Ru</mi><msub><mi mathvariant="normal">O</mi><mn>2</mn></msub></mrow></math> nanoparticles on electron emission from carbon nanotubes

Open the PDF for in another window

Yield improvement of $0.13 μ m$ Cu/low- $k$ dual-damascene interconnection by organic cleaning process

Nam-Hoon Kim; Sang-Yong Kim; Hyun-Ki Lee; Kang-Yeon Lee; Chang-Il Kim; Eui-Goo Chang

J. Vac. Sci. Technol. B 25, 1819–1822 (2007) https://doi.org/10.1116/1.2794049

Abstract

View articletitled, Yield improvement of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>0.13</mn><mspace width="0.3em"></mspace><mi>μ</mi><mi mathvariant="normal">m</mi></mrow></math> Cu/low-<math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">k</mi></math> dual-damascene interconnection by organic cleaning process

Open the PDF for in another window

Growth of ZnSe nanowires by pulsed-laser deposition

Tinwei Zhang; Yiqun Shen; Wei Hu; Jian Sun; Jiada Wu; Zhifeng Ying; Ning Xu

J. Vac. Sci. Technol. B 25, 1823–1826 (2007) https://doi.org/10.1116/1.2794052

Abstract

View articletitled, Growth of ZnSe nanowires by pulsed-laser deposition

Open the PDF for in another window

Fabrication of periodic microstructures on flexible polyimide membranes

D. J. Shelton; J. S. Tharp; G. Zummo; W. R. Folks; G. D. Boreman

J. Vac. Sci. Technol. B 25, 1827–1831 (2007) https://doi.org/10.1116/1.2794054

Abstract

View articletitled, Fabrication of periodic microstructures on flexible polyimide membranes

Open the PDF for in another window

Evolution of surface morphology of GaN thin films during photoelectrochemical etching

J. H. Leach; Ü. Özgür; H. Morkoç

J. Vac. Sci. Technol. B 25, 1832–1835 (2007) https://doi.org/10.1116/1.2794055

Abstract

View articletitled, Evolution of surface morphology of GaN thin films during photoelectrochemical etching

Open the PDF for in another window

C-doped semi-insulating GaN HFETs on sapphire substrates with a high breakdown voltage and low specific on-resistance

Y. C. Choi; J. Shi; M. Pophristic; M. G. Spencer; L. F. Eastman

J. Vac. Sci. Technol. B 25, 1836–1841 (2007) https://doi.org/10.1116/1.2794058

Abstract

View articletitled, C-doped semi-insulating GaN HFETs on sapphire substrates with a high breakdown voltage and low specific on-resistance

Open the PDF for in another window

Large-scale growth of single-walled carbon nanotubes using cold-wall chemical vapor deposition

K. Y. Shin; C. T. Lee; J. S. Kao; C. C. Kei; C. M. Chang; C. N. Hsiao; J. H. Liang; K. C. Leou; C. H. Tsai

J. Vac. Sci. Technol. B 25, 1842–1846 (2007) https://doi.org/10.1116/1.2796186

Abstract

View articletitled, Large-scale growth of single-walled carbon nanotubes using cold-wall chemical vapor deposition

Open the PDF for in another window

Formation of single crystal sulfur supersaturated silicon based junctions by pulsed laser melting

Malek Tabbal; Taegon Kim; Jeffrey M. Warrender; Michael J. Aziz; B. L. Cardozo; R. S. Goldman

J. Vac. Sci. Technol. B 25, 1847–1852 (2007) https://doi.org/10.1116/1.2796184

Abstract

View articletitled, Formation of single crystal sulfur supersaturated silicon based junctions by pulsed laser melting

Open the PDF for in another window

Effects and mechanisms of nitrogen incorporation into hafnium oxide by plasma immersion implantation

Hei Wong; Banani Sen; B. L. Yang; A. P. Huang; P. K. Chu

J. Vac. Sci. Technol. B 25, 1853–1858 (2007) https://doi.org/10.1116/1.2799969

Abstract

View articletitled, Effects and mechanisms of nitrogen incorporation into hafnium oxide by plasma immersion implantation

Open the PDF for in another window

Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks

Pei-yang Yan; Eberhard Spiller; Paul Mirkarimi

J. Vac. Sci. Technol. B 25, 1859–1866 (2007) https://doi.org/10.1116/1.2799963

Abstract

View articletitled, Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks

Open the PDF for in another window

Zero-dimensional analysis for discharge characteristics

Wontaek Park

J. Vac. Sci. Technol. B 25, 1867–1869 (2007) https://doi.org/10.1116/1.2798726

Abstract

View articletitled, Zero-dimensional analysis for discharge characteristics

Open the PDF for in another window

Highly selective zero-bias plasma etching of GaN over AlGaN

Michael L. Schuette; Wu Lu

J. Vac. Sci. Technol. B 25, 1870–1874 (2007) https://doi.org/10.1116/1.2796183

Abstract

View articletitled, Highly selective zero-bias plasma etching of GaN over AlGaN

Open the PDF for in another window

Structural and optical characterization of $W O_{3}$ nanorods/films prepared by oblique angle deposition

W. Smith; Z.-Y. Zhang; Y.-P. Zhao

J. Vac. Sci. Technol. B 25, 1875–1881 (2007) https://doi.org/10.1116/1.2799968

Abstract

View articletitled, Structural and optical characterization of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">W</mi><msub><mi mathvariant="normal">O</mi><mn>3</mn></msub></mrow></math> nanorods/films prepared by oblique angle deposition

Open the PDF for in another window

Ion energy control at substrates during plasma etching of patterned structures

R. Silapunt; A. E. Wendt; K. H. R. Kirmse

J. Vac. Sci. Technol. B 25, 1882–1887 (2007) https://doi.org/10.1116/1.2803723

Abstract

View articletitled, Ion energy control at substrates during plasma etching of patterned structures

Open the PDF for in another window

Thermal model for a superstrate cooling apparatus for an integrated in-line manufacturing process for thin film photovoltaic devices

R. A. Enzenroth; K. L. Barth; W. S. Sampath; V. Manivannan

J. Vac. Sci. Technol. B 25, 1888–1891 (2007) https://doi.org/10.1116/1.2803724

Abstract

View articletitled, Thermal model for a superstrate cooling apparatus for an integrated in-line manufacturing process for thin film photovoltaic devices

Open the PDF for in another window

Structure and magnetic property of $c$ -axis oriented $L 1_{0} -FePt$ nanoparticles on TiN/ $a$ -Si underlayers

Yoshiko Tsuji; Suguru Noda; Yukio Yamaguchi

J. Vac. Sci. Technol. B 25, 1892–1895 (2007) https://doi.org/10.1116/1.2803726

Abstract

View articletitled, Structure and magnetic property of <math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">c</mi></math>-axis oriented <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi>L</mi><msub><mn>1</mn><mn>0</mn></msub><mtext>-FePt</mtext></mrow></math> nanoparticles on TiN/<math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">a</mi></math>-Si underlayers

Open the PDF for in another window

Influence of different surface-passivation dielectrics on high-temperature strain relaxation of AlGaN in $Al Ga N ∕ Ga N$ heterostructures

D. J. Chen; Y. Q. Tao; C. Chen; Z. L. Xie; Z. Y. Zhai; X. S. Wu; P. Han; R. Zhang; Y. D. Zheng

J. Vac. Sci. Technol. B 25, 1896–1898 (2007) https://doi.org/10.1116/1.2803728

Abstract

View articletitled, Influence of different surface-passivation dielectrics on high-temperature strain relaxation of AlGaN in <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Al</mi><mi mathvariant="normal">Ga</mi><mi mathvariant="normal">N</mi><mo>∕</mo><mi mathvariant="normal">Ga</mi><mi mathvariant="normal">N</mi></mrow></math> heterostructures

Open the PDF for in another window

Effects of surface plasmon resonant scattering on the power conversion efficiency of organic thin-film solar cells

Y. C. Chang; F. Y. Chou; P. H. Yeh; H. W. Chen; S.-H. Chang; Y. C. Lan; T. F. Guo; T. C. Tsai; C. T. Lee

J. Vac. Sci. Technol. B 25, 1899–1902 (2007) https://doi.org/10.1116/1.2806959

Abstract

View articletitled, Effects of surface plasmon resonant scattering on the power conversion efficiency of organic thin-film solar cells

Open the PDF for in another window

Optimized plasma-deposited fluorocarbon coating for dry release and passivation of thin SU-8 cantilevers

Stephan Keller; Daniel Haefliger; Anja Boisen

J. Vac. Sci. Technol. B 25, 1903–1908 (2007) https://doi.org/10.1116/1.2806960

Abstract

View articletitled, Optimized plasma-deposited fluorocarbon coating for dry release and passivation of thin SU-8 cantilevers

Open the PDF for in another window

Structural characteristics of single-crystal nanowires grown by self-catalytic chemical vapor deposition method

Maoqi He; S. Noor Mohammad

J. Vac. Sci. Technol. B 25, 1909–1915 (2007) https://doi.org/10.1116/1.2804613

Abstract

View articletitled, Structural characteristics of single-crystal nanowires grown by self-catalytic chemical vapor deposition method

Open the PDF for in another window

Atomic diffusion and electronic structure in ${Al}_{0.52} {In}_{0.48} P ∕ Ga As$ heterostructures

P. E. Smith; M. Lueck; S. A. Ringel; L. J. Brillson

J. Vac. Sci. Technol. B 25, 1916–1921 (2007) https://doi.org/10.1116/1.2811705

Abstract

View articletitled, Atomic diffusion and electronic structure in <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">Al</mi><mn>0.52</mn></msub><msub><mi mathvariant="normal">In</mi><mn>0.48</mn></msub><mi mathvariant="normal">P</mi><mo>∕</mo><mi mathvariant="normal">Ga</mi><mi mathvariant="normal">As</mi></mrow></math> heterostructures

Open the PDF for in another window

Atomic layer deposited ${HfO}_{2} / {HfSi}_{x} O_{y} N_{z}$ stacked gate dielectrics for metal-oxide-semiconductor structures

Seokhoon Kim; Sanghyun Woo; Hyungchul Kim; Wooho Jeong; Taeyong Park; Honggyu Kim; Sung Bae Kim; Hyeongtag Jeon

J. Vac. Sci. Technol. B 25, 1922–1927 (2007) https://doi.org/10.1116/1.2811707

Abstract

View articletitled, Atomic layer deposited <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mrow><mtext>HfO</mtext></mrow><mn>2</mn></msub><mo>/</mo><msub><mrow><mtext>HfSi</mtext></mrow><mi>x</mi></msub><msub><mtext>O</mtext><mi>y</mi></msub><msub><mtext>N</mtext><mi>z</mi></msub></mrow></math> stacked gate dielectrics for metal-oxide-semiconductor structures

Open the PDF for in another window

Mechanisms of porous dielectric film modification induced by reducing and oxidizing ash plasmas

N. Posseme; T. Chevolleau; T. David; M. Darnon; O. Louveau; O. Joubert

J. Vac. Sci. Technol. B 25, 1928–1940 (2007) https://doi.org/10.1116/1.2804615

Abstract

View articletitled, Mechanisms of porous dielectric film modification induced by reducing and oxidizing ash plasmas

Open the PDF for in another window

PAPERS FROM THE 51st INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION

Directed Self Assembly

Graphoepitaxial cylindrical block copolymer nanodomains evaluated as bit patterned media template

Shuaigang Xiao; XiaoMin Yang

J. Vac. Sci. Technol. B 25, 1953–1957 (2007) https://doi.org/10.1116/1.2801860

Abstract

View articletitled, Graphoepitaxial cylindrical block copolymer nanodomains evaluated as bit patterned media template

Open the PDF for in another window

Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular weight

K. O. Stuen; I. In; E. Han; J. A. Streifer; R. J. Hamers; P. F. Nealey; P. Gopalan

J. Vac. Sci. Technol. B 25, 1958–1962 (2007) https://doi.org/10.1116/1.2799970

Abstract

View articletitled, Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular weight

Open the PDF for in another window

Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching

Chi-Chun Liu; Paul F. Nealey; Yuk-Hong Ting; Amy E. Wendt

J. Vac. Sci. Technol. B 25, 1963–1968 (2007) https://doi.org/10.1116/1.2801884

Abstract

View articletitled, Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching

Open the PDF for in another window

Exploring the manufacturability of using block copolymers as resist materials in conjunction with advanced lithographic tools

Gordon S. W. Craig; Paul F. Nealey

J. Vac. Sci. Technol. B 25, 1969–1975 (2007) https://doi.org/10.1116/1.2801888

Abstract

View articletitled, Exploring the manufacturability of using block copolymers as resist materials in conjunction with advanced lithographic tools

Open the PDF for in another window

Submicron aligned wafer bonding via capillary forces

Michael R. Tupek; Kevin T. Turner

J. Vac. Sci. Technol. B 25, 1976–1981 (2007) https://doi.org/10.1116/1.2787866

Abstract

View articletitled, Submicron aligned wafer bonding via capillary forces

Open the PDF for in another window

Creation of sub- $20 - nm$ contact using diblock copolymer on a $300 mm$ wafer for complementary metal oxide semiconductor applications

Wai-kin Li; Sam Yang

J. Vac. Sci. Technol. B 25, 1982–1984 (2007) https://doi.org/10.1116/1.2787732

Abstract

View articletitled, Creation of sub-<math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>20</mn><mtext>-</mtext><mi>nm</mi></mrow></math> contact using diblock copolymer on a <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>300</mn><mspace width="0.3em"></mspace><mi>mm</mi></mrow></math> wafer for complementary metal oxide semiconductor applications

Open the PDF for in another window

Nanostructures using self-assembled multilayers as molecular rulers and etch resists

C. Srinivasan; J. N. Hohman; M. E. Anderson; P. S. Weiss; M. W. Horn

J. Vac. Sci. Technol. B 25, 1985–1988 (2007) https://doi.org/10.1116/1.2811712

Abstract

View articletitled, Nanostructures using self-assembled multilayers as molecular rulers and etch resists

Open the PDF for in another window

Rapid partial melt crystallization of silicon for monolithic three-dimensional integration

D. J. Witte; D. S. Pickard; F. Crnogorac; P. Pianetta; R. F. W. Pease

J. Vac. Sci. Technol. B 25, 1989–1992 (2007) https://doi.org/10.1116/1.2798732

Abstract

View articletitled, Rapid partial melt crystallization of silicon for monolithic three-dimensional integration

Open the PDF for in another window

Surface energy induced patterning of organic and inorganic materials on heterogeneous Si surfaces

L. Tao; A. Crouch; F. Yoon; B. K. Lee; J. S. Guthi; J. Kim; J. Gao; W. Hu

J. Vac. Sci. Technol. B 25, 1993–1997 (2007) https://doi.org/10.1116/1.2804577

Abstract

View articletitled, Surface energy induced patterning of organic and inorganic materials on heterogeneous Si surfaces

Open the PDF for in another window

Electron Beam Lithography

Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers

Anda E. Grigorescu; Marco C. van der Krogt; Cees W. Hagen; Pieter Kruit

J. Vac. Sci. Technol. B 25, 1998–2003 (2007) https://doi.org/10.1116/1.2794316

Abstract

View articletitled, Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers

Open the PDF for in another window

Nanofabrication of high aspect ratio $24 nm$ x-ray zone plates for x-ray imaging applications

Yan Feng; Michael Feser; Alan Lyon; Steve Rishton; Xianghui Zeng; Sharon Chen; Simone Sassolini; Wenbing Yun

J. Vac. Sci. Technol. B 25, 2004–2007 (2007) https://doi.org/10.1116/1.2789447

Abstract

View articletitled, Nanofabrication of high aspect ratio <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>24</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> x-ray zone plates for x-ray imaging applications

Open the PDF for in another window

Accurate control of remaining resist depth for nanoscale three-dimensional structures in electron-beam grayscale lithography

S.-Y. Lee; K. Anbumony

J. Vac. Sci. Technol. B 25, 2008–2012 (2007) https://doi.org/10.1116/1.2781521

Abstract

View articletitled, Accurate control of remaining resist depth for nanoscale three-dimensional structures in electron-beam grayscale lithography

Open the PDF for in another window

Optimal temperature for development of poly(methylmethacrylate)

Bryan Cord; Jodie Lutkenhaus; Karl K. Berggren

J. Vac. Sci. Technol. B 25, 2013–2016 (2007) https://doi.org/10.1116/1.2799978

Abstract

View articletitled, Optimal temperature for development of poly(methylmethacrylate)

Open the PDF for in another window

Imaging with surface sensitive backscattered electrons

T. Luo; A. Khursheed

J. Vac. Sci. Technol. B 25, 2017–2019 (2007) https://doi.org/10.1116/1.2781523

Abstract

View articletitled, Imaging with surface sensitive backscattered electrons

Open the PDF for in another window

Novel magnetic microstigmator for electron beam astigmatism correction in the electron beam microcolumn system

Rong Rong; Ho Seob Kim; Seong Soon Park; Nam Woo Hwang; Kyoung Wan Park; Sang Won Jin; Chong H. Ahn

J. Vac. Sci. Technol. B 25, 2020–2024 (2007) https://doi.org/10.1116/1.2804427

Abstract

View articletitled, Novel magnetic microstigmator for electron beam astigmatism correction in the electron beam microcolumn system

Open the PDF for in another window

Using high-contrast salty development of hydrogen silsesquioxane for sub- $10 ‐ nm$ half-pitch lithography

Joel K. W. Yang; Karl K. Berggren

J. Vac. Sci. Technol. B 25, 2025–2029 (2007) https://doi.org/10.1116/1.2801881

Abstract

View articletitled, Using high-contrast salty development of hydrogen silsesquioxane for sub-<math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>10</mn><mtext>‐</mtext><mi>nm</mi></mrow></math> half-pitch lithography

Open the PDF for in another window

Sub- $30 ‐ nm$ hybrid lithography (electron beam∕deep ultraviolet) and etch process for fully depleted metal oxide semiconductor transistors

S. Pauliac-Vaujour; P. Brianceau; S. Landis; J. Chiaroni; O. Faynot

J. Vac. Sci. Technol. B 25, 2030–2033 (2007) https://doi.org/10.1116/1.2798731

Abstract

View articletitled, Sub-<math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>30</mn><mtext>‐</mtext><mi>nm</mi></mrow></math> hybrid lithography (electron beam∕deep ultraviolet) and etch process for fully depleted metal oxide semiconductor transistors

Open the PDF for in another window

Enhanced stitching for the fabrication of photonic structures by electron beam lithography

M. Gnan; D. S. Macintyre; M. Sorel; R. M. De La Rue; S. Thoms

J. Vac. Sci. Technol. B 25, 2034–2037 (2007) https://doi.org/10.1116/1.2800325

Abstract

View articletitled, Enhanced stitching for the fabrication of photonic structures by electron beam lithography

Open the PDF for in another window

Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications

C. Hohle; C. Arndt; K.-H. Choi; J. Kretz; T. Lutz; F. Thrum; K. Keil

J. Vac. Sci. Technol. B 25, 2038–2040 (2007) https://doi.org/10.1116/1.2779043

Abstract

View articletitled, Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications

Open the PDF for in another window

Patterning issues in superconducting nanowire single photon detector fabrication

C. Constancias; R. Espiau de Lamaëstre; O. Louveau; P. Cavalier; J.-C. Villégier

J. Vac. Sci. Technol. B 25, 2041–2044 (2007) https://doi.org/10.1116/1.2806965

Abstract

View articletitled, Patterning issues in superconducting nanowire single photon detector fabrication

Open the PDF for in another window

Influence of temperature on HSQ electron-beam lithography

M. Häffner; A. Haug; A. Heeren; M. Fleischer; H. Peisert; T. Chassé; D. P. Kern

J. Vac. Sci. Technol. B 25, 2045–2048 (2007) https://doi.org/10.1116/1.2794324

Abstract

View articletitled, Influence of temperature on HSQ electron-beam lithography

Open the PDF for in another window

Extracting the Boersch effect contribution from experimental energy spread measurements for Schottky electron emitters

M. S. Bronsgeest; J. E. Barth; G. A. Schwind; L. W. Swanson; P. Kruit

J. Vac. Sci. Technol. B 25, 2049–2054 (2007) https://doi.org/10.1116/1.2794067

Abstract

View articletitled, Extracting the Boersch effect contribution from experimental energy spread measurements for Schottky electron emitters

Open the PDF for in another window

Multilayer phase-only diffraction gratings: Fabrication and application to extreme ultraviolet optics

Farhad Salmassi; Eric M. Gullikson; Erik H. Anderson; Patrick P. Naulleau

J. Vac. Sci. Technol. B 25, 2055–2058 (2007) https://doi.org/10.1116/1.2798725

Abstract

View articletitled, Multilayer phase-only diffraction gratings: Fabrication and application to extreme ultraviolet optics

Open the PDF for in another window

Process characterization of inductively coupled plasma etched silicon nanopillars by micro-Raman

G. M. Laws; A. Handugan; T. Eschrich; P. Boland; C. Sinclair; S. Myhajlenko; C. D. Poweleit

J. Vac. Sci. Technol. B 25, 2059–2063 (2007) https://doi.org/10.1116/1.2781514

Abstract

View articletitled, Process characterization of inductively coupled plasma etched silicon nanopillars by micro-Raman

Open the PDF for in another window

Improving electron beam resist sensitivity by preexposure to deep ultraviolet radiation

Raghunath Murali; Devin Brown; Kevin P. Martin; James D. Meindl

J. Vac. Sci. Technol. B 25, 2064–2067 (2007) https://doi.org/10.1116/1.2794070

Abstract

View articletitled, Improving electron beam resist sensitivity by preexposure to deep ultraviolet radiation

Open the PDF for in another window

Fabrication of spiral-phase diffractive elements using scanning-electron-beam lithography

Hsin-Yu Tsai; Henry I. Smith; Rajesh Menon

J. Vac. Sci. Technol. B 25, 2068–2071 (2007) https://doi.org/10.1116/1.2806961

Abstract

View articletitled, Fabrication of spiral-phase diffractive elements using scanning-electron-beam lithography

Open the PDF for in another window

Real-time spatial-phase locking for vector-scan electron beam lithography

Yugu Yang; J. T. Hastings

J. Vac. Sci. Technol. B 25, 2072–2076 (2007) https://doi.org/10.1116/1.2781518

Abstract

View articletitled, Real-time spatial-phase locking for vector-scan electron beam lithography

Open the PDF for in another window

Metal-semiconductor-metal electron detectors

Rafael Aldana; R. Fabian Pease

J. Vac. Sci. Technol. B 25, 2077–2080 (2007) https://doi.org/10.1116/1.2798745

Abstract

View articletitled, Metal-semiconductor-metal electron detectors

Open the PDF for in another window

Nanometer-scale gaps in hydrogen silsesquioxane resist for $T$ -gate fabrication

Niu Jin; Sookyung Choi; Liang Wang; Guang Chen; DongHyun Kim; Vipan Kumar; Ilesanmi Adesida

J. Vac. Sci. Technol. B 25, 2081–2084 (2007) https://doi.org/10.1116/1.2798734

Abstract

View articletitled, Nanometer-scale gaps in hydrogen silsesquioxane resist for <math xmlns="http://www.w3.org/1998/Math/MathML"><mi xmlns="">T</mi></math>-gate fabrication

Open the PDF for in another window

Effects of developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense silicon nanowire fabrication

Sookyung Choi; Niu Jin; Vipan Kumar; Ilesanmi Adesida; Mark Shannon

J. Vac. Sci. Technol. B 25, 2085–2088 (2007) https://doi.org/10.1116/1.2794315

Abstract

View articletitled, Effects of developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense silicon nanowire fabrication

Open the PDF for in another window

EUV Lithography

Extreme ultraviolet lithography: From research to manufacturing

Bruno La Fontaine; Yunfei Deng; Ryoung-han Kim; Harry J. Levinson; Uzodinma Okoroanyanwu; Richard Sandberg; Tom Wallow; Obert Wood

J. Vac. Sci. Technol. B 25, 2089–2093 (2007) https://doi.org/10.1116/1.2794061

Abstract

View articletitled, Extreme ultraviolet lithography: From research to manufacturing

Open the PDF for in another window

Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers

P. W. Wachulak; M. G. Capeluto; M. C. Marconi; D. Patel; C. S. Menoni; J. J. Rocca

J. Vac. Sci. Technol. B 25, 2094–2097 (2007) https://doi.org/10.1116/1.2801870

Abstract

View articletitled, Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers

Open the PDF for in another window

Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Ted Liang; Erdem Ultanir; Guojing Zhang; Seh-Jin Park; Erik Anderson; Eric Gullikson; Patrick Naulleau; Farhad Salmassi; Paul Mirkarimi; Eberhard Spiller; Sherry Baker

J. Vac. Sci. Technol. B 25, 2098–2103 (2007) https://doi.org/10.1116/1.2779044

Abstract

View articletitled, Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks

Open the PDF for in another window

Evaluation of surface roughness of Zerodur® substrates machined by ${Ar}^{+}$ ion beam with energy of $3 - 10 keV$

Yuichi Kurashima; Ryou Uozumi; Iwao Miyamoto; Manabu Ando; Atsushi Numata

J. Vac. Sci. Technol. B 25, 2104–2109 (2007) https://doi.org/10.1116/1.2800333

Abstract

View articletitled, Evaluation of surface roughness of Zerodur® substrates machined by <math xmlns="http://www.w3.org/1998/Math/MathML"><msup xmlns=""><mi mathvariant="normal">Ar</mi><mo>+</mo></msup></math> ion beam with energy of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>3</mn><mo>–</mo><mn>10</mn><mspace width="0.3em"></mspace><mi>keV</mi></mrow></math>

Open the PDF for in another window

Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics

M. Kanaoka; C. Liu; K. Nomura; M. Ando; H. Takino; Y. Fukuda; H. Mimura; K. Yamauchi; Y. Mori

J. Vac. Sci. Technol. B 25, 2110–2113 (2007) https://doi.org/10.1116/1.2789440

Abstract

View articletitled, Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics

Open the PDF for in another window

Estimation of diffusion lengths of acid and quencher in chemically amplified resist on the basis of extreme ultraviolet exposure results

Yuusuke Tanaka; Yukiko Kikuchi; DooHoon Goo; Hiroaki Oizumi; Iwao Nishiyama

J. Vac. Sci. Technol. B 25, 2114–2117 (2007) https://doi.org/10.1116/1.2787867

Abstract

View articletitled, Estimation of diffusion lengths of acid and quencher in chemically amplified resist on the basis of extreme ultraviolet exposure results

Open the PDF for in another window

In situ x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination

Masahito Niibe; Yukinobu Kakutani; Keigo Koida; Shuichi Matsunari; Takashi Aoki; Shigeru Terashima; Hiromitsu Takase; Katsuhiko Murakami; Yasuaki Fukuda

J. Vac. Sci. Technol. B 25, 2118–2122 (2007) https://doi.org/10.1116/1.2779047

Abstract

View articletitled, In situ x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination

Open the PDF for in another window

Bit-array patterns with density over $1 Tbit ∕ {in.}^{2}$ fabricated by extreme ultraviolet interference lithography

Harun H. Solak; Yasin Ekinci

J. Vac. Sci. Technol. B 25, 2123–2126 (2007) https://doi.org/10.1116/1.2799974

Abstract

View articletitled, Bit-array patterns with density over <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>1</mn><mspace width="0.3em"></mspace><mi>Tbit</mi><mo>∕</mo><msup><mi>in.</mi><mn>2</mn></msup></mrow></math> fabricated by extreme ultraviolet interference lithography

Open the PDF for in another window

Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy

G. F. Lorusso; A. M. Goethals; R. Jonckheere; J. Hermans; K. Ronse; A. M. Myers; I. Kim; A. Niroomand; F. Iwamoto; D. Ritter

J. Vac. Sci. Technol. B 25, 2127–2131 (2007) https://doi.org/10.1116/1.2781516

Abstract

View articletitled, Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy

Open the PDF for in another window

Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

Patrick P. Naulleau; Christopher N. Anderson; Kim Dean; Paul Denham; Kenneth A. Goldberg; Brian Hoef; Dimitra Niakoula; Bruno La Fontaine; Tom Wallow

J. Vac. Sci. Technol. B 25, 2132–2135 (2007) https://doi.org/10.1116/1.2781522

Abstract

View articletitled, Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool

Open the PDF for in another window

Effects of photoacid generator incorporation into the polymer main chain on $193 nm$ chemically amplified resist behavior and lithographic performance

Cheng-Tsung Lee; Clifford L. Henderson; Mingxing Wang; Kenneth E. Gonsalves; Wang Yueh

J. Vac. Sci. Technol. B 25, 2136–2139 (2007) https://doi.org/10.1116/1.2801868

Abstract

View articletitled, Effects of photoacid generator incorporation into the polymer main chain on <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>193</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> chemically amplified resist behavior and lithographic performance

Open the PDF for in another window

Influence of solubility switching mechanism on resist performance in molecular glass resists

Richard A. Lawson; Cheng-Tsung Lee; Clifford L. Henderson; Robert Whetsell; Laren Tolbert; Wang Yueh

J. Vac. Sci. Technol. B 25, 2140–2144 (2007) https://doi.org/10.1116/1.2801885

Abstract

View articletitled, Influence of solubility switching mechanism on resist performance in molecular glass resists

Open the PDF for in another window

Progress in extreme ultraviolet interferometric and holographic lithography

A. Isoyan; Y.-C. Cheng; F. Jiang; J. Wallace; F. Cerrina; S. Bollepalli

J. Vac. Sci. Technol. B 25, 2145–2150 (2007) https://doi.org/10.1116/1.2794069

Abstract

View articletitled, Progress in extreme ultraviolet interferometric and holographic lithography

Open the PDF for in another window

Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool

Christopher N. Anderson; Patrick P. Naulleau; Paul Denham; Drew Kemp; Senajith Rekawa

J. Vac. Sci. Technol. B 25, 2151–2154 (2007) https://doi.org/10.1116/1.2804610

Abstract

View articletitled, Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool

Open the PDF for in another window

Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance for extreme ultraviolet lithography

M. R. Sogard; A. R. Mikkelson; M. Nataraju; K. T. Turner; R. L. Engelstad

J. Vac. Sci. Technol. B 25, 2155–2161 (2007) https://doi.org/10.1116/1.2798724

Abstract

View articletitled, Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance for extreme ultraviolet lithography

Open the PDF for in another window

Ion Beam Lithography and X-ray Lithography

Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap

Falk Ullmann; Frank Grossmann; Vladimir P. Ovsyannikov; Jacques Gierak; Eric Bourhis; Jacques Ferré; Jean Pierre Jamet; Alexandra Mougin; Günter Zschornack

J. Vac. Sci. Technol. B 25, 2162–2167 (2007) https://doi.org/10.1116/1.2799971

Abstract

View articletitled, Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap

Open the PDF for in another window

Fabrication of zinc nanotip arrays by ion beam sputtering

Liang-Chiun Chao; Chung-Chi Liau; Jun-Wei Lee; Fu-Chieh Tsai

J. Vac. Sci. Technol. B 25, 2168–2170 (2007) https://doi.org/10.1116/1.2798710

Abstract

View articletitled, Fabrication of zinc nanotip arrays by ion beam sputtering

Open the PDF for in another window

Fabrication of three-dimensional structures of resist by proton beam writing

Yusuke Furuta; Naoyuki Uchiya; Hiroyuki Nishikawa; Junji Haga; Takahiro Sato; Masakazu Oikawa; Yasuyuki Ishii; Tomihiro Kamiya

J. Vac. Sci. Technol. B 25, 2171–2174 (2007) https://doi.org/10.1116/1.2806974

Abstract

View articletitled, Fabrication of three-dimensional structures of resist by proton beam writing

Open the PDF for in another window

Focused ion beam iodine-enhanced etching of high aspect ratio holes in InP photonic crystals

V. Callegari; P. M. Nellen; J. Kaufmann; P. Strasser; F. Robin; U. Sennhauser

J. Vac. Sci. Technol. B 25, 2175–2179 (2007) https://doi.org/10.1116/1.2804607

Abstract

View articletitled, Focused ion beam iodine-enhanced etching of high aspect ratio holes in InP photonic crystals

Open the PDF for in another window

Deposition of carbonaceous structures using focused Au and Si ion-beam-induced chemical vapor deposition methods

Ryo Okada; Takuma Yo; Junichi Yanagisawa; Shinji Matsui

J. Vac. Sci. Technol. B 25, 2180–2183 (2007) https://doi.org/10.1116/1.2798712

Abstract

View articletitled, Deposition of carbonaceous structures using focused Au and Si ion-beam-induced chemical vapor deposition methods

Open the PDF for in another window

Membrane folding by helium ion implantation for three-dimensional device fabrication

William J. Arora; Sybren Sijbrandij; Lewis Stern; John Notte; Henry I. Smith; George Barbastathis

J. Vac. Sci. Technol. B 25, 2184–2187 (2007) https://doi.org/10.1116/1.2779049

Abstract

View articletitled, Membrane folding by helium ion implantation for three-dimensional device fabrication

Open the PDF for in another window

Design studies for a high brightness, energetic neutral atom source for proximity lithography

Hong-jie Guo; Barry Craver; Jackson Reynolds; John C. Wolfe

J. Vac. Sci. Technol. B 25, 2188–2191 (2007) https://doi.org/10.1116/1.2804604

Abstract

View articletitled, Design studies for a high brightness, energetic neutral atom source for proximity lithography

Open the PDF for in another window

Mechanical nanostepping for atom beam lithography

B. Craver; A. Roy; H. Nounu; J. C. Wolfe

J. Vac. Sci. Technol. B 25, 2192–2195 (2007) https://doi.org/10.1116/1.2804605

Abstract

View articletitled, Mechanical nanostepping for atom beam lithography

Open the PDF for in another window

Fabrication of a needle array using a Si gray mask for x-ray lithography

Harutaka Mekaru; Takayuki Takano; Koichi Awazu; Masaharu Takahashi; Ryutaro Maeda

J. Vac. Sci. Technol. B 25, 2196–2201 (2007) https://doi.org/10.1116/1.2794314

Abstract

View articletitled, Fabrication of a needle array using a Si gray mask for x-ray lithography

Open the PDF for in another window

Maskless Lithography

Challenges in $1 Teradot ∕ in .^{2}$ dot patterning using electron beam lithography for bit-patterned media

XiaoMin Yang; Shuaigang Xiao; Wei Wu; Yuan Xu; Keith Mountfield; Robert Rottmayer; Kim Lee; David Kuo; Dieter Weller

J. Vac. Sci. Technol. B 25, 2202–2209 (2007) https://doi.org/10.1116/1.2798711

Abstract

View articletitled, Challenges in <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>1</mn><mtext> </mtext><mtext>Teradot</mtext><mo>∕</mo><mtext>in</mtext><msup><mtext>.</mtext><mn>2</mn></msup></mrow></math> dot patterning using electron beam lithography for bit-patterned media

Open the PDF for in another window

In situ monitoring and control of material growth for high resolution electron beam induced deposition

W. F. van Dorp; C. W. Hagen; P. A. Crozier; P. Kruit

J. Vac. Sci. Technol. B 25, 2210–2214 (2007) https://doi.org/10.1116/1.2804603

Abstract

View articletitled, In situ monitoring and control of material growth for high resolution electron beam induced deposition

Open the PDF for in another window

Redeposition characteristics of focused ion beam milling for nanofabrication

D. A. M. de Winter; J. J. L. Mulders

J. Vac. Sci. Technol. B 25, 2215–2218 (2007) https://doi.org/10.1116/1.2806973

Abstract

View articletitled, Redeposition characteristics of focused ion beam milling for nanofabrication

Open the PDF for in another window

Resolution in focused electron- and ion-beam induced processing

Ivo Utke; Vinzenz Friedli; Martin Purrucker; Johann Michler

J. Vac. Sci. Technol. B 25, 2219–2223 (2007) https://doi.org/10.1116/1.2789441

Abstract

View articletitled, Resolution in focused electron- and ion-beam induced processing

Open the PDF for in another window

Fabrication of $22 nm$ half-pitch silicon lines by single-exposure self-aligned spatial-frequency doubling

Alex K. Raub; Dong Li; Andrew Frauenglass; S. R. J. Brueck

J. Vac. Sci. Technol. B 25, 2224–2227 (2007) https://doi.org/10.1116/1.2801889

Abstract

View articletitled, Fabrication of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>22</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> half-pitch silicon lines by single-exposure self-aligned spatial-frequency doubling

Open the PDF for in another window

Focused electron beam induced deposition of nickel

A. Perentes; G. Sinicco; G. Boero; B. Dwir; P. Hoffmann

J. Vac. Sci. Technol. B 25, 2228–2232 (2007) https://doi.org/10.1116/1.2794071

Abstract

View articletitled, Focused electron beam induced deposition of nickel

Open the PDF for in another window

Oxygen assisted focused electron beam induced deposition of Si-containing materials: Growth dynamics

A. Perentes; P. Hoffmann

J. Vac. Sci. Technol. B 25, 2233–2238 (2007) https://doi.org/10.1116/1.2798746

Abstract

View articletitled, Oxygen assisted focused electron beam induced deposition of Si-containing materials: Growth dynamics

Open the PDF for in another window

High brightness 100-electron-beam source for high-resolution applications

Yanxia Zhang; P. Kruit

J. Vac. Sci. Technol. B 25, 2239–2244 (2007) https://doi.org/10.1116/1.2794073

Abstract

View articletitled, High brightness 100-electron-beam source for high-resolution applications

Open the PDF for in another window

Cathode ray tube type electron gun as a source for multibeam electron lithography

A. J. van den Brom; A. H. V. van Veen; W. M. Weeda; G. Z. M. Berglund; M. Wieland; P. Kruit

J. Vac. Sci. Technol. B 25, 2245–2249 (2007) https://doi.org/10.1116/1.2801869

Abstract

View articletitled, Cathode ray tube type electron gun as a source for multibeam electron lithography

Open the PDF for in another window

Annealing of electron beam induced deposits of platinum from $Pt {({PF}_{3})}_{4}$

Matthew H. Ervin; Daniel Chang; Barbara Nichols; Alma Wickenden; John Barry; John Melngailis

J. Vac. Sci. Technol. B 25, 2250–2254 (2007) https://doi.org/10.1116/1.2806978

Abstract

View articletitled, Annealing of electron beam induced deposits of platinum from <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mtext>Pt</mtext><msub><mrow><mrow><mo>(</mo><mrow><msub><mrow><mtext>PF</mtext></mrow><mn>3</mn></msub></mrow><mo>)</mo></mrow></mrow><mn>4</mn></msub></mrow></math>

Open the PDF for in another window

Electrospun DNA nanofibers

Leon M. Bellan; Elizabeth A. Strychalski; Harold G. Craighead

J. Vac. Sci. Technol. B 25, 2255–2257 (2007) https://doi.org/10.1116/1.2801886

Abstract

View articletitled, Electrospun DNA nanofibers

Open the PDF for in another window

Multiple beam sub- $80 ‐ nm$ lithography with miniature electron beam column arrays

C. S. Silver; J. P. Spallas; L. P. Muray

J. Vac. Sci. Technol. B 25, 2258–2265 (2007) https://doi.org/10.1116/1.2811710

Abstract

View articletitled, Multiple beam sub-<math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>80</mn><mtext>‐</mtext><mi>nm</mi></mrow></math> lithography with miniature electron beam column arrays

Open the PDF for in another window

$Cs Br ∕ Ga N$ heterojunction photoelectron source

Juan R. Maldonado; Zhi Liu; Yun Sun; Scott Schuetter; Piero Pianetta; R. F. W. Pease

J. Vac. Sci. Technol. B 25, 2266–2270 (2007) https://doi.org/10.1116/1.2779042

Abstract

View articletitled, <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Cs</mi><mi mathvariant="normal">Br</mi><mo>∕</mo><mi mathvariant="normal">Ga</mi><mi mathvariant="normal">N</mi></mrow></math> heterojunction photoelectron source

Open the PDF for in another window

Subwavelength proximity nanolithography using a plasmonic lens

Sungkyu Seo; Hyun Chul Kim; Hyungduk Ko; Mosong Cheng

J. Vac. Sci. Technol. B 25, 2271–2276 (2007) https://doi.org/10.1116/1.2804517

Abstract

View articletitled, Subwavelength proximity nanolithography using a plasmonic lens

Open the PDF for in another window

Monolithic multichannel secondary electron detector for distributed axis electron beam lithography and inspection

D. S. Pickard; C. Kenney; S. Tanimoto; T. Crane; T. Groves; R. F. W. Pease

J. Vac. Sci. Technol. B 25, 2277–2283 (2007) https://doi.org/10.1116/1.2804611

Abstract

View articletitled, Monolithic multichannel secondary electron detector for distributed axis electron beam lithography and inspection

Open the PDF for in another window

Atomic-force lithography with interferometric tip-to-substrate position metrology

Euclid E. Moon; Jan Kupec; Mark K. Mondol; Henry I. Smith; Karl K. Berggren

J. Vac. Sci. Technol. B 25, 2284–2287 (2007) https://doi.org/10.1116/1.2787794

Abstract

View articletitled, Atomic-force lithography with interferometric tip-to-substrate position metrology

Open the PDF for in another window

Modeling Simulation and CAD

Electron beam and optical proximity effect reduction for nanolithography: New results

Martin Peckerar; David Sander; Ankur Srivastava; Adakou Foli; Uzi Vishkin

J. Vac. Sci. Technol. B 25, 2288–2294 (2007) https://doi.org/10.1116/1.2806967

Abstract

View articletitled, Electron beam and optical proximity effect reduction for nanolithography: New results

Open the PDF for in another window

Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography

Takahiro Kozawa; Seiichi Tagawa; Julius Joseph Santillan; Minoru Toriumi; Toshiro Itani

J. Vac. Sci. Technol. B 25, 2295–2300 (2007) https://doi.org/10.1116/1.2794326

Abstract

View articletitled, Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography

Open the PDF for in another window

Study of the assist features effect on the through focus behavior in isoline with an innovative method

Jianliang Li; Qiliang Yan; Lawrence S. Melvin, III

J. Vac. Sci. Technol. B 25, 2301–2306 (2007) https://doi.org/10.1116/1.2789448

Abstract

View articletitled, Study of the assist features effect on the through focus behavior in isoline with an innovative method

Open the PDF for in another window

Pattern matching, simulation, and metrology of complex layouts fabricated by electron beam lithography

N. Tsikrikas; D. Drygiannakis; G. P. Patsis; I. Raptis; A. Gerardino; S. Stavroulakis; E. Voyiatzis

J. Vac. Sci. Technol. B 25, 2307–2311 (2007) https://doi.org/10.1116/1.2798714

Abstract

View articletitled, Pattern matching, simulation, and metrology of complex layouts fabricated by electron beam lithography

Open the PDF for in another window

Nanoimprint and Soft Lithography

Visualization of mold filling stages in thermal nanoimprint by using pressure gradients

Helmut Schift; Sandro Bellini; Morten Bo Mikkelsen; Jens Gobrecht

J. Vac. Sci. Technol. B 25, 2312–2316 (2007) https://doi.org/10.1116/1.2806972

Abstract

View articletitled, Visualization of mold filling stages in thermal nanoimprint by using pressure gradients

Open the PDF for in another window

Ultrastiff stage for imprint lithography

Y. Jeon; M. Feldman; L. Jiang

J. Vac. Sci. Technol. B 25, 2317–2320 (2007) https://doi.org/10.1116/1.2798722

Abstract

View articletitled, Ultrastiff stage for imprint lithography

Open the PDF for in another window

Chemical nanoimprint lithography for step-and-repeat Si patterning

Hideo Namatsu; Masatoshi Oda; Atsushi Yokoo; Makoto Fukuda; Koichi Irisa; Shigeyuki Tsurumi; Kazuhiko Komatsu

J. Vac. Sci. Technol. B 25, 2321–2324 (2007) https://doi.org/10.1116/1.2806970

Abstract

View articletitled, Chemical nanoimprint lithography for step-and-repeat Si patterning

Open the PDF for in another window

Optimizing nanoimprint and transfer-bonding techniques for three-dimensional polymer microstructures

Hyunsoo Park; Huifeng Li; Xing Cheng

J. Vac. Sci. Technol. B 25, 2325–2328 (2007) https://doi.org/10.1116/1.2804518

Abstract

View articletitled, Optimizing nanoimprint and transfer-bonding techniques for three-dimensional polymer microstructures

Open the PDF for in another window

Fabrication of terahertz holograms

E. D. Walsby; J. Alton; C. H. Worrall; H. E. Beere; D. A. Ritchie; J. Leach; M. Padgett; D. R. S. Cumming

J. Vac. Sci. Technol. B 25, 2329–2332 (2007) https://doi.org/10.1116/1.2799976

Abstract

View articletitled, Fabrication of terahertz holograms

Open the PDF for in another window

UV-nanoimprint with the assistance of gas condensation at atmospheric environmental pressure

Hiroshi Hiroshima; Masanori Komuro

J. Vac. Sci. Technol. B 25, 2333–2336 (2007) https://doi.org/10.1116/1.2800334

Abstract

View articletitled, UV-nanoimprint with the assistance of gas condensation at atmospheric environmental pressure

Open the PDF for in another window

Fabrication of 3D-photonic crystals via UV-nanoimprint lithography

Thomas Glinsner; Paul Lindner; Michael Mühlberger; Iris Bergmair; Rainer Schöftner; Kurt Hingerl; Holger Schmid; Ernst-Bernhard Kley

J. Vac. Sci. Technol. B 25, 2337–2340 (2007) https://doi.org/10.1116/1.2798733

Abstract

View articletitled, Fabrication of 3D-photonic crystals via UV-nanoimprint lithography

Open the PDF for in another window

Time dependent analysis of the resist deformation in thermal nanoimprint

Yoshihiko Hirai; Yuki Onishi; Toshiaki Tanabe; Masayoshi Nishihata; Takuya Iwasaki; Hiroaki Kawata; Yasuroh Iriye

J. Vac. Sci. Technol. B 25, 2341–2345 (2007) https://doi.org/10.1116/1.2804429

Abstract

View articletitled, Time dependent analysis of the resist deformation in thermal nanoimprint

Open the PDF for in another window

Nanoimprint lithography processes on $200 mm$ Si wafer for optical application: Residual thickness etching anisotropy

N. Chaix; C. Gourgon; C. Perret; S. Landis; T. Leveder

J. Vac. Sci. Technol. B 25, 2346–2351 (2007) https://doi.org/10.1116/1.2801878

Abstract

View articletitled, Nanoimprint lithography processes on <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>200</mn><mspace width="0.3em"></mspace><mi>mm</mi></mrow></math> Si wafer for optical application: Residual thickness etching anisotropy

Open the PDF for in another window

Stretching and selective immobilization of DNA in SU-8 micro- and nanochannels

B. Yang; V. R. Dukkipati; D. Li; B. L. Cardozo; S. W. Pang

J. Vac. Sci. Technol. B 25, 2352–2356 (2007) https://doi.org/10.1116/1.2806975

Abstract

View articletitled, Stretching and selective immobilization of DNA in SU-8 micro- and nanochannels

Open the PDF for in another window

Fabrication of three dimensional structures for an UV curable nanoimprint lithography mold using variable dose control with critical-energy electron beam exposure

K. Mohamed; M. M. Alkaisi; R. J. Blaikie

J. Vac. Sci. Technol. B 25, 2357–2360 (2007) https://doi.org/10.1116/1.2794317

Abstract

View articletitled, Fabrication of three dimensional structures for an UV curable nanoimprint lithography mold using variable dose control with critical-energy electron beam exposure

Open the PDF for in another window

Sub- $100 - nm$ three-dimensional nanoimprint lithography

Noriyuki Unno; Jun Taniguchi; Yoshiaki Ishii

J. Vac. Sci. Technol. B 25, 2361–2364 (2007) https://doi.org/10.1116/1.2811715

Abstract

View articletitled, Sub-<math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>100</mn><mtext>-</mtext><mi>nm</mi></mrow></math> three-dimensional nanoimprint lithography

Open the PDF for in another window

Surface characterization of imprinted resist above glass transition temperature

T. Lévéder; S. Landis; L. Davoust; S. Soulan; J.-H. Tortai; N. Chaix

J. Vac. Sci. Technol. B 25, 2365–2369 (2007) https://doi.org/10.1116/1.2799975

Abstract

View articletitled, Surface characterization of imprinted resist above glass transition temperature

Open the PDF for in another window

Micro-nano mixture patterning by thermal-UV novel nanoimprint

Keisuke Okuda; Naoyuki Niimi; Hiroaki Kawata; Yoshihiko Hirai

J. Vac. Sci. Technol. B 25, 2370–2372 (2007) https://doi.org/10.1116/1.2801859

Abstract

View articletitled, Micro-nano mixture patterning by thermal-UV novel nanoimprint

Open the PDF for in another window

Benchmarking of $50 nm$ features in thermal nanoimprint

C. Gourgon; N. Chaix; H. Schift; M. Tormen; S. Landis; C. M. Sotomayor Torres; A. Kristensen; R. H. Pedersen; M. B. Christiansen; I. Fernandez-Cuesta; D. Mendels; L. Montelius; T. Haatainen

J. Vac. Sci. Technol. B 25, 2373–2378 (2007) https://doi.org/10.1116/1.2794064

Abstract

View articletitled, Benchmarking of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>50</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> features in thermal nanoimprint

Open the PDF for in another window

Coarse-grain simulation of viscous flow and stamp deformation in nanoimprint

V. Sirotkin; A. Svintsov; S. Zaitsev; H. Schift

J. Vac. Sci. Technol. B 25, 2379–2383 (2007) https://doi.org/10.1116/1.2812534

Abstract

View articletitled, Coarse-grain simulation of viscous flow and stamp deformation in nanoimprint

Open the PDF for in another window

Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists

P. Voisin; M. Zelsmann; H. Ridaoui; M. Chouiki; C. Gourgon; J. Boussey; K. Zahouily

J. Vac. Sci. Technol. B 25, 2384–2387 (2007) https://doi.org/10.1116/1.2804519

Abstract

View articletitled, Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists

Open the PDF for in another window

Bilayer metal wire-grid polarizer fabricated by roll-to-roll nanoimprint lithography on flexible plastic substrate

Se Hyun Ahn; Jin-Sung Kim; L. Jay Guo

J. Vac. Sci. Technol. B 25, 2388–2391 (2007) https://doi.org/10.1116/1.2798747

Abstract

View articletitled, Bilayer metal wire-grid polarizer fabricated by roll-to-roll nanoimprint lithography on flexible plastic substrate

Open the PDF for in another window

Impact of glass temperature for thermal nanoimprint

H.-C. Scheer; N. Bogdanski; M. Wissen; S. Möllenbeck

J. Vac. Sci. Technol. B 25, 2392–2395 (2007) https://doi.org/10.1116/1.2811718

Abstract

View articletitled, Impact of glass temperature for thermal nanoimprint

Open the PDF for in another window

Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry

Rayan M. Al-Assaad; Suresh Regonda; Li Tao; Stella W. Pang; Wenchuang (Walter) Hu

J. Vac. Sci. Technol. B 25, 2396–2401 (2007) https://doi.org/10.1116/1.2800327

Abstract

View articletitled, Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry

Open the PDF for in another window

Nonresidual layer imprinting and new replication capabilities demonstrated for fast thermal curable polydimethysiloxanes

Carlos Pina-Hernandez; Jin-Sung Kim; Peng-Fei Fu; L. Jay Guo

J. Vac. Sci. Technol. B 25, 2402–2406 (2007) https://doi.org/10.1116/1.2800326

Abstract

View articletitled, Nonresidual layer imprinting and new replication capabilities demonstrated for fast thermal curable polydimethysiloxanes

Open the PDF for in another window

Simple fabrication of UV nanoimprint templates using critical energy electron beam lithography

Jaebum Joo; Kimin Jun; Joseph M. Jacobson

J. Vac. Sci. Technol. B 25, 2407–2411 (2007) https://doi.org/10.1116/1.2806976

Abstract

View articletitled, Simple fabrication of UV nanoimprint templates using critical energy electron beam lithography

Open the PDF for in another window

Creating micro- and nanostructures on tubular and spherical surfaces

O. Lima; L. Tan; A. Goel; M. Negahban; Z. Li

J. Vac. Sci. Technol. B 25, 2412–2418 (2007) https://doi.org/10.1116/1.2804428

Abstract

View articletitled, Creating micro- and nanostructures on tubular and spherical surfaces

Open the PDF for in another window

Solid-state electrochemical nanoimprinting of copper

Peter L. Schultz; Keng H. Hsu; Nicholas X. Fang; Placid M. Ferreira

J. Vac. Sci. Technol. B 25, 2419–2424 (2007) https://doi.org/10.1116/1.2799977

Abstract

View articletitled, Solid-state electrochemical nanoimprinting of copper

Open the PDF for in another window

Economic approximate models for backscattered electrons

Leili Baghaei Rad; Ian Downes; Jun Ye; David Adler; R. Fabian W. Pease

J. Vac. Sci. Technol. B 25, 2425–2429 (2007) https://doi.org/10.1116/1.2794068

Abstract

View articletitled, Economic approximate models for backscattered electrons

Open the PDF for in another window

Improved release strategy for UV nanoimprint lithography

Sophie Garidel; Marc Zelsmann; Nicolas Chaix; Pauline Voisin; Jumana Boussey; Arnaud Beaurain; Bernard Pelissier

J. Vac. Sci. Technol. B 25, 2430–2434 (2007) https://doi.org/10.1116/1.2806969

Abstract

View articletitled, Improved release strategy for UV nanoimprint lithography

Open the PDF for in another window

Viscosity measurement of nanoimprint lithography resists with a rheological nanoindenter

A. A. Svintsov; O. V. Trofimov; S. I. Zaitsev

J. Vac. Sci. Technol. B 25, 2435–2438 (2007) https://doi.org/10.1116/1.2794321

Abstract

View articletitled, Viscosity measurement of nanoimprint lithography resists with a rheological nanoindenter

Open the PDF for in another window

Optical Lithography

Phase control in multiexposure spatial frequency multiplication

Yong Zhao; Chih-Hao Chang; Ralf K. Heilmann; Mark L. Schattenburg

J. Vac. Sci. Technol. B 25, 2439–2443 (2007) https://doi.org/10.1116/1.2794318

Abstract

View articletitled, Phase control in multiexposure spatial frequency multiplication

Open the PDF for in another window

Study of process contributions to total overlay error budget for sub- $60 - nm$ memory devices

Jangho Shin; Hyunjae Kang; SungWon Choi; Seoukhoon Woo; Hochul Kim; SukJoo Lee; Junghyeon Lee; Chang-Jin Kang

J. Vac. Sci. Technol. B 25, 2444–2446 (2007) https://doi.org/10.1116/1.2787772

Abstract

View articletitled, Study of process contributions to total overlay error budget for sub-<math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>60</mn><mtext>-</mtext><mi>nm</mi></mrow></math> memory devices

Open the PDF for in another window

Deep ultraviolet photolithography capability of ZEP520A electron beam resist for mix and match lithography

Devin K. Brown

J. Vac. Sci. Technol. B 25, 2447–2450 (2007) https://doi.org/10.1116/1.2794072

Abstract

View articletitled, Deep ultraviolet photolithography capability of ZEP520A electron beam resist for mix and match lithography

Open the PDF for in another window

Photolithography using an optical microscope

Ron Gonski; John Melngailis

J. Vac. Sci. Technol. B 25, 2451–2452 (2007) https://doi.org/10.1116/1.2779046

Abstract

View articletitled, Photolithography using an optical microscope

Open the PDF for in another window

Experimental demonstration of dark field illumination using contact hole features

Michael M. Crouse; Emil Schmitt-Weaver; Steven G. Hansen; Robert Routh

J. Vac. Sci. Technol. B 25, 2453–2460 (2007) https://doi.org/10.1116/1.2800323

Abstract

View articletitled, Experimental demonstration of dark field illumination using contact hole features

Open the PDF for in another window

Double patterning overlay budget for $45 nm$ technology node single and double mask approach

Pierluigi Rigolli; Catia Turco; Umberto Iessi; Gianfranco Capetti; Paolo Canestrari; Aldo Fradilli

J. Vac. Sci. Technol. B 25, 2461–2465 (2007) https://doi.org/10.1116/1.2805246

Abstract

View articletitled, Double patterning overlay budget for <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>45</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> technology node single and double mask approach

Open the PDF for in another window

Application of contrast enhancement layer to $193 nm$ lithography

Ryoung-han Kim; Harry J. Levinson

J. Vac. Sci. Technol. B 25, 2466–2470 (2007) https://doi.org/10.1116/1.2798705

Abstract

View articletitled, Application of contrast enhancement layer to <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>193</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> lithography

Open the PDF for in another window

Lithography, plasmonics, and subwavelength aperture exposure technology

Yves Ngu; Marty Peckerar; Mario Dagenais; John Barry; Birendra (Raj) Dutt

J. Vac. Sci. Technol. B 25, 2471–2475 (2007) https://doi.org/10.1116/1.2812524

Abstract

View articletitled, Lithography, plasmonics, and subwavelength aperture exposure technology

Open the PDF for in another window

Laser interferometric nanolithography using a new positive chemical amplified resist

R. Luttge; H. A. G. M. van Wolferen; L. Abelmann

J. Vac. Sci. Technol. B 25, 2476–2480 (2007) https://doi.org/10.1116/1.2800328

Abstract

View articletitled, Laser interferometric nanolithography using a new positive chemical amplified resist

Open the PDF for in another window

Photoresist Technology

Acid distribution in chemically amplified extreme ultraviolet resist

Takahiro Kozawa; Seiichi Tagawa; Heidi B. Cao; Hai Deng; Michael J. Leeson

J. Vac. Sci. Technol. B 25, 2481–2485 (2007) https://doi.org/10.1116/1.2794063

Abstract

View articletitled, Acid distribution in chemically amplified extreme ultraviolet resist

Open the PDF for in another window

Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography

Minoru Toriumi; Julius Santillan; Toshiro Itani; Takahiro Kozawa; Seiichi Tagawa

J. Vac. Sci. Technol. B 25, 2486–2489 (2007) https://doi.org/10.1116/1.2787850

Abstract

View articletitled, Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography

Open the PDF for in another window

Are extreme ultraviolet resists ready for the $32 nm$ node?

Karen Petrillo; Yayi Wei; R. Brainard; G. Denbeaux; Dario Goldfarb; C.-S. Koay; J. Mackey; Warren Montgomery; W. Pierson; T. Wallow; Obert Wood

J. Vac. Sci. Technol. B 25, 2490–2495 (2007) https://doi.org/10.1116/1.2787815

Abstract

View articletitled, Are extreme ultraviolet resists ready for the <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>32</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> node?

Open the PDF for in another window

Measurements of acid generation by extreme ultraviolet irradiation in lithographic films

Martin Glodde; Dario L. Goldfarb; David R. Medeiros; Gregory M. Wallraff; Gregory P. Denbeaux

J. Vac. Sci. Technol. B 25, 2496–2503 (2007) https://doi.org/10.1116/1.2779045

Abstract

View articletitled, Measurements of acid generation by extreme ultraviolet irradiation in lithographic films

Open the PDF for in another window

Geometry impact on ultrahigh resolution pattern collapse

A. Jouve; J. Simon; L. Gonon; J. H. Tortai

J. Vac. Sci. Technol. B 25, 2504–2507 (2007) https://doi.org/10.1116/1.2801866

Abstract

View articletitled, Geometry impact on ultrahigh resolution pattern collapse

Open the PDF for in another window

Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness

Young-Hye La; Insik-In; Sang-Min Park; Robert P. Meagley; Melvina Leolukman; Padma Gopalan; Paul F. Nealey

J. Vac. Sci. Technol. B 25, 2508–2513 (2007) https://doi.org/10.1116/1.2800330

Abstract

View articletitled, Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness

Open the PDF for in another window

Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity

Vivek M. Prabhu; Bryan D. Vogt; Shuhui Kang; Ashwin Rao; Eric K. Lin; Sushil K. Satija

J. Vac. Sci. Technol. B 25, 2514–2520 (2007) https://doi.org/10.1116/1.2800329

Abstract

View articletitled, Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity

Open the PDF for in another window

Metrology

High throughput defect detection with multiple parallel electron beams

H. M. P. van Himbergen; M. D. Nijkerk; P. W. H. de Jager; T. C. Hosman; P. Kruit

J. Vac. Sci. Technol. B 25, 2521–2525 (2007) https://doi.org/10.1116/1.2789449

Abstract

View articletitled, High throughput defect detection with multiple parallel electron beams

Open the PDF for in another window

Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging

James S. Clarke; Michael B. Schmidt; Ndubuisi G. Orji

J. Vac. Sci. Technol. B 25, 2526–2530 (2007) https://doi.org/10.1116/1.2804516

Abstract

View articletitled, Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging

Open the PDF for in another window

Nanodevices

Hybrid semiconductor/nanoelectronic circuits: Freeing advanced lithography from the alignment accuracy burden

Konstantin K. Likharev

J. Vac. Sci. Technol. B 25, 2531–2536 (2007) https://doi.org/10.1116/1.2794060

Abstract

View articletitled, Hybrid semiconductor/nanoelectronic circuits: Freeing advanced lithography from the alignment accuracy burden

Open the PDF for in another window

Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities

J. Vac. Sci. Technol. B 25, 2537–2546 (2007) https://doi.org/10.1116/1.2794325

Abstract

View articletitled, Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities

Open the PDF for in another window

Helium ion microscope invasiveness and imaging study for semiconductor applications

Richard H. Livengood; Yuval Greenzweig; Ted Liang; Michael Grumski

J. Vac. Sci. Technol. B 25, 2547–2552 (2007) https://doi.org/10.1116/1.2794319

Abstract

View articletitled, Helium ion microscope invasiveness and imaging study for semiconductor applications

Open the PDF for in another window

Dry etch release processes for micromachining applications

Tongtong Zhu; Petros Argyrakis; Enrico Mastropaolo; Kin Kiong Lee; Rebecca Cheung

J. Vac. Sci. Technol. B 25, 2553–2557 (2007) https://doi.org/10.1116/1.2794074

Abstract

View articletitled, Dry etch release processes for micromachining applications

Open the PDF for in another window

Mechanical properties of suspended graphene sheets

I. W. Frank; D. M. Tanenbaum; A. M. van der Zande; P. L. McEuen

J. Vac. Sci. Technol. B 25, 2558–2561 (2007) https://doi.org/10.1116/1.2789446

Abstract

View articletitled, Mechanical properties of suspended graphene sheets

Open the PDF for in another window

Surface gate and contact alignment for buried, atomically precise scanning tunneling microscopy–patterned devices

Martin Fuechsle; Frank J. Rueß; Thilo C. G. Reusch; Mladen Mitic; Michelle Y. Simmons

J. Vac. Sci. Technol. B 25, 2562–2567 (2007) https://doi.org/10.1116/1.2781512

Abstract

View articletitled, Surface gate and contact alignment for buried, atomically precise scanning tunneling microscopy–patterned devices

Open the PDF for in another window

Novel coexisted sol-gel derived poly-Si-oxide-nitride-oxide-silicon type memory

Hsin-Chiang You; Chi-Chang Wu; Fu-Hsiang Ko; Tan-Fu Lei; Wen-Luh Yang

J. Vac. Sci. Technol. B 25, 2568–2571 (2007) https://doi.org/10.1116/1.2794327

Abstract

View articletitled, Novel coexisted sol-gel derived poly-Si-oxide-nitride-oxide-silicon type memory

Open the PDF for in another window

Adaptive wiring for $20 nm$ scale epitaxial silicon Ohmic contacts to silicon nanowires

M. J. Rooks; G. M. Cohen; J. O. Chu; P. M. Solomon; J. A. Ott; R. J. Miller; R. Viswanathan; W. Haensch

J. Vac. Sci. Technol. B 25, 2572–2576 (2007) https://doi.org/10.1116/1.2798738

Abstract

View articletitled, Adaptive wiring for <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>20</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> scale epitaxial silicon Ohmic contacts to silicon nanowires

Open the PDF for in another window

Hybrid carbon nanotube-silicon complementary metal oxide semiconductor circuits

I. Meric; V. Caruso; R. Caldwell; J. Hone; K. L. Shepard; S. J. Wind

J. Vac. Sci. Technol. B 25, 2577–2580 (2007) https://doi.org/10.1116/1.2800322

Abstract

View articletitled, Hybrid carbon nanotube-silicon complementary metal oxide semiconductor circuits

Open the PDF for in another window

Hydrogen plasma-enhanced atomic layer deposition of copper thin films

Liqi Wu; Eric Eisenbraun

J. Vac. Sci. Technol. B 25, 2581–2585 (2007) https://doi.org/10.1116/1.2779050

Abstract

View articletitled, Hydrogen plasma-enhanced atomic layer deposition of copper thin films

Open the PDF for in another window

Emission characteristics of ${Au}_{60} {Be}_{40}$ and ${Au}_{62} {Si}_{23} {Be}_{15}$ liquid metal ion sources

G. A. Schwind; L. W. Swanson

J. Vac. Sci. Technol. B 25, 2586–2592 (2007) https://doi.org/10.1116/1.2781520

Abstract

View articletitled, Emission characteristics of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">Au</mi><mn>60</mn></msub><msub><mi mathvariant="normal">Be</mi><mn>40</mn></msub></mrow></math> and <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><msub><mi mathvariant="normal">Au</mi><mn>62</mn></msub><msub><mi mathvariant="normal">Si</mi><mn>23</mn></msub><msub><mi mathvariant="normal">Be</mi><mn>15</mn></msub></mrow></math> liquid metal ion sources

Open the PDF for in another window

Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers

Minseung Ahn; Ralf K. Heilmann; Mark L. Schattenburg

J. Vac. Sci. Technol. B 25, 2593–2597 (2007) https://doi.org/10.1116/1.2779048

Abstract

View articletitled, Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers

Open the PDF for in another window

Soft x-ray imaging of spin dynamics at high spatial and temporal resolution

Brooke L. Mesler; Peter Fischer; Weilun Chao; Erik H. Anderson; Dong-Hyun Kim

J. Vac. Sci. Technol. B 25, 2598–2602 (2007) https://doi.org/10.1116/1.2806977

Abstract

View articletitled, Soft x-ray imaging of spin dynamics at high spatial and temporal resolution

Open the PDF for in another window

Ultrathin magnetic multilayer films for low-field microwave notch filters

Bijoy K. Kuanr; Alka V. Kuanr; T. Fal; R. E. Camley; Z. Celinski

J. Vac. Sci. Technol. B 25, 2603–2606 (2007) https://doi.org/10.1116/1.2801887

Abstract

View articletitled, Ultrathin magnetic multilayer films for low-field microwave notch filters

Open the PDF for in another window

Study of fluorine bombardment on the electrical properties of $Al Ga N ∕ Ga N$ heterostructures

Anirban Basu; Vipan Kumar; Ilesanmi Adesida

J. Vac. Sci. Technol. B 25, 2607–2610 (2007) https://doi.org/10.1116/1.2789444

Abstract

View articletitled, Study of fluorine bombardment on the electrical properties of <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mi mathvariant="normal">Al</mi><mi mathvariant="normal">Ga</mi><mi mathvariant="normal">N</mi><mo>∕</mo><mi mathvariant="normal">Ga</mi><mi mathvariant="normal">N</mi></mrow></math> heterostructures

Open the PDF for in another window

Prospects for nanowire sculptured-thin-film devices

Sean M. Pursel; Mark W. Horn

J. Vac. Sci. Technol. B 25, 2611–2615 (2007) https://doi.org/10.1116/1.2787749

Abstract

View articletitled, Prospects for nanowire sculptured-thin-film devices

Open the PDF for in another window

First-principles calculation of electronic structure and magnetic properties of copper adsorbed polar-ZnO surface

Yoon-Suk Kim; Yong-Chae Chung

J. Vac. Sci. Technol. B 25, 2616–2618 (2007) https://doi.org/10.1116/1.2806962

Abstract

View articletitled, First-principles calculation of electronic structure and magnetic properties of copper adsorbed polar-ZnO surface

Open the PDF for in another window

Nickel nanowires for planer microwave circuit applications and characterization

Ryan L. Marson; Bijoy K. Kuanr; Sanjay R. Mishra; R. E. Camley; Z. Celinski

J. Vac. Sci. Technol. B 25, 2619–2623 (2007) https://doi.org/10.1116/1.2801964

Abstract

View articletitled, Nickel nanowires for planer microwave circuit applications and characterization

Open the PDF for in another window

In situ visualization of local electric field in an ultrasharp tungsten emitter under a low voltage scanning transmission electron microscope

Jun-Ichi Fujita; Yuta Ikeda; Satoshi Okada; Kodai Higashi; Shotaro Nakasawa; Masahiko Ishida; Shinji Matsui

J. Vac. Sci. Technol. B 25, 2624–2627 (2007) https://doi.org/10.1116/1.2800332

Abstract

View articletitled, In situ visualization of local electric field in an ultrasharp tungsten emitter under a low voltage scanning transmission electron microscope

Open the PDF for in another window

Photonics

Fabrication and tuning of nanoscale metallic ring and split-ring arrays

A. K. Sheridan; A. W. Clark; A. Glidle; J. M. Cooper; D. R. S. Cumming

J. Vac. Sci. Technol. B 25, 2628–2631 (2007) https://doi.org/10.1116/1.2794328

Abstract

View articletitled, Fabrication and tuning of nanoscale metallic ring and split-ring arrays

Open the PDF for in another window

Fabrication of two dimensional GaN nanophotonic crystals (31)

Bifeng Rong; Huub W. M. Salemink; Erik M. Roeling; Rob van der Heijden; Fouad Karouta; Emile van der Drift

J. Vac. Sci. Technol. B 25, 2632–2636 (2007) https://doi.org/10.1116/1.2794066

Abstract

View articletitled, Fabrication of two dimensional GaN nanophotonic crystals (31)

Open the PDF for in another window

Semitransparent Cu electrode on a flexible substrate and its application in organic light emitting diodes

Myung-Gyu Kang; L. Jay Guo

J. Vac. Sci. Technol. B 25, 2637–2641 (2007) https://doi.org/10.1116/1.2801873

Abstract

View articletitled, Semitransparent Cu electrode on a flexible substrate and its application in organic light emitting diodes

Open the PDF for in another window

Photoluminescence enhancement in metallic nanocomposite printable polymer

V. Reboud; N. Kehagias; M. Striccoli; T. Placido; A. Panniello; M. L. Curri; M. Zelsmann; F. Reuther; G. Gruetzner; C. M. Sotomayor Torres

J. Vac. Sci. Technol. B 25, 2642–2644 (2007) https://doi.org/10.1116/1.2789445

Abstract

View articletitled, Photoluminescence enhancement in metallic nanocomposite printable polymer

Open the PDF for in another window

Fabrication of high aspect ratio Si nanogratings with smooth sidewalls for a deep UV-blocking particle filter

Pran Mukherjee; Myung-Gyu Kang; Thomas H. Zurbuchen; L. Jay Guo; Fred A. Herrero

J. Vac. Sci. Technol. B 25, 2645–2648 (2007) https://doi.org/10.1116/1.2804612

Abstract

View articletitled, Fabrication of high aspect ratio Si nanogratings with smooth sidewalls for a deep UV-blocking particle filter

Open the PDF for in another window

V-groove plasmonic waveguides fabricated by nanoimprint lithography

Irene Fernandez-Cuesta; Rasmus Bundgaard Nielsen; Alexandra Boltasseva; Xavier Borrisé; Francesc Pérez-Murano; Anders Kristensen

J. Vac. Sci. Technol. B 25, 2649–2653 (2007) https://doi.org/10.1116/1.2779041

Abstract

View articletitled, V-groove plasmonic waveguides fabricated by nanoimprint lithography

Open the PDF for in another window

$58 nm$ half-pitch plastic wire-grid polarizer by nanoimprint lithography

Lei Chen; Jian Jim Wang; Frank Walters; Xuegong Deng; Mike Buonanno; Stephen Tai; Xiaoming Liu

J. Vac. Sci. Technol. B 25, 2654–2657 (2007) https://doi.org/10.1116/1.2801967

Abstract

View articletitled, <math xmlns="http://www.w3.org/1998/Math/MathML"><mrow xmlns=""><mn>58</mn><mspace width="0.3em"></mspace><mi>nm</mi></mrow></math> half-pitch plastic wire-grid polarizer by nanoimprint lithography

Open the PDF for in another window

Optimization of hydrogen silsesquioxane for photonic applications

C. W. Holzwarth; T. Barwicz; Henry I. Smith

J. Vac. Sci. Technol. B 25, 2658–2661 (2007) https://doi.org/10.1116/1.2787832

Abstract

View articletitled, Optimization of hydrogen silsesquioxane for photonic applications

Open the PDF for in another window

Membrane stacking: A new approach for three-dimensional nanostructure fabrication

Amil A. Patel; Henry I. Smith

J. Vac. Sci. Technol. B 25, 2662–2664 (2007) https://doi.org/10.1116/1.2799979

Abstract

View articletitled, Membrane stacking: A new approach for three-dimensional nanostructure fabrication

Open the PDF for in another window