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REGULAR ARTICLES

J. Vac. Sci. Technol. B 20, 2183–2186 (2002) https://doi.org/10.1116/1.1513633
J. Vac. Sci. Technol. B 20, 2187–2191 (2002) https://doi.org/10.1116/1.1513792
J. Vac. Sci. Technol. B 20, 2192–2198 (2002) https://doi.org/10.1116/1.1513632
J. Vac. Sci. Technol. B 20, 2199–2205 (2002) https://doi.org/10.1116/1.1513621
J. Vac. Sci. Technol. B 20, 2206–2209 (2002) https://doi.org/10.1116/1.1513582
J. Vac. Sci. Technol. B 20, 2210–2213 (2002) https://doi.org/10.1116/1.1515912
J. Vac. Sci. Technol. B 20, 2214–2218 (2002) https://doi.org/10.1116/1.1515908
J. Vac. Sci. Technol. B 20, 2219–2224 (2002) https://doi.org/10.1116/1.1515911
J. Vac. Sci. Technol. B 20, 2225–2228 (2002) https://doi.org/10.1116/1.1515909
J. Vac. Sci. Technol. B 20, 2229–2232 (2002) https://doi.org/10.1116/1.1515910
J. Vac. Sci. Technol. B 20, 2233–2237 (2002) https://doi.org/10.1116/1.1517262
J. Vac. Sci. Technol. B 20, 2238–2242 (2002) https://doi.org/10.1116/1.1517261
J. Vac. Sci. Technol. B 20, 2243–2247 (2002) https://doi.org/10.1116/1.1517410
J. Vac. Sci. Technol. B 20, 2248–2251 (2002) https://doi.org/10.1116/1.1517263
J. Vac. Sci. Technol. B 20, 2252–2255 (2002) https://doi.org/10.1116/1.1517260
J. Vac. Sci. Technol. B 20, 2256–2264 (2002) https://doi.org/10.1116/1.1518969
J. Vac. Sci. Technol. B 20, 2265–2270 (2002) https://doi.org/10.1116/1.1518968
J. Vac. Sci. Technol. B 20, 2271–2274 (2002) https://doi.org/10.1116/1.1518970
J. Vac. Sci. Technol. B 20, 2275–2280 (2002) https://doi.org/10.1116/1.1518973
J. Vac. Sci. Technol. B 20, 2281–2287 (2002) https://doi.org/10.1116/1.1518967
J. Vac. Sci. Technol. B 20, 2288–2294 (2002) https://doi.org/10.1116/1.1518972
J. Vac. Sci. Technol. B 20, 2295–2298 (2002) https://doi.org/10.1116/1.1518974
J. Vac. Sci. Technol. B 20, 2299–2302 (2002) https://doi.org/10.1116/1.1518971
J. Vac. Sci. Technol. B 20, 2303–2308 (2002) https://doi.org/10.1116/1.1520557
J. Vac. Sci. Technol. B 20, 2309–2313 (2002) https://doi.org/10.1116/1.1520553
J. Vac. Sci. Technol. B 20, 2314–2319 (2002) https://doi.org/10.1116/1.1520549
J. Vac. Sci. Technol. B 20, 2320–2327 (2002) https://doi.org/10.1116/1.1520554
J. Vac. Sci. Technol. B 20, 2328–2336 (2002) https://doi.org/10.1116/1.1520556
J. Vac. Sci. Technol. B 20, 2337–2345 (2002) https://doi.org/10.1116/1.1520548
J. Vac. Sci. Technol. B 20, 2346–2350 (2002) https://doi.org/10.1116/1.1520551
J. Vac. Sci. Technol. B 20, 2351–2360 (2002) https://doi.org/10.1116/1.1520555
J. Vac. Sci. Technol. B 20, 2361–2366 (2002) https://doi.org/10.1116/1.1520552
J. Vac. Sci. Technol. B 20, 2367–2374 (2002) https://doi.org/10.1116/1.1520550
J. Vac. Sci. Technol. B 20, 2375–2383 (2002) https://doi.org/10.1116/1.1521428
J. Vac. Sci. Technol. B 20, 2384–2387 (2002) https://doi.org/10.1116/1.1524152
J. Vac. Sci. Technol. B 20, 2388–2392 (2002) https://doi.org/10.1116/1.1524151
J. Vac. Sci. Technol. B 20, 2393–2400 (2002) https://doi.org/10.1116/1.1524153
J. Vac. Sci. Technol. B 20, 2401–2407 (2002) https://doi.org/10.1116/1.1524150
J. Vac. Sci. Technol. B 20, 2408–2412 (2002) https://doi.org/10.1116/1.1525813
J. Vac. Sci. Technol. B 20, 2413–2420 (2002) https://doi.org/10.1116/1.1525811
J. Vac. Sci. Technol. B 20, 2421–2432 (2002) https://doi.org/10.1116/1.1525812
J. Vac. Sci. Technol. B 20, 2433–2440 (2002) https://doi.org/10.1116/1.1526360
J. Vac. Sci. Technol. B 20, 2441–2448 (2002) https://doi.org/10.1116/1.1526357
J. Vac. Sci. Technol. B 20, 2449–2458 (2002) https://doi.org/10.1116/1.1526605
J. Vac. Sci. Technol. B 20, 2459–2465 (2002) https://doi.org/10.1116/1.1526356
J. Vac. Sci. Technol. B 20, 2466–2469 (2002) https://doi.org/10.1116/1.1526601

PAPERS FROM THE THIRD LOW ENERGY ELECTRON/MICROSCOPY PHOTOEMISSION ELECTRON MICROSCOPY WORKSHOP

SURFACE DYNAMICS, SURFACE PHASE TRANSITIONS, NUCLEATION, AND GROWTH
J. Vac. Sci. Technol. B 20, 2473–2477 (2002) https://doi.org/10.1116/1.1521958
J. Vac. Sci. Technol. B 20, 2478–2491 (2002) https://doi.org/10.1116/1.1523370
J. Vac. Sci. Technol. B 20, 2492–2495 (2002) https://doi.org/10.1116/1.1523372
J. Vac. Sci. Technol. B 20, 2496–2499 (2002) https://doi.org/10.1116/1.1523374
J. Vac. Sci. Technol. B 20, 2500–2504 (2002) https://doi.org/10.1116/1.1525006

DIAMOND AND ORGANIC THIN-FILM APPLICATIONS

J. Vac. Sci. Technol. B 20, 2505–2508 (2002) https://doi.org/10.1116/1.1525008
J. Vac. Sci. Technol. B 20, 2509–2513 (2002) https://doi.org/10.1116/1.1525009

DEVICE APPLICATIONS AND INSTRUMENTATION

J. Vac. Sci. Technol. B 20, 2514–2518 (2002) https://doi.org/10.1116/1.1525007
J. Vac. Sci. Technol. B 20, 2519–2525 (2002) https://doi.org/10.1116/1.1523375
J. Vac. Sci. Technol. B 20, 2526–2534 (2002) https://doi.org/10.1116/1.1523373

MAGNETIC THIN-FILM APPLICATIONS

J. Vac. Sci. Technol. B 20, 2535–2538 (2002) https://doi.org/10.1116/1.1519863
J. Vac. Sci. Technol. B 20, 2539–2542 (2002) https://doi.org/10.1116/1.1525005
J. Vac. Sci. Technol. B 20, 2543–2549 (2002) https://doi.org/10.1116/1.1523371

PAPERS FROM THE 46TH INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION

OPTICAL LITHOGRAPHY
J. Vac. Sci. Technol. B 20, 2562–2566 (2002) https://doi.org/10.1116/1.1520577
J. Vac. Sci. Technol. B 20, 2567–2573 (2002) https://doi.org/10.1116/1.1524974
J. Vac. Sci. Technol. B 20, 2574–2577 (2002) https://doi.org/10.1116/1.1515302
J. Vac. Sci. Technol. B 20, 2578–2582 (2002) https://doi.org/10.1116/1.1526099
J. Vac. Sci. Technol. B 20, 2583–2588 (2002) https://doi.org/10.1116/1.1526098
J. Vac. Sci. Technol. B 20, 2589–2596 (2002) https://doi.org/10.1116/1.1520567
J. Vac. Sci. Technol. B 20, 2597–2601 (2002) https://doi.org/10.1116/1.1526353
J. Vac. Sci. Technol. B 20, 2602–2605 (2002) https://doi.org/10.1116/1.1523396
J. Vac. Sci. Technol. B 20, 2606–2609 (2002) https://doi.org/10.1116/1.1524978
J. Vac. Sci. Technol. B 20, 2610–2616 (2002) https://doi.org/10.1116/1.1526603
J. Vac. Sci. Technol. B 20, 2617–2621 (2002) https://doi.org/10.1116/1.1520563

ELECTRON BEAM LITHOGRAPHY

J. Vac. Sci. Technol. B 20, 2622–2626 (2002) https://doi.org/10.1116/1.1520576
J. Vac. Sci. Technol. B 20, 2627–2633 (2002) https://doi.org/10.1116/1.1515303
J. Vac. Sci. Technol. B 20, 2634–2639 (2002) https://doi.org/10.1116/1.1523016
J. Vac. Sci. Technol. B 20, 2640–2645 (2002) https://doi.org/10.1116/1.1521738
J. Vac. Sci. Technol. B 20, 2646–2650 (2002) https://doi.org/10.1116/1.1520559
J. Vac. Sci. Technol. B 20, 2651–2656 (2002) https://doi.org/10.1116/1.1520562
J. Vac. Sci. Technol. B 20, 2657–2661 (2002) https://doi.org/10.1116/1.1520574
J. Vac. Sci. Technol. B 20, 2662–2665 (2002) https://doi.org/10.1116/1.1520566
J. Vac. Sci. Technol. B 20, 2666–2671 (2002) https://doi.org/10.1116/1.1526633
J. Vac. Sci. Technol. B 20, 2672–2677 (2002) https://doi.org/10.1116/1.1520571
J. Vac. Sci. Technol. B 20, 2678–2681 (2002) https://doi.org/10.1116/1.1523020

ION BEAM LITHOGRAPHY

J. Vac. Sci. Technol. B 20, 2682–2685 (2002) https://doi.org/10.1116/1.1521736
J. Vac. Sci. Technol. B 20, 2686–2689 (2002) https://doi.org/10.1116/1.1518022
J. Vac. Sci. Technol. B 20, 2690–2694 (2002) https://doi.org/10.1116/1.1524982
J. Vac. Sci. Technol. B 20, 2695–2699 (2002) https://doi.org/10.1116/1.1526665
J. Vac. Sci. Technol. B 20, 2700–2704 (2002) https://doi.org/10.1116/1.1515310
J. Vac. Sci. Technol. B 20, 2705–2708 (2002) https://doi.org/10.1116/1.1520568
J. Vac. Sci. Technol. B 20, 2709–2712 (2002) https://doi.org/10.1116/1.1523398
J. Vac. Sci. Technol. B 20, 2713–2716 (2002) https://doi.org/10.1116/1.1524977

ELECTRON AND ION SOURCE TECHNOLOGY

J. Vac. Sci. Technol. B 20, 2717–2720 (2002) https://doi.org/10.1116/1.1526694
J. Vac. Sci. Technol. B 20, 2721–2725 (2002) https://doi.org/10.1116/1.1521742
J. Vac. Sci. Technol. B 20, 2726–2729 (2002) https://doi.org/10.1116/1.1524981

NANO- AND MICROFABRICATION

J. Vac. Sci. Technol. B 20, 2730–2733 (2002) https://doi.org/10.1116/1.1515306
J. Vac. Sci. Technol. B 20, 2734–2738 (2002) https://doi.org/10.1116/1.1523026
J. Vac. Sci. Technol. B 20, 2739–2744 (2002) https://doi.org/10.1116/1.1515301
J. Vac. Sci. Technol. B 20, 2745–2748 (2002) https://doi.org/10.1116/1.1523019
J. Vac. Sci. Technol. B 20, 2749–2752 (2002) https://doi.org/10.1116/1.1524979
J. Vac. Sci. Technol. B 20, 2753–2757 (2002) https://doi.org/10.1116/1.1521744
J. Vac. Sci. Technol. B 20, 2758–2762 (2002) https://doi.org/10.1116/1.1520558
J. Vac. Sci. Technol. B 20, 2763–2767 (2002) https://doi.org/10.1116/1.1526635
J. Vac. Sci. Technol. B 20, 2768–2772 (2002) https://doi.org/10.1116/1.1526697
J. Vac. Sci. Technol. B 20, 2773–2776 (2002) https://doi.org/10.1116/1.1520569
J. Vac. Sci. Technol. B 20, 2777–2779 (2002) https://doi.org/10.1116/1.1518023
J. Vac. Sci. Technol. B 20, 2780–2783 (2002) https://doi.org/10.1116/1.1518021
J. Vac. Sci. Technol. B 20, 2784–2787 (2002) https://doi.org/10.1116/1.1526699
J. Vac. Sci. Technol. B 20, 2788–2792 (2002) https://doi.org/10.1116/1.1521730
J. Vac. Sci. Technol. B 20, 2793–2797 (2002) https://doi.org/10.1116/1.1523015

NANODEVICES

J. Vac. Sci. Technol. B 20, 2798–2801 (2002) https://doi.org/10.1116/1.1521731
J. Vac. Sci. Technol. B 20, 2802–2805 (2002) https://doi.org/10.1116/1.1523025
J. Vac. Sci. Technol. B 20, 2806–2809 (2002) https://doi.org/10.1116/1.1524975
J. Vac. Sci. Technol. B 20, 2810–2813 (2002) https://doi.org/10.1116/1.1524973
J. Vac. Sci. Technol. B 20, 2814–2818 (2002) https://doi.org/10.1116/1.1518014
J. Vac. Sci. Technol. B 20, 2819–2823 (2002) https://doi.org/10.1116/1.1518016
J. Vac. Sci. Technol. B 20, 2824–2828 (2002) https://doi.org/10.1116/1.1523017

EUV LITHOGRAPHY

J. Vac. Sci. Technol. B 20, 2829–2833 (2002) https://doi.org/10.1116/1.1524976
J. Vac. Sci. Technol. B 20, 2834–2839 (2002) https://doi.org/10.1116/1.1523401
J. Vac. Sci. Technol. B 20, 2840–2843 (2002) https://doi.org/10.1116/1.1518017
J. Vac. Sci. Technol. B 20, 2844–2848 (2002) https://doi.org/10.1116/1.1518015
J. Vac. Sci. Technol. B 20, 2849–2852 (2002) https://doi.org/10.1116/1.1526354

NANOIMPRINT LITHOGRAPHY

J. Vac. Sci. Technol. B 20, 2853–2856 (2002) https://doi.org/10.1116/1.1523405
J. Vac. Sci. Technol. B 20, 2857–2861 (2002) https://doi.org/10.1116/1.1520575
J. Vac. Sci. Technol. B 20, 2862–2866 (2002) https://doi.org/10.1116/1.1521729
J. Vac. Sci. Technol. B 20, 2867–2871 (2002) https://doi.org/10.1116/1.1515305
J. Vac. Sci. Technol. B 20, 2872–2876 (2002) https://doi.org/10.1116/1.1523404
J. Vac. Sci. Technol. B 20, 2877–2880 (2002) https://doi.org/10.1116/1.1515307
J. Vac. Sci. Technol. B 20, 2881–2886 (2002) https://doi.org/10.1116/1.1526355
J. Vac. Sci. Technol. B 20, 2887–2890 (2002) https://doi.org/10.1116/1.1520564
J. Vac. Sci. Technol. B 20, 2891–2895 (2002) https://doi.org/10.1116/1.1521743
J. Vac. Sci. Technol. B 20, 2896–2901 (2002) https://doi.org/10.1116/1.1515311

RESISTS

J. Vac. Sci. Technol. B 20, 2902–2908 (2002) https://doi.org/10.1116/1.1526358
J. Vac. Sci. Technol. B 20, 2909–2912 (2002) https://doi.org/10.1116/1.1526359
J. Vac. Sci. Technol. B 20, 2913–2919 (2002) https://doi.org/10.1116/1.1521735
J. Vac. Sci. Technol. B 20, 2920–2926 (2002) https://doi.org/10.1116/1.1524970
J. Vac. Sci. Technol. B 20, 2927–2931 (2002) https://doi.org/10.1116/1.1526638
J. Vac. Sci. Technol. B 20, 2932–2936 (2002) https://doi.org/10.1116/1.1524980
J. Vac. Sci. Technol. B 20, 2937–2941 (2002) https://doi.org/10.1116/1.1524971
J. Vac. Sci. Technol. B 20, 2942–2945 (2002) https://doi.org/10.1116/1.1521740
J. Vac. Sci. Technol. B 20, 2946–2952 (2002) https://doi.org/10.1116/1.1523027
J. Vac. Sci. Technol. B 20, 2953–2957 (2002) https://doi.org/10.1116/1.1520565
J. Vac. Sci. Technol. B 20, 2958–2961 (2002) https://doi.org/10.1116/1.1521737
J. Vac. Sci. Technol. B 20, 2962–2967 (2002) https://doi.org/10.1116/1.1520561
J. Vac. Sci. Technol. B 20, 2968–2972 (2002) https://doi.org/10.1116/1.1521741
J. Vac. Sci. Technol. B 20, 2973–2978 (2002) https://doi.org/10.1116/1.1526352

X-RAY LITHOGRAPHY

J. Vac. Sci. Technol. B 20, 2979–2983 (2002) https://doi.org/10.1116/1.1524972
J. Vac. Sci. Technol. B 20, 2984–2990 (2002) https://doi.org/10.1116/1.1521733
J. Vac. Sci. Technol. B 20, 2991–2994 (2002) https://doi.org/10.1116/1.1523021

MASKS

J. Vac. Sci. Technol. B 20, 2995–2999 (2002) https://doi.org/10.1116/1.1520573
J. Vac. Sci. Technol. B 20, 3000–3005 (2002) https://doi.org/10.1116/1.1523397
J. Vac. Sci. Technol. B 20, 3006–3009 (2002) https://doi.org/10.1116/1.1523400
J. Vac. Sci. Technol. B 20, 3010–3014 (2002) https://doi.org/10.1116/1.1523024
J. Vac. Sci. Technol. B 20, 3015–3020 (2002) https://doi.org/10.1116/1.1518019
J. Vac. Sci. Technol. B 20, 3021–3024 (2002) https://doi.org/10.1116/1.1521739
J. Vac. Sci. Technol. B 20, 3025–3028 (2002) https://doi.org/10.1116/1.1521734
J. Vac. Sci. Technol. B 20, 3029–3034 (2002) https://doi.org/10.1116/1.1521745
J. Vac. Sci. Technol. B 20, 3035–3039 (2002) https://doi.org/10.1116/1.1520560
J. Vac. Sci. Technol. B 20, 3040–3043 (2002) https://doi.org/10.1116/1.1523399
J. Vac. Sci. Technol. B 20, 3044–3046 (2002) https://doi.org/10.1116/1.1523023
J. Vac. Sci. Technol. B 20, 3047–3052 (2002) https://doi.org/10.1116/1.1523028
J. Vac. Sci. Technol. B 20, 3053–3057 (2002) https://doi.org/10.1116/1.1521732
J. Vac. Sci. Technol. B 20, 3058–3062 (2002) https://doi.org/10.1116/1.1520570

METROLOGY

J. Vac. Sci. Technol. B 20, 3063–3066 (2002) https://doi.org/10.1116/1.1523022
J. Vac. Sci. Technol. B 20, 3067–3070 (2002) https://doi.org/10.1116/1.1523406
J. Vac. Sci. Technol. B 20, 3071–3074 (2002) https://doi.org/10.1116/1.1523402