Skip Nav Destination
Issues
May 2001
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
ISSN 1071-1023
EISSN 1520-8567
In this Issue
REGULAR ARTICLES
Enhanced diffusion as a mechanism for ion-induced damage propagation in GaN
J. Vac. Sci. Technol. B 19, 603–608 (2001)
https://doi.org/10.1116/1.1362684
Electrical properties of Pd-based ohmic contact to p-GaN
J. Vac. Sci. Technol. B 19, 609–614 (2001)
https://doi.org/10.1116/1.1372922
Raman study of luminescent spark processed porous GaAs
M. Rojas-López; J. M. Gracia-Jiménez; M. A. Vidal; H. Navarro-Contreras; R. Silva-González; E. Gómez
J. Vac. Sci. Technol. B 19, 622–627 (2001)
https://doi.org/10.1116/1.1366709
Technique employing gold nanospheres to study defect evolution in thin films
J. Vac. Sci. Technol. B 19, 628–633 (2001)
https://doi.org/10.1116/1.1364702
Molecular dynamics study of the interactions of small thermal and energetic silicon clusters with crystalline and amorphous silicon surfaces
J. Vac. Sci. Technol. B 19, 634–644 (2001)
https://doi.org/10.1116/1.1362682
Formation of Si–Si bonds and precipitation of Si nanocrystals in vacuum-ultraviolet-irradiated films
J. Vac. Sci. Technol. B 19, 649–658 (2001)
https://doi.org/10.1116/1.1368674
Field-based scanning tunneling microscope manipulation of antimony dimers on Si(001)
J. Vac. Sci. Technol. B 19, 659–665 (2001)
https://doi.org/10.1116/1.1372925
Nanowearing property of a fatigued polycarbonate surface studied by atomic force microscopy
J. Vac. Sci. Technol. B 19, 666–670 (2001)
https://doi.org/10.1116/1.1370173
Growth and structure of aligned B–C–N nanotubes
J. Vac. Sci. Technol. B 19, 671–674 (2001)
https://doi.org/10.1116/1.1371316
Scanning field-emission force microscopy and spectroscopy of chemical-vapor-deposited carbon field-emission cathodes
J. Vac. Sci. Technol. B 19, 675–682 (2001)
https://doi.org/10.1116/1.1370172
Effects of post-treatment of MgO on the discharge characteristics of an alternating current plasma display panel
J. Vac. Sci. Technol. B 19, 687–691 (2001)
https://doi.org/10.1116/1.1372921
Selective ultrahigh vacuum dry etching process for ZnSe-based II–VI semiconductors
M. Legge; G. Bacher; S. Bader; T. Kümmell; A. Forchel; J. Nürnberger; C. Schumacher; W. Faschinger; G. Landwehr
J. Vac. Sci. Technol. B 19, 692–694 (2001)
https://doi.org/10.1116/1.1372923
Time-dependent Si etch behavior and its effect on oxide/Si selectivity in electron cyclotron resonance plasma etching
J. Vac. Sci. Technol. B 19, 695–700 (2001)
https://doi.org/10.1116/1.1371318
Level set approach to simulation of feature profile evolution in a high-density plasma-etching system
J. Vac. Sci. Technol. B 19, 701–710 (2001)
https://doi.org/10.1116/1.1370174
Formation of metallic surface structures by ion etching using a S-layer template
J. Vac. Sci. Technol. B 19, 722–724 (2001)
https://doi.org/10.1116/1.1364699
Effects of gas pressure and substrate temperature on the etching of parylene-N using a remote microwave oxygen plasma
J. Vac. Sci. Technol. B 19, 725–731 (2001)
https://doi.org/10.1116/1.1366707
Exposure characteristics and three-dimensional profiling of SU8C resist using electron beam lithography
J. Vac. Sci. Technol. B 19, 732–735 (2001)
https://doi.org/10.1116/1.1368678
Photoinduced outgassing from the resist for extreme ultraviolet lithography by the analysis of mass spectroscopy
Takeo Watanabe; Hiroo Kinoshita; Hajime Nii; Kazuhiro Hamamoto; Harushige Tsubakino; Hideo Hada; Hiroshi Komano; Shigeo Irie
J. Vac. Sci. Technol. B 19, 736–742 (2001)
https://doi.org/10.1116/1.1368671
Resist hardening by fluorocarbon plasma for electron-beam and optical mix-and-match lithography
J. Vac. Sci. Technol. B 19, 743–748 (2001)
https://doi.org/10.1116/1.1364700
Ion channeling effects on the focused ion beam milling of Cu
J. Vac. Sci. Technol. B 19, 749–754 (2001)
https://doi.org/10.1116/1.1368670
Preparation of site specific transmission electron microscopy plan-view specimens using a focused ion beam system
J. Vac. Sci. Technol. B 19, 755–758 (2001)
https://doi.org/10.1116/1.1371317
Selective chemical vapor deposition of copper on AZ 5214™-patterned silicon substrates
J. Vac. Sci. Technol. B 19, 759–761 (2001)
https://doi.org/10.1116/1.1362680
Recrystallization effects in Cu electrodeposits used in fine line damascene structures
J. Vac. Sci. Technol. B 19, 762–766 (2001)
https://doi.org/10.1116/1.1366708
Investigations of effects of bias polarization and chemical parameters on morphology and filling capability of 130 nm damascene electroplated copper
Shih-Chieh Chang; Jia-Min Shieh; Kun-Cheng Lin; Bau-Tong Dai; Ting-Chun Wang; Chia-Fu Chen; Ming-Shiann Feng; Ying-Hao Li; Chih-Peng Lu
J. Vac. Sci. Technol. B 19, 767–773 (2001)
https://doi.org/10.1116/1.1368673
Integration and electrical characterization of photosensitive polyimide
J. Vac. Sci. Technol. B 19, 774–779 (2001)
https://doi.org/10.1116/1.1364703
Characteristics of fluorinated amorphous carbon films and implementation of 0.15 μm damascene interconnection
J. Vac. Sci. Technol. B 19, 780–787 (2001)
https://doi.org/10.1116/1.1362683
Effect of thinning a barrier layer on its barrier capability
J. Vac. Sci. Technol. B 19, 788–793 (2001)
https://doi.org/10.1116/1.1368681
Mechanically controllable break junctions with quasi-planar electrodes
J. Vac. Sci. Technol. B 19, 807–811 (2001)
https://doi.org/10.1116/1.1373637
Integration of piezoelectric on (100)InP by using a buffer layer
J. Vac. Sci. Technol. B 19, 812–817 (2001)
https://doi.org/10.1116/1.1370177
Gas sensing properties of copper gate metal–oxide–semiconductor capacitors
J. Vac. Sci. Technol. B 19, 825–828 (2001)
https://doi.org/10.1116/1.1372924
Effects of oxygen flooding on crater bottom composition and roughness in ultrashallow secondary ion mass spectrometry depth profiling
J. Vac. Sci. Technol. B 19, 829–835 (2001)
https://doi.org/10.1116/1.1368680
Secondary-ion-mass spectrometry and high-resolution x-ray diffraction analyses of GaSb–AlGaSb heterostructures grown by molecular beam epitaxy
J. Vac. Sci. Technol. B 19, 836–842 (2001)
https://doi.org/10.1116/1.1372926
Influence of the microchannel plate and anode gap parameters on the spatial resolution of an image intensifier
J. Vac. Sci. Technol. B 19, 843–850 (2001)
https://doi.org/10.1116/1.1364701
BRIEF REPORTS AND COMMENTS
Incorporation of polyhedral oligosilsesquioxane in chemically amplified resists to improve their reactive ion etching resistance
J. Vac. Sci. Technol. B 19, 851–855 (2001)
https://doi.org/10.1116/1.1368672
RAPID COMMUNICATIONS
Effect of the Ti-underlayer microstructure on the texture of Al thin films
J. Vac. Sci. Technol. B 19, 856–858 (2001)
https://doi.org/10.1116/1.1362681
PAPERS FROM THE 13TH INTERNATIONAL VACUUM MICROELECTRONICS CONFERENCE
APPLICATIONS
Use of microfabricated cold field emitters in sub-100 nm maskless lithography
J. Vac. Sci. Technol. B 19, 862–865 (2001)
https://doi.org/10.1116/1.1360178
Secondary electron emission characteristics for sol–gel based thin films
J. Vac. Sci. Technol. B 19, 866–869 (2001)
https://doi.org/10.1116/1.1373640
Improved performance of nonevaporable getter activated by a continuous wave infrared laser
S. N. Cha; J. Y. Choung; B. G. Song; J. M. Choi; I. T. Han; N. S. Park; J. E. Jung; N. S. Lee; J. M. Kim; J. K. Chee; J. P. Hong
J. Vac. Sci. Technol. B 19, 870–873 (2001)
https://doi.org/10.1116/1.1371016
Pressure change characteristics of a field emission display panel in operation
J. Vac. Sci. Technol. B 19, 874–876 (2001)
https://doi.org/10.1116/1.1370176
FE CHARACTERIZATION
Electron field emission characteristics of textured silicon surface
J. Vac. Sci. Technol. B 19, 884–887 (2001)
https://doi.org/10.1116/1.1361040
MICROFABRICATION AND TIP ARRAYS
Mold-type field-emission array fabrication by the use of fast silicon etching
J. Vac. Sci. Technol. B 19, 897–899 (2001)
https://doi.org/10.1116/1.1373639
100 nm gate hole openings for low voltage driving field emission display applications
J. Vac. Sci. Technol. B 19, 900–903 (2001)
https://doi.org/10.1116/1.1375821
Wedge emitter fabrication using focused ion beam
J. Vac. Sci. Technol. B 19, 904–906 (2001)
https://doi.org/10.1116/1.1349734
Performance improvement of gated silicon field emitters with a thin layer of boron nitride
J. Vac. Sci. Technol. B 19, 907–911 (2001)
https://doi.org/10.1116/1.1370179
Emission characteristics of Spindt-type platinum field emitters improved by operation in carbon monoxide ambient
J. Vac. Sci. Technol. B 19, 912–915 (2001)
https://doi.org/10.1116/1.1376392
Fabrication and electrical characterization of high aspect ratio silicon field emitter arrays
J. Vac. Sci. Technol. B 19, 916–919 (2001)
https://doi.org/10.1116/1.1371018
Damageless vacuum sealing of Si field emitters with plasma treatment
J. Vac. Sci. Technol. B 19, 920–924 (2001)
https://doi.org/10.1116/1.1364696
Novel resistive layer structure using via holes of an insulating interdielectric as a current path
J. Vac. Sci. Technol. B 19, 929–932 (2001)
https://doi.org/10.1116/1.1372920
Fabrication process of field emitter arrays using focused ion and electron beam induced reaction
J. Vac. Sci. Technol. B 19, 933–935 (2001)
https://doi.org/10.1116/1.1349205
DIAMOND I
Recent development of diamond microtip field emitter cathodes and devices
J. Vac. Sci. Technol. B 19, 936–941 (2001)
https://doi.org/10.1116/1.1368667
Microscopic field emission investigation of nanodiamond and AlN coated Si tips
B. Günther; A. Göhl; G. Müller; E. Givargizov; L. Zadorozhnaya; A. Stepanova; B. Spitsyn; A. N. Blaut-Bachev; B. Seleznev; N. Suetin
J. Vac. Sci. Technol. B 19, 942–945 (2001)
https://doi.org/10.1116/1.1370178
Field electron emission from patterned nanostructured carbon films on sodalime glass substrates
J. Vac. Sci. Technol. B 19, 946–949 (2001)
https://doi.org/10.1116/1.1373641
Field emission from heat-treated cobalt-containing amorphous carbon composite films on glass substrate
J. Vac. Sci. Technol. B 19, 950–953 (2001)
https://doi.org/10.1116/1.1372918
Fabrication of triode diamond field emitter arrays on glass substrate by anisotropic conductive film bonding
J. Vac. Sci. Technol. B 19, 954–957 (2001)
https://doi.org/10.1116/1.1361039
Stable and uniform electron emission from nanostructured carbon films
J. Vac. Sci. Technol. B 19, 958–961 (2001)
https://doi.org/10.1116/1.1360177
DIAMOND II
Electron emission from nanocrystalline diamond films
J. Vac. Sci. Technol. B 19, 962–964 (2001)
https://doi.org/10.1116/1.1372919
Low-field electron emission of diamond/pyrocarbon composites
J. Vac. Sci. Technol. B 19, 965–970 (2001)
https://doi.org/10.1116/1.1368669
DIAMOND
Diamond emitter arrays with uniform self-aligned gate built from silicon-on-insulator wafer
J. Vac. Sci. Technol. B 19, 971–974 (2001)
https://doi.org/10.1116/1.1370175
Electron field emission properties of nanodiamonds synthesized by the chemical vapor deposition process
J. Vac. Sci. Technol. B 19, 975–979 (2001)
https://doi.org/10.1116/1.1349207
FE FUNDAMENTALS
Field emission current cleaning and annealing of microfabricated cold cathodes
J. Vac. Sci. Technol. B 19, 980–987 (2001)
https://doi.org/10.1116/1.1349206
Field emitters for space application
J. Vac. Sci. Technol. B 19, 988–991 (2001)
https://doi.org/10.1116/1.1366705
Relationship between work function and current fluctuation of field emitters: Use of SK chart for evaluation of work function
J. Vac. Sci. Technol. B 19, 992–994 (2001)
https://doi.org/10.1116/1.1350836
Analytic expression of the average energy of the field electrons from the n-type semiconductors
J. Vac. Sci. Technol. B 19, 995–998 (2001)
https://doi.org/10.1116/1.1360179
PHOSPHORS
Effects of the field emission display panel sealing process on the cathodoluminescence properties of phosphor screen
J. Vac. Sci. Technol. B 19, 999–1003 (2001)
https://doi.org/10.1116/1.1354981
ZnO:Zn phosphor thin films prepared by filtered arc deposition
Wei Li; Dongsheng Mao; Fumin Zhang; Xi Wang; Xianghuai Liu; Shichang Zou; Yukun Zhu; Qiong Li; Jingfang Xu
J. Vac. Sci. Technol. B 19, 1004–1007 (2001)
https://doi.org/10.1116/1.1371019
Luminescence characteristics of green phosphors with dwell times for field emission display design
J. E. Jang; J. W. Kim; S. J. Lee; N. H. Kwon; Y. W. Jin; S. H. Park; J. E. Jung; N. S. Lee; J. M. Kim
J. Vac. Sci. Technol. B 19, 1008–1011 (2001)
https://doi.org/10.1116/1.1371015
CARBON NANOTUBES
Patterning technology of carbon nanotubes for field emission displays
Young-Rae Cho; Jin Ho Lee; Yoon-Ho Song; Seung-Youl Kang; Moon-Youn Jung; Chi-Sun Hwang; Kyoung Ik Cho
J. Vac. Sci. Technol. B 19, 1012–1015 (2001)
https://doi.org/10.1116/1.1373638
Numerical indicator field emission display using carbon nanotubes as emitters
J. Vac. Sci. Technol. B 19, 1023–1025 (2001)
https://doi.org/10.1116/1.1375822
Effect of catalyst on growth behavior of carbon nanotube synthesizing by microwave heating thermal chemical vapor deposition process
J. Vac. Sci. Technol. B 19, 1026–1029 (2001)
https://doi.org/10.1116/1.1375818
Microwave-assisted chemical vapor deposition process for synthesizing carbon nanotubes
J. Vac. Sci. Technol. B 19, 1030–1033 (2001)
https://doi.org/10.1116/1.1352722
Electron field emission properties of pulsed laser deposited carbon films containing carbon nanotubes
J. Vac. Sci. Technol. B 19, 1034–1039 (2001)
https://doi.org/10.1116/1.1349204
Characteristics of carbon nanowires synthesized by local arc-discharging technique
J. Vac. Sci. Technol. B 19, 1040–1043 (2001)
https://doi.org/10.1116/1.1375824
NOVEL DEVICES AND MATERIALS
Recent progress in the characterization of electron emission from solid-state field-controlled emitters
J. Vac. Sci. Technol. B 19, 1044–1050 (2001)
https://doi.org/10.1116/1.1375820
Field emission characteristics of boron nitride films deposited on Si substrates with cubic boron nitride crystal grains
J. Vac. Sci. Technol. B 19, 1051–1054 (2001)
https://doi.org/10.1116/1.1361042
Field activated lateral-type polysilicon emitter with extremely high emission current and very low turn-on voltage
Jae-Hoon Lee; Myoung-Bok Lee; Sung-Ho Hahm; Hyun-Chul Choi; Jong-Hyun Lee; Jung-Hee Lee; Jin-Sup Kim; Kyu-Man Choi; Chang-Auck Choi
J. Vac. Sci. Technol. B 19, 1055–1058 (2001)
https://doi.org/10.1116/1.1371017
Theoretical study of the threshold field for field electron emission from amorphous diamond thin films
J. Vac. Sci. Technol. B 19, 1059–1063 (2001)
https://doi.org/10.1116/1.1352721
Robust high current field emitter tips and arrays for vacuum microelectronics devices
J. Vac. Sci. Technol. B 19, 1064–1072 (2001)
https://doi.org/10.1116/1.1349203
Electron emission from silicon tips coated with sol-gel ferroelectric thin film
J. Vac. Sci. Technol. B 19, 1073–1076 (2001)
https://doi.org/10.1116/1.1343095
Pulsed laser deposition of zinc oxide luminescent thin films
J. Vac. Sci. Technol. B 19, 1082–1084 (2001)
https://doi.org/10.1116/1.1368668
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Exploring SiC CVD growth parameters compatible with remote epitaxy
Daniel J. Pennachio, Jenifer R. Hajzus, et al.