We have grown thin, highly oriented, polycrystalline DyBa2Cu3O7−x films using molecular‐beam epitaxy (MBE) techniques that show the onset of superconductivity at temperatures above 90 K and complete transitions at temperatures as high as 87 K. These films have critical current densities as high as 5×105 A/cm2 at 4.2 K. Films were grown in a modified Varian 360 MBE machine using effusion sources containing the metal constituents, along with a gaseous oxygen source. The early stages of deposition were monitored with reflection high‐energy electron diffraction (RHEED). The best films were obtained on SrTiO3 substrates at substrate temperatures of 600–750 °C. At these temperatures, the initial stage of growth is dominated by epitaxy of copper islands. At lower temperatures, the growth is amorphous, while at higher temperatures, copper may not be incorporated into the film. Copper incorporation is also affected by oxygen flux. In all cases, the films are semiconducting or insulating as grown, and become superconducting only after high‐temperature oxygen anneals. We comment on the prospects for obtaining true epitaxy superconducting phase in situ.
Skip Nav Destination
Article navigation
March 1988
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Research Article|
March 01 1988
Molecular‐beam epitaxy and deposition of high‐Tc superconductors
E. S. Hellman;
E. S. Hellman
Solid State Electronics Laboratory and Ginzton Applied Physics Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
D. G. Schlom;
D. G. Schlom
Solid State Electronics Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
N. Missert;
N. Missert
Ginzton Applied Physics Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
K. Char;
K. Char
Ginzton Applied Physics Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
J. S. Harris, Jr.;
J. S. Harris, Jr.
Solid State Electronics Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
M. R. Beasley;
M. R. Beasley
Ginzton Applied Physics Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
A. Kapitulnik;
A. Kapitulnik
Ginzton Applied Physics Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
T. H. Geballe;
T. H. Geballe
Ginzton Applied Physics Laboratory, Stanford University, Stanford, California 94305
Search for other works by this author on:
J. N. Eckstein;
J. N. Eckstein
Varian Research Center, Palo Alto, California 94303
Search for other works by this author on:
S.‐L. Weng;
S.‐L. Weng
Varian Research Center, Palo Alto, California 94303
Search for other works by this author on:
C. Webb
C. Webb
Varian Research Center, Palo Alto, California 94303
Search for other works by this author on:
J. Vac. Sci. Technol. B 6, 799–803 (1988)
Article history
Received:
September 09 1987
Accepted:
November 17 1987
Citation
E. S. Hellman, D. G. Schlom, N. Missert, K. Char, J. S. Harris, M. R. Beasley, A. Kapitulnik, T. H. Geballe, J. N. Eckstein, S.‐L. Weng, C. Webb; Molecular‐beam epitaxy and deposition of high‐Tc superconductors. J. Vac. Sci. Technol. B 1 March 1988; 6 (2): 799–803. https://doi.org/10.1116/1.584334
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Suppressing oxygen vacancy formation in ZrO2 to improve electrical properties by employing MoO2 bottom electrode
Jaehyeon Yun, Seungyeon Kim, et al.
Related Content
Strain-induced structural transition in DyBa2Cu3O7−x films grown by atomic layer-by-layer molecular beam epitaxy
Appl. Phys. Lett. (August 2020)
Growth of DyBa2Cu3O7−x thin films on vicinal (100) SrTiO3 substrates
J. Vac. Sci. Technol. A (May 1993)
Nucleation and growth of DyBa2Cu3O7−x thin films on SrTiO3 substrates studied by transmission electron microscopy and atomic force microscopy
J. Vac. Sci. Technol. A (July 1992)
Surface step density oscillation during the growth of YBa2Cu3O7−x and DyBa2Cu3O7−x superconducting thin films
J. Vac. Sci. Technol. A (July 1993)
Characterization of a radio frequency plasma source for molecular beam epitaxial growth of high‐Tc superconductor films
J. Vac. Sci. Technol. A (September 1992)