We have performed self‐consistent density‐functional calculations in order to determine the electronic structure and band offsets at ideal (110) interfaces between HgTe, CdTe, and InSb. These materials are very nearly lattice matched; strains due to the small lattice mismatch have negligible effects on the lineups. Local‐density‐functional theory, together with ab initio pseudopotentials, is used to calculate charge densities and potentials for the interface system; this allows us to determine the lineup of the bulk band structures. The following valence‐band discontinuities are derived: 0.27 eV for CdTe/HgTe, 0.91 eV for HgTe/InSb, and 1.19 eV for CdTe/InSb. These values obey the transitivity rule. For HgTe/CdTe, we also examined the (100) and (111) interface orientations; the valence‐band offset is the same in all cases. We have also used our simpler ‘‘model solid’’ approach to predict the lineups; the results are in very good agreement with those from the self‐consistent interface calculations. Noticeable differences are found, however, with values obtained from model theories by Tersoff and by Harrison. Our value for HgTe/CdTe also clearly differs from ΔEv≊0, predicted by the common anion rule. Results for alloys can be obtained by interpolating our results for ΔEv for the pure materials. We discuss how changing the alloy composition x in HgxCd1−xTe/InSb interfaces can result in varying the band offsets over a wide range of values. Finally, we present a discussion of the experimental values that have been reported for HgTe/CdTe, and find good agreement between our theoretical value and the experimental result obtained from photoemission data.
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July 1987
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics Processing and Phenomena
Research Article|
July 01 1987
Band offsets at interfaces between HgTe, CdTe, and InSb Available to Purchase
Chris G. Van de Walle;
Chris G. Van de Walle
Stanford Electronics Laboratories and Xerox Palo Alto Research Center, Palo Alto, California 94304
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Richard M. Martin
Richard M. Martin
Xerox Palo Alto Research Center, Palo Alto, California 94304
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Chris G. Van de Walle
Richard M. Martin
Stanford Electronics Laboratories and Xerox Palo Alto Research Center, Palo Alto, California 94304
J. Vac. Sci. Technol. B 5, 1225–1228 (1987)
Article history
Received:
February 10 1987
Accepted:
March 25 1987
Citation
Chris G. Van de Walle, Richard M. Martin; Band offsets at interfaces between HgTe, CdTe, and InSb. J. Vac. Sci. Technol. B 1 July 1987; 5 (4): 1225–1228. https://doi.org/10.1116/1.583716
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