Poly acrylic acid patterning by electron beam lithography

Poly acrylic acid (PAA) is a polymer and a derivative of acrylic acid that is a superabsorbent, being able to absorb and retain water, and swell many times beyond its original volume. This property classifies it into a group of polymers called hydrogels. Hydrogels are being investigated in emerging applications such as drug delivery, biosensors, tissue engineering, wound healing bandages, and more. The ability to lithographically pattern hydrogel materials to specific dimensions at the micro and nanoscales can be very useful in devices and sensors. Limited work has been done on characterizing PAA for lithographic purposes, and so, this work investigates the ability to pattern PAA by electron beam lithography (EBL). PAA is interesting in that its carrier solvent, developer, and remover are all water alone, which may make it attractive for processes or materials that cannot tolerate solvents, acids, and bases used with other common EBL resists. PAA behaves as a negative tone resist with a relatively low base dose of 75 μC/cm² at 100 kV acceleration voltage. The resolution is limited to 1.8 μm due to a low contrast of 1.29. However, PAA may still have many uses at that resolution where the positioning and dimension control of a hydrogel could be useful. Furthermore, PAA can successfully be used for pattern transfer with either a metal liftoff process or a silicon plasma etch.