Using a self-consistent plasma model coupled with Maxwell's equations, the limitations of independent control of ion fluxes and their energy distribution functions extracted from the high-density inductively coupled chlorine plasma are studied. Two extreme cases of discharge power are considered: 100 W and 1 kW. We find that in the low-power case, plasma is mainly generated by electromagnetic waves while the radio-frequency biased electrode primarily enables plasma ion extraction. Therefore, the ion fluxes and distribution functions are controlled independently. For the high-power case of 1 kW, the bias electrode significantly contributes to plasma generation but has only a small effect on sheath voltage. As a consequence, independent control of ion fluxes and distribution functions becomes impossible. Namely, the increase in the power driving the radio-frequency electrode leads to the increase in the ion fluxes but has little effect on their energy and angular distributions.

1.
D. M.
Manos
and
D. L.
Flamm
,
Plasma Etching: An Introduction
(
Academics
,
San Diego
,
1989
).
2.
G. S.
Hwang
and
K. P.
Giapis
,
Appl. Phys. Lett.
71
,
458
(
1997
).
3.
S. K.
Kanakasabapathy
,
L. J.
Overzet
,
V.
Midha
, and
D.
Economou
,
Appl. Phys. Lett.
78
,
22
(
2001
).
4.
M. A.
Lieberman
and
A. J.
Lichtenberg
,
Principles of Plasma Discharges and Plasma Processing
(
Wiley
,
New York
,
2005
).
5.
H.
Takekida
and
K.
Nanbu
,
J. Phys. D: Appl. Phys.
38
,
3461
(
2005
).
6.
H.-C.
Lee
,
M.-H.
Lee
, and
C.-W.
Chung
,
Appl. Phys. Lett.
96
,
071501
(
2010
).
7.
J.
Schulze
,
E.
Schüngel
, and
U.
Czarnetzki
,
Appl. Phys. Lett.
100
,
024102
(
2012
).
8.
E.
Meeks
,
J. W.
Shon
,
Y.
Ra
, and
P.
Jones
,
J. Vac. Sci. Technol. A
13
,
2884
(
1995
).
9.
M. V.
Malyshev
and
V. M.
Donnelly
,
J. Appl. Phys.
87
,
1642
(
2000
).
10.
V.
Midha
and
D. J.
Economou
,
Plasma Sources Sci. Technol.
9
,
256
(
2000
).
11.
S.
Huang
and
J. T.
Gudmundsson
,
Plasma Sources Sci. Technol.
22
,
055020
(
2013
).
12.
S.
Huang
and
J. T.
Gudmundsson
,
Plasma Sources Sci. Technol.
23
,
025015
(
2014
).
13.
E.
Kemaneci
,
E.
Carbone
,
J.-P.
Booth
,
W.
Graef
,
J.
van Dijk
, and
G.
Kroesen
,
Plasma Source Sci. Technol.
23
,
045002
(
2014
).
14.
R. S.
Wise
,
D. P.
Lymberopoulos
, and
D. J.
Economou
,
Plasma Sources Sci. Technol.
4
,
317
(
1995
).
15.
S.
Huang
and
J. T.
Gudmundsson
,
IEEE Trans. Plasma Sci.
42
,
2854
(
2014
).
16.
L.
Tong
,
Y.-R.
Zhang
,
J.-W.
Huang
,
M.-L.
Zhao
,
D.-Q.
Wen
,
Y.-H.
Song
, and
Y.-N.
Wang
,
Phys. Plasmas
28
,
053512
(
2021
).
17.
VizGlow
,
Plasma Modeling Software for Multi-Dimensional Simulations of Non-Equilibrium Glow Discharge Systems, Theory Manual, Version 2.4
(
Esgee Technologies Inc.
, Austin, TX,
2020
).
18.
VizGrain
,
A Simulator for Rarefied Gas, Macroscopic Particle and Hybrid Plasma Dynamic Simulations, Version 2.4
(
Esgee Technologies Inc.
, Austin, TX,
2020
).
19.
D.
Levko
and
L. L.
Raja
,
J. Vac. Sci. Technol. B
40
,
052205
(
2022
).
20.
L. L.
Raja
,
S.
Mahadevan
,
P. L. G.
Ventzek
, and
J.
Yoshikawa
,
J. Vac. Sci. Technol. A
31
,
031304
(
2013
).
21.
M. H.
Khater
and
L. J.
Overzet
,
Plasma Sources Sci. Technol.
13
,
466
(
2004
).
22.
Yu. P.
Raizer
,
Gas Discharge Physics
(
Springer
,
Berlin
,
1991
).
23.
E. G.
Thorsteinsson
and
J. T.
Gudmundsson
,
Plasma Sources Sci. Technol.
19
,
015001
(
2010
).
24.
Y.
Wang
and
J. K.
Olthoff
,
J. Appl. Phys.
85
,
6358
(
1999
).
25.
D.
Levko
,
R. R.
Upadhyay
,
A.
Karpatne
,
D.
Breden
,
K.
Suzuki
,
V.
Topalian
,
C.
Shukla
, and
L. L.
Raja
,
Plasma Sources Sci. Technol.
30
,
055012
(
2021
).
26.
K.
Nanbu
and
Y.
Kitatani
,
J. Phys. D: Appl. Phys.
28
,
324
(
1995
).
27.
R. R.
Upadhyay
,
K.
Suzuki
,
L. L.
Raja
,
P. L. G.
Ventzek
, and
A.
Ranjan
,
J. Phys. D: Appl. Phys.
53
,
435209
(
2020
).
28.
E.
Kawamura
,
V.
Vahedi
,
M. A.
Lieberman
, and
C. K.
Birdsall
,
Plasma Sources Sci. Technol.
8
,
R45
(
1999
).
29.
R. A.
Gottscho
,
J. Vac. Sci. Technol. B
11
,
1884
(
1993
).
30.
E. S.
Aydil
,
B. O. M.
Quiniou
,
J. T. C.
Lee
,
J. A.
Gregus
, and
R. A.
Gottscho
,
Mater. Sci. Semicond. Process.
1
,
75
(
1998
).
31.
D. J.
Economou
,
Appl. Surf. Sci.
253
,
6672
(
2007
).
32.
Y.-R.
Zhang
,
F.
Gao
,
X.-C.
Li
,
A.
Bogaerts
, and
Y.-N.
Wang
,
J. Vac. Sci. Technol. A
33
,
061303
(
2015
).
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