Laser microstructuring allows the manufacturing of conical shaped emitters on a graphitized carbon substrate without any additional treatment. Integral field emission measurements were performed in a diode configuration with a 50 μm mica spacer and a metalized Si-grid in a vacuum chamber at pressures of about 10−9 mbar. Emission currents up to 10 μA at a voltage of 1000 V (11 MV/m) with a positive current drift were observed for an array of 16 emitters. A strong modification of the emitter tip is noticeable after individual measurements. A comparable alteration of the surface is also achieved by an electrochemical treatment of the samples with a potassium hydroxide solution. However, the IV-measurements of such samples show not only higher onset voltages but also higher integral emission currents. For all arrays, an ideal Fowler–Nordheim (FN) behavior is only noticeable at applied voltages below 625 V (7 MV/m). Numerical calculations indicate that the deviation in the FN-plot for higher voltage values is caused by the change of the effective work function.
Skip Nav Destination
Article navigation
March 2022
Research Article|
February 01 2022
Field emission arrays from graphite fabricated by laser micromachining
Special Collection:
Vacuum Nanoelectronics
Robert Ławrowski
;
Robert Ławrowski
a)
1
Applied Natural Sciences and Cultural Studies, OTH Regensburg
, 93053 Regensburg, Germany
a)Author to whom correspondence should be addressed: robert.lawrowski@oth-regensburg.de
Search for other works by this author on:
Michael Bachmann
;
Michael Bachmann
2
Ketek GmbH
, 81737 Munich, Germany
Search for other works by this author on:
Rupert Schreiner
Rupert Schreiner
1
Applied Natural Sciences and Cultural Studies, OTH Regensburg
, 93053 Regensburg, Germany
Search for other works by this author on:
a)Author to whom correspondence should be addressed: robert.lawrowski@oth-regensburg.de
Note: This paper is a part of the Special Topic Collection on Vacuum Nanoelectronics.
J. Vac. Sci. Technol. B 40, 023203 (2022)
Article history
Received:
October 13 2021
Accepted:
January 13 2022
Citation
Robert Ławrowski, Michael Bachmann, Rupert Schreiner; Field emission arrays from graphite fabricated by laser micromachining. J. Vac. Sci. Technol. B 1 March 2022; 40 (2): 023203. https://doi.org/10.1116/6.0001547
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications
A. S. Stodolna, T. W. Mechielsen, et al.
Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning
Yasser Pordeli, Céline Steenge, et al.
Related Content
Silicon chip field emission electron source fabricated by laser micromachining
J. Vac. Sci. Technol. B (December 2019)
Integrated multichip field emission electron source fabricated by laser-micromachining and MEMS technology
J. Vac. Sci. Technol. B (January 2024)
Maximizing the performance of a field emission device by profiling the emitter’s height distribution
J. Vac. Sci. Technol. B (September 2023)
Fabrication of multiple microcolumn array combined with field emission array
J. Vac. Sci. Technol. B (November 1997)
Single micromachined emitter characteristics
J. Vac. Sci. Technol. B (March 1993)