The authors developed a microparticle simulation for low-pressure plasma environments occurring in certain plasma coating systems. The simulation is based on a theoretical model for the forces and currents acting on microparticles and takes place in a 3D geometry modeled after the coating chamber. As a test case, the Enhanded Optical Sputtering System was used, and the resulting size distribution functions for two different microparticle species were compared with experimental size distributions, showing a qualitative agreement and yielding some explanations for the experimental results.
Simulation of microparticle motion and contamination in plasma coating systems
Note: This paper is part of the Conference Collection: 15th International Symposium on Sputtering and Plasma Processes (ISSP2019).
Philipp Schulz, Andreas Pflug, Hans-Ulrich Kricheldorf; Simulation of microparticle motion and contamination in plasma coating systems. J. Vac. Sci. Technol. B 1 March 2020; 38 (2): 022203. https://doi.org/10.1116/1.5130720
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