A line edge roughness analysis software is developed based on the Canny edge detection algorithm with a double threshold, where threshold values are obtained by Otsu’s method. The performance of the software is demonstrated on features with a 200-nm nominal pitch generated by current-controlled, field-emission scanning probe lithography. Two lithographic modes are applied: (a) direct self-development positive mode and (b) image reversal mode. Atomic force imaging is used to analyze the line edge roughness. This is followed by a benchmarking study, where findings are compared to those provided by metroler software (Fractilia, LLC). This work is the first report on both line edge roughness involving imaging using the same exposure setup and latent image line edge roughness—made possible thanks to the resolving power of imaging through noncontact AFM. The authors are presenting a comparison of patterning through image reversal of the calixarene molecular glass resist from negative-tone to positive-tone as well as direct-write. In image reversal, a close match was observed between the proposed analysis and metroler software for line edge roughness and linewidth.
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January 2020
Research Article|
December 26 2019
Line edge roughness metrology software
Sertac Guneri Yazgi;
Sertac Guneri Yazgi
1
Department of Mechanical Engineering, Koc University
, Sarıyer, 34450 Istanbul, Turkey
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Tzvetan Ivanov;
Tzvetan Ivanov
2
Department of Micro- and Nanoelectronic Systems, TU Ilmenau
, 98693 Ilmenau, Germany
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Mathias Holz;
Mathias Holz
3
nano analytik GmbH
, 98693 Ilmenau, Germany
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Ivo W. Rangelow
;
Ivo W. Rangelow
2
Department of Micro- and Nanoelectronic Systems, TU Ilmenau
, 98693 Ilmenau, Germany
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Burhanettin Erdem Alaca
Burhanettin Erdem Alaca
a)
1
Department of Mechanical Engineering, Koc University
, Sarıyer, 34450 Istanbul, Turkey
4
Koc University Surface Technologies Research Center (KUYTAM), Koc University
, Sarıyer, 34450 Istanbul, Turkey
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a)
Electronic mail: ealaca@ku.edu.tr
Note: This paper is part of the Conference Collection: The 63rd International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication (EIPBN 2019).
J. Vac. Sci. Technol. B 38, 012602 (2020)
Article history
Received:
July 30 2019
Accepted:
December 13 2019
Citation
Sertac Guneri Yazgi, Tzvetan Ivanov, Mathias Holz, Ivo W. Rangelow, Burhanettin Erdem Alaca; Line edge roughness metrology software. J. Vac. Sci. Technol. B 1 January 2020; 38 (1): 012602. https://doi.org/10.1116/1.5122675
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