Numerical and analytical approaches developed for the calculation of dielectric constants of porous organosilicate glasses (OSG) were applied to porous hydrocarbon bridged OSG films. All calculations were based on a modified Clausius–Mossotti equation and used for films with wide ranges of porosity (0.2–0.4). The dielectric constants were calculated in an assumption of preferential localization of CH3 groups on the pore walls as for OSG films and uniform distribution of ethylene and phenylene groups in the silicon dioxide matrix. The authors expect the predicted values of dielectric constants to be of help for the plasma processing industry.

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