The organic/inorganic hybridization of photopolymerized resist films for ultraviolet nanoimprint lithography (UV-NIL) through chemical vapor modifications of atomic layer deposition (ALD), sequential infiltration synthesis (SIS), and saturated vapor infiltration (SVI) with an inorganic precursor of trimethylaluminum (TMA) and an oxidant of water was investigated. The hybridization of the bisphenol A-based polymethacrylate resist films was compared between resin-A comprising a monomer with hydroxy groups and resin-B comprising another monomer without hydroxy groups. The elemental depth profiles by scanning transmission electron microscopy and energy dispersive x-ray spectroscopy revealed the following three things. ALD and SIS caused the hybridization of the organic resist films with inorganic alumina near the film surfaces, while SVI caused the hybridization of the resist films entirely. The hydroxy-free resin-B physically adsorbed and chemically fixed more TMA molecules than the hydroxy-containing resin-A. Although SIS progressed the entire hybridization of the resist films, different behaviors of segregation of alumina between the hydroxy-containing resin-A and hydroxy-free resin-B films were confirmed near the film surface, inside, and interface with a silicon substrate. The organic/inorganic hybridization enabled the tuning of the etching rate of the NIL resist masks with a thickness of no thicker than 20 nm in oxygen reactive ion etching often used for the removal of residual layers from imprint patterns in UV-NIL processes.
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November 2018
Research Article|
November 14 2018
Visualization of organic/inorganic hybridization of UV-cured films with trimethylaluminum by scanning transmission electron microscopy and energy dispersive x-ray spectroscopy
Masaru Nakagawa;
Masaru Nakagawa
a)
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, Japan
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Takuya Uehara;
Takuya Uehara
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, Japan
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Yuki Ozaki;
Yuki Ozaki
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, Japan
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Takahiro Nakamura;
Takahiro Nakamura
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, Japan
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Shunya Ito
Shunya Ito
Institute of Multidisciplinary Research for Advanced Materials (IMRAM), Tohoku University
, 2-1-1 Katahira, Aoba-ku, Sendai, Miyagi 980-8577, Japan
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a)
Electronic mail: masaru.nakagawa.c5@tohoku.ac.jp
J. Vac. Sci. Technol. B 36, 06JF02 (2018)
Article history
Received:
July 10 2018
Accepted:
October 23 2018
Citation
Masaru Nakagawa, Takuya Uehara, Yuki Ozaki, Takahiro Nakamura, Shunya Ito; Visualization of organic/inorganic hybridization of UV-cured films with trimethylaluminum by scanning transmission electron microscopy and energy dispersive x-ray spectroscopy. J. Vac. Sci. Technol. B 1 November 2018; 36 (6): 06JF02. https://doi.org/10.1116/1.5047822
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