In order to overcome the limitations of sputter depth profiling, the authors have introduced focused ion beam-time-of-flight secondary ion mass spectrometry (FIB-TOF-SIMS). In this article, the authors summarize our investigation into the capability of Ar-gas cluster ion beam (GCIB) to remove FIB-induced molecular damage. The analysis of organic–inorganic hybrid mixture samples is applied and discussed. The authors demonstrate a method whereby the accurate and reproducible chemical depth distributions of atomic and molecular moieties in hybrid materials are successfully acquired. Our results reveal the approach of using Ar-GCIB for molecular recovery of FIB straggle to be highly reproducible and amenable to three-dimensional materials characterization.

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