Focused soft X-ray beam induced deposition of metallic deposits from metal organic precursors is a promising novel technique for additive nanostructure fabrication. In the present work, the authors present a comparative study for deposition and in situ characterization of Co and Mn nanostructures in a scanning transmission x-ray microscope. The authors detect a significant selectivity of the deposition process with respect to the incident photon energy that arises from the enhanced x-ray absorption cross section of the precursor molecules for near-threshold excitation. This effect has been investigated for the L2,3-edges of the respective metal centers of two different precursor molecules as well as the N and O K-edges of the respective ligands. The authors find a photon-limited growth mode for deposition from cobalt tricarbonyl nitrosyl [Co(CO)3NO], while the process is precursor-limited for methylcyclopentadienyl manganese tricarbonyl [MeCpMn(CO)3] possibly due to a comparably low vapor pressure of the latter precursor.
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See supplementary material at http://dx.doi.org/10.1116/1.4979274 for C K-edge NEXAFS spectra of the deposits presented in this work.
© 2017 American Vacuum Society.
2017
American Vacuum Society
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