In this study, an array of Mo cones for volcano-structured Spindt-type microelectron emitters were fabricated. A recently developed triode high power pulsed magnetron sputtering system was used to control the positive plasma potential and efficiently accelerate ion species. By applying a proper positive voltage to the additional electrode, the authors obtained good cone shapes with high aspect ratios in a water-cooled microcavity structure made of two resist layers, which was previously impossible by conventional vacuum evaporation techniques. The effects of ion acceleration on the alignment of ions along the normal direction, as well as on the stress in the deposited film, are discussed. The former is important for the formation of sharp cones, while the latter is crucial for achieving stable fabrication.
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March 2017
Research Article|
March 20 2017
Fabrication of Mo microcones for volcano-structured double-gate Spindt-type emitter cathodes using triode high power pulsed magnetron sputtering
Takeo Nakano;
Takeo Nakano
a)
Department of Materials and Life Science,
Seikei University
, 3-3-1 Kichijoji-Kita, Musashino, Tokyo 180-8633, Japan
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Tomoki Narita;
Tomoki Narita
Department of Materials and Life Science,
Seikei University
, 3-3-1 Kichijoji-Kita, Musashino, Tokyo 180-8633, Japan
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Kei Oya;
Kei Oya
Department of Materials and Life Science,
Seikei University
, 3-3-1 Kichijoji-Kita, Musashino, Tokyo 180-8633, Japan
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Masayoshi Nagao;
Masayoshi Nagao
National Institute of Advanced Industrial Science and Technology (AIST)
, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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Hisashi Ohsaki
Hisashi Ohsaki
National Institute of Advanced Industrial Science and Technology (AIST)
, 1-1-1 Umezono, Tsukuba, Ibaraki 305-8568, Japan
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a)
Electronic mail: nakano@st.seikei.ac.jp
J. Vac. Sci. Technol. B 35, 022204 (2017)
Article history
Received:
October 29 2016
Accepted:
February 27 2017
Citation
Takeo Nakano, Tomoki Narita, Kei Oya, Masayoshi Nagao, Hisashi Ohsaki; Fabrication of Mo microcones for volcano-structured double-gate Spindt-type emitter cathodes using triode high power pulsed magnetron sputtering. J. Vac. Sci. Technol. B 1 March 2017; 35 (2): 022204. https://doi.org/10.1116/1.4978506
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