In this study, an array of Mo cones for volcano-structured Spindt-type microelectron emitters were fabricated. A recently developed triode high power pulsed magnetron sputtering system was used to control the positive plasma potential and efficiently accelerate ion species. By applying a proper positive voltage to the additional electrode, the authors obtained good cone shapes with high aspect ratios in a water-cooled microcavity structure made of two resist layers, which was previously impossible by conventional vacuum evaporation techniques. The effects of ion acceleration on the alignment of ions along the normal direction, as well as on the stress in the deposited film, are discussed. The former is important for the formation of sharp cones, while the latter is crucial for achieving stable fabrication.

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