The authors describe a new lithography technique that relies on spatially thinning down a polymethyl methacrylate (PMMA) film through ultraviolet (UV) radiation exposure. Patterns on chrome-on-quartz mask plates or shadow masks can be transferred to an underlying PMMA film as UV light at 254 nm is projected through the mask. This work made use of cheap and easily available low pressure hot filament mercury discharge tubes as the UV radiation source. UV irradiation causes chain scission in PMMA followed by the removal of chain fragments. The process is synergistically aided by heating the PMMA-covered sample. This process thins down the PMMA wherever it receives UV irradiation, creating a topographic pattern in the polymer film. With sufficient irradiation dose, PMMA can be completely removed, all the way down to the substrate. The UV-induced decomposition of PMMA is shown to be aided by a secondary exposure from photoelectrically generated electrons ejected from the substrate. Subsequently, both additive and subtractive processes can be performed on the patterned resist to fabricate desired structures. This novel process works with even several microns thick PMMA films and benefits from the unparalleled transparency and high resolution capability of PMMA. The authors also show some example structures fabricated using this technique.
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July 2016
Research Article|
July 08 2016
Development-less deep ultraviolet positive tone photolithography with polymethyl methacrylate
Daniel J. Carbaugh;
Daniel J. Carbaugh
School of Electrical Engineering and Computer Science, Russ College of Engineering and Technology,
Ohio University
, Athens, Ohio 45701
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Jason T. Wright;
Jason T. Wright
School of Electrical Engineering and Computer Science, Russ College of Engineering and Technology,
Ohio University
, Athens, Ohio 45701
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Parthiban Rajan;
Parthiban Rajan
School of Electrical Engineering and Computer Science, Russ College of Engineering and Technology,
Ohio University
, Athens, Ohio 45701
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Savas Kaya;
Savas Kaya
School of Electrical Engineering and Computer Science, Russ College of Engineering and Technology,
Ohio University
, Athens, Ohio 45701
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Faiz Rahman
Faiz Rahman
a)
School of Electrical Engineering and Computer Science, Russ College of Engineering and Technology,
Ohio University
, Athens, Ohio 45701
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Daniel J. Carbaugh
Jason T. Wright
Parthiban Rajan
Savas Kaya
Faiz Rahman
a)
School of Electrical Engineering and Computer Science, Russ College of Engineering and Technology,
Ohio University
, Athens, Ohio 45701a)
Author to whom correspondence should be addressed; electronic mail: [email protected]
J. Vac. Sci. Technol. B 34, 041609 (2016)
Article history
Received:
April 27 2016
Accepted:
June 21 2016
Citation
Daniel J. Carbaugh, Jason T. Wright, Parthiban Rajan, Savas Kaya, Faiz Rahman; Development-less deep ultraviolet positive tone photolithography with polymethyl methacrylate. J. Vac. Sci. Technol. B 1 July 2016; 34 (4): 041609. https://doi.org/10.1116/1.4955176
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