The authors study the thermal oxidation of nickel thin films (50 nm) fabricated by conventional thermal evaporation, resulting from annealing in air at 300, 325, 350, 400, and 700 °C. The characterization is performed by x-ray diffraction, Raman spectroscopy, superconducting quantum interference device magnetometry, and scanning electron microscopy. These techniques show that the oxidation increases with annealing temperature. The formation of granular films of coexisting Ni and NiO is confirmed after annealing at 400 °C. The magnetic measurements indicate coexisting ferromagnetism and antiferromagnetism, corresponding to Ni and NiO contributions. The magnetic hysteresis loops reveal exchange bias in the samples annealed at 235, 350, and 400 °C due to the competition between the exchange interactions at the Ni/NiO interfaces.
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September 2014
Research Article|
September 22 2014
Characterization of Ni thin films following thermal oxidation in air
Luis De Los Santos Valladares;
Luis De Los Santos Valladares
a)
Cavendish Laboratory, Department of Physics,
University of Cambridge
, J.J Thomson Ave., Cambridge CB3 0HE, United Kingdom
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Adrian Ionescu;
Adrian Ionescu
Cavendish Laboratory, Department of Physics,
University of Cambridge
, J.J Thomson Ave., Cambridge CB3 0HE, United Kingdom
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Stuart Holmes;
Stuart Holmes
Cavendish Laboratory, Department of Physics,
University of Cambridge
, J.J Thomson Ave., Cambridge CB3 0HE, United Kingdom
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Crispin H. W. Barnes;
Crispin H. W. Barnes
Cavendish Laboratory, Department of Physics,
University of Cambridge
, J.J Thomson Ave., Cambridge CB3 0HE, United Kingdom
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Angel Bustamante Domínguez;
Angel Bustamante Domínguez
Laboratorio de Cerámicos y Nanomateriales, Facultad de Ciencias Físicas,
Universidad Nacional Mayor de San Marcos
, Ap. Postal 14-0149, Lima, Peru
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Oswaldo Avalos Quispe;
Oswaldo Avalos Quispe
Laboratorio de Cerámicos y Nanomateriales, Facultad de Ciencias Físicas,
Universidad Nacional Mayor de San Marcos
, Ap. Postal 14-0149, Lima, Peru
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Juan C. González;
Juan C. González
Laboratorio de Cerámicos y Nanomateriales, Facultad de Ciencias Físicas,
Universidad Nacional Mayor de San Marcos
, Ap. Postal 14-0149, Lima, Peru
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Silvia Milana;
Silvia Milana
Cambridge Graphene Centre,
University of Cambridge
, 9 J.J. Thomson Avenue, Cambridge CB3 0FA, United Kingdom
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Matteo Barbone;
Matteo Barbone
Cambridge Graphene Centre,
University of Cambridge
, 9 J.J. Thomson Avenue, Cambridge CB3 0FA, United Kingdom
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Andrea C. Ferrari;
Andrea C. Ferrari
Cambridge Graphene Centre,
University of Cambridge
, 9 J.J. Thomson Avenue, Cambridge CB3 0FA, United Kingdom
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Henry Ramos;
Henry Ramos
National Institute of Physics, College of Science,
University of the Philippines
, Diliman, Quenzon City 1101, Philippines
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Yutaka Majima
Yutaka Majima
Materials and Structures Laboratory,
Tokyo Institute of Technology
, 4259 Nagatsuta cho, Midori ku, Yokohama 226-8503, Japan
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Luis De Los Santos Valladares
a)
Adrian Ionescu
Stuart Holmes
Crispin H. W. Barnes
Angel Bustamante Domínguez
Oswaldo Avalos Quispe
Juan C. González
Silvia Milana
Matteo Barbone
Andrea C. Ferrari
Henry Ramos
Yutaka Majima
Cavendish Laboratory, Department of Physics,
University of Cambridge
, J.J Thomson Ave., Cambridge CB3 0HE, United Kingdom
a)
Electronic addresses: [email protected]; [email protected]
J. Vac. Sci. Technol. B 32, 051808 (2014)
Article history
Received:
May 30 2014
Accepted:
September 05 2014
Citation
Luis De Los Santos Valladares, Adrian Ionescu, Stuart Holmes, Crispin H. W. Barnes, Angel Bustamante Domínguez, Oswaldo Avalos Quispe, Juan C. González, Silvia Milana, Matteo Barbone, Andrea C. Ferrari, Henry Ramos, Yutaka Majima; Characterization of Ni thin films following thermal oxidation in air. J. Vac. Sci. Technol. B 1 September 2014; 32 (5): 051808. https://doi.org/10.1116/1.4895846
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