The fabrication of an etching template for 5 Td/in.2 bit patterned media using a self-organization material, namely, poly(styrene)-poly(dimethylsiloxane) (PS-PDMS), was investigated. The molecular weight of the PS-PDMS for forming the areal density of 5 Td/in.2 dot pattern was estimated from the polymerization index related to the Flory–Huggins interaction parameter. Annealing was carried out to obtain a fine-order dot pattern. PS-PDMS films were subjected to thermal treatment or solvent annealing. The ordering of the dot array in these films was evaluated by using Voronoi diagrams. The results indicate that the film annealed in N-methylpyrrolidone (NMP) vapor showed finer ordering than did the thermally treated film. This seemed to be attributable to the high solubility parameter of NMP. The soaking of NMP into the PS phase slightly shifted the phase separation energy of the polymer matrix. The lattice spacing of the obtained hexagonal pattern was 11 nm. By using low-molecular-weight PS-PDMS with solvent annealing, a dot-array template for 5 Td/in.2 bit patterned media was formed.

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