Grating arrays of polystyrenic nanostructures were fabricated by directed assembly of lamellae-forming poly(styrene-b-methyl methacrylate) diblock and poly(methyl methacrylate-b-styrene-b-methyl methacrylate) triblock copolymer films on chemical patterns and subsequent removal of polyacrylic regions by soft x-ray blanket exposure and fluid development. The collapse of gratings induced by capillary forces in a fluid rinse was observed when the aspect ratio of gratings was above a critical value or the critical aspect ratio of collapse (CARC). In stark contrast to the performance of traditional polymer photoresists, the CARC of gratings fabricated from block copolymers decreased monotonically with increasing LS. For a given pattern period (LS), the CARC of polystyrenic gratings fabricated from diblock copolymers was larger than that of gratings fabricated from an analogous triblock copolymer. The apparent elastic moduli of gratings that were calculated from CARC data using an elastic cantilever beam bending model decreased monotonically with increasing LS/L0 ratio, where L0 is the natural domain period of the block copolymer. This result is discussed in terms of possible LS-dependent changes in chain conformation, line width roughness, and domain shape of nanostructures fabricated from self-assembled block copolymer films.
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November 2012
Research Article|
November 26 2012
Mechanical properties of polymeric nanostructures fabricated through directed self-assembly of symmetric diblock and triblock copolymers
Sean P. Delcambre;
Sean P. Delcambre
Department of Chemical and Biological Engineering, University of Wisconsin – Madison
, Madison, Wisconsin 53706
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Shengxiang Ji;
Shengxiang Ji
Key Laboratory of Polymer Ecomaterials, Changchun Institute of Applied Chemistry, Chinese Academy of Sciences
, 5625 Renmin Street, Changchun 130022, China
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Paul F. Nealey
Paul F. Nealey
a)
Institute for Molecular Engineering, University of Chicago
, 5747 South Ellis Avenue, Jones 217, Chicago, IL 60637
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Sean P. Delcambre
Shengxiang Ji
Paul F. Nealey
a)
Department of Chemical and Biological Engineering, University of Wisconsin – Madison
, Madison, Wisconsin 53706a)
Electronic mail: [email protected]
J. Vac. Sci. Technol. B 30, 06F204 (2012)
Article history
Received:
June 29 2012
Accepted:
October 24 2012
Citation
Sean P. Delcambre, Shengxiang Ji, Paul F. Nealey; Mechanical properties of polymeric nanostructures fabricated through directed self-assembly of symmetric diblock and triblock copolymers. J. Vac. Sci. Technol. B 1 November 2012; 30 (6): 06F204. https://doi.org/10.1116/1.4766916
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