The authors describe a photolithographic scheme based on the replication of a periodic transparent mask in a photoresist utilizing the coherent self-imaging Talbot effect. A periodic two-dimensional diffractive structure (or Talbot mask) composed of unit tiles distributed in a square matrix was illuminated by a coherent extreme ultraviolet (EUV) beam from a table top EUV laser. The illumination beam was reflected in a spherical mirror and the Talbot mask was placed in the path of the convergent beam. At designed locations determined by the Talbot distance, reduced replicas of the mask were obtained and used to print the slightly de-magnified copies of the mask on the surface of a photoresist. Experimental results showing the de-magnification effect are in good agreement with the diffraction theory. The limits of the technique are discussed.
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November 2011
Research Article|
November 10 2011
Analysis of a scheme for de-magnified Talbot lithography
L. Urbanski;
L. Urbanski
NSF ERC for Extreme Ultraviolet Science & Technology and Electrical and Computer Engineering,
Colorado State University Fort Collins
, Colorado 80523
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M. C. Marconi;
M. C. Marconi
NSF ERC for Extreme Ultraviolet Science & Technology and Electrical and Computer Engineering,
Colorado State University Fort Collins
, Colorado 80523
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A. Isoyan;
A. Isoyan
Synopsys, Inc., Hillsboro, Oregon 97124
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A. Stein;
A. Stein
Center for Functional Nanomaterials, Brookhaven National Laboratory, New York 11973
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C. S. Menoni;
C. S. Menoni
NSF ERC for Extreme Ultraviolet Science & Technology and Electrical and Computer Engineering,
Colorado State University Fort Collins
, Colorado 80523
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J. J. Rocca
J. J. Rocca
NSF ERC for Extreme Ultraviolet Science & Technology and Electrical and Computer Engineering,
Colorado State University Fort Collins
, Colorado 80523
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J. Vac. Sci. Technol. B 29, 06F504 (2011)
Article history
Received:
June 22 2011
Accepted:
September 23 2011
Citation
L. Urbanski, M. C. Marconi, A. Isoyan, A. Stein, C. S. Menoni, J. J. Rocca; Analysis of a scheme for de-magnified Talbot lithography. J. Vac. Sci. Technol. B 1 November 2011; 29 (6): 06F504. https://doi.org/10.1116/1.3653507
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