High-aspect-ratio nanostructures are thermally imprinted with dynamic heating of the mold surface. A thin-film current heater located at the back of the mold realized rapid heating, and an upper punch and a heater substrate as coolants make the cooling time short. This heater is applied to stamping-type imprinting and injection molding. The authors demonstrated imprinting nanostructures with aspect ratios of 2–3 in the cycle time of 15 s. This equipment concept is practical for high-throughput and low-energy thermal nanoimprinting.
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