Rigorous electromagnetic field simulations are applied to investigate phase effects in the light diffraction from masks for advanced optical and extreme ultraviolet lithography. Analogies of these phase effects with wave aberrations of the projection lens and their impact on the lithographic process performance are discussed.

Topics
Electromagnetism, Holography, Photolithography, Phase shift mask, Extreme ultraviolet lithography, Finite difference methods, Optical aberrations, Diffraction, Transition metals, Diseases and conditions
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© 2010 American Vacuum Society.
2010
American Vacuum Society
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