In this study, a pulsed laser deposition process was developed to deposit a carbon nanotube (CNT) assisted electrode to improve its power density. The electrodes were deposited on Pt-coated Si substrates with Ar and as sputtering gases and as the target. The results indicate that the working pressure is the most important parameter to control the composition of the electrode. Therefore, electrodes with a three-layer structure (i.e., ) were fabricated by a three-step deposition process by varying the pressures from 13 to and then 13 Pa again, and it was found that the charge/discharge capacity became approximately 1.5 times greater than that in the corresponding electrode without a CNT-rich layer. The results also indicate that a higher substrate temperature is favorable for improving the crystallinity of the electrode to approach crystals.
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November 2009
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
December 04 2009
Process and properties of the carbon nanotube assisted thin-film battery electrode by pulsed laser deposition
An-Ya Lo;
An-Ya Lo
Department of Materials Science and Engineering,
National Chiao Tung University
, Hsinchu 30010, Taiwan
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Chuan-Shu Sun;
Chuan-Shu Sun
Department of Materials Science and Engineering,
National Chiao Tung University
, Hsinchu 30010, Taiwan
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Wen-Shou Tseng;
Wen-Shou Tseng
Department of Materials Science and Engineering,
National Chiao Tung University
, Hsinchu 30010, Taiwan
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Cheng-Tzu Kuo
Cheng-Tzu Kuo
a)
Department of Materials Science and Engineering,
MingDao University
, Changhua 52345, Taiwan
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a)
Author to whom correspondence should be addressed; electronic mail: [email protected]
J. Vac. Sci. Technol. B 27, 3067–3072 (2009)
Article history
Received:
July 08 2009
Accepted:
October 26 2009
Citation
An-Ya Lo, Chuan-Shu Sun, Wen-Shou Tseng, Cheng-Tzu Kuo; Process and properties of the carbon nanotube assisted thin-film battery electrode by pulsed laser deposition. J. Vac. Sci. Technol. B 1 November 2009; 27 (6): 3067–3072. https://doi.org/10.1116/1.3264678
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