Sphere-forming polystyrene-block-poly(-butyl acrylate) diblock copolymer with catalytic amounts of photo-acid generator (PAG) formulated a pixelated photoresist. In thin films with single-sphere thickness, hexagonal arrays of spheres ( diameter on a 40 nm pitch) of PS within a matrix of PAG segregated in was obtained through solvent annealing. Upon exposure and post-exposure baking, the soluble matrix was converted to insoluble poly(acrylic acid), such that a negative pattern could be formed in the chlorobenzene developer. The concept of pixelation was demonstrated by exposing line and space patterns with increasing widths. In contrast to the width of the exposure fields that increased monotonically, the widths of the pixelated resist structures after development were quantized with respect to an integer number of rows of spheres. Furthermore, line edge roughness could be correlated with the size of each pixel (diameter of spherical domain).
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November 2009
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
December 04 2009
Control of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists
Huiman Kang;
Huiman Kang
Department of Chemical and Biological Engineering,
University of Wisconsin
, Madison, Wisconsin 53706
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Yun Jun Kim;
Yun Jun Kim
Department of Materials Science and Engineering,
University of Wisconsin
, Madison, Wisconsin 53706
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Padma Gopalan;
Padma Gopalan
Department of Materials Science and Engineering,
University of Wisconsin
, Madison, Wisconsin 53706
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Paul F. Nealey
Paul F. Nealey
a)
Department of Chemical and Biological Engineering,
University of Wisconsin
, Madison, Wisconsin 53706
Search for other works by this author on:
Huiman Kang
Yun Jun Kim
Padma Gopalan
Paul F. Nealey
a)
Department of Chemical and Biological Engineering,
University of Wisconsin
, Madison, Wisconsin 53706a)
Author to whom correspondence should be addressed; electronic mail: [email protected]
J. Vac. Sci. Technol. B 27, 2993–2997 (2009)
Article history
Received:
July 17 2009
Accepted:
October 05 2009
Citation
Huiman Kang, Yun Jun Kim, Padma Gopalan, Paul F. Nealey; Control of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists. J. Vac. Sci. Technol. B 1 November 2009; 27 (6): 2993–2997. https://doi.org/10.1116/1.3256632
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