Scratch nanolithography by scanning probe microscopy (SPM), which enables us to fabricate nanoscale grooves on the surfaces, was performed for ferromagnetic metals from the point of view of fabrication technologies of planar-type ferromagnetic tunnel junction devices. The authors investigated the relationship of various scan parameters (applied force, scan cycle, and scan speed) on the groove size of NiFe. Scratch experiments were carried out using a diamond-coated tip in ambient air. The width and depth of the fabricated grooves were clearly controlled by the applied force and the number of scan cycles. In addition, SPM scratching with various applied forces was performed on Ni surfaces and scratching properties of Ni were compared to those of NiFe. The results suggested the differences of nanoscale patterning properties between such materials. Furthermore, a direct modification of NiFe nanostructures by SPM scratching caused a variation of electrical properties of the structures. These results imply that SPM scratch nanolithography is promising for the fabrication of nanoscale devices.
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March 2009
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
April 01 2009
Nanoscale patterning of NiFe surface by scanning probe microscopy scratch nanolithography Available to Purchase
Kazuya Miyashita;
Kazuya Miyashita
Department of Electrical and Electronic Engineering,
Tokyo University of Agriculture and Technology
, Koganei, Tokyo 184-8588, Japan
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Shinya Nishimura;
Shinya Nishimura
Department of Electrical and Electronic Engineering,
Tokyo University of Agriculture and Technology
, Koganei, Tokyo 184-8588, Japan
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Takashi Toyofuku;
Takashi Toyofuku
Department of Electrical and Electronic Engineering,
Tokyo University of Agriculture and Technology
, Koganei, Tokyo 184-8588, Japan
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Jun-ichi Shirakashi
Jun-ichi Shirakashi
a)
Department of Electrical and Electronic Engineering,
Tokyo University of Agriculture and Technology
, Koganei, Tokyo 184-8588, Japan
Search for other works by this author on:
Kazuya Miyashita
Department of Electrical and Electronic Engineering,
Tokyo University of Agriculture and Technology
, Koganei, Tokyo 184-8588, Japan
Shinya Nishimura
Department of Electrical and Electronic Engineering,
Tokyo University of Agriculture and Technology
, Koganei, Tokyo 184-8588, Japan
Takashi Toyofuku
Department of Electrical and Electronic Engineering,
Tokyo University of Agriculture and Technology
, Koganei, Tokyo 184-8588, Japan
Jun-ichi Shirakashi
a)
Department of Electrical and Electronic Engineering,
Tokyo University of Agriculture and Technology
, Koganei, Tokyo 184-8588, Japana)
Electronic mail: [email protected]
J. Vac. Sci. Technol. B 27, 953–957 (2009)
Article history
Received:
August 20 2008
Accepted:
January 05 2009
Citation
Kazuya Miyashita, Shinya Nishimura, Takashi Toyofuku, Jun-ichi Shirakashi; Nanoscale patterning of NiFe surface by scanning probe microscopy scratch nanolithography. J. Vac. Sci. Technol. B 1 March 2009; 27 (2): 953–957. https://doi.org/10.1116/1.3077488
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