Scratch nanolithography by scanning probe microscopy (SPM), which enables us to fabricate nanoscale grooves on the surfaces, was performed for ferromagnetic metals from the point of view of fabrication technologies of planar-type ferromagnetic tunnel junction devices. The authors investigated the relationship of various scan parameters (applied force, scan cycle, and scan speed) on the groove size of NiFe. Scratch experiments were carried out using a diamond-coated tip in ambient air. The width and depth of the fabricated grooves were clearly controlled by the applied force and the number of scan cycles. In addition, SPM scratching with various applied forces was performed on Ni surfaces and scratching properties of Ni were compared to those of NiFe. The results suggested the differences of nanoscale patterning properties between such materials. Furthermore, a direct modification of NiFe nanostructures by SPM scratching caused a variation of electrical properties of the structures. These results imply that SPM scratch nanolithography is promising for the fabrication of nanoscale devices.

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