In many early investigations of the ultraviolet (UV) imprinting process, imprint resists served as sacrificial etch barrier masks for pattern transfer onto the underlying layer. In this study, conductive photocurable resin incorporating silver nanoparticles was used in UV imprinting for the direct manufacture of electronic device structures. The materials were formulated simply by mixing acrylate-based UV-curable resin with nanosilver colloids. Successful photopolymerization was possible with these formulations without affecting the antistiction-treated surface chemistry of the stamp. Even with the increased viscosity due to silver (Ag) particulate inclusions, resin infiltration into the master patterns several micrometers deep occurred successfully during the imprinting process. Heat treatment and wet chemical etching followed the UV imprinting to shrink the polymer phase even further and to remove imprint residue to complete electrically conductive continuous media based on Ag nanoparticles.
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July 2008
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
August 12 2008
Direct UV-imprint lithography using conductive nanofiller-dispersed UV-curable resin
Jun-Hyuk Choi;
Jun-Hyuk Choi
a)
Department of Intelligent Precision Machine,
Korea Institute of Machinery and Materials
, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea
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Soon-Won Lee;
Soon-Won Lee
Department of Intelligent Precision Machine,
Korea Institute of Machinery and Materials
, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea
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Dae-Geun Choi;
Dae-Geun Choi
Department of Intelligent Precision Machine,
Korea Institute of Machinery and Materials
, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea
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Ki-Don Kim;
Ki-Don Kim
Department of Intelligent Precision Machine,
Korea Institute of Machinery and Materials
, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea
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Jun-Ho Jeong;
Jun-Ho Jeong
Department of Intelligent Precision Machine,
Korea Institute of Machinery and Materials
, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea
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Eung-Suk Lee
Eung-Suk Lee
Department of Intelligent Precision Machine,
Korea Institute of Machinery and Materials
, 171 Jang-dong, Yuseong-gu, Daejeon 305-343, Korea
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a)
Electronic mail: junhyuk@kimm.re.kr
J. Vac. Sci. Technol. B 26, 1390–1394 (2008)
Article history
Received:
June 08 2007
Accepted:
June 09 2008
Citation
Jun-Hyuk Choi, Soon-Won Lee, Dae-Geun Choi, Ki-Don Kim, Jun-Ho Jeong, Eung-Suk Lee; Direct UV-imprint lithography using conductive nanofiller-dispersed UV-curable resin. J. Vac. Sci. Technol. B 1 July 2008; 26 (4): 1390–1394. https://doi.org/10.1116/1.2953731
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