The Center for Nanotechnology has developed an advanced beamline dedicated to nanopatterning using the radiation from a new undulator on the Aladdin storage ring at the Synchrotron Radiation Center of the University of Wisconsin-Madison. Computer generated holograms and transmission interferometric gratings were fabricated and tested on the new extreme ultraviolet (EUV) exposure system. The authors have developed an accurate model, based on Fresnel-Kirchhoff integral diffraction theory, to analyze performance of real EUV interferometric and holographic lithography systems.
REFERENCES
1.
B. J.
Lin
, J. Microlithogr., Microfabr., Microsyst.
5
, 33005
(2006
), and the references therein.2.
3.
D. T.
Attwood
, Soft X-rays and Extreme Ultraviolet Radiation
(Cambridge University Press
, New York
, 1999
), 1st Ed.4.
S.-H.
Lee
, P.
Naulleau
, K. A.
Goldberg
, C.-H.
Cho
, S.-T.
Jeong
, and J.
Bokor
, Appl. Opt.
40
, 2655
(2001
).5.
J. A.
Hoffnagle
, W. D.
Hinsberg
, M.
Sanchez
, and F. A.
Houle
, J. Vac. Sci. Technol. B
17
, 3306
(1999
).6.
W.
Hinsberg
, G. M.
Wallraff
, C. E.
Larson
, B. W.
Davis
, V.
Deline
, S.
Raoux
, D.
Miller
, F. A.
Houle
, J.
Hoffnagle
, M. I.
Sanchez
, C.
Rettner
, L. K.
Sundberg
, D. R.
Medeiros
, R. R.
Dammel
, and W. E.
Conley
, Proc. SPIE
5376
, 21
(2004
).7.
H. H.
Solak
, J. Phys. D
39
, R171
(2006
).8.
E. H.
Anderson
, K.
Komatsu
, and H. I.
Smith
, J. Vac. Sci. Technol. B
6
, 216
(1988
);A.
Yen
, E. H.
Anderson
, R. A.
Ghanbari
, M. L.
Schattenburg
, and H. I.
Smith
, Appl. Opt.
31
, 4540
(1992
).
[PubMed]
9.
M.
Wei
, D. T.
Attwood
, T. K.
Gustafson
, and E. H.
Anderson
, J. Vac. Sci. Technol. B
12
, 3648
(1994
).10.
M. L.
Schattenburg
, C.
Chen
, P. N.
Everett
, J.
Ferrera
, P.
Konkola
, and H. I.
Smith
, J. Vac. Sci. Technol. B
17
, 2692
(1999
).11.
H. H.
Solak
, D.
He
, W.
Li
, S.
Singh-Gasson
, F.
Cerrina
, B. H.
Sohn
, X. M.
Yang
, and P.
Nealey
, Appl. Phys. Lett.
75
, 2328
(1999
).12.
Y.-C.
Cheng
, A.
Isoyan
, J.
Wallace
, M.
Khan
, and F.
Cerrina
, Appl. Phys. Lett.
90
, 023116
(2007
).13.
K.
Eidmann
et al., J. X-Ray Sci. Technol.
2
, 259
(1990
).14.
H. W.
Schnopper
, L. P.
Van Speybroeck
, J. P.
Delvaille
, A.
Epstein
, E.
Kallne
, R. Z.
Bachrach
, J.
Dijkstra
, and L.
Lantward
, Appl. Opt.
16
, 1088
(1977
).15.
M.
Born
and E.
Wolf
, Principles of Optics
(Macmillan
, New York
, 1964
), 7th Ed., Chap. 8, p. 412
.16.
L. E.
Ruggles
, M. E.
Cuneo
, J. L.
Porter
, D. F.
Wenger
, and W. W.
Simpson
, Rev. Sci. Instrum.
72
, 1218
(2001
).17.
Center for X-Ray Optics at Lawrence Berkeley National Laboratory, website http://www-cxro.lbl.gov/
18.
M.
Khan
, S.
Bollepalli
, and F.
Cerrina
, J. Vac. Sci. Technol. B
15
, 2255
(1997
).19.
M. C.
Marconi
, J. L. A.
Chilla
, C. H.
Moreno
, B. R.
Benware
, and J. J.
Rocca
, Phys. Rev. Lett.
79
, 2799
(1997
).© 2007 American Vacuum Society.
2007
American Vacuum Society
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