Recent upgrades made to the SEMATECH Berkeley microfield exposure tool are summarized and some of the latest resist characterization results are presented. Tool illumination uniformity covering the full wafer-side field of view is demonstrated and intrawafer focus control of is shown. Printing results demonstrate chemically amplified resist resolution of dense and semi-isolated. Moreover, contact printing results show that shot noise is not a dominant issue in current contact printing performance.
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© 2007 American Vacuum Society.
2007
American Vacuum Society
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