The problem of nanoparticle contamination on critical surfaces is becoming more and more important for the semiconductor industry. Under the low pressure conditions, as, e.g., prevalent in the extreme ultraviolet lithography (EUVL), generally two different deposition mechanisms need to be distinguished: impaction of high speed particles and diffusion of low speed particles. To protect EUVL photomasks from particle contamination, it is intended to maintain them facing down to make use of gravitational settling and to establish a temperature gradient below the mask surface to make use of thermophoresis. A simple theoretical approach to estimate the effect of gravity and thermophoresis on the diffusional nanoparticle deposition on downward facing surfaces, e.g., of EUVL photomasks, under low pressure conditions (, ) is described in this article. The time dependent diffusional displacement of particles is compared with the gravitational and with the combined thermophoretic and gravitational settling. Initially, the diffusional displacement is always larger than the distance, particles have traveled due to gravity or gravity plus thermophoresis. Since thermophoresis and gravity move the particles away from the downward facing critical surface, while diffusion might cause a particle to move towards the surface, a certain risk exists that particles might deposit on the mask. Due to the different time and pressure dependencies of diffusional displacement ( and ) on the one side and gravitational and thermophoretic settlings ( and ) on the other side, gravity and the combined effect of gravity and thermophoresis can overcome diffusion only after a certain time and distance. The approach presented here allows the estimation whether particle contamination is likely or not. The authors found that if only gravity is acting as a protecting force against diffusion, only the deposition of particles larger than is unlikely, whereas smaller particles might still be deposited. When a temperature gradient of is established adjacent to the critical surface to make use of thermophoresis, the deposition of all particles down to becomes quite unlikely for pressure levels of and above.
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January 2007
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
December 29 2006
Simple theoretic approach to estimate the effect of gravity and thermophoresis on the diffusional nanoparticle contamination under low pressure conditions Available to Purchase
Christof Asbach;
Christof Asbach
a)
Institute of Energy and Environmental Technology (IUTA) e.V.
, 47229 Duisburg, Germany
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Heinz Fissan;
Heinz Fissan
Institute of Energy and Environmental Technology (IUTA) e.V.
, 47229 Duisburg, Germany
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Jung Hyeun Kim;
Jung Hyeun Kim
Department of Chemical Engineering,
University of Seoul
, Seoul 130-743, Korea
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Se-Jin Yook;
Se-Jin Yook
Particle Technology Laboratory,
University of Minnesota
, Minneapolis, Minnesota 55455
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David Y. H. Pui
David Y. H. Pui
b)
Particle Technology Laboratory,
University of Minnesota
, Minneapolis, Minnesota 55455
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Christof Asbach
a)
Heinz Fissan
Jung Hyeun Kim
Se-Jin Yook
David Y. H. Pui
b)
Institute of Energy and Environmental Technology (IUTA) e.V.
, 47229 Duisburg, Germanya)
Electronic mail: [email protected]
b)
Electronic mail: [email protected]
J. Vac. Sci. Technol. B 25, 47–53 (2007)
Article history
Received:
December 02 2005
Accepted:
November 08 2006
Citation
Christof Asbach, Heinz Fissan, Jung Hyeun Kim, Se-Jin Yook, David Y. H. Pui; Simple theoretic approach to estimate the effect of gravity and thermophoresis on the diffusional nanoparticle contamination under low pressure conditions. J. Vac. Sci. Technol. B 1 January 2007; 25 (1): 47–53. https://doi.org/10.1116/1.2404685
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