Microphotonic resonators are very sensitive to sidewall roughness. Several structures with sub- gap between bus and ring have been patterned on silicon-on-insulator wafer with electron-beam lithography at different doses. The authors’ direct Monte Carlo (DMC) model has been used to model the electron scattering and energy deposition to predict proximity effects and image modulation. By comparing the point spread function from DMC with independent experimental results, the DMC model has been validated. Experimentally, the line edge roughness (LER) study has been carried out to include both the first order (standard deviation) and the second order of statistical analysis (correlation length). The authors found that the LER is not uniform and varies with the position along the pattern—this nonlocal LER may have profound implications for the performance of the devices. The highest local LER is obtained at the position when the bus is closest to the ring. This phenomenon will be exacerbated when the gap size becomes smaller and will affect coupling efficiency of the waveguides.
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January 2007
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
January 26 2007
Local line edge roughness in microphotonic devices: An electron-beam lithography study
Yuansheng Ma;
Yuansheng Ma
Electrical and Computer Engineering,
University of Wisconsin-Madison
, Wisconsin 53706
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Yang-chun Cheng;
Yang-chun Cheng
Electrical and Computer Engineering,
University of Wisconsin-Madison
, Wisconsin 53706
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Franco Cerrina;
Franco Cerrina
a)
Electrical and Computer Engineering,
University of Wisconsin-Madison
, Wisconsin 53706
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T. Barwicz;
T. Barwicz
Research Laboratory of Electronics,
Massachusetts Institute of Technology
, Cambridge, Massachusetts 02139-4307
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H. I. Smith
H. I. Smith
Research Laboratory of Electronics,
Massachusetts Institute of Technology
, Cambridge, Massachusetts 02139-4307
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a)
Author to whom correspondence should be addressed; electronic mail: [email protected]
J. Vac. Sci. Technol. B 25, 235–241 (2007)
Article history
Received:
July 25 2005
Accepted:
December 01 2006
Citation
Yuansheng Ma, Yang-chun Cheng, Franco Cerrina, T. Barwicz, H. I. Smith; Local line edge roughness in microphotonic devices: An electron-beam lithography study. J. Vac. Sci. Technol. B 1 January 2007; 25 (1): 235–241. https://doi.org/10.1116/1.2426978
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