Acrylates have been used as patterning monomers in step and flash imprint lithography. Vinyl ether formulations have a lower viscosity, faster curing rate, and higher tensile strength than acrylate formulations. However, the lack of commercially available, silicon-containing vinyl ether monomers has required the synthesis of several new vinyl ethers. An ideal monomer has low viscosity and low vapor pressure. The vapor pressure of silicon-containing vinyl ethers was predicted using the Joback-Reid, Lyderson, and Lee-Kesler methods. BVMDSO (1,1,3,3-tetramethyl-1,3-bis(vinyloxymethyl)-disiloxane) has the lowest viscosity of the synthesized silicon-containing vinyl ethers that meet the volatility requirement for a 80 pl dispense volume. The formulation of BVMDSO, CHDVE (cyclohexanedimethanol divinyl ether), and TEGDVE (triethylene glycol divinyl ether) shows good tensile strength and modulus. The formulation of BVMDSO, CHDVE, TEGDVE, and fluorinated acetate can print a 30 nm line because it has a low separation force and high tensile modulus.
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November 2005
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
December 02 2005
Vinyl ether formulations for step and flash imprint lithography
E. K. Kim;
E. K. Kim
Department of Chemical Engineering,
The University of Texas at Austin
, Austin, Texas 78712
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M. D. Stewart;
M. D. Stewart
Department of Chemical Engineering,
The University of Texas at Austin
, Austin, Texas 78712
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K. Wu;
K. Wu
Department of Chemical Engineering,
The University of Texas at Austin
, Austin, Texas 78712
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F. L. Palmieri;
F. L. Palmieri
Department of Chemical Engineering,
The University of Texas at Austin
, Austin, Texas 78712
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M. D. Dickey;
M. D. Dickey
Department of Chemical Engineering,
The University of Texas at Austin
, Austin, Texas 78712
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J. G. Ekerdt;
J. G. Ekerdt
Department of Chemical Engineering,
The University of Texas at Austin
, Austin, Texas 78712
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C. G. Willson
C. G. Willson
a)
Department of Chemical Engineering,
The University of Texas at Austin
, Austin, Texas 78712
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a)
Author to whom correspondence should be addressed; electronic mail: willson@che.utexas.edu
J. Vac. Sci. Technol. B 23, 2967–2971 (2005)
Article history
Received:
July 05 2005
Accepted:
October 10 2005
Citation
E. K. Kim, M. D. Stewart, K. Wu, F. L. Palmieri, M. D. Dickey, J. G. Ekerdt, C. G. Willson; Vinyl ether formulations for step and flash imprint lithography. J. Vac. Sci. Technol. B 1 November 2005; 23 (6): 2967–2971. https://doi.org/10.1116/1.2131881
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