Resists using polyphenol resin are introduced to reduce line-edge roughness (LER), and the spatial frequency characteristics of LER are evaluated. It is found that the long-period components of LER are suppressed in our low molecular-weight polyphenol resists. Device simulation using the measured LER shows that our polyphenol-based resist can drastically reduce the number of low-threshold-voltage transistors compared with a conventional resist due to reduced long-period LER. Because LER impact is more serious as the transistor width shrinks, our results suggest that the use of the polyphenol-type resist will be more effective in improving device performance in future lithography process. In addition, it is shown that spectral analysis is a powerful tool for LER evaluation, especially from the viewpoint of device performance estimation.
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November 2005
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
December 01 2005
Spectral analysis of line-edge roughness in polyphenol EB-resists and its impact on transistor performance
Atsuko Yamaguchi;
Atsuko Yamaguchi
a)
Center Research Laboratory,
Hitachi, Ltd.
, Kokubunji-shi, Tokyo 185-8601, Japan
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Hiroshi Fukuda;
Hiroshi Fukuda
Center Research Laboratory,
Hitachi, Ltd.
, Kokubunji-shi, Tokyo 185-8601, Japan
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Tadashi Arai;
Tadashi Arai
Center Research Laboratory,
Hitachi, Ltd.
, Kokubunji-shi, Tokyo 185-8601, Japan
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Jiro Yamamoto;
Jiro Yamamoto
Center Research Laboratory,
Hitachi, Ltd.
, Kokubunji-shi, Tokyo 185-8601, Japan
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Taku Hirayama;
Taku Hirayama
Tokyo Ohka Kogyo Co., Ltd.
, Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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Daiju Shiono;
Daiju Shiono
Tokyo Ohka Kogyo Co., Ltd.
, Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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Hideo Hada;
Hideo Hada
Tokyo Ohka Kogyo Co., Ltd.
, Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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Junichi Onodera
Junichi Onodera
Tokyo Ohka Kogyo Co., Ltd.
, Tabata, Samukawa-machi, Koza-gun, Kanagawa 253-0114, Japan
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a)
Author to whom correspondence should be addressed; electronic mail: [email protected]
J. Vac. Sci. Technol. B 23, 2711–2715 (2005)
Article history
Received:
June 20 2005
Accepted:
September 12 2005
Citation
Atsuko Yamaguchi, Hiroshi Fukuda, Tadashi Arai, Jiro Yamamoto, Taku Hirayama, Daiju Shiono, Hideo Hada, Junichi Onodera; Spectral analysis of line-edge roughness in polyphenol EB-resists and its impact on transistor performance. J. Vac. Sci. Technol. B 1 November 2005; 23 (6): 2711–2715. https://doi.org/10.1116/1.2110318
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