Previous work with the mechanical properties of step and flash imprint lithography etch barrier materials has shown bulk volumetric shrinkage trends that could impact imprinted feature dimensions and profile. This article uses mesoscopic and finite element modeling techniques to model the behavior of the etch barrier during polymerization. Model results are then compared to cross section images of template and etch barrier. Volumetric shrinkage is seen to impact imprinted feature profiles largely as a change in feature height.

Topics
Metrology, Elastic modulus, Poisson's ratio, Scanning electron microscopy, Flash imprint lithography, Thin films, Transmission electron microscopy, Finite-element analysis, Optical coatings, Photopolymerisation
© 2005 American Vacuum Society.
2005
American Vacuum Society
You do not currently have access to this content.