Calixarenes of a variety of molecular weights and with several different functional attachments have been studied as high resolution, high contrast negative electron beam resists. In this article, results are presented for a new type of calixarene molecule to be used as an electron beam resist. The molecule differs from previous calixarene resists through the use of bridging groups to limit its conformational mobility and by having only a partial functionalization of the available phenol units with allyl groups to enhance the resist sensitivity. Both the sensitivity and contrast of the calixarene were measured. The measured contrast was found to be 4, while the sensitivity was which is comparable to other fully functionalized calix[6]arene resists. A closer comparison of this calixarene with similar calixarenes indicates that the measured sensitivity is better than would be expected for this partially functionalized molecule and that full functionalization might not be necessary to obtain a significant benefit from the functional groups.
Skip Nav Destination
,
,
,
,
,
Article navigation
September 2005
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
September 14 2005
Synthesis, characterization, and investigation of a conformationally immobile calix[6]arene as a negative electron beam resist Available to Purchase
Gabriel H. Monreal;
Gabriel H. Monreal
Department of Chemistry,
Texas State University-San Marcos
, San Marcos, Texas 78666
Search for other works by this author on:
Sara J. Staggs;
Sara J. Staggs
Department of Chemistry,
Texas State University-San Marcos
, San Marcos, Texas 78666
Search for other works by this author on:
Michael T. Blanda;
Michael T. Blanda
Department of Chemistry,
Texas State University-San Marcos
, San Marcos, Texas 78666
Search for other works by this author on:
Wilhelmus J. Geerts;
Wilhelmus J. Geerts
Department of Physics,
Texas State University-San Marcos
, San Marcos, Texas 78666
Search for other works by this author on:
Heather C. Galloway;
Heather C. Galloway
Department of Physics,
Texas State University-San Marcos
, San Marcos, Texas 78666
Search for other works by this author on:
Gregory F. Spencer
Gregory F. Spencer
a)
Department of Physics,
Texas State University-San Marcos
, San Marcos, Texas 78666
Search for other works by this author on:
Gabriel H. Monreal
Sara J. Staggs
Michael T. Blanda
Wilhelmus J. Geerts
Heather C. Galloway
Gregory F. Spencer
a)
Department of Chemistry,
Texas State University-San Marcos
, San Marcos, Texas 78666a)
Electronic mail: [email protected]
J. Vac. Sci. Technol. B 23, 1998–2002 (2005)
Article history
Received:
May 10 2005
Accepted:
July 18 2005
Citation
Gabriel H. Monreal, Sara J. Staggs, Michael T. Blanda, Wilhelmus J. Geerts, Heather C. Galloway, Gregory F. Spencer; Synthesis, characterization, and investigation of a conformationally immobile calix[6]arene as a negative electron beam resist. J. Vac. Sci. Technol. B 1 September 2005; 23 (5): 1998–2002. https://doi.org/10.1116/1.2038027
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Citing articles via
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Science challenges and research opportunities for plasma applications in microelectronics
David B. Graves, Catherine B. Labelle, et al.
Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications
A. S. Stodolna, T. W. Mechielsen, et al.
Related Content
Functionalization dependence of the electron beam sensitivity for a conformationally immobile calix[6]arene resist
J. Vac. Sci. Technol. B (August 2011)
Evaluation of calixarene—derivatives as high-resolution negative tone electron-beam resists
J. Vac. Sci. Technol. B (December 2002)
Synthesis and characterization of calixarene derivatives as resist materials for electron-beam lithography
J. Vac. Sci. Technol. B (January 2006)
Characteristics of a novel calix[8]arene modified with carbon nanotubes thin films for metal cations detection
AIP Conf. Proc. (May 2013)
High resolution electron beam lithography using a chemically amplified calix[4]arene based resist
J. Vac. Sci. Technol. B (December 2004)