Microfabricated field emitters have shown the potential for very high current densities and total emission currents . However, realizing this potential has been elusive, primarily because these cathodes exhibit insufficient emission uniformity over an emitter array. In this article we report the development of an in situ processing method based on emitter tip self-heating during operation that is shown to improve emission uniformity between emitter tips. Two tips differing in emission current by three orders of magnitude for a given voltage as fabricated are shown to be essentially identical in their emission characteristics after controlled pulsing to very high emission current. When the method was applied to a 50 000 tip array, it produced 300 mA of emission . The experimental arrangement prevented advancing to higher emission levels due to space charge limitations. It is expected that 1 A of emission at is possible with appropriate modifications to the experimental apparatus.
Skip Nav Destination
Article navigation
March 2005
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
April 06 2005
High current, high current density field emitter array cathodes
P. R. Schwoebel;
P. R. Schwoebel
a)
MicroSystems Engineering Center, SRI International
, 333 Ravenswood Avenue, Menlo Park, California 94025
Search for other works by this author on:
C. A. Spindt;
C. A. Spindt
MicroSystems Engineering Center, SRI International
, 333 Ravenswood Avenue, Menlo Park, California 94025
Search for other works by this author on:
C. E. Holland
C. E. Holland
MicroSystems Engineering Center, SRI International
, 333 Ravenswood Avenue, Menlo Park, California 94025
Search for other works by this author on:
a)
Author to whom correspondence should be addressed; electronic mail: pauls@chtm.unm.edu
J. Vac. Sci. Technol. B 23, 691–693 (2005)
Article history
Received:
September 24 2004
Accepted:
November 22 2004
Citation
P. R. Schwoebel, C. A. Spindt, C. E. Holland; High current, high current density field emitter array cathodes. J. Vac. Sci. Technol. B 1 March 2005; 23 (2): 691–693. https://doi.org/10.1116/1.1849189
Download citation file:
Sign in
Don't already have an account? Register
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
Pay-Per-View Access
$40.00
Citing articles via
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Novel low-temperature and high-flux hydrogen plasma source for extreme-ultraviolet lithography applications
A. S. Stodolna, T. W. Mechielsen, et al.
Vertical silicon nanowedge formation by repetitive dry and wet anisotropic etching combined with 3D self-aligned sidewall nanopatterning
Yasser Pordeli, Céline Steenge, et al.
Related Content
Thermal field forming of Spindt cathode arrays
J. Vac. Sci. Technol. B (January 2015)
Direct measurement of emission current distribution of Spindt-type field emitters
J. Vac. Sci. Technol. B (March 2001)
Electron emission enhancement by overcoating molybdenum field‐emitter arrays with titanium, zirconium, and hafnium
J. Vac. Sci. Technol. B (March 1995)
Emission characteristics of Spindt-type field emitter arrays in oxygen ambient
J. Vac. Sci. Technol. B (March 1999)
Beam profile measurement of volcano-structured double-gate Spindt-type field emitter arrays
J. Vac. Sci. Technol. B (March 2016)