In the lateral shearing interferometer for EUVL PO at-wavelength measurement, a grating is used to separate and shear the test wavefront. Normally, the astigmatism component of the test wavefront is difficult to be measured from the phase distribution tilt because the grating position influences it also. We found the grating position influences the tilt component of the interferogram phase distribution along the shear direction only. A part of the astigmatism can be measured from the tilt component perpendicular to the shear direction. To measure the other part of astigmatism, we perform a measurement with the shear direction in 45°. From the tilt component of the phase distribution in 135°, the other part of the astigmatism can be measured. By these two measurements, the whole astigmatism can be measured. We analyzed the measurement errors and showed the conditions for high accuracy astigmatism measurement.
Skip Nav Destination
,
,
,
,
,
,
,
Article navigation
November 2004
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
The 48th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication
1-4 June 2004
San Diego, California (USA)
Research Article|
December 10 2004
Astigmatism measurement by lateral shearing interferometer
Zhiqiang Liu;
Zhiqiang Liu
a)
Extreme Ultraviolet Lithography System Development Association (EUVA)
, Wave Front Measurement Laboratory, Nikon Corporation, 6-3, Nishi-ohi, 1-Chome, Shinagana-ku, Tokyo, Japan
Search for other works by this author on:
Kasumi Sugisaki;
Kasumi Sugisaki
Extreme Ultraviolet Lithography System Development Association (EUVA)
, Wave Front Measurement Laboratory, Nikon Corporation, 6-3, Nishi-ohi, 1-Chome, Shinagana-ku, Tokyo, Japan
Search for other works by this author on:
Mikihiko Ishii;
Mikihiko Ishii
Extreme Ultraviolet Lithography System Development Association (EUVA)
, Wave Front Measurement Laboratory, Nikon Corporation, 6-3, Nishi-ohi, 1-Chome, Shinagana-ku, Tokyo, Japan
Search for other works by this author on:
Yucong Zhu;
Yucong Zhu
Extreme Ultraviolet Lithography System Development Association (EUVA)
, Wave Front Measurement Laboratory, Nikon Corporation, 6-3, Nishi-ohi, 1-Chome, Shinagana-ku, Tokyo, Japan
Search for other works by this author on:
Jun Saito;
Jun Saito
Extreme Ultraviolet Lithography System Development Association (EUVA)
, Wave Front Measurement Laboratory, Nikon Corporation, 6-3, Nishi-ohi, 1-Chome, Shinagana-ku, Tokyo, Japan
Search for other works by this author on:
Akiyosi Suzuki;
Akiyosi Suzuki
Extreme Ultraviolet Lithography System Development Association (EUVA)
, Wave Front Measurement Laboratory, Nikon Corporation, 6-3, Nishi-ohi, 1-Chome, Shinagana-ku, Tokyo, Japan
Search for other works by this author on:
Masanobu Hasegawa;
Masanobu Hasegawa
Extreme Ultraviolet Lithography System Development Association (EUVA)
, Wave Front Measurement Laboratory, Nikon Corporation, 6-3, Nishi-ohi, 1-Chome, Shinagana-ku, Tokyo, Japan
Search for other works by this author on:
Katsuhiko Murakami
Katsuhiko Murakami
Extreme Ultraviolet Lithography System Development Association (EUVA)
, Wave Front Measurement Laboratory, Nikon Corporation, 6-3, Nishi-ohi, 1-Chome, Shinagana-ku, Tokyo, Japan
Search for other works by this author on:
Zhiqiang Liu
a)
Kasumi Sugisaki
Mikihiko Ishii
Yucong Zhu
Jun Saito
Akiyosi Suzuki
Masanobu Hasegawa
Katsuhiko Murakami
Extreme Ultraviolet Lithography System Development Association (EUVA)
, Wave Front Measurement Laboratory, Nikon Corporation, 6-3, Nishi-ohi, 1-Chome, Shinagana-ku, Tokyo, Japana)
Electronic mail: [email protected]
J. Vac. Sci. Technol. B 22, 2980–2983 (2004)
Article history
Received:
July 06 2004
Accepted:
September 21 2004
Citation
Zhiqiang Liu, Kasumi Sugisaki, Mikihiko Ishii, Yucong Zhu, Jun Saito, Akiyosi Suzuki, Masanobu Hasegawa, Katsuhiko Murakami; Astigmatism measurement by lateral shearing interferometer. J. Vac. Sci. Technol. B 1 November 2004; 22 (6): 2980–2983. https://doi.org/10.1116/1.1815307
Download citation file:
Pay-Per-View Access
$40.00
Sign In
You could not be signed in. Please check your credentials and make sure you have an active account and try again.
53
Views
Citing articles via
Future of plasma etching for microelectronics: Challenges and opportunities
Gottlieb S. Oehrlein, Stephan M. Brandstadter, et al.
Transferable GeSn ribbon photodetectors for high-speed short-wave infrared photonic applications
Haochen Zhao, Suho Park, et al.
Exploring SiC CVD growth parameters compatible with remote epitaxy
Daniel J. Pennachio, Jenifer R. Hajzus, et al.
Related Content
Lithographic characterization of the field dependent astigmatism and alignment stability of a 0.3 numerical aperture extreme ultraviolet microfield optic
J. Vac. Sci. Technol. B (September 2005)
Wave-front errors of reference spherical waves in high-numerical aperture point diffraction interferometers
J. Vac. Sci. Technol. B (January 2004)
Calibration method to characterize the accuracy of phase-shifting point diffraction interferometer
Rev. Sci. Instrum. (March 2011)
Straightforward correction for the astigmatism of a Czerny–Turner spectrometer
Rev. Sci. Instrum. (February 2010)
Calibration of the oscillation amplitude of quartz tuning fork-based force sensors with astigmatic displacement microscopy
Rev. Sci. Instrum. (January 2024)