A relatively simple and effective method to directly fabricate large-area field emission microtip arrays on -type silicon wafers is proposed. The presented fabrication approach of silicon microtip devices mainly involves photolithography, thermal shaping and consolidation, argon ion beam etching and sputtering deposition. The measurements show that the silicon field emission microtip devices fabricated have good structural uniformity and electrical characteristics. The center-to-center spacing of microtips fabricated is and the typical microtip height about . The scanning electron microscope analysis and the surface style measurements are carried out for the surface morphologies of silicon microtips, such as square-bottom pyramid-shaped microtips, cone-shaped microtips, square-bottom circle-microtips, and circle-bottom circle-microtips. Electrical measurements are performed to obtain the typical field emission properties of the devices. The experiment results show that the method utilized can be applied to fabricate silicon field emission microtip arrays and circle-microtip arrays of larger area.
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November 2004
This content was originally published in
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena
Research Article|
December 09 2004
Application of ion beam etching technique to the direct fabrication of silicon microtip arrays
Xinyu Zhang;
Xinyu Zhang
a)
Institute for Pattern Recognition for Artificial Intelligence, Huazhong University of Science & Technology
, Wuhan 430074, People's Republic of China
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Qingle Tang;
Qingle Tang
b)
Huazhong Research Institute of Electro-Optical Technology
, Wuhan 430074, People's Republic of China
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Junming Tang
Junming Tang
Department of Physics, Huazhong University of Science & Technology
, Wuhan 430074, People's Republic of China
Search for other works by this author on:
Xinyu Zhang
a)
Qingle Tang
b)
Junming Tang
Institute for Pattern Recognition for Artificial Intelligence, Huazhong University of Science & Technology
, Wuhan 430074, People's Republic of Chinaa)
Electronic mail: [email protected]
b)
Electronic mail: [email protected]
J. Vac. Sci. Technol. B 22, 2853–2859 (2004)
Article history
Received:
October 22 2003
Accepted:
October 07 2004
Citation
Xinyu Zhang, Qingle Tang, Junming Tang; Application of ion beam etching technique to the direct fabrication of silicon microtip arrays. J. Vac. Sci. Technol. B 1 November 2004; 22 (6): 2853–2859. https://doi.org/10.1116/1.1826061
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