We have designed and fabricated shape-controlled three-dimensional structures combining electron- beam and ultraviolet (UV) lithography. Starting with a tiff file format, a gray scale pattern using a high energy beam sensitive mask is produced with electron-beam direct writing. In only a one step UV exposure, an optical lens and a photonic band gap structure in 16.5 μm thick AZ 4562 positive photoresist, with controlled profile and smooth resist surface, were fabricated. A three-dimensional grid structure was also transferred to a 100 μm thick SU-8 negative photoresist.

1.
M. T.
Gale
,
M.
Rossi
,
J.
Pedersen
, and
H.
Schütz
,
Opt. Eng. (Bellingham)
33
,
3556
(
1994
).
2.
K.
Petersen
and
J.
Brown
,
Proc. Transducers
85
,
361
(
1985
).
3.
V. V.
Aristov
,
S. V.
Dubonos
,
R. Ya.
Dyachenko
,
B. N.
Matveev
,
H.
Raith
,
A. A.
Svintsov
, and
S. I.
Zaitsev
,
J. Vac. Sci. Technol. B
13
,
2526
(
1995
).
4.
W.
Daschner
,
M.
Larsson
, and
S.
Lee
,
Appl. Opt.
34
,
2534
(
1995
).
5.
U. D.
Zeitner
and
P.
Dannberg
,
Proc. SPIE
4440
,
44
(
2001
).
6.
W.
Henke
,
W.
Hoppe
,
H. J.
Quenzer
,
P.
Staudt Fischbach
, and
B.
Wagner
,
Jpn. J. Appl. Phys., Part 1
33
,
6809
(
1994
).
7.
K.
Reimer
,
W.
Henke
,
H. J.
Quenzer
,
W.
Pilz
, and
B.
Wagner
,
Microelectron. Eng.
30
,
559
(
1996
).
8.
S.
Nicolas
,
E.
Dufour-Gergam
,
A.
Bosseboeuf
,
T.
Bourouina
,
J. P.
Gilles
, and
J. P.
Grandchamp
,
J. Micromech. Microeng.
8
,
95
(
1998
).
9.
K.
Reimer
,
U.
Hofmann
,
M.
Jurss
,
W.
Pilz
,
H. J.
Quenzer
, and
B.
Wagner
,
Proc. SPIE
3226
,
2
(
1997
).
10.
W.
Daschner
,
P.
Long
,
R.
Stein
,
C.
Wu
, and
S. H.
Lee
,
J. Vac. Sci. Technol. B
14
,
3730
(
1996
).
11.
B.
Gralak
,
G.
Tayeb
, and
S.
Enoch
,
Opt. Express
9
,
567
(
2001
).
This content is only available via PDF.
You do not currently have access to this content.